Reminder: EE PhD Oral Defense - Chia-Yu Chen, Monday, May 3, 2010; 9-11am, CIS-X Auditorium

Stanford University Ph.D. Dissertation Defense

Title: "Low frequency noise in advanced MOS transistors"
Chia‐Yu Chen
Department of Electrical Engineering
Research Advisor: Prof. Robert W. Dutton
Date: Monday, May 3rd, 2010
Time: 9:00 am (Refreshments beforehand)
Location: CIS‐X 101 (Auditorium)

Abstract:
When scaling down device size and power supply, noise becomes more and more important in the future IC technology. However there are still fundamental issues in low frequency (LF) noise. This talk will address the fundamental mechanism of LF noise in advanced MOSFETs, which includes two parts:

(a) Low frequency noise in hetero‐MOSFETs:
The study starts from LF noise in p‐type Si/SiGe/Si buried channel MOSFETs and in standard surface channel p‐type MOSFETs. Through the comparison between buried channel and surface channel MOSFETs the effects from surface and from bulk are separated and the detailed LF noise mechanisms in the whole gate bias conditions can be discussed. To clarify the LF noise origin advanced TCAD simulations and noise characterization are used and a complete picture of LF noise mechanism in MOSFETs is provided.
(b) Low frequency noise in scaled MOSFETs:
In the second part of talk we studied LF noise in scaled MOSFETs. When scaling down the device size to nano‐meter level LF noise becomes different and random telegraph noise (RTN) is observed. Through measurements in different gate bias conditions and TCAD simulations a complete picture of LF noise origin in scaled MOSFETs is suggested.

This study lays groundwork for device LF noise performance optimization and provides physical insights of LF noise for IC designers.

Alternative developer for 3612

Does anyone know if there is an alternative developer for 3612 resist that does not etch ALD Al2O3?


Thanks,
Arash

Comment p5000etch SNF 2010-04-30 14:58:33: Update Ch.A rf gen

Installed RF generator. Need to perform RF calibration

Problem p5000etch SNF 2010-04-29 19:21:27: Ch.C slit valve did not open in maximum allowed time

Re: Fga2 Furnace Abuse

Dear labmembers --

This is your worst lab nightmare. You've just spent a week working on
these wafers and they've just been damaged. It's bad enough when it an
equipment problem. But it's much worse when an unknown person does it.
Jiale's process has a limited thermal budget and because she doesn't
know the thermal history now, she has to start over.

It seems that it's a habit among some fga2 users to enter recipes and
load wafers before even enabling on Coral. Certainly, if this person
had tried to enable on Coral, they would have seen that Jiale had it
enabled and reserved. Another and bigger mistake was that this person
has not gotten back to Jiale about this.

So first, a reminder to all: USE Coral PROPERLY! If you are preparing
a machine or loading wafers so that no one else can use it, should be
enabled by you on Coral BEFORE you begin. You should check the status
on Coral and respect reservations. This goes for any tool.

Second, another reminder: MISTAKES HAPPEN AND IT'S OK! This is a
learning institution so mistakes happen all the time. But we need to be
responsible adults and own up to them. Jiale would appreciate an
apology. She would really appreciate information which might help her
to salvage her wafers -- and if not, perhaps a hand in reprocessing
them. When any of us makes a mistake, we should try learn from it.

So if anyone has any information that might help, please get in touch.
Please also take this as a reminder to use Coral properly and remind
others to do so.

Thank you for your attention --

Your SNF staff

Jiale Liang wrote:
> Hi, Professor Howe, Professor Wong, Mary, and Nancy.
>
> I enabled my fga2 around 15:30pm and I have reserved the tool for a long time annealling till next day. I adjusted my temperature to 400C, put my wafer into the furnace and left SNF around 17:30. However, when I came back 2 hours after, I was surprised to see the door of the furnace is fully open, the quartz cap is put on the desk beside and the temperature shows only 267C.
>
> Everyone knows the fga2 is a manual-controlled furnace and the wafers can be directly seen through the door. It is hard to believe someone opened the door, pulled out the quartz cap and adjusted the temperature setting UNINTENTIONALLY. Even if the labmember opened the furnace by mistake without checking the Coral first, they should not leave the quartz tube uncapped, the door open, and the temperature adjusted. Since I came with the furnace fully open without any message left around the tool, it makes me feel extremely unsafe in this lab and cannot trust my samples any more. The failure of this step ruins all my previous work and costs me tens of hours to start again. I hope people can respect others' work and instrument reservation.
>
> Please let me know who operated that furnace during that period. I will really appreciate that.
>
> Best,
>
> Jiale
>

Epi Move

Hello All,
The big day has come. The ASM epi will be leaving today. The
schedule is for the tool to leave the lab around 8:00am and be on the
truck by 10:00. This means the lab doors will be open for a short period
of time as the tool exits. please plan accordingly. Thanks for your
understanding and cooperation. ted

Final Notice Stanford Nanoprobes Workshop! - May 14, 2010

April 28, 2010 – FINAL NOTICE

Dear SNF labmembers (feel free to forward to others),
You are cordially invited to:
Stanford University's Center for Probing the Nanoscale (CPN) 6th Annual Workshop
Friday, May 14, 2010
8:30-6, with continental breakfast and lunch included.
Poster session from 4-6, with hors d'oeuvres served.
STUDENTS AND POSTDOCS ARE FREE, BUT EVERYONE MUST REGISTER!
Registration: <http://www.stanford.edu/group/cpn/research/anworkshop_reg.html>

Location:
Bechtel Conference Center, Encina Hall, 616 Serra Mall, Stanford University.

Speakers include:

Alexander Balatsky, Los Alamos National Laboratory
" Dirac Materials"

Irfan Siddiqi, University of California, Berkeley
"Noiseless Amplification in Superconducting Nanoscale Magnetometers"

Tetsuo Hanaguri, RIKEN Advanced Science Institute, Saitama, Japan
" Spectroscopic-Imaging STM at High Magnetic Fields"

Ray Ashoori, MIT
"Extremely High Energy Resolution Spectroscopy of Two-Dimensional
Electronic Systems"

Roya Maboudian, University of California, Berkeley
"Probing Interfacial Contact via MEMS-based Instrumentation"

Wilson Ho, University of California, Irvine
"Single Spin Phenomena"

David A. Muller, Cornell University
"Atomic-Resolution Imaging of the Physical and Electronic Structure of
Nano-Devices"

Keith Schwab, California Institute of Technology
"Exploration of the Quantum Properties of Nanoscale Electro-Mechanical
Structures"

Andreas Heinrich, IBM
"Measuring Spin Relaxation Times of Single Atoms with Nanosecond Time
Resolution"

-----------------------------------------------------------------
David Goldhaber-Gordon                            goldhaber-gordon@stanford.edu
Associate Professor of Physics                  davidg@post.harvard.edu
and Deputy Director,                                 (permanent forwarding)
Center for Probing the Nanoscale
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)

Address for letters or packages:                      Administrative Associate:
David Goldhaber-Gordon                                 Roberta Edwards
Geballe Laboratory for Advanced Materials       McCullough, Rm. 338
McCullough Building, Room 346                      Phone: (650) 723-8028
476 Lomita Mall                                             Fax: (650) 724-3681
Stanford, CA 94305-4045                                email:
redward@stanford.edu

--
-----------------------------------------------------------------
David Goldhaber-Gordon goldhaber-gordon@stanford.edu
Associate Professor of Physics davidg@post.harvard.edu
and Deputy Director, (permanent forwarding)
Center for Probing the Nanoscale
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)

Address for letters or packages: Administrative Associate:
David Goldhaber-Gordon Roberta Edwards
Geballe Laboratory for Advanced Materials McCullough, Rm. 338
McCullough Building, Room 346 Phone: (650) 723-8028
476 Lomita Mall Fax: (650) 724-3681
Stanford, CA 94305-4045 email:
redward@stanford.edu

AppNano AFM Probes Presentation

Stanford Nanofabrication Facility and AFM Lab Member Community,

AppNano AFM Probes Technology will be on campus Tuesday, April 4th to
give a presentation on their latest probe technology. The
presentation will begin at 12 noon in room Paul Allan 101. Please
refer to the attached flier for complete details. The presentation
will last approximately one hour and will highlight several recent
AFM tip technologies and developments.

