Comment p5000etch SNF 2008-03-31 11:53:36: Update

Installed spare hard drive. Now able to boot-up the system. Currently checking robot calibrations.

tylan: oxidation at T between 950 and 1000?

Hello all:
I was wondering if anyone could describe the use of any of the Tylan
recipes that would allow me to oxidize Si at a "non-standard"
temperature, specifically one between 950 and 1000ºC. I found a
recipe called "DRY3TEMP", which looks like it might do what I want it
to, but I wanted to ask you all if anyone could describe their
experience with such a recipe.

Thanks,
Alex

Alex R. Guichard
Ph.D Candidate
Dept. of Mat. Sci. and Eng.
Stanford University
(M)919-434-6906 (F)650-724-9851
(O) 650-723-6352 (L)650-723-6466

I am running another marathon to raise money for Leukemia and Lymphoma
research! Support my efforts at:
http://www.active.com/donate/tntsvmb/alex07

SNF oraganizational change

Hi all,

Please find attached the announcement for the change of SNF organizational
and reporting structure, which becomes effective immediately.
I would like to ask your full cooperation and support to the new SNF as our
critically important infrastructure for nanotechnology research at Stanford.

Thank you,

Yoshio Nishi

Comment p5000etch SNF 2008-03-27 13:22:32: FS working on Drive

Field service is securing another hard drive and it should arrive tomorrow then they have to rebuild it. Wish them luck

SNF Enterprise Forum: Follow up

Dear Labmembers:

Earlier this month, we hosted a Venture Forum featuring Shahin Farschi from Lux Capital. Your feedback on this event has been very positive. Shahin has indicated that he would be willing to provide his slides outlining the venture process. He also said he would glad to return for future seminars; and so we would like to know if there are any specific topics in the venture initiation process that you would like to see covered. Please send comments and suggestions to me. Shahin would also be glad to talk about career opportunities in venture; please get in touch with him directly at shahin.farschi@luxcapital.com if you are interested.

Thanks,

Mary

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Comment p5000etch SNF 2008-03-27 06:05:59: Applied working on restoring Hard drive

Shutdown p5000etch SNF 2008-03-26 09:16:10: Hard drive crashed

Berkeley Nano Forum

Labmembers --

A meeting announcement from across the bay:

Fellow Researchers in Nanotechnology!

The Berkeley Nanotechnology Club is proud to present to you an opportunity to
present your research in the field of Nanotechnology at our upcoming Berkeley
Nano Forum on April 27^th. The event will be hosting of about 300 fellow
researchers, professors, entrepreneurs and others. We invite you to bring your
research and put it on display at our Poster Session, to do so, please submit
your 250 word abstracts to the following email addresses: tapanpatel@berkeley.edu 
and also to kayte@berkeley.edu.

Where: Haas School of Business on the UCB Campus)
When: April 27^th
Abstract Deadline: April 5th (March 28^th for UCB students)
Abstracts Submission: tapanpatel@berkeley.edu ; kayte@berkeley.edu  

Also take a look at the attached Poster Session Flyer.

To subscribe to the Berkeley Nanotechnology Club mailing list, send an e-mail to majordomo@listlink.berkeley.edu containing the single line "subscribe nanoclub" (without the quotes) in the body of the message. Visit us at http://nanoclub.berkeley.edu

--  Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA  94305 (650)723-9980 mtang@stanford.edu http://snf.stanford.edu 

Changing desktop environments and easier starting of Coral in the "new" desktop environment ...

SNF Lab Members:

In working with a few of you to restore your desktop environments, I've
learned several things that I
thought I'd share with you.

First, let me define a couple of terms: there are two desktop
environments available on our Sun Rays:
the older one is called the Common Desktop Environment (CDE) and is the
one that has the menu bar along the bottom center of the window with the
little globe at the left end and usually will automatically start Coral
for you. The newer one is called the Java Desktop System (JDS) and has
the yellowish "Launch" menu in the lower left corner.

