SOG and low-temperature frit glass

Hi,

 

I am interested in SOG (spin-on-glass) and low-temperature frit glass for (off-cleanroom usage). Before determining their feasibility for my purpose, I would like to obtain small amount of samples for test first. Could anyone be so kind to provide or direct me to right source for these samples?

 

Thanks and Happy Holidays.

 

Allen

Re: Announcement for a faculty director of SNF

SNF Lab Members, Faculty, and Staff:

I'd like to thank Yoshio for his kind words and support, and thank the
entire SNF staff for their effort, commitment, and friendship during my
brief tenure as Interim Director.

I join Yoshio in welcoming Roger as the SNF Faculty Director, and trust
that everyone will be as supportive of his efforts as you have been of mine.

Thank you again and Happy Holidays to all,

John

> Dear all,
>
> After the organizational change which we made in the beginning
> of this academic year, there have been significant improvements made in the
> SNF operations in terms of equipment performance and uptime. Many
> thanks should go to John Shott as the Interim Director for his hard
> work and dedication over the past several months, with the help of the
> SNF staff and a number of senior students, postdocs, and research
> associates.
>
> Now it is time to have a Faculty Director of SNF, as we
> begin the search for a new staff position, the Operations Director.
> Prof. Roger Howe has agreed to serve in this capacity of SNF
> Faculty Director effective immediately and he will work closely with
> John and the SNF faculty users as the point of contact. Roger reports to
> Dean Jim Plummer.
> While I will handle the other responsibilities of the NNIN Stanford site,
> e.g., the NNIN/NSF relationship and reporting, computational support,
> education, SEI, nanosafety, workshops, coordination with Nano-Center
> and SNL, Roger will focus on any organizational development and
> staffing improvement of SNF in order for us to prepare for the
> forthcoming NNIN recompetition -- coming just down the road in 2013.
>
> Please join me welcoming Roger to his new role as SNF Faculty Director.
>
> Cheers and wishing you all a happy holidays and a prosperous New Year!
>
> Yoshio
>

Re: Comment p5000etch SNF 2009-12-10 21:13:55: Chamber B

Re: Problem p5000etch SNF 2009-12-10 21:00:04: Chamber B

Re: Problem p5000etch SNF 2009-12-12 14:57:00: Ch. B is Offline

Re: Comment p5000etch SNF 2009-12-13 22:31:33: Chamber B

Re: Problem p5000etch SNF 2009-12-15 05:58:45: CHA: BCl3 flow error

Repaired vacuum leak on turbo purge line..

Announcement for a faculty director of SNF

Dear all,

After the organizational change which we made in the beginning
of this academic year, there have been significant improvements made in the
SNF operations in terms of equipment performance and uptime. Many
thanks should go to John Shott as the Interim Director for his hard
work and dedication over the past several months, with the help of the
SNF staff and a number of senior students, postdocs, and research
associates.

Now it is time to have a Faculty Director of SNF, as we
begin the search for a new staff position, the Operations Director.
Prof. Roger Howe has agreed to serve in this capacity of SNF
Faculty Director effective immediately and he will work closely with
John and the SNF faculty users as the point of contact. Roger reports to
Dean Jim Plummer.
While I will handle the other responsibilities of the NNIN Stanford site,
e.g., the NNIN/NSF relationship and reporting, computational support,
education, SEI, nanosafety, workshops, coordination with Nano-Center
and SNL, Roger will focus on any organizational development and
staffing improvement of SNF in order for us to prepare for the
forthcoming NNIN recompetition -- coming just down the road in 2013.

Please join me welcoming Roger to his new role as SNF Faculty Director.

Cheers and wishing you all a happy holidays and a prosperous New Year!

Yoshio

Annual Lab Shutdown, 12/16/09-1/5/10

Greetings Labmembers!

The lab is officially closed for business. We reopen on Tuesday,
January 5, at 7 am.

The wafersaw and the semhitachi systems which are located outside the
cleanroom will be available for labmember use, as maintenance and
facilities allow. Because there will be no waste pickup, the CMP will
not be available for use. A microscope with image capture will be made
available in the CAD/semihitachi room. The Tanner layout desktops and
ASML emulator will continue to be available in the CAD room. But please
be aware that all these tools will be unsupported by staff during this
time. As the University is shutdown during this time, no process and
administrative staff are available. Some Maintenance and Facilities
staff will be present, but will be busy performing routine annual
maintenance as well as installing new utilities and cleaning up.

Beware, the lab cleanup starts today. If you have items to rescue from
the clutches of process staff, come to the CAD room where we will be
collecting and sorting treasures from the lab.

Happy holidays!!

Your SNF Staff

Reminder: Ph.D. Oral- Linyou Cao, 1:00pm TODAY, Dec. 16, CISX 101

Optical Resonances in Semiconductor Nanowires

Linyou Cao

Brongersma Group

Department of Materials Science and Engineering

Time: Dec. 16th 1:00pm (Refreshments start at 12:45 pm)                   Location: CISX 101

Abstract:

Semiconductor nanowires constitute one of the most exciting frontiers of materials research because of their potential application in a wide range of important fields, including information technology, biomedicine, sustainable energy, and artificial intelligence.  Embarking on these exciting applications heavily hinges on a deep understanding of the fundamental physical properties of nanowires. For the first time, we experimentally demonstrate the existence of strong, tunable optical resonances in semiconductor nanowires, and propose an intuitive theoretical framework based on leaky mode resonances (LMRs) to understand and engineer the nanowire's optical properties. The optical resonances enable engineering of the nanowire's light absorption, scattering, and emission properties and a rational design of high-performance optoelectronic devices, including photodetectors, solar cells, and light emitters.  I will also show that coupled optical resonances in arrays of nanowire can give rise to many novel optical functionalities that do not exist in stand-alone nanowires, for example,  coupled nanowire optical waveguiding.

Physically, the optical resonances arise from strong and resonant coupling of light with leaky modes supported by the nanowires. When the light wavelength matches one of the allowed LMRs, the high refractive index wire can capture and trap the light by multiple internal reflections at its boundary and build up strong electromagnetic field inside. As a consequence, the photoresponse of the nanowire at the specific wavelengths can be dramatically enhanced.  By tuning the nanowire diameter, both the number of allowed LMRs in the nanowire and the spectral position of specific LMRs can be precisely controlled.   This size-dependent tunability provides a powerful guidance for the rational design of photonic devices with desired spectral, polarization response features. The technological promise of this approach is illustrated by the possibility to realize efficient germanium photodetectors in near infrared regime, silicon solar cells with 250% enhancement in solar absorption efficiency, and multicolored silicon nanostructures.

Optical coupling between neighboring nanowires provides extra latitude to manipulate light at the nanoscale. The essence of the optical coupling lies in the exchange of photons between the nanowires, much like the exchange of electrons between neighboring atoms in molecules.  Experimentally, it can be observed by monitoring the light scattering spectra of a bi-nanowire structure that consists of two closely-spaced, parallel nanowires of similar diameter. It will be shown that, unlike the optical coupling of classical microscale resonators, which can be described by conventional coupled mode theory (CMT), the much stronger coupling of nanowire resonators does not strictly follow this model. By taking into account the leaky nature of optical modes in the nanowire resonator, we propose a theoretical model, coupled leaky mode theory (CLMT), to account for the experimental observations and to point towards rational designs of complex nanostructure-arrays with desirable light-matter interaction features for nanophotonic applications. One exciting application is the efficient transfer of optical power at the nanoscale through a chain of coupled nanowires.

Overall, these results represent the first systematic studies on the optical resonances of semiconductor nanowires. The demonstrated general existence of the LMRs and the coupled LMRs cast new light on semiconductor nanostructures, and open up enormous opportunities to explore novel optical and optoelectronic functionalities in semiconductor nanostructures for photonics applications.

Time: Dec. 16th 1:00pm (Refreshments start at 12:45 pm)                   Location: CISX 101

Mouse from ald-metal computer

Whoever took the mouse from the ald-metal computer bring it back
immediately. If you are not sure if the USB mouse you stole is from
the ald-metal computer, doesn't matter: STOP STEALING. I'm anxious to
hear any legitimate excuse for this mouse being gone but it needs to
be back before shutdown (currently 19.5hours away).
J

Problem p5000etch SNF 2009-12-15 05:58:45: CHA: BCl3 flow error

Large fluctuation while trying to run CH.A METAL recipe

TiN thickness measurement using woollam

Hi,

I'm interested in measuring TiN thickness (~10nm) using woollam. Have anyone tried or succeed this task using woollam?

Many Thanks,

Wooshik Jung

Re: Problem p5000etch SNF 2009-12-14 08:50:20: ChA He supply pressure fault

Found the He cooling pump valve had been turned off. Turned on valve and ran two wafers with no problems.

Re: Comment p5000etch SNF 2009-12-14 07:24:46: All chamber offline?

Placed Ch.A and C online

Problem p5000etch SNF 2009-12-14 08:50:20: ChA He supply pressure fault

Comment p5000etch SNF 2009-12-14 07:24:46: All chamber offline?

Comment p5000etch SNF 2009-12-13 22:31:33: Chamber B

Picking up 5 scale leak behind the turbo pump close to the
gas feedthru inline filter. need to pin point the where the actual
leak is.

Problem p5000etch SNF 2009-12-12 14:57:00: Ch. B is Offline

FYI. Ch. B is actually offline by maintence due to the high leak rate. There is a note mentioning that taped to the machine, but I think it should be made explicit here on Coral when a chamber is taken offline.