A free lunch will be provided to registered guests. To reserve your
pizza lunch and the option of free AFM tip samples please reply to
info@appnano.com with your name and contact information (email and
phone number) and the AFM probe part number.

To request sample probes please visit www.appnano.com and suggest the
probe part number you are most interested in obtaining.
You may select one part number out of the following series of probes :
ACT, ACL, FORT, SHOCON, SICON and HYDRA.

For additional information on the presentation please contact:
mhuey@appnano.com

RTPs and other brief disruptions

Hello All,
As most of you know things are improving in the lab. In the
process of installing new tools i.e. we will need to shut down RTAGAAS
for a period of about a week. This will begin on June 1st. During this
time STS dep will have certain gases shut down for brief periods to tie
in gas lines. Hopefully this will give users ample notice to plan ahead.
We apologize for the disruption but know we are making the lab more
versatile for all of you. Thanks in advance for your cooperation.

Fga2 Furnace Abuse

Hi, Professor Howe, Professor Wong, Mary, and Nancy.

I enabled my fga2 around 15:30pm and I have reserved the tool for a long time annealling till next day. I adjusted my temperature to 400C, put my wafer into the furnace and left SNF around 17:30. However, when I came back 2 hours after, I was surprised to see the door of the furnace is fully open, the quartz cap is put on the desk beside and the temperature shows only 267C.

Everyone knows the fga2 is a manual-controlled furnace and the wafers can be directly seen through the door. It is hard to believe someone opened the door, pulled out the quartz cap and adjusted the temperature setting UNINTENTIONALLY. Even if the labmember opened the furnace by mistake without checking the Coral first, they should not leave the quartz tube uncapped, the door open, and the temperature adjusted. Since I came with the furnace fully open without any message left around the tool, it makes me feel extremely unsafe in this lab and cannot trust my samples any more. The failure of this step ruins all my previous work and costs me tens of hours to start again. I hope people can respect others' work and instrument reservation.

Please let me know who operated that furnace during that period. I will really appreciate that.

Best,

Jiale

Problem p5000etch SNF 2010-04-27 14:35:22: still having helium leak error

I would like to run some test wafefs to try and diagnosis the inconsistent etch rate problem but cannot run anything until the helium leak error is resolved.

SOI wafers

Hey Everybody,

Does anyone have any recommendations for vendors to buy SOI wafers? I
am looking for 4" wafers with a device layer of 200-300nm thickness.
Thanks!

Ed

ASM Epi1 Move: Thursday, 4/29

Dear labmembers:

The ASM Epi system (otherwise known as epi or epi1) will be moved from
the lab this Thursday, April 29, starting at about 7 am. Preparations
are underway now for this move, which should take only a couple of
hours. Please be warned that the white area of the cleanroom will be
breached during the move (the double doors next to the chemicals
passthrough will be opened), but that we expect the cleanroom to recover
quickly afterwards. You may want to plan your lab activities accordingly.

This move marks the end of an era at SNF... The ASM Epsilon was
commissioned here around 1987 as an atmospheric epitaxial deposition
system, the first to our knowledge at any University lab. After
significant modification, it was soon converted to a prototype
sub-atmospheric system. Pioneering process development work was done on
this system: Ge and SiGe on silicon devices, conformal poly
encapsulation for packaging, hydrogen annealing of silicon. The methods
developed on this system have launched many dozens of PhD's, not to
mention at least one successful company.

However, the decades take their toll and it became increasingly
difficult to maintain this system, particularly with is one-of-a-kind
modifications. With the introduction of epi2, ASM Epi is no longer the
critical path step it once was. Once the ASM Epi departs this world,
its space will be prepped for the installation of two new PECVD systems,
due in August (for more information about these, see the News on the SNF
website.) And in the meantime, strategic discussions are underway to
further increase epitaxial deposition capacity and capability at SNF.

So, it's the end of an era -- but the beginning of a new one, as we
embark on introducing new equipment and processes at SNF.

If you have any questions about the move or new equipment, please
contact any of us --

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

[Reminder] Seminar: Adam de la Zerda, Tuesday, April 27, 4:00-5:00pm, Allen 101X Auditorium

Photoacoustic Molecular Imaging and its Biomedical Applications

Adam de la Zerda
Stanford University, Department of Electrical Engineering and the
Molecular Imaging Program

Abstract:
Photoacoustic imaging is a new medical imaging field with tremendous
clinical and commercial potential. In this talk, I will show how we
utilize the 'photoacoustic effect' - the conversion of short light
pulses into ultrasound waves, for performing highly sensitive disease
detection in a living body. By measuring the ultrasound waves
emanating from the body, one can create a detailed 3D image of the
blood vessels structure, oxygen saturation levels and track external
contrast agent molecules as they target diseased tissues such as
cancer. I will present our experimental photoacoustic imaging system,
reviewing its various aspects including: optics, electronics,
ultrasound, image processing, nanoparticle chemistry, biology and
medicine.  Finally, a number of medical needs we attempt to solve
using this technology will be introduced, including cancer, eye
diseases, and lymphatic diseases.

Biography:
Adam de la Zerda is a Ph.D. candidate at the Dept. of Electrical
Engineering at Stanford. He works on Photoacoustic Molecular Imaging
and its application for ophthalmic and cancer imaging under the
mentorship of Prof. Sanjiv Sam Gambhir at the Radiology and
Bioengineering departments at Stanford University. Mr. de la Zerda has
received over 14 awards for his work including the Best Poster
Presentation at SPIE Photonics West (2009), the Young Investigator
Award at the World Molecular Imaging Congress (2008), the Department
of Defense Breast Cancer Research Program Award for Predoctoral
researchers (2008), the Bio-X Graduate Student Fellowship (2008), and
first place at the Bay Area Entrepreneurship Contest (2007). He has
published over 10 papers in leading journals including Nature
Nanotechnology, Nano Letters, and PNAS, some of which received
significant press coverage from Forbes Magazine, US News and The
Washington Post. He holds a number of patents and is the co-founder of
a medical imaging device company, OcuBell Inc. Mr. de la Zerda studied
Computer Engineering and Physics at the Technion – Israel Institute of
Technology where he graduated with a B.Sc. Summa Cum Laude.

spin-on-glass

Hi, labmembers.

I'm planning to use spin-on-glass with <100nm thickness.
But, I don't have any experience for this material.
If anyone of you have experience in using spin-on-glass or have some samples,
please let me know.

Thanks.



--
Sangmoo Jeong

Graduate student
Department of Electrical Engineering
Stanford University
Email: popomoo@gmail.com
Phone: 650-704-3295

SU-8 10

Hi all, 

I was wondering if anybody has any SU-8 10 and if they would mind letting me borrow a few ml.  I'm not sure if it will help me solve my processing issue or not, and I wanted to test the process once before buying a whole bottle.

thanks,
Mehdi

--
Mehdi Javanmard, PhD
Engineering Research Associate
Stanford Genome Technology Center
909-438-6864
mehdij@stanford.edu

Problem p5000etch SNF 2010-04-26 11:30:26: He leak

Attempted to run some dummies, but keep getting He leak errors.