Several of you have told me that you like this new one (JDS) better ....
some of you like it because it is more "Windows-like" and some of you
have said that you like it because it gives you easier access to the
Star Office (AKA Open Office) tools. The complaint about this one
(other than the snafu of a couple of days ago) is that Coral is harder
to start .... you have to open a Terminal window and manually type "coral".

I believe that I have improved this in two ways: you should now see the
Coral icon at the very top of the Launch menu. Selecting that from the
menu should start Coral for you. If you would like to make it so that
Coral will start automatically for you, however, you can issue the
following command .... if you type it correctly, Coral should start
automatically for you each time that you login to the Sun Rays under the
Java Desktop System. Here is the command that you should type ....

cp /etc/skel/.gnome2/session-manual ~/.gnome2/session-manual

Note: don't miss the "dot" that preceeds gnome2 in two places .... this
will copy a file that "auto-starts" Coral into the appropriate location
in your directory.

A couple of other items:

1. Can you test the Java Desktop System for a bit and then move back to
CDE if you don't like it?

Yes

2. How do you switch from one to the other?

By default, you get the desktop system that you used last time ... so,
once you use one or the other, you will continue to get that unless and
until you explicitly tell it that you want to use the other.

To switch from one to another, you have to insert a smart card into the
system before you login.
Then, also before you login, you need to click the "Options" button
below the login space and then select "Session ...". You will be given
4 options:
Common Desktop Environment (CDE)
Java Desktop System, Release 3
User's Last Session
Failsafe Session

Select the one that you would like to try, and then login normally.
That should start up the specified desktop environment .... and will
continue to do so unless you explicitly switch back to the other.

Please let me know if you have any problems or questions.

Thanks,

John

Problem p5000etch SNF 2008-03-24 15:18:46: where is Jim DP trench?

could not find the recipe Jim DP trench in the ChC list

Problems with "desktop" on Sunrays?

SNF Lab Members:

Several people have reported problems with the computer "desktop" when
they log into the Sunrays.
These problems seem to affect only those people who have been using the
Java Desktop System .... this is the one that looks a little more
Windows-like and has the menu labeled "Launch" in the lower left corner.

For reasons that I can't completely explain, several people ended up
with corrupted configuration files starting about last Friday. In some
cases, it seems to freeze on a window that says "The Panel" and in other
cases it simply shows a dark screen and never gets to your login
environment.

If you seem to have these problems, send me email with your Coral login
name. I believe that I can "fix" this by giving you a fresh set of
configuration files.

Thanks,

John

SNF Process Grand Rounds, today, 11:30, CIS 101

Hi everyone --

Just a reminder of the Process Grand Rounds today (Friday) at 11:30 in
CIS 101. On the agenda:

1. Maskmaking services
2. Process brainstorming
3. Process qual data on Coral
4. When to do process quals
5. How to get process qual data

Pizza provided.

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

vacuum furnace

Dear labmembers,

Sorry to bother you, I just want to ask is there any available vacuum
furnace as you know that can be heated to above 1200C.

Your help is really appreciated.
Thanks.

Hailiang

SNF Survey: DRIE/STS Etch

Hi all --

Just wanted to let you know that the SNF STS etch opinion survey closes at
midnight tonight(yes, it's been two weeks since it's been live.) If you have
an opinion on STS usage and management at SNF (and I know you do!), we
want to encourage you to share it. It's short and sweet with plenty of
opportunity to add your own comments. Here's the link:

http://www.surveymonkey.com/s.aspx?sm=HV3UtmHb0exdw7_2b_2bMBEz9g_3d_3d

Special thanks to Nahid for organizing the survey!

Mary

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Where can you make masks? SNF Process Grand Rounds, Friday, 3/21, 11:30

Hi everyone --

The next SNF Process Grand Rounds is this Friday, 3/21, at 11:30 am in
CIS 101. Topics to be covered (not necessarily in this order) will be
as follows:

1. Where and how to get masks and reticles made, and how much they'll cost.
2. Process brainstorming (bring your process problems!)
3. Finish mapping out process qual data collection, using Coral
4. Decide on when process qual data should be collected.
5. Decide on how the data should be accessed, reported, and/or viewed.
6. Discuss John's test database mockup of data entry for metal dep

Pizza, this time. Hope to see you there!