Comment p5000etch SNF 2009-12-11 15:00:06: Wet cleaned Ch.C

Wet cleaned Ch.C and ran conditioning wafers.

And the Winners of the Guess the Candy Count and Guess the Labmembers in their Bunny Suits are...

Dear All,

 

I hope you enjoyed yourself at the Building party yesterday.  The winners of our two contest are:

 

1.        Roozbeh Parsa picked ALL the Staff Lab Members and one non Lab Member correctly.  We have a small courtesy gift for you at my desk.

2.       Dario Amodei guessed the closest number to the candy count.  The true number was 532 and Dario guessed at 512.  Your gift is the candy please come and collect it at my cubicle.

 

Thank you for coming and making the party a success!!

 

Your Party Planners, Marjorie, Mary and Maureen

 

 

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Nonstandard chemicals cleanup

Hello all,

*we are planning to cleanup the two flammable yellow cabinets and the
refrigerator during shut down.

We will get rid of any:

*Bottles with messy labels
Bottles that labels do not have date
Bottles that Labels do not show labmembers info or the name of the chemical
Bottles are that from 2008

You can get new labels and redo your chemicals if you like so please
take the time and take care of it by next week.

mahnaz

Comment p5000etch SNF 2009-12-10 21:13:55: Chamber B

Unable to hook up the leak detector, currently being use on other
down tool.

Problem p5000etch SNF 2009-12-10 21:00:04: Chamber B

Chamber B has big vacuum leak ,it when to above 1torr in
under a min.

Comment p5000etch SNF 2009-12-10 11:34:19: 2. Update chamber B

Wafers did not properly drop on blade after a 400s etch run.
I extended the over etch at 50 W from 10 s to 20 s and the pump time is 120s.
I ran three wafers in a row without any problems.
Maybe, it is possible to reduce the pump time but I tried to keep myself out of trouble.

Comment p5000etch SNF 2009-12-09 19:17:30: Update chamber B

To minimize the wafer mis-handling from Ch.B, please add a this step to your recipe.
-10 sec, 50 W ,250 mT, Ar plasma step before the final pump down. I shortened the final pump down to 15 sec withou a problem
Ran 96, 200 sec etch (Via etch recipe) without any faults.

Re: Problem p5000etch SNF 2009-12-08 22:58:59: He leak error in Ch.B

Cycled 96 wafers without a problem.

Re: Shutdown p5000etch SNF 2009-12-08 23:20:38: Could not retrieve wafer

Another user recovered the wafer. Added a 10 sec, 50 W ,250 mT, Ar plasma step before the final 15 sec pump down. Ran 96, 200 sec etch (Via etch recipe) without any problems.

Fwd: Tenure-Track Faculty Position: UC Berkeley Experimental Physical Chemistry

>From: "Berkeley Recruiting" <Do-Not-Reply@lbl.gov>
>To: "rissman@stanford.edu" <rissman@stanford.edu>
>Reply-To: chemdept.recruit@berkeley.edu
>Date: Thu, 10 Dec 2009 11:25:37 +1100
>Subject: Tenure-Track Faculty Position: UC Berkeley Experimental
>Physical Chemistry
>X-Mailer: createsend2.com
>X-Complaints-To: abuse@createsend2.com
>List-Unsubscribe: <http://unsub.createsend2.com/t/r/u/ktijhh/yduikithj/>
>
>The University of California, Berkeley and Lawrence Berkeley
>National Laboratory invite applicants for a tenure-track,
>assistant professor faculty position in experimental physical
>chemistry beginning in the fall of 2010. Creative candidates
>who show extraordinary promise or accomplishment in research
>and teaching in experimental physical chemistry are specifically
>sought. Research plans in solar energy conversion, including
>topics such as solar fuel, photocatalysis, and artificial
>photosynthesis, are essential.
>
>This tenure-track faculty position is jointly supported through
>the UC Berkeley Department of Chemistry and the Helios Project
>at Lawrence Berkeley National Laboratory.
>
>Applicants should send a curriculum vitae and a proposed
>research plan, and arrange to have three letters of
>recommendation sent to:
>
>Chair, Search Committee
>Department of Chemistry
>419 Latimer Hall
>University of California, Berkeley, CA 94720-1460.
>
>OR
>
>chemdept.recruit@berkeley.edu
>
>or
>
>Electronic submissions preferred via Candidate self-registration:
>http://chem-dept.berkeley.edu:80/sReg.php?i=59
>
>The link above allows candidates to register and upload
>application material. Once application materials have been
>uploaded, candidates will be given a URL where their referees
>may upload PDFs of their letters. Please refer references to the
>UC statement on confidentiality:
>http://www.chance.berkeley.edu/apo/evalltr.htm.
>
>Application material must be received by December 15, 2009.
>
>The University of California is an Equal Opportunity/Affirmative
>Action Employer. UC Berkeley is committed to diversity in all
>aspects of our mission and to addressing the family needs of
>faculty, including dual career couples and single parents.
>----
>
>This email was sent to rissman@stanford.edu.
>You can instantly unsubscribe from these emails by clicking the link below:
>http://molecularfoundry.createsend2.com/t/r/u/ktijhh/yduikithj/

Comment p5000etch SNF 2009-12-09 14:19:31: Update reliability test

Have cycle 64 wafers so far with no failures. 200 sec etch, with 10 sec 50W plasma declamp step and a 15 sec post process pumpdown.

PhD Defense - Leili Baghaei Rad - Thursday, 10:15 am, Packard 101

Hi everyone,

 

please join me for my defense on Thursday the 10^th of December in Packard 101 at 10:15 am (Stanford). The title of the seminar is: " Algorithmic reconstruction methods in diffraction microscopy using a priori information ". The abstract is attached.

 

Looking forward to seeing many of you.

 

Leili

 

--------------------------------------

Ph.D. Candidate, Stanford University

Department of Electrical Engineering

Allen Center for Integrated Systems

B-103, 420 Via Palou

Stanford, CA 94305

Comment p5000etch SNF 2009-12-09 10:55:45: Update

Wafer was recovered by another user.
Ran 32 wafers with the "declamp" plasma step before the final pump step with no problems. He leak rate was ~ 1.5 sccm for all wafers.
Lowered the power of the declamp step to 50 W from 150 W and will continue to cycle wafers.

REMINDER - One Last Get Together Before the Winter Closure - Please SAVE the Date - Thursday, December 10th from 2:00 to 4:00P.

Tomorrow (Thursday 12/10) is the building Holiday party from 2:00 – 4:00P.  Please come and enjoy and share your good cheer with all.  The party will be located on the first floor next to the exterior side of the Lithograph area for lab members for non-lab members it’s where the yellow paned windows are or the easiest thing to do is  listen for the good cheer.

 

Again, you are encouraged to share any holiday family dishes / treats with the crowd.  Yes you read that correctly just like years past there will be a HUGH crowd guessing the lab members in their bunny suits, doing the wafer toss, painting wafer ornaments and so much more

 

Please come!

 

Maureen

 

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

From: Maureen Baran [mailto:mbaran@stanford.edu]
Sent: Thursday, December 03, 2009 4:58 PM
To: cis-building@cis.stanford.edu; labmembers@snf.stanford.edu
Subject: One Last Get Together Before the Winter Closure - Please SAVE the Date - Thursday, December 10th from 2:00 to 4:00P.
Importance: High

 

Yes – it’s true – PLEASE SAVE THE DATE Thursday, December 10^th from 2 – 4P for another get together.  You can add to your growing collection of uniquely painted wafer ornaments and make more.   We will also have the return of the famous wafer toss and so much more. 

 

There will be plenty of soda, crackers and treats…  If you would like to make your  famous fruit cake, eggnog or your favorite family dip to add to the festivities you are encouraged to do so.

 

Thank you,

 

Maureen, Marjorie and Mary

 

 

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Shutdown p5000etch SNF 2009-12-08 23:20:38: Could not retrieve wafer

Wafer is currently stuck on blade. Blade does not recognize the wafer though, because it got tilted when it was extracted from the chamber. Tried the manual wafer move without any luck.

Problem p5000etch SNF 2009-12-08 22:58:59: He leak error in Ch.B

Got the usual error again. Wafer currently stuck in system on the robot. Trying to get it out right now, but for now machine isn't operable.

Fwd: DISSERTATION DEFENSE: Xinran Wang

DEPT OF PHYSICS


DISSERTATION DEFENSE

 

Ph.D. Candidate:  Xinran Wang
Research Advisor:  Prof. Hongjie Dai

Date: Tuesday, Dec. 15th, 2009

Time: 2pm (Refreshment starts at 1:45pm)
Location: CIS-X Auditorium (CISX-101)
Title: Graphene Nanoribbons: Synthesis, Properties and Electronics

Abstract:
Graphene, a two-dimensional single atomic layer of graphite, has emerged as a material with interesting physical and chemical properties and high potential for various applications such as sensors, transparent electrodes and electronics. Due to giant carrier mobility, graphene has gained much interest as a possible candidate for future molecular electronics. Bulk graphene is a semi-metal with zero bandgap, not suitable for high on/off ratio transistors. However, narrow (~ a few nanometer) graphene nanoribbons (GNRs) have been theoretically predicted to be semiconductors that afford high performance room temperature field-effect transistors.

In this presentation, I will talk about the synthesis, physical and chemical properties and electronic devices of GNRs down to a few nanometers wide. I will address several critical issues towards graphene electronics, including the fabrication and assessment of complementary GNR transistors and large scale patterning of narrow GNRs.