Re: Shutdown p5000etch SNF 2010-04-25 21:57:06: etch fluctuations due to DC bias and He leak

Only chamber is down. Working on chamber B etchrate problem.

Re: Problem p5000etch SNF 2010-04-25 18:38:07: broken wafer in Ch. C

I removed the broken wafer chips on Sat..

Shutdown p5000etch SNF 2010-04-25 21:57:06: etch fluctuations due to DC bias and He leak

I have noticed strange etch rate fluctions in the past. This has been very intermitant and has not correlated with any fluctions in gas flows, pressure, RF power, magnetic field, or He leak rate. Tonight I observed this again, quite apparent on the EPD showing a drop from -1 to -2 over the course of 10sec. It was correlated with a drop in the DC bias from -450 (+/-10V) to widely flucting DC bias between -50 and -120V. The helium leak rate remained below 3sccm during this.
Then, on another wafer, the He leak rate of ~9sccm caused error. These two issues seem unrelated, but its hard to say at this time.

Problem p5000etch SNF 2010-04-25 18:38:07: broken wafer in Ch. C

Somebody broke a wafer in Chamber C and left a note on the bench. No name or mention of this on coral.

clean up after yourself in the gowning area!

Dear Labmembers,

Why is it necessary to make a mess of the table with the gloves, leave the booties strewn all over with the baskets tipped over and leave your clothes hangers lying all over the place? It kind of makes me embarrassed to be a labmember. Please straighten up after yourself so that someone else doesnt have to (I just did).

Dave

Re: Problem p5000etch SNF 2010-04-25 10:40:44: CH. B _ He Leak Rate Too High

Vented chamber and clean lip seal o-ring

Problem p5000etch SNF 2010-04-25 10:40:44: CH. B _ He Leak Rate Too High

Could not run any wafer. Attempted running process twice. Had high backside He.

warning from p5000etch-pcs@snf.stanford.edu

Hi! This is the ezmlm program. I'm managing the
p5000etch-pcs@snf.stanford.edu mailing list.

I'm working for my owner, who can be reached
at p5000etch-pcs-owner@snf.stanford.edu.

Messages to you from the p5000etch-pcs mailing list seem to
have been bouncing. I've attached a copy of the first bounce
message I received.

If this message bounces too, I will send you a probe. If the probe bounces,
I will remove your address from the p5000etch-pcs mailing list,
without further notice.

I've kept a list of which messages from the p5000etch-pcs mailing list have
bounced from your address.

Copies of these messages may be in the archive.

To retrieve a set of messages 123-145 (a maximum of 100 per request),
send an empty message to:
<p5000etch-pcs-get.123_145@snf.stanford.edu>

To receive a subject and author list for the last 100 or so messages,
send an empty message to:
<p5000etch-pcs-index@snf.stanford.edu>

Here are the message numbers:

2925

--- Enclosed is a copy of the bounce message I received.

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Re: Problem p5000etch SNF 2010-04-23 15:06:13: CH. C DOWN

Removed wafer chips on chamber and set reset the overtemp
switch on lid heater. Set foreline, bellow bias and turbo purge.

Problem p5000etch SNF 2010-04-23 15:06:13: CH. C DOWN

Wafer was cleaved in the chamber and bits still remain in the chamber.

silicone oil

Hi, I wonder if any of your lab has chemically pure silicone oil. I'd
like to use a small amount of 5ml as pressure transmitting medium in
diamond cell.

Thank you,
Shibing

--
Shibing Wang
Ph.D. Candidate
Department of Applied Physics
Stanford University

316 Via Pueblo Mall
Department of Applied Physics
Stanford, CA, 94305
Tel: 650 862 3001

Reminder: EE PhD Oral Defense - Jia Zhu, Monday, April 26, 2010; 4-6pm, CIS-X Auditorium

Stanford University Ph.D. Dissertation Defense

Name: Jia Zhu
Advisor: Prof. Yi Cui
Time: April 26 (Monday: 4pm-6pm)
Location: CIS-X Auditorium

Title: Tuning the Shape of Semiconductor Nanowires for Advanced Photovoltaics

Abstract:

Tuning the shape of nanostructures can have a strong effect on photon
management and charge carrier collection for photovoltaics. Here, I
demonstrate two examples of nanowire shape designing: nanocones and
branched nanowires.

Photon management, involving both absorption enhancement and
reflection reduction, is critical to all photovoltaic devices. It can
improve the efficiency by minimizing optical and electrical losses,
and cut cost by reducing material usage, process time and capital
investment. Here I demonstrate a novel solar cell structure with an
efficient photon management design. The centerpiece of the design is a
novel nanocone structure, which is fabricated by a scalable low
temperature process. With this design, devices with very thin active
layer can achieve near perfect absorption because of both efficient
antireflection and absorption enhancement over a broad spectral range
and a wide range of angles of incidence. More strikingly, the design
and process is not in principle limited to any specific material
system, hence it opens up exciting opportunities for all classes of
photovoltaic devices. I have used amorphous silicon and dye sensitized
solar cells as two examples to demonstrate the concept. The device
efficiencies of this design are significantly better compared to
conventional devices. Moreover, I also have explored absorption
enhancement on a sub-wavelength scale, compared to "classical" light
trapping limits.

PbSe nanocrystals have shown a greatly enhanced multi exciton
generation (MEG) effect, one important step toward third generation
solar cells. However, it is difficult to extract generated carriers
from nanocrystals without good transport pathways. Three dimensional
branched nanowire or nanotube networks, with strong quantum
confinement within two dimensions, and the connected third dimension
as an efficient charge carrier pathway, could be ideal for enhancing
the MEG effect, light absorption, and carrier collection. I
successfully demonstrate a large area growth of PbSe hyperbranced and
chiral branched nanowires on a variety of substrates. More excitingly,
Chiral branched nanowires reveal a new nanowire growth mechanism,
dislocation driven growth, which can be applied to a variety of
materials.

Re: Problem p5000etch SNF 2010-04-22 02:39:45: Chamber C gas flows

Reduced chlorine gas flow from 30 psi to about 10 psi. Ran 8 wafers with no problems.

Problem p5000etch SNF 2010-04-22 02:39:45: Chamber C gas flows

Getting MFC error on final step (pump step) of chamber C poly etch recipe. Can't seem to unload my wafers, either, they are stuck in the chamber and the elevator. Please unload to casette w/ my name on it by the machine.

Re: Comment p5000etch SNF 2010-04-19 11:32:00: Chamber A

switched to problem to get users attention.

Problem p5000etch SNF 2010-04-21 11:03:17: CH.A down

Were sending out the OEM12 generator for repair,
it will take about 5 working days to repair the
generator..
(put as a problem instead of comment)

Re: Comment p5000etch SNF 2010-02-11 13:48:18: feedback on chamber clamp problem

archived

Re: Comment p5000etch SNF 2009-12-10 11:34:19: 2. Update chamber B

archived

Re: Comment p5000etch SNF 2009-11-30 15:00:47: Ch.A heat ex fault update

archived

Re: Comment p5000etch SNF 2009-02-25 14:35:23: root directory full on disk?

recipe creation ok now

Re: Comment p5000etch SNF 2010-01-11 22:15:13: Also...

noted

Re: Comment p5000etch SNF 2010-01-15 10:22:09: Ch.B shutdown

archived

Re: Problem p5000etch SNF 2009-12-07 23:23:30: Cannot create recipes

I removed several recipes and created a test recipe without error! Go ahead and give new recipe writting a try....

