From experience, the etch seems to start only after ~30sec in solution, and the etch rate is quite fast. In about 1 min, I could etch 10nm Cr. It doesn't seem like the etch rate is linear in time and varies greatly (perhaps because it is expired), so it may undercut resist patterns significantly.
Best,
Dany
On Mon, Mar 29, 2010 at 10:27 AM, Kyunghoae Koo <koo1028@stanford.edu> wrote:
Dear Labmembers,
What is the etching rate of Cr etchant in snf? I need to etch 2nm buffer Cr layer. Lateral etching is not a big issue. How much time will be enough for that?
Thanks
Kyunghoae
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Kyung-Hoae Koo
PhD candidate
Stanford University
EE department
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