Probe station setup

Hi,

I recently set up a probe station measuring I-V curve of
a two-terminal device with thin tunneling oxide, which
is called as a Magnetic Tunnel Junction. These devices
are very vulnerable to static charges and often blow up
after a few measurements. I am concerned if my setup
in the probe station is causing this problem. So, if you
have some experience dealing with this kind of delicate
measurements I would be very grateful for any advice.

Thank you,
Larkhoon

Re: Comment p5000etch SNF 2009-11-27 22:12:57: Ran chamber clean on Ch.C

Archived

Re: Comment p5000etch SNF 2009-11-28 15:06:53: Ch.C clean may have fixed problem

Archived

Re: Comment p5000etch SNF 2009-12-03 13:35:12: Completed Ch.A wet clean

Archived

Re: Problem p5000etch SNF 2009-12-05 14:53:09: cassette indexer slacking off

Calibrated cap sensors

Re: Comment p5000etch SNF 2009-12-07 11:52:20: longer etches problematic ... run shorter etches

Archived

Re: Comment p5000etch SNF 2009-12-07 11:12:23: Update stuck wafer

Archived

Re: Problem p5000etch SNF 2009-12-04 23:41:57: wafer handling issues

Added a step to the VIA etch recipe before the final pump down step. It is a 10 sec, 150 Watt plasma, 250 mT with a 200 sccm Ar flow and 0 gauss on the electromagnet. The purpose of the step is to dissipate static that has built up on the clamp. Ran 20 wafers (200 sec etch) with no problems. I also reduced the final pump down time to 15 secs because I do not think its necessary to have such a long pump time.

Comment p5000etch SNF 2009-12-08 11:41:44: Update cannot create recipe

Field service looked into this problem a few months ago. They concluded that it was caused by a defective SBC board. The version of the board is old and is no longer supported. We've looked online but was unable to locate the same version. They recommended replacing individual chips on the board.

Re: Comment p5000etch SNF 2009-12-08 00:41:36: Cap sensors

Archived

Re: Problem p5000etch SNF 2009-12-07 16:25:30: Watch your wafers!

Cap sensors have been re-enable.

Comment p5000etch SNF 2009-12-08 00:41:36: Cap sensors

I enable the caps sensor back and adjusted the caps sensitivity on both caps to 7volts. I also made adjustment on wafer pick up
at storage elevator and vacuum pick up at cassette elevator.
I recommend doing a full wafer handoff during the shutdown.

Problem p5000etch SNF 2009-12-07 23:23:30: Cannot create recipes

It seems to have dropped off the coral radar, so I am putting it back on as a "to do during shutdown". We have been unable to create recipes for a LONG TIME.

Problem p5000etch SNF 2009-12-07 16:25:30: Watch your wafers!

The cap sensors are disabled for now. Make sure to watch where your wafers go! Avoid breakage by ensuring each etched wafer is picked up from the etch chamber. If a second wafer is loaded on top of the first, that is a recipe for wafer breakage and a mess.
Why? There are some problems with calibration and balancing of the capacitive sensors. The sensors are an important feature for ensuring success of wafer transfer. However, when sensor conditions are not met, wafer transfer will stop. This has been disabled in the past, but is not the safest way to run. Elmer will continue working on the sensors, but in the meantime, they have been disabled.

Am Vac Soc: CMPUG/PAG/TFUG Joint Meeting--December 9, 2009

Northern Calif Am Vac Soc (www.avsusergroups.org)
CMP USERS GROUP, PLASMA APPLICATIONS GROUP, THIN FILM USERS GROUP

FREE ADMISSION-No need to register, just show up!!
Topic: Back End Integration
Meeting Date: December 9, 2009

Location: SEMI Global Headquarters
Seminar Rooms 1, 2 & 3
3081 Zanker Road
San Jose, CA 95134
**Park in front or behind the vacant building across from SEMI**

EARLY START TIME: 1:30 - 5:00 pm
Chair: Kapila Wijekoon, Applied Materials, Kapila_wijekoon@amat.com;
Brett Cruden, NASA Ames UARC, brett.a.cruden@nasa.gov
Roc Blumenthal, roc@rocsolidsoln.com
AGENDA:
1:30-1:40 Welcome/Opening Remarks
1:40-2:10 "3D Imaging and Its Applications in CMP and Solar", Jim Xu, Zeta Technologies

2:10-2:40 "Effect of pad conditioning on CMP process performance for read
write magnetic heads", Ramin Emami, Hitachi

2:40-3:10 "Challenges in Porous Ultra Low-k for 22nm Dual Damascene Trench
Etch", K. Zhou, R. Patz, A. Darlak, Y. Zhou, J. Pender, M. Armacost, C.
Labelle, D. Horak, Applied Materials and IBM

3:10-3:30 Coffee Break

3:30-4:00 "Metallization Challenges in the Fabrication of Reliable
Interconnects for 2X Technology and Beyond", Emesh Ismail, Semitool Inc.

4:00-4:30 "Reducing Tungsten Contact and Line Resistance with advanced
Pulsed Nucleation Layer (PNLTM) and Low Resistivity Tungsten (LRW)
treatment", Raashina Humayun, Anand Chandrashekar, Feng Chen, Michal
Danek; Novellus Systems

4:30-5:00 " Effects of vacuum ultraviolet plasma emission on low-k
dielectrics", E. A. Hudson1, M. Moravej1, M. Block1, S. Sirard1, D. Wei1,
K. Takeshita1, B. Jinnai2 and S. Samukawa2, 1Lam Research Corp. and 2
Tohoku University

**********************************************************************************
NCCAVS User Group website: www.avsusergroups.org <http://www.avsusergroups.org/>

Ø All 2010 Group Meeting schedules will be available 12/31/09

Ø New Banner Ad and Meeting Sponsorship opportunities information available soon!

Ø Find: Meeting Schedules, Announcements, Call for Papers, Committee
Contact Information, Proceedings from monthly meetings, and more.

Ø Sign up for a User Group: www.avsusergroups.org <http://www.avsusergroups.org/>
*********************************************************************************

Happy Holidays!!!

Re: dichlorobenzene

Hi Kyunghoae --


For good reason.  This is a suspected carcinogen and we have worked hard to eliminate it from the standard chemicals in the lab.  The industry has many greener/safer alternatives now.  It you plan to use dichlorobenzene at SNF, you must submit a SpecMat request.  In order to use it, your request would have to demonstrate that these alternative do not work for your application and that its use would be absolutely restricted.


Mary

--  Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA  94305 (650)723-9980 mtang@stanford.edu http://snf.stanford.edu

Kyunghoae Koo wrote:

Dear lab members

 

Does anybody know where I can purchase dichlorobenzene?

I checked with Biostore, they don’t deal with it.

Thank you.

 

Kyunghoae,

 

 

RE: dichlorobenzene

Try Sigma-Aldrich, www.sigmaaldrich.com

 

Alan Cassell

From: Kyunghoae Koo [mailto:koo1028@stanford.edu]
Sent: Monday, December 07, 2009 3:41 PM
To: labmembers@snf.stanford.edu
Subject: dichlorobenzene

 

Dear lab members

 

Does anybody know where I can purchase dichlorobenzene?

I checked with Biostore, they don’t deal with it.

Thank you.

 

Kyunghoae,

 

 

dichlorobenzene

Dear lab members

 

Does anybody know where I can purchase dichlorobenzene?

I checked with Biostore, they don’t deal with it.

Thank you.

 

Kyunghoae,

 

 

ohmic contact to Si wafer

Hi labmembers,
I would appreciate some advice.  I want to put metal vias through a 20nm oxide layer to make ohmic contact to the underlying silicon.  My wafers are degenerate n-type, resistivity < .005 ohm-cm.  I've tried evaporating titanium contacts after etching via holes through the oxide in the MRC etcher, but I see Schottky diode-like behavior, ie. an exponentially increasing IV curve.

Has anyone made ohmic contacts with a wafer of this resistivity before?  It's been suggested to me that I need to further dope the silicon to narrow the depletion region so that I have good tunneling and ohmic contact through the barrier.  I've also read that I can anneal the Ti contacts in nitrogen to form a silicide - is this something that should be done in addition to doping, or can silicide formation alone provide ohmic contact?

Thanks in advance,
Alex


Alex Neuhausen
PhD Candidate Electrical Engineering
Goldhaber-Gordon Lab
476 Lomita Mall
Stanford, CA 94305
Office: 650-725-2047
Cell: 650-776-5672

Re: Shutdown p5000etch SNF 2009-12-05 17:47:40: wafer stuck in load-lock

Wafer cycling (200 sec etch) failed after 7 wafer. Placed the ch.B online and disabled the cap sensors again. The cap sensors need to be recalibrated before they are fully operational.
I will leave the system under Problem but please watch your wafers as they enter and exit the process chambers especially Ch.B. If you see a loading problem that might endanger your wafer, press STOP and all wafer movement will stop.

Comment p5000etch SNF 2009-12-07 11:52:20: longer etches problematic ... run shorter etches

I am inclined now to break up etches longer than 30 seconds into shorter etches and just leave the pump time at whatever the recommended minimum is?
I have been breaking etches longer than 300 seconds into "shorter" etches and always using very long pump times (> 600 seconds ) hoping that that would help with the capacitive sensors and thick dielectric on the front and back of my wafer.
Elmer, do you experience any wafer handling issues from short etches when there is thick dielectric on the front and back of the wafer?