Re: Comment p5000etch SNF 2010-03-22 13:40:31: Update:

Archived

Re: Comment p5000etch SNF 2010-02-09 14:58:13: New BCl3 cylinder

Archived

Re: Comment p5000etch SNF 2010-03-21 21:35:26: Update

Archived

Re: Comment p5000etch SNF 2010-03-20 15:51:00: Update..

Archived

Comment p5000etch SNF 2010-04-19 11:32:00: Chamber A

Were sending out the OEM12 generator for repair,
it will take about 5 working days to repair the
generator..

Comment p5000etch SNF 2010-04-19 10:10:47: Chamber A

The rf generator is bad, no ac power.

Re: Shutdown p5000etch SNF 2010-04-18 19:59:53: NO RF

Chambe A is only chamber, bad oem12 rf generator..

Process Clinic Today, 2-3:30 pm

Greetings labmembers --

Just a reminder that there is a Process Clinic today (Monday) from 2-3:30
pm in the cubicle area outside of Maureen's office.

Experienced people will be on hand to answer questions and
brainstorm ideas to address process issues. Bring your ideas, process
questions, your process runsheets, SpecMat request, device layouts, and
whatever else.

(Senior labmembers are most welcome to help advise!)

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Fwd: New Frontiers in Plasma Nanopatterning Workshop - Register Today

Delivered-To: rissman@snf.stanford.edu
From: "Molecular Foundry" <Do-Not-Reply@lbl.gov>
To: "rissman@snf.stanford.edu" <rissman@snf.stanford.edu>
Reply-To: nancy.crouch@oxinst.com
Date: Mon, 19 Apr 2010 14:00:22 +1000
Subject: New Frontiers in Plasma Nanopatterning Workshop - Register Today
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The Molecular Foundry
April 12, 2010
 

July 15-16, 2010 at The Molecular Foundry of LBNL

Thursday, July 15: 8am - 5:30pm
Friday July 16: 8:30am - 12:30pm

This two-day seminar, sponsored by The Molecular Foundry and Oxford Instruments Plasma Technology is free of charge, but must be booked in advance as spaces are limited. Click here to book your place.

View the preliminary program.

Presentations by key speakers include:

• The future of nanoelectronics
• ALD in solar cells and direct-write patterning
• Pt ALD
• Inorganic resists for high speed, high resolution patterning
• Advanced plasma diagnostics and links to on-wafer performance

Workshops and classes include:

• Intros to ALD/PECVD, Plasma diagnostics, and Nanofabrication & etching
• Plasma based etching and atomic layer deposition
• Nanofab tour

There will also be tours of The Molecular Foundry, a poster session, and a Process Helpdesk, at which Oxford Instruments process experts will be on hand to answer any specific Process Application questions.

Register today to reserve your seat. Space is limited, so early booking is advisable.
 

 

 

 

 
A U.S. Department of Energy National Laboratory Operated by the University of California

Questions & Comments · Privacy & Security Notice

This email was sent to rissman@snf.stanford.edu. You can instantly unsubscribe from these emails by clicking here.

Shutdown p5000etch SNF 2010-04-18 19:59:53: NO RF

happened at Step 1 when running Ch. A Metal

Updating Java and Acrobat reader ....

SNF Lab Members:

The folks that distribute malware have apparently begun to exploit both
Java run from within a browser and Adobe Acrobat Reader to download
unwanted software onto your machines. While this does not affect Remote
Coral in any way, if you do not have the latest versions of Java and
Acrobat Reader installed on your desktop machines and laptops, you could
be at risk when visiting other web sites or opening PDF documents.

On Windows machines, if you open up your control panel, you should have
an icon for Java. If you open that, it will have a tab named Update and
on that panel is a button named "Update Now" which will download and
install the latest Java Runtime Environment 1.6.0_20. Note: this may
also offer to install either a Yahoo menu bar and a backup product named
Carbonite .... and, I think, pre-checks those check boxes. If you don't
want to install these things, make sure that you look at and read each
page rather than blindly clicking "Next".

In Adobe Reader, if you get a pop up window labeled "Launch File" that
claims that it wants to launch an application from a PDF document, be
careful. This may be a bad guy trying to download something undesirable
onto your machine.

More details about these threats are at:

http://krebsonsecurity.com/2010/04/java-patch-targets-latest-attacks/

Note: for Mac users, I don't know whether Apple has released a version
of their JRE to thwart these threats.

Thanks,

John

Vacuum Training Seminar Tuesday, April 20

Dear Labmembers,

Kurt J. Lesker Co. is giving a vacuum training seminar this coming Tuesday, April 20. It is from 1-4 PM in Braun Auditorium in Mudd Chemistry Building.

It will cover:
Gas-Solid Interactions
Basic Pumping Concepts
Gas Load
Throughput
Equating Gas Load and Throughput
Vacuum System Modeling

Please feel free to forward this to any lists you are on, as it should be very informative.

Refreshments will be provided.
For any questions, contact Shawn Jones, shawnj@lesker.com , 209-401-6453.

Thanks!
James Mack
jfmack@stanford.edu

Fwd: Stanford Vacuum Training-Tuesday, April 20th @ 1pm

Begin forwarded message:

From: "Peggy Loche" <peggyl@lesker.com>

Date: April 15, 2010 12:20:07 PM PDT

To: <kpkuhl@stanford.edu>, "Neil Dasgupta" <dasgupta@stanford.edu>, "Shuang Li" <shuangli@stanford.edu>, "Felix Schmitt" <fschmitt@stanford.edu>

Cc: <ghassink@stanford.edu>, <jrgdavid@stanford.edu>, <fmwang@stanford.edu>, "Samuel Rosenthal" <sjrosen@stanford.edu>, "Chia-Jung Chung" <cchung08@stanford.edu>, <uraib@stanford.edu>, <chalfin@stanford.edu>, "Rungthiwa Methaapanon" <rmetha@stanford.edu>, "Robert Hammond" <rhammond@stanford.edu>, "James Mack" <jfmack@stanford.edu>, "Xinyu Bao" <xinyubao@stanford.edu>

Subject: Stanford Vacuum Training-Tuesday, April 20th @ 1pm

 

 

Lesker will be holding our free vacuum training seminar at Stanford University on Tuesday, April 20^th, see attached outline. You are welcome to attend and it is free of charge so please share this info with others as I simply ask anyone planning to attend to RSVP so I can make appropriate arrangements for beverages and snacks.

 

Shawn Jones

 

Re: Problem p5000etch SNF 2010-04-14 11:53:32: pressure fluctuation

Changed the throttle valve hysteresis value from 2 to 0. Chamber leak rate < 2mT/min.

Problem p5000etch SNF 2010-04-14 11:53:32: pressure fluctuation

ran 6 dummies successfully
attempted to run 8 production wafers
wafer 3 failed due to helium leak error
wafer 4 failed due to large pressure fluctuations:
setpoint 250mTorr
fluctuating between 200 and 300mTorr
All gas flows were stable to within 2sccm of setpoint
helium leak rate for wafer 4 was <2sccm

[POSSIBLE VIRUS:###] [Fwd: Tiberio is looking for thin dielectric on Silicon]

Hi Jeannie and SNF Lab Members,

This was from Rich Tiberio working at the Nanocenter.  He is leaving soon for Japan and  needs some substrates with thin oxide or Nitride.

If anyone has a few 75 or 100 mm substrates with measured thin oxide films to spare you can leave it on James Conway's desk or drop off to Rich directly.

Thank you,

James Conway

 From Rich Tiberio:

Typically at JEOL we expose ZEP on bare silicon and then go right into the SEM.