Mary

Comment p5000etch SNF 2008-03-19 18:33:20: Ch.A update

Wafer lift position sensors do not appear to be working. Called field service, they will be here tomorrow.

Borrow portable tachometer

Dear Labmembers,

I'm wondering if anyone has a portable tachometer (non-contact) and if
I could borrow it for a while. The tachometer of my spin coater is
out of order and I would like to calibrate the spin speed.

Many thanks!
Wing

Re: Comment p5000etch SNF 2008-02-27 19:14:02: Endpoint update

logged

Re: Comment p5000etch SNF 2008-03-13 10:49:44: Ch A worked fine

logged

Re: Problem p5000etch SNF 2008-03-17 08:22:05: Ch.C is down

Opened the chamber and found a wafer chip on the lip seal. Cleaned the chuck and lip seal. Ran 4 wafer using Ch.C Trench recipe.

Problem p5000etch SNF 2008-03-17 08:22:05: Ch.C is down

Ran 4 wafers. All faulted for high backside He leak. Need to open the chamber.

Problem p5000etch SNF 2008-03-17 08:19:47: Ch.A is down

Please do not place the chamber ONLINE.
Ch.A is down. Need to rebuild the wafer lifter assembly.

Re: Problem p5000etch SNF 2008-03-14 09:07:47: chamber a lifter issue reoccured

Ch.A is down. Need to rebuild the wafer lifter assembly.

Re: Problem p5000etch SNF 2008-03-14 13:47:26: chamber B offline for maintenance

A chamber will go OFFLINE automatically if it does not have a recipe to run. Please verify that you have entered your recipe in the correct chamber entry.
Ran 4 wafers without any problems.

Re: Problem p5000etch SNF 2008-03-14 14:19:17: chamber B shuts down itself automatically

A chamber will go OFFLINE automatically if it does not have a recipe to run. Please verify that you have entered your recipe in the correct chamber entry.
Ran 4 wafers without any problems.

Re: Shutdown p5000etch SNF 2008-03-15 00:12:21: "Chamber A wafer lifter cannot reach process position within timeout"

warning from p5000etch-pcs@snf.stanford.edu

Hi! This is the ezmlm program. I'm managing the
p5000etch-pcs@snf.stanford.edu mailing list.

I'm working for my owner, who can be reached
at p5000etch-pcs-owner@snf.stanford.edu.

Messages to you from the p5000etch-pcs mailing list seem to
have been bouncing. I've attached a copy of the first bounce
message I received.

If this message bounces too, I will send you a probe. If the probe bounces,
I will remove your address from the p5000etch-pcs mailing list,
without further notice.

I've kept a list of which messages from the p5000etch-pcs mailing list have
bounced from your address.

Copies of these messages may be in the archive.

To retrieve a set of messages 123-145 (a maximum of 100 per request),
send an empty message to:
<p5000etch-pcs-get.123_145@snf.stanford.edu>

To receive a subject and author list for the last 100 or so messages,
send an empty message to:
<p5000etch-pcs-index@snf.stanford.edu>

Here are the message numbers:

1938
1939

--- Enclosed is a copy of the bounce message I received.

Return-Path: <>
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Date: Tue, 4 Mar 2008 16:41:49 -0800 (PST)
From: MAILER-DAEMON@stanford.edu (Mail Delivery System)
Subject: Delayed Mail (still being retried)
To: p5000etch-pcs-return-1938-snfblog.P5000=blogger.com@snf.stanford.edu
Auto-Submitted: auto-replied
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warning from labmembers@snf.stanford.edu

Hi! This is the ezmlm program. I'm managing the
labmembers@snf.stanford.edu mailing list.

I'm working for my owner, who can be reached
at labmembers-owner@snf.stanford.edu.

Messages to you from the labmembers mailing list seem to
have been bouncing. I've attached a copy of the first bounce
message I received.