Comment p5000etch SNF 2009-12-07 11:12:23: Update stuck wafer

Recovered the user's wafer and placed in slot 24 of his cassette.
Replaced the wafer clamp. Now running wafers using the user's recipe (200 sec etch). Previous maintenance tests were ran for only 30 secs. It appears that longer etches have more problems with wafer handling.
Note: I enabled the robot's capacitive sensor last week to minimize wafer breakages when there is a wafer mis-handling (I don't know who disabled it). The down side is that there will be more handling faults. Instead of the system continuing to process wafers even with a broken wafer in the chamber, the loading operation is stopped.

9 days to Lab Cleanup!

Greetings labmembers -

Remember, the annual lab shutdown and lab cleanup starts Wednesday, Dec.
16, at 7 am.

Starting then, any personal items in the cleanroom not inside a storage
bin will be removed from the lab. So save yourself the New Year ritual
of sifting through dozens of boxes of stuff to find your wafers or
notebook -- start collecting your personal items now!

Speaking of items in the lab, some of the WIP racks are piled up higher
than is considered safe. Please remove any items that are not being
actively processed -- or staff will begin removing them, starting with
unlabeled or undated/aged items. We won't wait for the shutdown to
start cleaning up the WIP racks. Remember, WIP stands for "Work in
Progress" not "Work in Permanence".

Finally, make sure to label storage containers kept in the CAD room
(151). Storage bins must be transparent and labeled with an active
Coral ID and current date. Unlabeled, undated, boxes and boxes older than one
year WILL BE removed and dispositioned.

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Shutdown p5000etch SNF 2009-12-05 17:47:40: wafer stuck in load-lock

wafer did not transfer correctly from blade to elevator, and is balancing precariously.
wafer did not drop onto blade when coming out of Ch. B correctly. attempts to manually get it out using the software failed.

Problem p5000etch SNF 2009-12-05 14:53:09: cassette indexer slacking off

didn't see thus skipped processing my wafers in slot #2 twice, slot #3 once

Problem p5000etch SNF 2009-12-04 23:41:57: wafer handling issues

Wafer got stuck on blade (not sensed and a tiny bit crooked) coming out of 150sec etch in Ch. B. I had set pump time to 600s for all of my Ch. B etches as I have thick LTO, LSN stack on backside of wafer, and know that the capactive sensing can get unhappy.
Also was experiencing inablity of wafer in #1 (bottom) slot of cassette A to be loaded in, and when it looked for wafer in #2 slot it scratch my wafer in #1 slot on its topside. Pretty darn sure cassette was properly seated, retried having a labmate try his look, and still had handling issues. SOLUTION USED: I placed my wafer in #25 (topmost) slot of cassette.

Odor in the lab

Dear labmembers:

Around 4:45 pm today, an odor resembling burnt electronics was noted in
the lab. It seemed concentrated in the stsetch/2 area, but could be
smelled from the analytical and gowning rooms across to lampoly/gryphon
area.

We were not able to determine the source of the smell. After three
hours, it is still evident and but seems to be dissipating slowly.
Given that most of the lab air is recirculated, smells can take several
hours to disperse. We do not believe there is risk to health or safety,
but recommend not working in the lab if you find the smell very unpleasant.

Please report to us if the odor intensifies or otherwise does not
dissipate as expected (use the on-call phone or send an email.)

Thanks for your attention --

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Shutdown p5000etch SNF 2009-12-03 16:36:37: Wafer did not drop on blade from Ch B

Recovered by Elmer....

Shutdown p5000etch SNF 2009-12-03 16:36:37: Wafer did not drop on blade from Ch B

After processing one of two wafers, the tool was not able to retrieve the wafer fro m chamber B.
@Elmer: There is a box and tweezers standing on the desk at P5000. Could you load the two wafers into that box.
Thanks,
Frank

Labmembers' Meeting on New Equipment: Slides and feedback

Greetings labmembers --

Slides from the New Equipment Meeting have been posted. It is a lot of
information to absorb, but we have reached some decision points and need
your feedback as soon as possible. Please review the information and if
you have ideas or opinions to contribute, please get back to one or more
of us by lab closing, on Wednesday, Dec. 16.

For the Stanford community, slides can be found here:
www.stanford.edu/group/snf/ProcessInfo
A SUNet ID is required for access.

For our non-Stanford labmembers, please get in touch with me
(mtang@stanford.edu) to get access.

Thanks for your attention!

The New Equipment Team
(J Provine, Tom O'Sullivan, Ed Myers, Jim McVittie, John Shott, Mary Tang)

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Comment p5000etch SNF 2009-12-03 13:35:12: Completed Ch.A wet clean

Ran 10 seasoning wafers.

Workshop Announcement: Bridging the gap between theory and experiment: which theoretical approaches are best suited to solve real problems in nanotechnology and biology?

Dear Colleagues,

The Stanford NNIN Computing Facility will host a workshop February 23-26, 2010 entitled "Bridging the gap between theory and experiment: which theoretical approaches are best suited to solve real problems in nanotechnology and biology?" .

 Academic and industrial researchers from physics, chemistry, biology and engineering disciplines will be discussing the emerging impact of the synergy between experimental and computational advances in several nanoscience areas, including the interface with bio-molecules.  Experimental researchers interested in learning about how to interpret, analyze and design new experiments based on simulations, and theorists interested in expanding their modeling efforts into new application areas, are invited to attend.

 Key questions to be discussed: Which theoretical methodology is best suited for a specific application? What are the most recent state-of-the-art theoretical advances to tackle real problems at several timescales, and what challenges have to be addressed to make the theoretical and experimental advances more intrinsically linked?

The last two days of the workshop, 25-26 February, are dedicated to seminars and hands-on training on some of the advanced codes discussed including  ATK, VNL and SE from QuantumWise; DESMOND from DE Shaw Research, and ZEPHIR/OPENMM from Simbios.

 For more information about the workshop and to register please visit the following URL:

 http://www.stanford.edu/group/nnin-computing/workshop.html

Please find attached the workshop flyer.

Sincerely yours,

Prof. Yoshio Nishi
Dr. Blanka Magyari-Kope

SVTC visit - Friday, 12/11, 2 pm

This is a reminder that you need to let me know if you are interested in attending the SVTC visit a week from Friday.

-----------------------------------------------------------------------------------------------------------------------------------------------------------

Wilbur Catabay, Vice President of Technology and Engineering, has invited SNF labmembers to visit and tour SVTC's San Jose facility on

                          Friday, December 11th
                                   2-5 pm
                                   SVTC
                          3901 N. First Street, San Jose  95134
                           

SVTC will present an overview of their technologies which include CMOS, MEMS, solar, memory, materials and others.   Wilbur and his team will also give tours of the facility.  This is an excellent opportunity to find out if SVTC is a good place for you to continue the project development which has been started at SNF.

In addition, SVTC will be offering internships for summer 2010 for Stanford students.  These internships will be discussed at the meeting.

If you are interested in this visit RSVP to Paul Rissman (rissman@stanford.edu) NO LATER THAN FRIDAY, DECEMBER 4th.

Reminder: SNF New Equipment Meeting, Wed. 12/2, 10 am

Greetings all:

Labmembers, PI's and research advisors are invited to an SNF Community
meeting in which plans for new equipment acquisitions will be
discussed. This meeting will be held on Wednesday, December 2, from 10
am- noon in the CISX Auditorium.

As you may have heard, as part of the NNIN, SNF has received some
funding to support new tools. Our proposal requested funding for tools
on the SNF Faculty/Industrial AdCom wishlist. The tools that were funded
are: ALD, Ebeam evaporator, sputter deposition, and PECVD. Over the
past several months, a small group of SNF staff and labmembers have been
meeting to explore the commercially available equipment options and
solicit ideas from research groups. At this meeting, the New Equipment
Group will present a summary of options, the trade-offs, and
advantages/disadvantages of different approaches for each tool. Your
participation and input are appreciated in helping to shape the final
decisions. We ask interested research groups to make sure you are
represented. Presentation slides will be posted on the wiki RIGHT AFTER the
meeting and linked from the SNF home page. The agenda is as follows:

10-10:30 - ALD (J Provine)
10:30-11- Ebeam evaporator (Ed Myers)
11-11:30 - Sputter system (Ed Myers)
11:30-12 - PECVD (Jim McVittie)

Feedback and discussion outside this meeting is also encouraged. Please
feel free to contact any of us.

The New Equipment Group (Tom O'Sullivan, J Provine, Ed Myers, Jim
McVittie, John Shott, Mary Tang)

Ph.D. Oral Defense- Hesaam Esfandyarpour, 9am Thursday, Dec. 3rd, Clark Auditorium

Dear friends,

Please join me for my PhD defense this THURSDAY, 9 am, Clark Auditorium (318 Campus Drive, Stanford). The title of the talk is: "Electrical Biosensor in Microfluidic for High Throughput Genomics and Proteomics" and I am going to talk about my research on the development of a new method for DNA sequencing. The abstract is attached.
Looking forward to seeing many of you on Thursday.
Thanks a lot,

Best regards,

Hesaam

--
_________________________________
PhD Candidate in Electrical Engineering
Stanford University

Stanford Genome Technology Center
318 Campus Drive
Clark Center W300
Stanford, California 94305-5440
Phone: (650) 723-6287
Fax:   (650) 812-1975

Center for Integrated Systems
CISX B103, 420 Via Palou,
Stanford, CA 94305
Phone (650) 723.4566
Fax   (650) 723.4659  


Email: hesaam@stanford.edu
Nanobiotech site: http://med.stanford.edu/sgtc/nanobiotech/

CONFIDENTIALITY NOTICE: Information contained in this message and any attachments is intended only for the addressee(s). If you believe that you have received this message in error, please notify the sender immediately by return electronic mail, and please delete it without further review, disclosure, or copying.