However Mike Rooks shows me much nicer images after a shallow etch.

 

Process

1)  3 inch or 4 inch wafers  with thin ~ 15 to 20 nm  of silicon dioxide or silicon nitride

2)  spin ZEP resist

3) expose and develop

Extra step )  Light RIE to transfer into “hard mask”   <<< JEOL skips this and goes directly to SEM,

4)  SEM.   Resist is OK,  but hard mask doesn't’t melt.

 

I apologize for the short notice, I had given up, but last night I though   “go for it”.

 

Conclusion:

Any generic 3 inch or 4 inch wafer  with thin ~ 15 to 20 nm  of silicon dioxide or silicon nitride would be great.

I can image everyone asks for “ some wafer you happen to have on the shelf”.

 

Thanks for your time.

 

Rich Tiberio

desk:  650 724 4691

cell:    408 476 6855

 

Re: Problem p5000etch SNF 2010-03-07 13:24:33: Wafer did not drop on blade ... wafer in loadlock

Cesar worked on the robot and it seems to be working for now. See comments for details.

Seminar: Adam de la Zerda, Tuesday, April 27, 4:00-5:00pm, Allen 101X Auditorium

Photoacoustic Molecular Imaging and its Biomedical Applications

Adam de la Zerda
Stanford University, Department of Electrical Engineering and the
Molecular Imaging Program

Abstract:
Photoacoustic imaging is a new medical imaging field with tremendous
clinical and commercial potential. In this talk, I will show how we
utilize the 'photoacoustic effect' - the conversion of short light
pulses into ultrasound waves, for performing highly sensitive disease
detection in a living body. By measuring the ultrasound waves
emanating from the body, one can create a detailed 3D image of the
blood vessels structure, oxygen saturation levels and track external
contrast agent molecules as they target diseased tissues such as
cancer. I will present our experimental photoacoustic imaging system,
reviewing its various aspects including: optics, electronics,
ultrasound, image processing, nanoparticle chemistry, biology and
medicine. Finally, a number of medical needs we attempt to solve
using this technology will be introduced, including cancer, eye
diseases, and lymphatic diseases.

Biography:
Adam de la Zerda is a Ph.D. candidate at the Dept. of Electrical
Engineering at Stanford. He works on Photoacoustic Molecular Imaging
and its application for ophthalmic and cancer imaging under the
mentorship of Prof. Sanjiv Sam Gambhir at the Radiology and
Bioengineering departments at Stanford University. Mr. de la Zerda has
received over 14 awards for his work including the Best Poster
Presentation at SPIE Photonics West (2009), the Young Investigator
Award at the World Molecular Imaging Congress (2008), the Department
of Defense Breast Cancer Research Program Award for Predoctoral
researchers (2008), the Bio-X Graduate Student Fellowship (2008), and
first place at the Bay Area Entrepreneurship Contest (2007). He has
published over 10 papers in leading journals including Nature
Nanotechnology, Nano Letters, and PNAS, some of which received
significant press coverage from Forbes Magazine, US News and The
Washington Post. He holds a number of patents and is the co-founder of
a medical imaging device company, OcuBell Inc. Mr. de la Zerda studied
Computer Engineering and Physics at the Technion – Israel Institute of
Technology where he graduated with a B.Sc. Summa Cum Laude.

Re: Al2O3 etch

Pengyu,

ALD Al2O3 etches in 50:1 HF. I will have to check the rate but I expect 2
min should enough. Jim

On Tue, 13 Apr 2010, J Provine wrote:

> Koh will etch al2o3. I'm not sure about etch rate exactly, but it
> won't take very long at all to etch 20 nm.
> J
>
> On Tuesday, April 13, 2010, Pengyu Fan <fanpy839@stanford.edu> wrote:
> > Hi All,
> > I need to etch ~20nm of Al2O3 (grown ALD). Does anybody have any experience of wet etch of such materials? (e.g. etchant, etch rate and etc.)
> > Thank you so much!
> >
> > Best,--
> > Pengyu Fan
> >
> > PhD Candidate
> > Materials Science & Engineering
> > Stanford University
> >
> >
>

--
--------------------------------------------------------------
James (Jim) P. McVittie, Ph.D. Sr. Research Scientist
Paul G. Allen Building Electrical Engineering
Stanford Nanofabrication Facility jmcvittie@stanford.edu
Stanford University Office: (650) 725-3640
Rm. 336X, 330 Serra Mall Lab: (650) 721-6834
Stanford, CA 94305-4075 Fax: (650) 723-4659

Re: Shutdown p5000etch SNF 2010-04-12 18:24:00: stage doesn't come back to original position and the screen turns black

System computer was locked-up. Reset the system. Ran 8 wafers through all 3 chamber with no problem.s

Re: Al2O3 etch

Koh will etch al2o3. I'm not sure about etch rate exactly, but it
won't take very long at all to etch 20 nm.
J

On Tuesday, April 13, 2010, Pengyu Fan <fanpy839@stanford.edu> wrote:
> Hi All,
> I need to etch ~20nm of Al2O3 (grown ALD). Does anybody have any experience of wet etch of such materials? (e.g. etchant, etch rate and etc.)
> Thank you so much!
>
> Best,--
> Pengyu Fan
>
> PhD Candidate
> Materials Science & Engineering
> Stanford University
>
>

Al2O3 etch

Hi All,

I need to etch ~20nm of Al2O3 (grown ALD). Does anybody have any experience of wet etch of such materials? (e.g. etchant, etch rate and etc.)

Thank you so much!

Best,

--
Pengyu Fan

PhD Candidate
Materials Science & Engineering
Stanford University

seminar today: 4-5, Anne Sakdinawat, LBNL

All,

I've appended a flyer for Anne's seminar, today at 4:00 -- here's the
list of upcoming seminars.

Location: Allen 101X Auditorium
Time: 4:00-5:00 pm

April 13 Anne Sakdinawat, LBNL
April 27 Adam de la Zerda, EE Dept. and Molecular Imaging Program, Stanford
May 4 Liwei Lin, ME Dept. and BSAC, UC Berkeley
May 11 Michel Maharbiz, EECS Dept. and BSAC, UC Berkeley
May 25 Anita Flynn, Micropropulsion, Berkeley
June 1 Tony Tang, Siimpel, Arcadia
June 4 Franz Laermer, Bosch Research, Stuttgart

Dry Etching of Metals with Good Selectivity

Hi Labmembers,

I'm looking for a suitable metal for a gate first MOSFET flow.

I am thinking of using a dual metal structure where the top metal can be dry etched with selectivity over the bottom metal. I would also like to be able to wet etch the bottom metal to prevent overetching and roughening the underlying substrate, which may limit me to Ti, Cr, and Au. Both metals also need to withstand a 600C, so Al is not an option. If you know of a suitable dry etch chemistry, please tell me.

Another option for me is to use a single metal structure, if there is a metal that can be dry etched with good selectivity to Al2O3 or InGaAs.

Thank you in advance for your help!

Thanks,
Jenny

Shutdown p5000etch SNF 2010-04-12 18:24:00: stage doesn't come back to original position and the screen turns black

In the end of the process, wafer stage didn't come back to the original position. I tried recovering process according to instruction, but when I clicked "Wafer -> Control Handler", the screen suddenly turned black and it didn"t work.
All of my wafers have been saved successfully.

Reminder: Labmembers' New Equipment Mtg, Tuesday, 1 pm

Just a reminder of the Labmembers'/New Equipment Meeting tomorrow
(Tuesday), April 13, at 1 pm in the Auditorium. For more details see:
http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:4063:201004:eiadidebombcfmidnkdh

Or just come tomorrow! Information will be posted shortly afterward.

