1 wafer (looks like on robot arm) stuck inside while unloading.
Stop procedure followed:
Failed @ abort loader step with the following error message:
CY525 318, software 12217 on robot rotation axis after 50ms.
Friday, November 30, 2007
Problem p5000etch SNF 2007-11-30 15:51:41: Chamber B He Leak Rate Too High
Etching wafers in chamber B results in He leak rate too high error 10 sec into main etch. Resuming recipe allows it to complete, but wafers look like they have overheated on one side.
Thursday, November 29, 2007
Re: Problem p5000etch SNF 2007-11-29 13:27:30: I/O slit valve taking too long to close
Adjusted 1/o door speed.
Re: Shutdown p5000etch SNF 2007-11-29 13:45:55: wafer lost inside
System error lost wafer, but system is not showing any
wafer on any of the chambers. Vented chamber B and
found wafer on chuck, removed wafer and put chamber back
under vacuum.
wafer on any of the chambers. Vented chamber B and
found wafer on chuck, removed wafer and put chamber back
under vacuum.
Shutdown p5000etch SNF 2007-11-29 13:45:55: wafer lost inside
error positioning wafer in chamber B. sourced for move to handler and didn't error, but then sourced to move to cassete and there's no wafer. think it's still in the chamber, but creating wafer and moving it didn't work.
Problem p5000etch SNF 2007-11-29 13:27:30: I/O slit valve taking too long to close
keeps giving error, but eventually closes (about 15-20 seconds after alarm)
Problem p5000etch SNF 2007-11-29 10:56:36: Robot axis problem again.
I have to run the procedure for recover from stop every run for chamber. c. I did not have this problem when I used chamber b.
Wednesday, November 28, 2007
Re: Problem p5000etch SNF 2007-11-28 15:14:05: problem with unloading the wafer
Re-teach zero position and home robot.
Problem p5000etch SNF 2007-11-28 15:14:05: problem with unloading the wafer
It gives an error, and I have to apply the "recover from stop procedure" every time I unload a wafer
Tuesday, November 27, 2007
Re: Problem p5000etch SNF 2007-11-25 13:13:30: Cooling helium leak too high
Vented chamber and found broken wafer inside, vacuum
wafer chips and also chahged both large and small
lip seal. checked wafer handoff and rotation was off by
2 count.
wafer chips and also chahged both large and small
lip seal. checked wafer handoff and rotation was off by
2 count.
Comment p5000etch SNF 2007-11-27 07:56:20: Ch.C down for high He leak rate
He leak rate was about 29 sccm when I ran a dummy wafer.
Re: Problem p5000etch SNF 2007-11-26 18:47:20: Endpoint detection
Reset the endpoint detector computer
Monday, November 26, 2007
Sunday, November 25, 2007
Problem p5000etch SNF 2007-11-25 13:13:30: Cooling helium leak too high
According to chamber C monitor,
cooling helium leak is too high, about 20sccm.
Process stopped.
cooling helium leak is too high, about 20sccm.
Process stopped.
Friday, November 23, 2007
Tuesday, November 20, 2007
Problem p5000etch SNF 2007-11-20 16:54:16: pressure fluctuation
pressure was fluctuating largely and the system stopped etching twice with a red alarm message that pressure was 280 instead of 250. chamber B, recipe Oxide was used.
Monday, November 19, 2007
Re: Problem p5000etch SNF 2007-11-19 07:39:23: HBR problem, excess flow sensor error.
Ray, got the excess flow sensor to reset. HBR is back
online.
online.
Comment p5000etch SNF 2007-11-19 07:42:01: HBR problem.
Do not use chamber C, problem with the HBR panel
(excess flow sensor error)
(excess flow sensor error)
Thursday, November 1, 2007
Comment p5000etch SNF 2007-11-01 14:13:13: ch.c. rf power high
The popwer reading(~380) appears higher than specified(350)
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