If this message bounces too, I will send you a probe. If the probe bounces,
I will remove your address from the labmembers mailing list,
without further notice.

I've kept a list of which messages from the labmembers mailing list have
bounced from your address.

Copies of these messages may be in the archive.

To retrieve a set of messages 123-145 (a maximum of 100 per request),
send an empty message to:
<labmembers-get.123_145@snf.stanford.edu>

To receive a subject and author list for the last 100 or so messages,
send an empty message to:
<labmembers-index@snf.stanford.edu>

Here are the message numbers:

3111
3112

--- Enclosed is a copy of the bounce message I received.

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Date: Tue, 4 Mar 2008 18:46:16 -0800 (PST)
From: MAILER-DAEMON@stanford.edu (Mail Delivery System)
Subject: Delayed Mail (still being retried)
To: labmembers-return-3111-snfblog.P5000=blogger.com@snf.stanford.edu
Auto-Submitted: auto-replied
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Shutdown p5000etch SNF 2008-03-15 00:12:21: "Chamber A wafer lifter cannot reach process position within timeout"

Same problem as before, and before, and before. Using a P5000 lab dummy, running standard recipe CH.A METAL.
Wafer is in chamber. All other chambers are offline. Machine unusable.
Could we please call AMAT service again, as they seem to be the only solution to getting the machine operational?

Unique USB Stick Found

A unique USB stick was found in the CAD room today.  If this is yours, please be prepared to describe it.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Problem p5000etch SNF 2008-03-14 14:19:17: chamber B shuts down itself automatically

When trying to run a program in chamber B, the processing stopped when machine arm gets the first wafer. Chamber B changes to "offline for maintenance" in vacuum service, and system mode changes to manual.

Problem p5000etch SNF 2008-03-14 13:47:26: chamber B offline for maintenance

In vacuum service window, it lsays that chamber B is offline for maintenance

Problem p5000etch SNF 2008-03-14 09:07:47: chamber a lifter issue reoccured

Elmer/Mike to investigate

Re: Shutdown p5000etch SNF 2008-03-13 23:06:35: ChA lifter STILL not fixed

Elmer/Mike to investigate

Scheduled Downtime

Hi All

This message is to notify you that SVG coater #1 will be down on
Monday, 3/17 from 7:00 AM to Noon. We will have a vendor here to begin
troubleshooting and repairs of the Vapor Prime module. Sorry for the
short notice but please make alternate plans as needed and continue to
check coral for track status.

Also let me remind everyone that Karl Suss Aligner #1 will go down
on Monday 3/17 @ 10:00 AM for 6 - 8 hours to perform a PM. Karl Suss
Aligner #2 will go down on Tuesday 3/18 @ 9:00 AM for 6 - 8 hours to
perform a PM.

Thanks... Gary

Shutdown p5000etch SNF 2008-03-13 23:06:35: ChA lifter STILL not fixed

<sigh> Same error as prev user reported: Ch A lifter.
Wafer is in the chamber.

Re: Problem p5000etch SNF 2008-03-12 07:02:41: Ch.A lifter error

Adjusted lifter pneumatic metering valves. Cycled over 30 wafers through the chamber without any problems.

Re: Comment p5000etch SNF 2008-03-11 15:19:41: Ch A worked ok

Adjusted lifter pneumatic metering valves. Cycled over 30 wafers through the chamber without any problems.

Re: Problem p5000etch SNF 2008-03-10 12:18:34: Ch A lifter error

Adjusted lifter pneumatic metering valves. Cycled over 30 wafers through the chamber without any problems.

Comment p5000etch SNF 2008-03-13 10:49:44: Ch A worked fine

Elmer fixed the lifter issue.

Seminar: Materials Informatics by Prof. Rajan of ISU Wednesday March 19, 3-4pm CISX 101

Everyone,

Wednesday March 19 3-4pm
in CISX 101
Prof. Krishna Rajan of Iowa State University will give a seminar
titled "Materials Informatics for MEMS Design and Nanodevices."
Please come hear his talk about this unique perspective on materials
research.