Your New Equipment Team Members

looking for pieces of doped si

Hi, I'm looking for scrap pieces of n type silicon doped to ~10^18 for testing a characterization technique. If anyone has some pieces I can take let me know.

 

Thank you

WM.

 

 

PhD Defense - Katherine Tsai, Thursday, April 15, 2010, 1:00 pm

Stanford University Ph.D. Dissertation Defense

Title: "Magnetic Nanoparticle-based Technologies for Lab-on-a-Chip Applications"

Katherine Tsai
Department of Electrical Engineering
Research Advisor:  Prof. Roger Howe

Date:  Thursday, April 15, 2010
Time: 1:00 pm (Refreshments beforehand)
Location: CIS-X 101 (Auditorium)
http://campus-map.stanford.edu/index.cfm?ID=04-055

Abstract:

Lab-on-a-Chip devices are attractive for medical diagnostics due to
their ability to perform laboratory tasks on small scales.  In this
talk, I will show how magnetic nanoparticle-based technologies hold
promise for low-power, remote actuation in Lab-on-a-Chip systems, with
a focus on two applications: cell separation and microfluidic pumping.
 I will first describe the characterization of the magnetic, optical,
and mechanical properties of a magnetic polymer composed of SU-8
polymer embedded with magnetic nickel nanoparticles.  Next, I will
show how micropillars made of this magnetic polymer can be used to
capture magnetic bead-bound breast cancer cells in microchannels.
Finally, I will demonstrate how magnetic nanoparticles suspended
within a fluid can be used for chemistry-independent microfluidic
pumping.

Re: Comment p5000etch SNF 2010-04-11 23:48:41: Top monitor acting weirdly

monitor is OK

Comment p5000etch SNF 2010-04-11 23:48:41: Top monitor acting weirdly

The screen contents of the top monitor were very distorted when it was turned on, but it fixed itself after a few minutes.

Re: Moving new Fiji ALD system into the SNF Friday afternoon

dear labmembers,
there is a delay with getting the system on its wheels for movement into the fab...it looks likely to still happen today, but definitely not 1:30-2:30 window originally indicated.
j

On Fri, Apr 9, 2010 at 5:29 AM, J Provine <jprovine@stanford.edu> wrote:

Dear labmembers,
Thursday SNF received our new Fiji ALD system from Cambridge NanoTech.
Friday around 1:30-2:30 we will move the tool into SNF through the
doors near the chemical pass through and place it in the recently
cleared space there.

This move should be brief and the fab will only be breached for a
short time, but please be aware if your are planning sensitive work
inthis area around this time.

Thank you.
J and the new equipment team

Re: Comment p5000etch SNF 2010-03-09 14:24:13: Update Ch.B wafer handling

Re: Comment p5000etch SNF 2010-03-10 14:23:03: Watch for robot arm jostling the casette

Re: Problem p5000etch SNF 2010-03-10 21:02:05: Ch. B burning resist

Re: Comment p5000etch SNF 2010-03-11 13:28:00: Update Ch.B resist burning

Re: Problem p5000etch SNF 2010-03-17 21:53:14: Ch. B high He leak rates

Re: Comment p5000etch SNF 2010-03-19 15:10:01: Update wafer did not drop

Re: Comment p5000etch SNF 2010-04-06 11:26:48: Ch B offline

Re: Comment p5000etch SNF 2010-03-27 11:18:58: Chamber A He leak

Re: Comment p5000etch SNF 2010-03-26 08:34:15: Ch.C is down

Re: Problem p5000etch SNF 2010-03-26 04:17:02: Ch. C is in fault mode (red)

Re: Comment p5000etch SNF 2010-03-26 16:38:28: Chamber C

Re: Comment p5000etch SNF 2010-03-27 11:23:37: Chamber C..

Re: Shutdown p5000etch SNF 2010-04-07 14:46:37: Remote liquid too hot error?

Cleared error and also connected ac power to chamber c pump.

Moving new Fiji ALD system into the SNF Friday afternoon

Dear labmembers,
Thursday SNF received our new Fiji ALD system from Cambridge NanoTech.
Friday around 1:30-2:30 we will move the tool into SNF through the
doors near the chemical pass through and place it in the recently
cleared space there.

This move should be brief and the fab will only be breached for a
short time, but please be aware if your are planning sensitive work
inthis area around this time.

Thank you.
J and the new equipment team

German student wanted

Hi,

In connection with the visit of German chancellor Angela Merkel the
German TV station Deutsche Welle wants to do a background story. It is
supposed to feature an interview with a German student working on
"nanotechnology".

If you are German and interested in doing an interview tomorrow or
Saturday please directly contact Andreas who is the student
coordinating this. His phone number is 650-336-3136 and he is also
cc'ed.

Norbert

Annoying windows popping up over the top of Coral in CDE window manager ....

SNF Lab Members:

Several folks have reported an annoying behavior in the latest version
of Coral on the Sunrays that, we believe, only happens with the older
CDE desktop environment.

If you enable a tool, after you hit OK in the window that allows you to
select project and account, rather than the normal Coral window
returning to the top, if you have an underlying window, such as a
command prompt, it will move to the top. This is an interaction between
the CDE (Common Desktop Environment) and the Java GUI stuff. Sun/Oracle
is aware of this .... and has been for some time ... but has not come up
with a fix.

One way around this is to not use the Common Desktop Environment, but to
use the Java Desktop System (JDS) that does not appear to be affected by
this problem.

Even if you do not want to make a permanent change away from CDE to JDS,
you can test it out temporarily.

Here is how:

Next time you are about to login to one of the Sunrays, make sure that
you insert a smart card .... if you don't have a smart card inserted you
don't get the right options. Before you type in your login name, select
the Option button, select the Sessions sub-menu item, and then select
"Java Desktop System, Release 3" under that. Then login and you will
get a different looking set of windows ... and, I think, you should find
Coral at the top of the start menu. In any event, from this point on,
you will automatically get the Java Desktop System rather than the older
Common Desktop Environment unless and until you select these options
again (with a smart card inserted) and explicly switch back to the
Common Desktop Environment.

We apologize that we did not spot this earlier ... but, by default, we
happen to use the Java Desktop System and this is the first case where
we've ever seen a difference between the two desktop environments.

Let us know if you have any further problems,

John

SNF Alphastep and Lab Bins

Greetings labmembers --

You may have noticed a few changes in the lab. In preparation for the
arrival of new equipment (come to Tuesday afternoon's labmembers'
meeting to learn more!) some furniture has moved around.

Lab Bins: Lab bins in tall shelving near the old alphastep/chemicals
passthrough (A70-A119) are now in the room where the Flammables cabinets
live. Lab bins that were under tables in that area (A120-129, A30-39)
are now near the gasonics. Please be aware that these may move again,
as equipment arrives.

Analytical tools: The analytical tools in this area are now located in
the old mask room just off to the right side as you enter the Litho area.

Alphastep: The long saga of the old alphastep 200 is coming to a
close. Our old system had been "repaired" but is still not functioning
the way it should be (accurate, but a lot more noise). Ted and Ul have
arranged for a trade-up to an AS500, now located in the old mask room
with the other analytical tools. Uli has written operating procedures
and has been training interested people on this system, although it
should be straightforward from the instructions for anyone who knows the
200. It is pretty simple, but has a lot more features than the old
200. Please be aware that the old AS200 will be leaving the lab Friday.

Thanks for your attention and patience as we stage the new tool
installation (more details at Tuesday's meeting!)