Reminder: SNF New Equipment Meeting, Wed. 12/2, 10 am (note date correction)

Greetings all:

Labmembers, PI's and research advisors are invited to an SNF Community
meeting in which plans for new equipment acquisitions will be
discussed. This meeting will be held on Wednesday, December 2, from 10
am- noon in the CISX Auditorium.

As you may have heard, as part of the NNIN, SNF has received some
funding to support new tools. Our proposal requested funding for tools
on the SNF Faculty/Industrial AdCom wishlist. The tools that were funded
are: ALD, Ebeam evaporator, sputter deposition, and PECVD. Over the
past several months, a small group of SNF staff and labmembers have been
meeting to explore the commercially available equipment options and
solicit ideas from research groups. At this meeting, the New Equipment
Group will present a summary of options, the trade-offs, and
advantages/disadvantages of different approaches for each tool. Your
participation and input are appreciated in helping to shape the final
decisions. We ask interested research groups to make sure you are
represented. Presentation slides will be posted on the wiki before the
meeting and linked from the SNF home page. The agenda is as follows:

10-10:30 - ALD (J Provine)
10:30-11- Ebeam evaporator (Ed Myers)
11-11:30 - Sputter system (Ed Myers)
11:30-12 - PECVD (Jim McVittie)

Feedback and discussion outside this meeting is also encouraged. Please
feel free to contact any of us.

The New Equipment Group (Tom O'Sullivan, J Provine, Ed Myers, Jim
McVittie, John Shott, Mary Tang)

Comment p5000etch SNF 2009-11-30 15:00:47: Ch.A heat ex fault update

Ch.A is OK to use but etch rate might have changed. If you are not using the end point in your recipe, please run an etch rate test before committing your actual devices.
We temporarily bypassed the flow sensor in order to make the chamber functional. There is actual flow through the cooling lines but it is just slightly just below the fllow threshold. The plan is to change the heat exchanger pump on Wed.

Re: Problem p5000etch SNF 2009-11-27 20:43:26: Grassing with Ch.C POLY ETCH

Grassing eliminated after user ran several plasma cleans.

Re: Problem p5000etch SNF 2009-11-27 19:00:31: Ch.B may have broken wafer in it

Opened the chamber and did not find any signs of a wafer. Ran 4 wafers (He leak rate < 2 sccm).

Lost Earring found in Cleanroom - not the Gowning Room

Dear All,

 

If you have lost an earring sometime in the Cleanroom please come by my cubicle and claim it.  I am in cubicle #41 on the first floor of the Paul Allen Building.

 

Thanks,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Re: Shutdown p5000etch SNF 2009-11-29 22:21:42: Heat exchanger problem

Wall heat exchanger (amat 0) is OK. Problem is with CH.A heat exchanger. Need to replace Ch.A heat ex pump. Ch.B and C are OK. Ran 4 wafers through each chamber with no problem.

Process Clinic, Monday (today), 2 pm

Greetings labmembers --

Just a reminder of the Process Clinic today at 2 pm, in the cubicle area
outside Maureen's office. Bring your process ideas, process questions,
and device layouts for an open brainstorming session.

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Problem p5000etch SNF 2009-11-27 19:01:48: Wafer stuck in chamber B

Removed wafer from chamber..

Shutdown p5000etch SNF 2009-11-29 22:21:42: Heat exchanger problem

The wall heat exchanger(amat 0) is not flowing, still
troubleshooting...

Problem p5000etch SNF 2009-11-29 11:49:19: Ch A: HT EX fault

Comment p5000etch SNF 2009-11-28 15:06:53: Ch.C clean may have fixed problem

Do not observe grassing after clean

Comment p5000etch SNF 2009-11-27 22:12:57: Ran chamber clean on Ch.C

Used 4 wafers to clean Ch.C with the CH.C CLEAN recipe. The "rings" on the wafer look clean.

Problem p5000etch SNF 2009-11-27 20:43:26: Grassing with Ch.C POLY ETCH

I think the chamber may need a clean

Problem p5000etch SNF 2009-11-27 19:01:48: Wafer stuck in chamber B

Failed due toHe leak rate too high fault in chamber B.
Rik and me tryed to get it out ,but looks like wafer is broken inside.
Pradeep

Problem p5000etch SNF 2009-11-27 19:00:31: Ch.B may have broken wafer in it

Previous users wafer got stuck with a "He leak rate too high" error during the pump step. "Return wafers to cassette" did not return the wafer even though blade went into the chamber. Please do not use Ch.B until maintenance gets a chance to examine the system.

Using USB memory sticks on the SunRays ....

SNF Lab Members:

Rostam asked me how to transfer files to/from memory sticks on the
SunRays. I suspect that more than a few of you may be interested in
that answer, so I will post it here. It turns out that it is quite
simple .... but only if you know where to look for the files. In fact,
we've added some features that should mount and show the files on your
Memory Stick automatically.

First, login to the SunRay that you want to use .... before your insert
your memory stick.

Second, insert your memory stick into one of the 4 USB slots in the back
of the SunRay. This is actually the trickiest part as there are 4
closely spaced USB slots and two of them are in use with the keyboard
and mouse.

Depending on the size of the memory stick (the SunRays only have a USB
1.1 connection, I think ....) you will soon see a File Browser window
open that contains the contents of your USB device. If you have a
high-capacity memory stick, this may take a minute or two .... and the
LED on your memory stick will likely be flashing as it figures out what
is already on that device. In the top bar of the File Browser you will
also see the name of the directory in which those files are mounted.
That will be something like:
/tmp/SUNWut/mnt/${user_name}/${memory_stick_name}. In other words, if
your login name is johndoe and the name of your memory stick is
MyFlashDrive, then all of your files will be visible in the directory
/tmp/SUNWut/mnt/johndoe/MyFlashDrive. If you have not actually given
your flash drive a name, it will appear in the directory named "noname"
.... in other words /tmp/SUNWut/mnt/johndoe/noname.

You can either use the GUI-based File Browser to copy files from your
memory stick to some where in your home directory or can also copy files
from your home directory to your memory stick.

Of course, you can also open up a command window and use the Unix copy
command to copy files to/from your memory stick.

For example, to copy a file named MyFile.txt from your home directory to
your memory stick named MyFlashDrive you could issue the command:

cp ~/MyFile.txt /tmp/SUNWut/mnt/${user_name}/MyFlashDrive

where, of course, ${user_name} is replaced by your login name.

Alternatively, one way to copy a file named SomeOtherFile.txt from your
flash drive named AnotherThumbDrive to your home directory would be to
issue the command:

cp /tmp/SUNWut/mnt/${user_name}/AnotherThumbDrive/SomeOtherFile.txt ~

If you are unfamiliar with Unix, the tilde character "~" is an alias for
"my home directory". So, ~/SomeDirectory/SomeFile.txt is a way of
naming the file SomeFile.txt that is in the directory named
SomeDirectory in your home directory.

In any event, I'm hopeful that you'll find this improved access to
moving files onto or off of the SunRays with a USB.

Note: when you are done with your USB memory stick, you simply have to
remove it.

Remember, if you have a big memory stick and it is quite full, it will
take a while for this to open up on your desktop because the peak read
rate of USB 1.1 is only 12 Mb/second (which is 1.5 MB/second) using the
standard conventions of Mb = mega-bit and MB = mega-byte.

Let me know if you have any questions or problems,

John

Labmember Meeting on New Equipment: Wed. 12/1, 10-12

Greetings all:

Labmembers, PI's and research advisors are invited to an SNF Community
meeting in which plans for new equipment acquisitions will be
discussed. This meeting will be held on Wednesday, December 2, from 10
am- noon in the CISX Auditorium.

As you may have heard, as part of the NNIN, SNF has received some
funding to support new tools. Our proposal requested funding for tools
on the SNF Faculty/Industrial AdCom wishlist. The tools that were funded
are: ALD, Ebeam evaporator, sputter deposition, and PECVD. Over the
past several months, a small group of SNF staff and labmembers have been
meeting to explore the commercially available equipment options and
solicit ideas from research groups. At this meeting, the New Equipment
Group will present a summary of options, the trade-offs, and
advantages/disadvantages of different approaches for each tool. Your
participation and input are appreciated in helping to shape the final
decisions. We ask interested research groups to make sure you are
represented. Presentation slides will be posted on the wiki before the
meeting and linked from the SNF home page. The agenda is as follows:

10-10:30 - ALD (J Provine)
10:30-11- Ebeam evaporator (Ed Myers)
11-11:30 - Sputter system (Ed Myers)
11:30-12 - PECVD (Jim McVittie)

Feedback and discussion outside this meeting is also encouraged. Please
feel free to contact any of us.

The New Equipment Group (Tom O'Sullivan, J Provine, Ed Myers, Jim
McVittie, John Shott, Mary Tang)

Re: Problem p5000etch SNF 2009-11-24 16:48:59: Ch.B offline

Put chamber b online.