-Abstract-
Materials science seeks to understand structure-property
relationships, which can be very complex and difficult to discover.
?Materials Informatics? can enable one to survey complex, multiscale
information in a high throughput, statistically robust, and yet
physically meaningful manner. The application of such approaches can
have a significant impact in materials design and discovery. While
informatics is well established in fields such as biology, drug
discovery, astronomy and quantitative social sciences, its
applications to materials science problems is relatively new. This
presentation will demonstrate examples of how the use of data mining
techniques in a wide array of materials science problems can help to
address the challenges of informational complexity. Examples are
provided in the context of fundamental materials science problems that
are relevant to M/NEMS structures and nanomaterials in general.

-Biosketch-
Prof. Krishna Rajan is the Stanley Chair Professor in
Interdisciplinary Engineering and a member of the Department of
Materials Sciences and Engineering at Iowa State University. After
receiving his doctorate in 1978 from the Massachusetts Institute of
Technology in Materials Science, he held a research appointment at MIT
and at the Metallurgy and Materials Science Department at Cambridge
University until 1980. From 1980-87 he was staff scientist at the
National Research Council of Canada. In 1987, he joined the faculty at
Rensselaer Polytechnic Institute, where he became a full professor in
1993. Prof. Rajan moved to Iowa State University in 2005, were he
heads CoSMIC, the Combinatorial Sciences and Materials Informatics
Collaboratory, which is supported by the NSF and the International
Materials Institute. Prof. Rajan?s research interests focus on the
microstructural aspects of materials science with a major effort in
the applications of high-resolution electron microscopy. Professor
Rajan?s research extends into coupling new developments in computer
and mathematical sciences into combinatorial materials science and
informatics. Based on these efforts he has established the first
academic program in materials informatics and combinatorial materials
science in a major Materials Science department in the United States.

~j

SNF Stockroom Label Maker?

SNF Lab Members and CIS Building Occupants:

Did anyone borrow the label maker that lives in the SNF stockroom? It
has apparently been missing for 2 weeks or so .... and should never
leave that room.

Your help will be greatly appreciated in tracking down this useful
little item.

Thanks,

John

SVG Coater Logsheets

Hi labmembers...

In an effort to help us understand the fix the problems on the SVG
coaters, especially with the "recipe manager", we have created a
logsheet to collect some important information. The logsheets are on a
clipboard hanging on the left side of the track. I have even provided
a pen. If you encounter any problems on the coat tracks, please make
an enrty on the logsheet with all the pertinent information. Your help
will be greatly appriciated.

Thanks... Gary

Presentations for NNIN Annual Review at Stanford

Dear SNF Lab Members,

SNF will be hosting the Annual NNIN Review on campus on April 30 through
May 2 this year. This is a critical review for us as we are applying
for a 5-year renewal for the NNIN program from the National Science
Foundation. There will be a technical session on April 30 where all NNIN
sites will feature technical presentations by non-local (that is, in our
case, non-Stanford) lab users.

We are looking for either one or two strong presentations to be given by
members of the non-Stanford research community. If you are in a
position to give a short talk (probably 12-15 minutes plus questions) on
April 30, I would like to hear from you at your earliest convenience.

Thank you, and best regards,

Yoshio Nishi
Director, SNF

University PhD Dissertation Defense for Sora Kim

Photonic crystal mirrors:

Fundamental components for integrated photonic crystal MEMS

 

Sora Kim

Research Advisor: Olav Solgaard

 

Time: 1:15pm, March 14th, 2008 (Refreshment: 1:00pm)

Place: CISX-Auditorium

 

Abstract:

The 2D photonic crystal (PC) slab is an interesting optical component due to its ability to confine photons 3-dimensionally and couple to external radiation as well as its simplicity of fabrication. Many novel optical devices have been proposed based on the 2D PC slabs such as PC-based light-emitting diodes, lasers, directional output couplers, and sensors. Specifically, we are interested in integrating 2D PC slabs in optical MEMS devices such as tunable filters, position sensors, and scanners in order to achieve compactness and better sensitivity.