Your SNF Staff

Shutdown p5000etch SNF 2010-04-07 14:46:37: Remote liquid too hot error?

New error to me, but looking at the fault log it's been going on awhile.
Won't allow machine to start.

Re: Pd etchant?

I don't think there are any restrictions on Pd in the SNF cleanroom
other than it would be in the Au contaminated equipment group.

We use Pd coatings for charge compensation and to improve contrast in
SEM imaging

Best

James Conway
Ebeam lab at SNF

On Apr 7, 2010, at 12:15 PM, Betty Young <bayoung@stanford.edu> wrote:

> My understanding is that Pd is not allowed in lab - I had to do all
> Pd work off-campus.
> Perhaps that has changed....
>
> Betty
> ----- Original Message -----
> From: "Kyunghoae Koo" <koo1028@stanford.edu>
> To: labmembers@snf.stanford.edu
> Sent: Wednesday, April 7, 2010 11:45:25 AM GMT -08:00 US/Canada
> Pacific
> Subject: Pd etchant?
>
>
>
>
> Hi All,
>
>
>
> Any Pd wet etchant is available in SNF? Should I go with a dry
> etching?
>
> Thanks
>
>
>
> Kyunghoae
>
>
>
>
>
> ===========================================================
>
> Kyung-Hoae Koo
>
> PhD candidate
>
> Stanford University
>
> EE department
>
>

RE: Pd etchant?

You can use Au wet etchant.  It is used to be available at SNF.  May still be.

 

 

---

From: Kyunghoae Koo [mailto:koo1028@stanford.edu]
Sent: Wednesday, April 07, 2010 11:45 AM
To: labmembers@snf.stanford.edu
Subject: Pd etchant?

 

Hi All,

 

Any Pd wet etchant is available in SNF? Should I go with a dry etching?

Thanks

 

Kyunghoae

 

 

===========================================================

Kyung-Hoae Koo

PhD candidate

Stanford University

EE department

 

Re: Pd etchant?

My understanding is that Pd is not allowed in lab - I had to do all Pd work off-campus.
Perhaps that has changed....

Betty
----- Original Message -----
From: "Kyunghoae Koo" <koo1028@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Wednesday, April 7, 2010 11:45:25 AM GMT -08:00 US/Canada Pacific
Subject: Pd etchant?

Hi All,

 

Any Pd wet etchant is available in SNF? Should I go with a dry etching?

Thanks

 

Kyunghoae

 

 

===========================================================

Kyung-Hoae Koo

PhD candidate

Stanford University

EE department

 

Pd etchant?

Hi All,

 

Any Pd wet etchant is available in SNF? Should I go with a dry etching?

Thanks

 

Kyunghoae

 

 

===========================================================

Kyung-Hoae Koo

PhD candidate

Stanford University

EE department

 

Labmembers'/New Equipment Meeting: Tues. Apr. 13, 1pm Auditorium

Dear Labmembers --

As you may be aware, we were fortunate last year to obtain funding that
would allow us to acquire new tools. We were able to obtain a stimulus
grant and leverage this to obtain supplemental funds from other faculty
and programs, such as the new nanobuilding. Last December, we presented
an outline of plans to acquire new equipment for the lab and solicited
your input for their selection.

Thanks to your input and the due diligence of the new equipment team,
tools have been ordered and are being built and even shipped at this
moment. A couple of them are already here. Now, already installation
plans are underway and some of you are already experiencing some of the
disruptions to normal lab operations.
Here is the list of new tools:

- RTA 610 (two of them, to replace the two RTA210's)
- IntlVac Ebeam evaporator
- IntlVac PVD/Sputter deposition system
- PlasmaTherm ICP Plasma-Enhanced Vapor Deposition system
- PlasmaTherm Capactively-Coupled Plasma-Enhaced Vapor Deposition System
- Two-Chamber Cambridge Nanotech Fiji ALD system

We invite you to come and hear all about the new equipment at a
labmembers' meeting to be held on Tuesday, April 13, at 1 pm in the
Allen Auditorium. You will hear about their process capabilities,
installation/qualification timelines, and logistics. If you can't make
the meeting, the presentations will be posted soon afterward. We would
especially welcome your input as to how we can make this transitions
with minimum impact to your work With added capacity and lots of new
capability, these tools will no doubt transform research here. We are
all excited about the new possibilities and invite everyone in the lab
community to contribute their success.

The New Equipment Team
(John Shott, Ed Myers, Jim McVittie, Tom O'Sullivan, J Provine, Ted
Berg, Jim Haydon, Elmer Enriquez, Mary Tang)

Venture Clinic@SNF, Wednesday, 5 pm

Greetings labmembers --

Shahin Farschi of Lux Capital will be hosting the Venture Clinic Wed,
April 6, at 5 pm, in Allen 101. Here's an opportunity to learn about
the current climate in the venture world or bounce around any startup
ideas you might have. Shahin's contact information is below:

Shahin Farshchi, Ph.D.
Senior Associate
Lux Capital Management, LLC
C: 925.323.2784
http://www.luxcapital.com

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Seminar: Anne Sakdinawat Tues, April 13, 4:00-5:00pm, Allen 101X

Tuesday, April 13, 2010
4:00-5:00pm, Allen 101X Auditorium

Nanoscale Imaging with Soft X-rays

Anne Sakdinawat
UC Berkeley, Electrical Engineering and Computer Sciences

Abstract:
Nanoscale imaging with soft x-rays provides opportunities for element
specific studies across a wide range of applications in the physical
and life sciences with spatial resolutions approaching 10 nm. Areas
of application include magnetic materials, bio-tomography and
environmental sciences, to name a few. Presently, these studies are
conducted at synchrotron radiation facilities, but free electron
lasers (FELs), such as Stanford's LCLS, are just becoming available
for complimentary femtosecond duration dynamical studies. It is also
possible that in the future, relatively compact soft x-ray lasers will
evolve to have sufficient photon flux and brightness to permit studies
on university campuses, industrial, and clinical environments. In
this talk, I will present my work in novel x-ray imaging techniques,
such as spiral and other phase contrast techniques, methods for
increasing the depth of field for enhancement of 3-D tomographic
resolution, and 2-D resolution enhancement techniques. I will discuss
fabrication of the requisite optical nanostructures, and use of these
techniques at synchrotrons, FELs, and compact sources. I will also
discuss relevant applications in nanomagnetic imaging at the iron,
cobalt, and manganese edges, concrete formation studies at the calcium
edge, and single cell tomography imaging in the water window, just
below the oxygen K-edge.

Biography:
After receiving her Ph.D. in Bioengineering in 2008 from the
University of California at Berkeley, Anne Sakdinawat joined the
department of Electrical Engineering and Computer Sciences as an
assistant research scientist. Dr. Sakdinawat's research interests
encompass the fields of x-ray optics and x-ray imaging,
nanofabrication, and materials science. Dr. Sakdinawat was a
recipient of the Werner-Meyer Ilse Award given to young scientists for
exceptional contributions to the advancement of x-ray microscopy.

Signatone probe station?

Dear Labmembers,

Does anyone know which group at Stanford has a Signatone S-1160 probe station? I just want to take a look at it. I promise I won't ask to use it :)

Thanks,

Duygu

Comment p5000etch SNF 2010-04-06 11:26:48: Ch B offline

My reading of coral comments makes me think the chamber is ok to use....