Problem p5000etch SNF 2009-11-24 16:48:59: Ch.B offline

getting an error that ch.b is offline

webcams in SNF cleanroom for educations activities

SNF Labmembers,

You may have noticed that we have recently placed some webcameras inside
the cleanroom. There are 9 of them, mostly aimed down hallways. The
primary use of these will be for education activities as outlined below.
As education director of SNF, along with Maurice Stevens and Uli
Thumser, I have developed remote access activities using webcameras in
the past, mostly utilizing a single, Sony network camera, to transmit
video images into classrooms from the cleanroom as part of NNIN/NSF
education programs. I've also worked with Georgia Tech, another NNIN
member, who has 14 webcams in their cleanroom
(http://grover.mirc.gatech.edu/cameras/) which we have also utilized
jointly for similar education activities, and which has been very
successful. We now have decided to do similar education activities with
fixed webcams in SNF. A common scenario is to give guided tours through
the cleanroom, with Maurice or Uli for example going from room to room
while talking by telephone to students in their classrooms while they
watch and interact with Maurice through the image on a browser. We also
will use them in conjunction with the Sony cam to do AFM and SEM demos,
as well as other processing equipment. We also can use this to give lab
tours to students in the Linvill conference room (101) rather than
gown-up tours, which are very disruptive and difficult, or window tours,
in which the students can not see much anyway.

The webcam images are password protected, and would not be available to
anyone except the students watching the remote activities on that day,
and associated staff members such as myself.

In certain situations, the webcams may also provide a benefit from a
safety perspective. If alarms go off or we experience an earthquake, for
example, senior staff would be able to do a quick check of cleanroom,
even from home if necessary, in order to gain more information on what
is occurring. Again, the images would not be available to anyone except
a few SNF staff members through the password-protected interfaces.

We will not be recording the images, except perhaps during education
activities and only for those education purposes. We will not be using
the webcams for surveillance, etc.

We ask that you do not move our webcams. And do not think that you are
being watched all the time - we will only be looking at the images
during education activities, or for testing, or during safety-related
situations.

So in summary:
- 9 webcams are now in the cleanroom
- They will be used for education and safety-related situations only.
- The images are password protected and will only be viewed during
education activities, testing for those activities, and during
safety-related situations, such as when alarms go off.
- Please do not touch or move the webcams, or change their viewing
direction.

- If you have any questions, contact me, Mike Deal, SNF Education
Director, 5-3607, mdeal@stanford.edu.
-Thanks -Mike Deal, SNF

Re: Problem p5000etch SNF 2009-11-23 17:43:55: Helium Pressure deviation Fault

Replaced Ch.B's vacuum pump. The Helium cooling uses chamber B's pump to control the backside pressure.

Re: Problem p5000etch SNF 2009-11-23 16:03:07: Ch. A

Replaced Ch.B's vacuum pump. The Helium cooling uses chamber B's pump to control the backside pressure.

Re: Comment p5000etch SNF 2009-11-23 20:14:31: cleared Rik's wafer, but Ch B is down

Replaced the vacuum pump. Cycled 4 wafers with no problems.

Re: Shutdown p5000etch SNF 2009-11-23 18:42:43: Wafer stuck

Replaced the vacuum pump. Cycled 4 wafers with no problems.

Comment p5000etch SNF 2009-11-23 20:14:31: cleared Rik's wafer, but Ch B is down

Ch B has lost its roughing pump. Offline.....

Shutdown p5000etch SNF 2009-11-23 18:42:43: Wafer stuck

Got He supply deviation error before wafer even loaded into CH.B. After that, system got stuck at "trying to transfer wafer into Chamber B".
Wafer is currently on robot arm.

Problem p5000etch SNF 2009-11-23 17:43:55: Helium Pressure deviation Fault

Out of disk space ....

SNF Lab Members:

We all need to clean up some disk space .... flare is at 100% disk usage
and bad things begin to happen then including coral not being able to
start and run. We've only got about 300 MB (out of close to 60 GB ....)
left.

If you want to see where you may be using a significant amount of space,
in a command window you can issue the command:
'du -sk *'
which will give you a high-level summary in kilobytes of your usage.

Here is the current list of "big users" that are most likely be able to
quickly save us some space:

1311003 /export/home/User/mahnaz
1078027 /export/home/User/eenriquez
779022 /export/home/User/maurice
567168 /export/home/User/gyama
487378 /export/home/User/jperez
430244 /export/home/User/chen0622
427871 /export/home/User/pnataraj
387494 /export/home/User/mvikram
384895 /export/home/User/gunjim
370207 /export/home/User/rostam
341916 /export/home/User/vossough
332442 /export/home/User/akhan
327212 /export/home/User/bchui
322212 /export/home/User/popomoo
312744 /export/home/User/true
305345 /export/home/User/sbiaa
288537 /export/home/User/mislam
281780 /export/home/User/naiqian
270251 /export/home/User/ywidjaja
267089 /export/home/User/mcherry
252087 /export/home/User/lwchang
240674 /export/home/User/takuyan
235379 /export/home/User/vlordi
219268 /export/home/User/chongxie
212617 /export/home/User/rparsa
212200 /export/home/User/dinhthuc
207730 /export/home/User/mtan
206902 /export/home/User/king
205132 /export/home/User/benc
200431 /export/home/User/nppatil
200426 /export/home/User/gladys
195756 /export/home/User/gth
193887 /export/home/User/cmfaulkn
191357 /export/home/User/alsune
187651 /export/home/User/mcvittie
178836 /export/home/User/dgunning
178411 /export/home/User/kosarb
174304 /export/home/User/iwjung
173953 /export/home/User/ericp
171124 /export/home/User/sjkramer
168781 /export/home/User/jtsai
167808 /export/home/User/vishal
167245 /export/home/User/ajamo
167006 /export/home/User/dton
166899 /export/home/User/altug
166271 /export/home/User/cbaxter
164990 /export/home/User/sigari
164529 /export/home/User/junjun
163149 /export/home/User/renshen
160616 /export/home/User/lindaw
160601 /export/home/User/hphan
160060 /export/home/User/korgan
158866 /export/home/User/nharjee
155948 /export/home/User/dlieberm
151849 /export/home/User/chion
150545 /export/home/User/mdickey
148465 /export/home/User/ludwig
148016 /export/home/User/sdogbe
144905 /export/home/User/jfoster
142833 /export/home/User/mrlin
142767 /export/home/User/cbellew
141970 /export/home/User/jleu
139284 /export/home/User/cursive
137622 /export/home/User/sjinpark
135076 /export/home/User/joongsun
135040 /export/home/User/riteshj
134513 /export/home/User/ahazeghi
133133 /export/home/User/kimsangb
132105 /export/home/User/kokab
131247 /export/home/User/masaharu
130647 /export/home/User/faridz
128292 /export/home/User/fanpy
128069 /export/home/User/oliversw
128044 /export/home/User/dalyx
127669 /export/home/User/mferrier
127437 /export/home/User/maryamzm
126825 /export/home/User/muchiao
126797 /export/home/User/whlee
126252 /export/home/User/jennyhu
125850 /export/home/User/bwacker
125783 /export/home/User/grupp
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Deleting a little text file here and there doesn't really help ....

However, if you've got things like downloaded audio and video files ....
those should be dumped. If you've got locally installed versions of
software that is available elsewhere ... that should be dumped, etc.

Thanks for your help,

John

Problem p5000etch SNF 2009-11-23 16:03:07: Ch. A

the process went well at beginning and after a few trial error message: "He supply pressure deviation fault" occurs
unable to process further

Re: Problem p5000etch SNF 2009-11-21 15:20:23: Chamber A

Ran 4 wafer using Ch.A timed recipe + one wafer using the user's recipe with no problems. He cooling leak rate ~ 1.3 sccm.

Re: Problem p5000etch SNF 2009-11-23 03:16:14: Ch.B error message

Fully opened the filter isoslation valve (it was partially closed) and restarted the pump.

Re: Problem p5000etch SNF 2009-11-23 10:23:08: helium pressure errors for chamber a & c

Repaired broken wires in the He manometer connector. Ran 4 wafers with no problems.

Re: Shutdown p5000etch SNF 2009-11-23 11:19:00: Bad He press manometer

Repaired broken wires in the He manometer connector. Ran 4 wafers with no problems.

Shutdown p5000etch SNF 2009-11-23 11:19:00: Bad He press manometer

Backside Helium cooling manometer is defective.

Problem p5000etch SNF 2009-11-23 10:23:08: helium pressure errors for chamber a & c

chamber b already down with a turbo pump problem.
chambers a and c are currently erroring for all wafers including new, clean ones due to helium pressure errors.

Problem p5000etch SNF 2009-11-23 03:16:14: Ch.B error message

When I walked in, it was alarming. Here's the error message:
ChB wet pump overtemp or dry pump N2 purge incorrect.

Problem p5000etch SNF 2009-11-21 15:20:23: Chamber A

He pressure flustration failure... cannot process

Countdown to lab cleanup!

Greetings labmembers --

Four week warning. Remember, the annual lab shutdown starts in Wednesday, Dec.
16, at 7 am and is accompanied by the Annual Lab Cleanup.

Starting then, any personal items in the cleanroom not inside a storage
bin will be removed from the lab. So save yourself the New Year ritual
of sifting through dozens of boxes of stuff to find your wafers or
notebook -- start collecting your personal items now!

Speaking of items in the lab, some of the WIP racks are piled up higher
than is considered safe. Please remove any items that are not being
actively processed -- or staff will begin removing them, starting with
unlabeled or undated/aged items. We won't wait for the shutdown to
start cleaning up the WIP racks. Remember, WIP stands for "Work in
Progress" not "Work in Permanence".

Finally, make sure to label storage containers kept in the CAD room
(151). Storage bins must be transparent and labeled with an active
Coral ID and current date. Unlabeled, undated, boxes and boxes older than one
year WILL BE removed and dispositioned.