 

In the first part of the talk, a broadband PC mirror based on a 2D PC slab, which is a basic component of the optical PC MEMS devices, is discussed. Dielectric mirrors are preferred to metal mirrors in optical communication wavelengths because of their low loss. For example, Distributed Bragg Reflector (DBR) mirrors are commonly used for very high reflectivity (~99.5%). However, these mirrors consist of several pairs of dielectric layers, complicating their fabrication and resulting in bulky mirrors. 2D PC mirrors can be excellent alternatives to DBR mirrors because they have comparable reflectivity with a single dielectric layer. In the talk, I will review the basic principles of how to achieve a broadband spectrum by 2D PC slabs and present a broadband mirror with high reflectivity around 1550nm and small polarization and angular dependences.

 

In the second part of the talk, I will focus on ways to improve the optical spectrum of 2D PC mirrors by controlling the surface quality. Hydrogen annealing is a traditional way of reducing the roughness of etched silicon surfaces. We showed that the silicon migration of hydrogen annealing could be used to improve the optical spectrum of 2D PC mirrors by smoothing the rough interfaces and increasing the uniformity of PC holes. In particular, we applied hydrogen annealing on a 2D PC mirror that was processed on a silicon substrate by isotropic silicon etching (GOPHER). The reflectivity of the 2D PC mirror increased and the polarization dependence decreased.

 

In the last part, I will briefly introduce a 2D PC MEMS scanner and a 2D PC displacement sensor as applications of 2D PC mirrors that are integrated into optical MEMS are introduced.

 

Problem p5000etch SNF 2008-03-12 07:02:41: Ch.A lifter error

Comment p5000etch SNF 2008-03-11 15:19:41: Ch A worked ok

Ran 6 wafers without problem. Thanks to Elmer.

Maskmaking and Process Grand Rounds

Hi all --

Two topics which may be of general interest:

1. Maskmaking: Following Paul Jerabek's retirement and the timely
demise of the Micronics laser, we are in the process of making
alternative arrangements for SNF academic researchers. To see what's up,
check out:

https://www.stanford.edu/group/snf/Masks/Maskmaking.html

(SUNet ID required.)

2. SNF Process Grand Rounds. For those of you who missed last Friday's
meeting, minutes have just been posted (linked from the SNF home page.)
Since a couple of us will be in an all-day site visit this Friday, the
next meeting will be in TWO weeks, on Friday, March 21.

Comments, questions, and suggestions appreciated.

Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Problem p5000etch SNF 2008-03-10 12:18:34: Ch A lifter error

litho nanospec has bulb out, nanospec next to drytek2 out of spec

The nanospec in the litho area has a burnt out bulb.
The nanospec next to drytek 2 seems to be out of spec.
I and another user have measured using the new nanospec in the litho
room which measures values more to our expected specs: 4300A and 5300A
respectively.
The nanospec next to drytek2 measures ~300A less.
Just a heads up to people who are using this machine to take measurements.

Il Woong

Fwd: University PhD Dissertation Defense for Onur Kilic

Department of Applied Physics

University PhD Dissertation Defense

Fiber Based Photonic-Crystal Acoustic Sensor

Onur Kilic

Research Advisor: Professor O. Solgaard

11 March 2008 @4:00 p.m.

in

Applied Physics Building, Room 200

(Refreshments at 3:45 p.m.)

Abstract

Photonic crystal slabs can be employed to make various free space optical devices by tailoring the geometrical parameters of the structure such as hole radius, pitch, or hole shape. A standard photonic crystal slab can be used to make efficient optical filters and broadband mirrors. Breaking the symmetry through introducing asymmetric holes also enables polarization sensitive devices such as retarders, polarization beam splitters, and photonic crystals with additional non-degenerate resonances useful for increased sensitivity in sensors. The fabrication of photonic crystal slabs is compatible with microfabrication techniques, making them suitable as key components in micromachined sensor applications.
We report a micromachined acoustic sensor that consists of a Fabry-Perot interferometer made of a photonic-crystal reflector embedded on a compliant silicon diaphragm placed at the tip of a single-mode fiber. The small thickness of the photonic crystal slab makes it ideal as the external reflector that needs to be compliant for high sensitivity. Measurements in air indicate that this sensor has a relatively uniform frequency response up to at least 50 kHz, and detects pressures as low as 18 µPa/Hz1/2. This limit is four orders of magnitude lower than in similar types of acoustic fiber sensors.