Re: Problem p5000etch SNF 2010-03-08 12:02:42: Wafer did not drop on blade

wafer removed

Re: Problem p5000etch SNF 2010-03-01 19:53:31: wafer bits likely left in ChB

archived

Re: Cu ALD or CVD

Hi,
I am not sure what is available, but you might try:
http://www.lebowcompany.com/
Good luck, Betty Young

----- Original Message -----
From: "Rainer Fasching" <rfasch@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Monday, April 5, 2010 9:50:34 AM GMT -08:00 US/Canada Pacific
Subject: Cu ALD or CVD

All:

 

I'm  looking desperately for sources for ALD or CVD copper depositions. Please let me know, if you know anyone who could help.

 

Thanks,

Rainer

 

 

Rainer Fasching, PhD

Cons. Associate Professor

Department of Mechanical Engineering

Stanford University

 

Mail: 440 Escondido Mall, Bldg. 530, Rm. 220, Stanford, CA 94305-3030

Email: rfasch@stanford.edu

Phone: 415-505-3385

Fax: 650-723-5034

 

 

Process Clinic Today (Monday) 2-3:30

Greetings labmembers --

Just a reminder that there is a Process Clinic today (Monday) from 2-3:30
pm in the cubicle area outside of Maureen's office (note end time change!)

Staff and senior labmembers will be on hand to answer questions and brainstorm ideas to
address process issues. Bring your ideas, process questions, your
process runsheets, SpecMat request, device layouts, and whatever else.

(For anyone wanting to meet with Keith Best, he'll be around from 1:30-2 in this area.)

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Cu ALD or CVD

All:

 

I’m  looking desperately for sources for ALD or CVD copper depositions. Please let me know, if you know anyone who could help.

 

Thanks,

Rainer

 

 

Rainer Fasching, PhD

Cons. Associate Professor

Department of Mechanical Engineering

Stanford University

 

Mail: 440 Escondido Mall, Bldg. 530, Rm. 220, Stanford, CA 94305-3030

Email: rfasch@stanford.edu

Phone: 415-505-3385

Fax: 650-723-5034

 

 

spring quarter N/MEMS seminars

All,

As a heads up, here's the list of seminars for the upcoming quarter. No
titles or abstracts yet, but the talk by Tony Tang on the Siimpel
auto-focus motor for cellphone cameras on June 1 is a chance to connect
with an interesting startup from L.A. Anne is doing extreme nanofab at
the Advanced Light Source ... two heavy-hitters from BSAC, as well as
Anita Flynn to talk about her flying cm-scale robot. Adam is a senior
Ph.D. student who's been doing interesting work with Sam Gambhir in the
medical school. Last and certainly not least, Franz Laemer is headed to
Hilton Head for a plenary talk on silicon DRIE, but is in town and will
give it here on Friday, June 4.

Roger

> Location: Allen 101X Auditorium
> Time: 4:00-5:00 pm
>
> April 13 Anne Sakdinawat, LBNL
> April 27 Adam de la Zerda, EE Dept. and Molecular Imaging Program,
> Stanford
> May 4 Liwei Lin, ME Dept. and BSAC, UC Berkeley
> May 11 Michel Maharbiz, EECS Dept. and BSAC, UC Berkeley
> May 25 Anita Flynn, Micropropulsion, Berkeley
> June 1 Tony Tang, Siimpel, Arcadia
> June 4 Franz Laemer, Bosch Research, Stuttgart
>

Re: Comment p5000etch SNF 2010-04-01 12:25:17: Ch B has wafer handling issues

Made an adjustement on rotation drop..

New Coral release ....

SNF Lab Members:

Team Coral has pushed out the latest release of Coral. This allows you
to fire up xReporter in your default browser from within Coral. To do
this select the "Report Engine" menu item from the left most Window
menu. Also, there is a menu item under the Equipment menu named "Browse
Manual". If you select this menu item when you have a piece of
equipment highlighted in the equipment tree, it will open the relevant
manual page (if one has been defined) in your default browser. At this
point approximately 2/3 of the pieces of equipment have links of this
type and that fraction will increase over time.

Two additional comments:

1. If you do not have a default browser set, this will not work. On the
Sunrays, you can test this out first by opening firefox, assuming that
is the default browser that most of you use on the Sunrays. If it asks
you something like "Firefox is not currently your default browser.
Would you like this to be your default browser?" You should answer in
the affirmative so that you have a default browser set to take advantage
of these new Coral features.

2. As advertised earlier, this latest version requires Java Version 6.
While most of you likely already have an appropriate Java Runtime
Environment (JRE) installed on machines on which you run Remote Coral,
if Remote Coral suddenly will not start for largely unspecified reasons,
you likely need to download and install JRE Version 6.

If you have a Windows, Linux, or Solaris platform, you can download that
by going to:

http://java.sun.com/javase/downloads/index.jsp

On that page there are a number of red buttons that say "Download" ...
but there will be only one button that says "Download JRE"
If you click that link, you will be able to download and install the
Java Runtime Environment onto your machine. That version will run the
existing version of Remote Coral but will also be what you need when we
release the new version of Java later this week.

Let us know if you encounter any problems.

Thank you for your continued support,

John

The E341 MEMS Fab Class is coming!

Dear Labmembers:

The E341 MEMS Fab Class begins in the lab next week. This is an
intensive, popular 10-week, hands-on fabrication course (for more info,
check the class website.) In addition to lectures, the course has a
series of formal lab sessions, scheduled for Mondays, 8-12 and 1-5 and
Wednesdays, from 1-5, and starting a few weeks in, E341 students are
expected to begin processing on their own in the lab. This year, we're
fortunate to have Beth Pruitt, a former SNF labmember herself, teaching
the course, with Nahid Harjee roped in to serve again as head TA.

Please be aware that various equipment will be reserved for the lab
sessions and that the regular 15-minute rule will not apply during these
sessions. For your reference, the E341 equipment schedules will be
posted outside the gowning room. If you would like to squeeze use of a
tool reserved for E341 while it is idle, please check with the TA for
that lab session (contact info on the posted schedule.)

For anyone not familiar with this course (although between veteran
students, TA's, instructors and mentors, I'm not sure there aren't many
who haven't contributed over the years), you should know that these
students will be your SNF labmates in a few short weeks. Please give
them your support by answering questions and offering advice.

Thanks for your attention --

The organizers of E341 and your SNF Staff

Slippery floor in front of svgdev ...

SNF Lab Members:

Earlier this evening Rishi reported a slippery spot on the floor in
front of svgdev. While trying to investigate, we realized that there
was a very slow leak coming through the ceiling. Further investigation
revealed that there was a 1 meter diameter puddle of the hot water that
is used to heat the cleanroom sitting on the floor directly above this
area. This water must contain an additive that makes it very slippery.
In any event, we have dried the puddle on the floor and confirmed that
there is no additional leakage. However, there is likely still water
below the fan deck but above the HEPA filters that is inaccessible. As
a result, there will likely continue to be additional slow leakage
overnight.

We have marked the area with two plastic caution signs. Please be
EXCEEDINGLY CAREFUL when walking in this area ... it is quite slippery.
We may put down spill absorbent pads ... but be very careful when
walking on them because they are likely still very slippery.

Have a safe, but productive, evening,

John

Pd deposition on SiO2

 

Dear Labmembers,

 

Pd also tends to fall off from the SiO2 surface as Au does? If it does, do I also need Cr or Ti pad layer?

 

Thanks

 

Kyunghoae

 

Platinum etch

Dear labmembers,

I was wondering if anyone is etching platinum with wet or dry chemistry?

Thanks a bunch,
Ali
________________________________________________________________________________
Dr. Ali K. Okyay | Assistant Professor | Department of Electrical and Electronics Engineering | Bilkent University | aokyay@ee.bilkent.edu.tr |

Comment p5000etch SNF 2010-04-01 12:25:17: Ch B has wafer handling issues