Thanks for your attention --

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

PhD Orals: Filip Crnogorac, FRIDAY 1pm, Clark Auditorium

Friendly reminder,

Please join me for my defense on TODAY, 1pm at Clark Auditorium.
Looking forward to seeing you there,
Filip

------------------------------------------------------------------
"Semiconductor Crystal Islands for 3-Dimensional Integration"

Stanford University PhD Dissertation Defense

Filip Crnogorac (filip@stanford.edu)
Research Advisor: R. Fabian W. Pease
Department of Electrical Engineering

Time: Friday, November 20th, @ 1:00 pm
(refreshments served at 12:45 pm)

Location: Clark Center Auditorium
(Basement, entrance across from Nexus)

ABSTRACT

The critical operation needed to achieve 3-dimensional integrated
circuits is obtaining single-crystal, device-quality semiconductor
material on upper circuit layers without damaging circuits below
(400°C temperature limit). Simulation shows that microsecond pulse
532nm Nd:YAG laser can melt and crystallize amorphous Si or Ge layers
without heating the circuit layers underneath. However, experimental
results of unseeded (graphoepitaxy) and seeded (RMG) crystallization
of Si and Ge indicate that much longer pulse lengths are required for
high quality single crystal formation, rendering the approach not 3DIC
compatible.

A more straightforward approach is to directly attach high quality
crystal islands for upper layer device fabrication. A variety of
viable low-temperature (≤400°C) bonding methods have been
investigated: fusion bonding (SiO2-SiO2, Si-SiO2, Ge-SiO2), thermo-
compressive bonding (Cu-Cu, Ti-Ti), as well as AlGe eutectic bonding.
The unique advantages of AlGe technique for 3DICs are reported for the
first time. They include superior bond strength, low void formation,
no roughness requirement, use of thin films and CMOS friendly
materials. Finally, we present a full 3DIC compatible process of
obtaining single crystal Si or Ge islands for upper layer device
fabrication via SmartCut(TM) and CMP finish.

------------------------------------------------------------------

Lost a laptop power adaptor

Dear all,

 

I lost a laptop power adaptor a week ago, presumably, in CISX 338.

It's a black IBM/Lenovo adaptor.

If you have seen it or kept it, please email me back.

I really appreciate it.

 

Thanks,

Byoungil

Re: Comment p5000etch SNF 2009-10-23 16:29:27: CH C Etch Rate Qual

Archived

Re: Comment p5000etch SNF 2009-10-23 16:14:17: CH B Etch Rate Qual

Archived

Re: Comment p5000etch SNF 2009-10-23 16:08:45: CH A Etch Rate Qual

Archived

Re: Comment p5000etch SNF 2009-10-21 11:31:13: Ch.A wet clean

Archived

Re: Comment p5000etch SNF 2009-11-17 14:34:20: Update Ch.C He problem

Archived

Re: Comment p5000etch SNF 2009-11-18 09:16:33: Ch.C is down for He flow

Adjusted the He cooling bypass flow. Now when He press is set at 4 Torr, He flow is about 9 sccm (was 0.1 sccm). @ 8 Torr, He flow ~ 20 sccm. Ran 20 wafer through both Ch.C and Ch.B with no problems.

Re: Problem p5000etch SNF 2009-11-17 07:17:00: CH C Helium supply pressure

Adjusted the He cooling bypass flow. Now when He press is set at 4 Torr, He flow is about 9 sccm (was 0.1 sccm). @ 8 Torr, He flow ~ 20 sccm. Ran 20 wafer through both Ch.C and Ch.B with no problems.

Nanosociety Meeting Friday @ 12pm, McCullough 115: Lateral Fusion of Lipid Membranes to Nanoscale Functionalized Posts

Ben Almquist (Melosh Group) will be presenting his research involving "biomimetic stealth probes" at 12pm in McCullough 115 this Friday. Pizza will be served.


Lateral Fusion of Lipid Membranes to Nanoscale Functionalized Posts

The ability to specifically and non-destructively incorporate inorganic structures into or through biological membranes is essential to realizing full bio-inorganic integration. However, molecular delivery and interfaces to inorganic objects, such as patch-clamp pipettes, generally rely upon destructive membrane holes and serendipitous adhesion, rather than selective penetration and attachment to the bilayer. In fact, materials greater than a few nanometers have not been shown to penetrate lipid bilayers without disrupting the continuity of the membrane. I will discuss the development of nanofabricated probes that spontaneously insert into the hydrophobic membrane core by mimicking the hydrophobic banding of transmembrane proteins, forming a well-defined bio-inorganic lateral junction. These biomimetic 'stealth' probes consist of hydrophilic posts with 2-10 nm hydrophobic bands formed by molecular self-assembly, and are easily fabricated onto a variety of substrates including silicon wafers, nanoparticles, and AFM tips. By fabricating this architecture onto AFM probes, we have directly measured the penetration behavior and adhesion force of different molecular functionalities within the bilayer. Following insertion, stealth probes remain anchored in the center of the bilayer, while purely hydrophilic probes have no preferred location. The strength of the stealth probe adhesion varies greatly between short and long chain alkane functionalizations, indicating that chain mobility, orientation, and hydrophobicity all contribute to stability within the bilayer. In addition, the consequences of geometric factors such as band thickness and the presence of multiple bands on interface stability have been established. By selectively choosing the desired properties of the hydrophobic band, it is possible to tune the failure tension of the interface from values comparable to that of pristine lipid vesicles to only a fraction of the strength.

Comment p5000etch SNF 2009-11-18 09:16:33: Ch.C is down for He flow

During testing, Ch.C faulted for He valve not opening.

SVTC visit - Friday, 12/11, 2 pm

Wilbur Catabay, Vice President of Technology and Engineering, has invited SNF labmembers to visit and tour SVTC's San Jose facility on

                          Friday, December 11th
                                   2-5 pm
                                   SVTC
                          3901 N. First Street, San Jose  95134
                           

SVTC will present an overview of their technologies which include CMOS, MEMS, solar, memory, materials and others.   Wilbur and his team will also give tours of the facility.  This is an excellent opportunity to find out if SVTC is a good place for you to continue the project development which has been started at SNF.

In addition, SVTC will be offering internships for summer 2010 for Stanford students.  These internships will be discussed at the meeting.

If you are interested in this visit RSVP to Paul Rissman (rissman@stanford.edu) NO LATER THAN FRIDAY, DECEMBER 4th.

Re: SNF's Nitric Acid

Jason et al:

Yes, finding the concentration of JT Baker nitric acid does seem harder
than one would expect.

I'm pretty certain, however, that the concentration of the stuff that we
use is in the range of 69-70% with the balance being water.

Here is the link that provides those details:

http://mallinckrodtbaker.dirxion.com/jtbakermicroelectronics/WebProject.asp?BookCode=mal09flx#

The specific "version" that we us is product 9606-03 that is the 7 lb
bottles of CMOS grade nitric acid. The page on the link shows that the
concentration is 69-70% and also contains the information about particle
count in the bottles as well as concentrations of various contaminants.

Let us know if you have any further questions,

John

Comment p5000etch SNF 2009-11-17 14:34:20: Update Ch.C He problem

Did not have a chance to check the problem. We'll work on it tomorrow.

Re: Problem p5000etch SNF 2009-11-16 15:55:27: Ch A, 1st 2 wafers OK, next 2 He leak error

Ran 20 wafers using the Ch.A metal recipe with no problems. Cooling He leak rates were all < 1.8 sccm.

Re: Problem p5000etch SNF 2009-11-17 08:16:14: Wafer lost in CH B

Recovered user's wafer and placed in his wafer box (slot 15).
Cycled 20 wafers using Ch.B oxide recipe with no problems.

SNF's Nitric Acid

Hi labmembers,

Does anyone know what is the concentration of nitric acid stocked by SNF?  Seems like a basic question but I didn't see any clear descriptions on the bottle and the MSDS writes 50%-70%.  Thanks for your help in advance!

Thanks,

Jason

FW: REMINDER BioStores Fall Product Show TODAY

--++**==--++**==--++**==--++**==--++**==--++**==--++**==
stanfordbiostores mailing list
stanfordbiostores@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/stanfordbiostores

 

 

 

From: stanfordbiostores-bounces@lists.stanford.edu [mailto:stanfordbiostores-bounces@lists.stanford.edu] On Behalf Of Joseph Shackelford
Sent: Tuesday, November 17, 2009 7:34 AM
To: stanfordbiostores@lists.stanford.edu; biononexempt@lists.stanford.edu; bioexempt@lists.stanford.edu; biobargainingunit@lists.stanford.edu; biopostdoc@lists.stanford.edu; biomasters@lists.stanford.edu; biofacall@list.stanford.edu; biomainadmin@lists.stanford.edu
Subject: REMINDER BioStores Fall Product Show TODAY

 

 

Joseph G. Shackelford
Manager Bio-Stores
Biology Department
Stanford University
650-723-9825 {office}
650-725-5783 {fax}

Problem p5000etch SNF 2009-11-17 08:16:14: Wafer lost in CH B

Wafer is lost during unloading

Problem p5000etch SNF 2009-11-17 07:17:00: CH C Helium supply pressure

Encountered the following error: CHC He supply pressure deviation error

Re: Cleaning after dry etching (Removal of Fluorine)

Jim,

 

I meant after using SF6 or CF4 gas in drytek1/2.

Let me know if you need further information.

 

Joongsun

On Mon, Nov 16, 2009 at 6:01 PM, Jim McVittie <mcvittie@cis.stanford.edu> wrote:

Joongsun,

Can you define what you mean by Fluorine contaminants? What etch process
are you coming from? When I know more about what you want, I may be able
to give you some info.