        Through a modification in the design, such a sensor can also be used in water. In addition to the high compliance, the advantage for using the photonic crystal slab is that the holes provide a venting channel for pressure equalization so that the hydrophone can be employed in deep-sea applications. Measurements in water over the range of 10 kHz-50 kHz show that the hydrophone has a minimum detectable pressure down to 10 µPa/Hz1/2, close to the ambient noise level. A model was developed to show that after optimization to ocean acoustics, this sensor has a minimum detectable pressure that follows the minimum ambient noise spectrum of the ocean (reaching a minimum of ~10 µPa/Hz1/2 at ~30 kHz) in the bandwidth of 1 Hz-100 kHz. By placing several such sensors with different acoustic power ranges within a single sensor chip, the hydrophone is able of exhibiting a dynamic range in the excess of 200 dB.

--
Onur Kilic

Applied Physics
Stanford University

OnurKilic.com

Re: Problem p5000etch SNF 2008-02-27 09:28:52: ChA metal timed

Chamber pressure ok now. Calibration run....

Re: Problem p5000etch SNF 2008-02-26 15:10:40: Ednpoint not working

Noted.

Re: Comment p5000etch SNF 2008-02-26 15:11:16: CH C ok to use

logged

Re: Problem p5000etch SNF 2008-02-26 20:24:35: Frozen Endpoint detection

Looking inot EP issues. No solution yet....

SVG Coater 2 Scheduled Downtime

Hello Labmembers...

On Monday, March 10th, SVG coater #2 will be down from 10:00AM to
4:00PM. The vendor from NETTrack will be here to install a software
upgrade and to work or resolving some of the issues that we have had
with the systems. Sorry for the short notice. If there are any
questions or concerns that you have, or any observations that you have
made, regarding the recipe manager, please let me know so that we can
address them on Monday.

Thanks.. Gary

Karl Suss Aligners Scheduled Downtime

Hi Labmembers....

On the 17th and 18th of March, we will have a vendor here to do
PM's on the Karl Suss aligners. Karl Suss 1 will be done on the 17th
and Karl Suss 2 will be done on the 18th during the day. Each PM will
take 6 - 8 hours. During this time, the aligner will not be available
for use. Please make alternate plans as needed. Sorry for the
inconvenience.

Thanks... Gary

Tube-type furnace to borrow or local vendor?

Dear Labmembers,

I'm wondering if anyone has tube-type furnace for annealing, and if I
could borrow a bit because the one in the my lab is out of order just
now.
The model of tube furnace is MTF 10/25/130 from carbolite.
As long as inner diameter of tube is larger than 25mm and temperature
goes up to 500-600 C, any tube furnace will be fine.
Also if anyone knows somewhere that I can borrow in bay area, please
let me know.

Thanks,

Joongsun

Do you have an opinion about STS etching? Take this DRIE Survey!

Greetings again, labmembers --

We'd like to know your opinions and expectations for deep RIE etching at
SNF. Please help us by filling out this short, online survey:
http://www.surveymonkey.com/s.aspx?sm=HV3UtmHb0exdw7_2b_2bMBEz9g_3d_3d

We will close the survey and post results in two weeks -- so if you care
about STS etching at SNF, fill this out soon!
(Special thanks to Nahid for organizing the survey!)

Mary

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

--

SNF Process Grand Rounds, Friday, 3/7/08

Greetings labmembers --

Just a reminder of the next SNF Process Grand Rounds, which will be
Friday, 3/7, at 11:30 am in CIS 101. The agenda will be:

1. Brainstorming of a process problem or two (we invite submissions).
2. Review of action items from previous meetings.
3. Continue Quality Circle discussions. We will review everyone's
schemes for Coral data collection on key tools and begin discussion of
data reporting.

