Friday, November 30, 2007

Shutdown p5000etch SNF 2007-11-30 17:40:05: Wafer stuck while unloading

1 wafer (looks like on robot arm) stuck inside while unloading.
Stop procedure followed:
Failed @ abort loader step with the following error message:
CY525 318, software 12217 on robot rotation axis after 50ms.

Problem p5000etch SNF 2007-11-30 15:51:41: Chamber B He Leak Rate Too High

Etching wafers in chamber B results in He leak rate too high error 10 sec into main etch. Resuming recipe allows it to complete, but wafers look like they have overheated on one side.

Thursday, November 29, 2007

Re: Problem p5000etch SNF 2007-11-29 10:56:36: Robot axis problem again.

Re: Problem p5000etch SNF 2007-11-29 13:27:30: I/O slit valve taking too long to close

Adjusted 1/o door speed.

Re: Shutdown p5000etch SNF 2007-11-29 13:45:55: wafer lost inside

System error lost wafer, but system is not showing any
wafer on any of the chambers. Vented chamber B and
found wafer on chuck, removed wafer and put chamber back
under vacuum.

Shutdown p5000etch SNF 2007-11-29 13:45:55: wafer lost inside

error positioning wafer in chamber B. sourced for move to handler and didn't error, but then sourced to move to cassete and there's no wafer. think it's still in the chamber, but creating wafer and moving it didn't work.

Problem p5000etch SNF 2007-11-29 13:27:30: I/O slit valve taking too long to close

keeps giving error, but eventually closes (about 15-20 seconds after alarm)

Problem p5000etch SNF 2007-11-29 10:56:36: Robot axis problem again.

I have to run the procedure for recover from stop every run for chamber. c. I did not have this problem when I used chamber b.

Re: Comment p5000etch SNF 2007-10-12 14:21:10: Ch A and C needs process qual

done

Re: Comment p5000etch SNF 2007-10-12 14:58:07: Qual'd CH A- good to use

done

Wednesday, November 28, 2007

Re: Problem p5000etch SNF 2007-11-28 15:14:05: problem with unloading the wafer

Re-teach zero position and home robot.

Problem p5000etch SNF 2007-11-28 15:14:05: problem with unloading the wafer

It gives an error, and I have to apply the "recover from stop procedure" every time I unload a wafer

Tuesday, November 27, 2007

Re: Problem p5000etch SNF 2007-11-20 16:54:16: pressure fluctuation

Re: Problem p5000etch SNF 2007-11-25 13:13:30: Cooling helium leak too high

Vented chamber and found broken wafer inside, vacuum
wafer chips and also chahged both large and small
lip seal. checked wafer handoff and rotation was off by
2 count.

Comment p5000etch SNF 2007-11-27 07:56:20: Ch.C down for high He leak rate

He leak rate was about 29 sccm when I ran a dummy wafer.

Re: Problem p5000etch SNF 2007-11-23 12:40:11: chamber B offline

Chamber B is now online.

Re: Problem p5000etch SNF 2007-11-26 18:47:20: Endpoint detection

Reset the endpoint detector computer

Re: Problem p5000etch SNF 2007-11-26 19:00:01: Ch. C offline

Placed Ch.C online.

Sunday, November 25, 2007

Problem p5000etch SNF 2007-11-25 13:13:30: Cooling helium leak too high

According to chamber C monitor,
cooling helium leak is too high, about 20sccm.
Process stopped.

Friday, November 23, 2007

Tuesday, November 20, 2007

Problem p5000etch SNF 2007-11-20 16:54:16: pressure fluctuation

pressure was fluctuating largely and the system stopped etching twice with a red alarm message that pressure was 280 instead of 250. chamber B, recipe Oxide was used.

Thursday, November 1, 2007

Comment p5000etch SNF 2007-11-01 14:13:13: ch.c. rf power high

The popwer reading(~380) appears higher than specified(350)