       Jim

On Mon, 16 Nov 2009, Joongsun Park wrote:

> Dear labmembers,
>
> Does anyone know how to clean samples after dry etching?
> I could observe a lot of Fluorine contaminants after etching. If anyone
> knows cleaning processes please let me know.
> Many thanks in advance.
>
> Best,
> Joongsun
>

--
--------------------------------------------------------------
James (Jim) P. McVittie, Ph.D.          Sr. Research Scientist
Paul G. Allen Building                  Electrical Engineering
Stanford Nanofabrication Facility       jmcvittie@stanford.edu
Stanford University                     Office: (650) 725-3640
Rm. 336X, 330 Serra Mall                Lab: (650) 721-6834
Stanford, CA 94305-4075                 Fax: (650) 723-4659

Re: Cleaning after dry etching (Removal of Fluorine)

Joongsun,

Can you define what you mean by Fluorine contaminants? What etch process
are you coming from? When I know more about what you want, I may be able
to give you some info.

Jim

On Mon, 16 Nov 2009, Joongsun Park wrote:

> Dear labmembers,
>
> Does anyone know how to clean samples after dry etching?
> I could observe a lot of Fluorine contaminants after etching. If anyone
> knows cleaning processes please let me know.
> Many thanks in advance.
>
> Best,
> Joongsun
>

--
--------------------------------------------------------------
James (Jim) P. McVittie, Ph.D. Sr. Research Scientist
Paul G. Allen Building Electrical Engineering
Stanford Nanofabrication Facility jmcvittie@stanford.edu
Stanford University Office: (650) 725-3640
Rm. 336X, 330 Serra Mall Lab: (650) 721-6834
Stanford, CA 94305-4075 Fax: (650) 723-4659

Cleaning after dry etching (Removal of Fluorine)

Dear labmembers,

 

Does anyone know how to clean samples after dry etching? 

I could observe a lot of Fluorine contaminants after etching. If anyone knows cleaning processes please let me know.

Many thanks in advance.

 

Best,

Joongsun

Problem p5000etch SNF 2009-11-16 15:55:27: Ch A, 1st 2 wafers OK, next 2 He leak error

Re: Comment p5000etch SNF 2009-11-04 11:38:50: ChB He leak rate fixed

Archived

Re: Comment p5000etch SNF 2009-11-09 13:50:24: Maintenance work

Archived

Re: Shutdown p5000etch SNF 2009-11-16 10:35:44: Broken wafer

Wafer broke in the Ch.B coor (slit valve). Cleaned chamber B and loadlock. Checked handling at atmoshphere with no problems. Cycled 8 wafers running the oxide etch recipe.

Re: Problem p5000etch SNF 2009-11-16 03:15:14: wafer stuck in Ch.B

Wafer broke in the Ch.B coor (slit valve). Cleaned chamber B and loadlock. Checked handling at atmoshphere with no problems. Cycled 8 wafers running the oxide etch recipe.

TODAY: Special Seminar - MEMS at DARPA - Prof. Tom Kenny 4:00pm Allen 101X

Special Seminar

Where:  Allen 101X
When:  4 PM on Monday November 16th

MEMS at DARPA.

Professor Tom Kenny will describe DARPA programs he has been involved
with, and comment on where things are and where they might be going.

PhD Orals - Filip Crnogorac, FRIDAY, Nov. 20; 1:00pm

Please join me for my defense on FRIDAY, 1pm at Clark Auditorium.
Looking forward to seeing you there,
Filip

------------------------------------------------------------------
"Semiconductor Crystal Islands for 3-Dimensional Integration"

Stanford University PhD Dissertation Defense

Filip Crnogorac (filip@stanford.edu)
Research Advisor: R. Fabian W. Pease
Department of Electrical Engineering

Time: Friday, November 20th, @ 1:00 pm
(refreshments served at 12:45 pm)

Location: Clark Center Auditorium
(Basement, entrance across from Nexus)

ABSTRACT

The critical operation needed to achieve 3-dimensional integrated
circuits is obtaining single-crystal, device-quality semiconductor
material on upper circuit layers without damaging circuits below
(400°C temperature limit). Simulation shows that microsecond pulse
532nm Nd:YAG laser can melt and crystallize amorphous Si or Ge layers
without heating the circuit layers underneath. However, experimental
results of unseeded (graphoepitaxy) and seeded (RMG) crystallization
of Si and Ge indicate that much longer pulse lengths are required for
high quality single crystal formation, rendering the approach not 3DIC
compatible.

A more straightforward approach is to directly attach high quality
crystal islands for upper layer device fabrication. A variety of
viable low-temperature (≤400°C) bonding methods have been
investigated: fusion bonding (SiO2-SiO2, Si-SiO2, Ge-SiO2), thermo-
compressive bonding (Cu-Cu, Ti-Ti), as well as AlGe eutectic bonding.
The unique advantages of AlGe technique for 3DICs are reported for the
first time. They include superior bond strength, low void formation,
no roughness requirement, use of thin films and CMOS friendly
materials. Finally, we present a full 3DIC compatible process of
obtaining single crystal Si or Ge islands for upper layer device
fabrication via SmartCut(TM) and CMP finish.

------------------------------------------------------------------

TiN deposition

Does anyone have experience with titanium nitride deposition? I'm also interested in dry etching TiN.

Thanks,
Jason

Shutdown p5000etch SNF 2009-11-16 10:35:44: Broken wafer

Broken wafer at chamber B door (slit valve)

Problem p5000etch SNF 2009-11-16 03:15:14: wafer stuck in Ch.B

error: slit valve did not close in max allowed time
attempted to recover wafer, but it gives robot rotation axis is moving error. Please recover wafer and place it in box. Thanks!

Re: Problem p5000etch SNF 2009-11-13 10:33:16: Ch A, no He flow error

Vented chamber and found arcing on large lip seal o-ring,
changed large and smal lip seal o-rings and also wet cleaned
chamber.

Re: Problem p5000etch SNF 2009-11-13 08:45:18: Ch. B wet pump oil pressure bad

Backing pump was low on fombin oil, added 14/06 fomblin oil.

spin on doped glass

Hi,

If anyone uses spin on doped glass, I need some advise on the process flow.
Please get back to me.

Thank you!
Waqas Mustafeez
--------------------------------------------------------------
PhD Candidate,
Electrical Engineering,
Salleo Group: http://salleo.stanford.edu
Stanford University

Reminder: Process Clinic, Monday, 11/16, 2-4 pm

Hi all --

Just a reminder of the next Process Clinic, scheduled for Monday, 11/16
at 2 pm in the cubicle area outside Maureen's office. Bring process
questions, runsheets, layouts, SpecMat requests. Staff will be on
hand. Experienced labmembers are especially welcome to help with
brainstorming solutions.

Your SNF Staff

Problem p5000etch SNF 2009-11-13 10:33:16: Ch A, no He flow error

TODAY! Student OSA/SPIE seminar -- Mario Paniccia, Intel Fellow, Fri 11/13, 3:15pm, Ginzton AP 200

Special Seminar

Bridging Photonics and Computing

 

Dr. Mario Paniccia

Intel Fellow

Director, Photonics Technology Lab

Corporate Technology Group, Intel Corporation

 

Friday, November 13, 3:15 PM, Applied Physics 200

Refreshments at 3:00 PM

Presented by the Stanford Student OSA/SPIE

 

Abstract:

The silicon chip has been the mainstay of the electronics industry for the last 40 years and has revolutionized the way the world operates. Today a silicon chip the size of a fingernail contains over one billion transistors and has the computing power that only a decade ago would take up an entire room of servers. Silicon photonics based mainly upon silicon on insulator (SOI) has recently attracted a great deal of attention since it offers an opportunity for low cost optoelectronic solutions for applications ranging from telecommunications down to chip-to-chip interconnects as well as possible applications in emerging areas such as optical sensing and biomedical applications.

 

Recent advances and research breakthroughs in silicon photonic device performance over last few years have shown that silicon can be considered as a material onto which one can build future optical devices. While significant efforts are needed to improve device performance and to “commercialize” these technologies, progress is moving at a rapid rate. If successful, silicon photonics may similarly come to dominate the optical communications as it has the electronics industry.

 

This keynote will provide overview of silicon photonics research at Intel Corporation, describe some of the recent advances in device performance and discuss the key building blocks needed for “siliconizing” photonics. In addition the presentation will provide an overview and discussion on potential applications and future opportunities for enabling “photonics” in and around the PC and platform. For more info: www.intel.com/go/sp

 

Dr. Mario Paniccia is an Intel Fellow and Director of the Photonic Technology Lab at Intel Corporation. Mario currently directs a research group focused in the area of Silicon Photonics. The team is developing silicon-based photonic building blocks for future use in enterprise and data center communications. Mario has worked in many areas of optical technologies during his career at Intel including optical testing for leading edge microprocessors, optical communications and optical interconnects. His team’s pioneering activities in silicon photonics have led to many firsts such as the first silicon modulator with bandwidth >1GHz (2004) and then the first at 40Gb/s (2007), the first continuous wave silicon laser breakthrough (2005) and, together with UCSB, the world’s first “Hybrid Silicon Laser” (2006). Mario has won numerous awards including being named one of the top 50 researchers by Scientific American in November 2004 for his team’s work in the area of silicon photonics. In October 2008 Dr Paniccia was named by R&D Magazine as “Scientist of the year.” He has published numerous papers, including 3 Nature papers, 3 book chapters, and has over 65 patents issued or pending. He is a senior member or IEEE and a Fellow of OSA. Mario earned a B.S. degree in Physics in 1988 from the State University of New York at Binghamton and a Ph.D. degree in Solid State Physics from Purdue University in 1994.