Sandwiches provided.

For a summary of last week's meeting, check here:

http://snf.stanford.edu/Labmembers/ProcessGrandRound022908.html

Hope to see you there --

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Comment p5000etch SNF 2008-02-29 10:18:01: Ch. A worked

Noted.

Re: Problem p5000etch SNF 2008-02-29 05:44:40: Pressure

Calibrated the throttle valve closed position and hysterisis. Ran timed etch (45 sec) several times with no problems.

Cencelled: Friday 3/7/08 Maskmaking presentation by Image-Technology

Greetings labmembers:

The presentation on maskmaking by Image Technology originally scheduled
for this Friday at 10 am is now canceled (original announcement:

http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3108:200803:ecijpjkikjbekmcnnifp)

We are now working on assembling documentation and pricing for Stanford
researchers. Please bear with us as we iron out the details -- we hope
to have something presentable by the end of next week. In the meantime,
if you are immediate need of maskmaking services, please get in touch
with Ed, Mahnaz, or Mary and we can share with you the information we
have thus far.

Thanks for your patience --

Ed. Mahnaz & Mary
(The staff who are sorely missing Paul Jerabek's solid presence the most)

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Shahin Farschi, today, at 4 pm

Hi all --

Just a reminder that Shahin Farschi, from Lux Capital, will be speaking
today about collaborations between venture and inventors. This is in
CIS 101. There will be refreshments and Shahin will be around
afterwards for questions and discussion. For an abstract of his talk, see:

http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3077:200802:daieogjjhbhgegkgdlol

Hope to see you there!

Mary

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Imaging tubes

Greetings,

 

I am trying to image my nanotubes (diameter ~1.5nm) using AFM in tapping mode, I am wondering if anyone else has done similar imaging before and can share some tips and tricks with me.

 

 

 

 

 

Thanks,

 

Arash

 

 

 

Sharp silicon tips

Dear lab members,

If any of you have experience fabricating sharp silicon tips for scanning probe microscopy applications, please let me know. I'm interested in learning more about your process and sharing some of my results.

Thanks for your help,

nh

--
Nahid Harjee
Ph.D. Candidate
Electrical Engineering
Stanford University
408-761-8651

Re: Comment p5000etch SNF 2008-02-29 09:21:21: Maryam's problem report

Calibrated the throttle valve closed position and hysterisis. Ran timed etch (45 sec) several times with no problems.

Re: Problem p5000etch SNF 2008-03-03 15:07:15: Chamber B Pressure

Calibrated the throttle valve closed position and hysterisis. Ran timed etch (45 sec) several times with no problems.

SNF Process Grand Rounds, Friday, 3/7

Greeting labmembers --

Minutes of last week's Process Grand Rounds are now posted on the
website (linked from the home page.) Stay tuned for the next episode,
this Friday, March 7, 11:30-1 in CIS 101.

Your SNF staff

Enterprise Forum, March 5, 4 pm in CIS 101: Ask a VC

Greetings labmembers --

Just a reminder of the visit by Shahin Farschi from Lux Capital. Following a brief presentation, Shahin is most interested in an informal
discussion with researchers about the role of VC's in developing new opportunities.
This is scheduled for Wednesday, March 5, from 4-5 pm in CIS 101. Bio and presentation abstract can be found at:

http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3077:200802:daieogjjhbhgegkgdlol

Shahin also invites advance suggestions for specific topics of discussion -- just email him at shahin.farshchi@luxcapital.com

Problem p5000etch SNF 2008-03-03 15:07:15: Chamber B Pressure

I tried to process 10 wafers for about 45 seconds in Chamber B. Half the wafers processed fine; the other half had wildly fluctuating pressure from 200 mT to 270 mT, sometimes causing an error and stopping the etch. Sometimes I could restart the process, and it would begin, but sometimes not. This is similar to what maryamzm experienced earlier.

Image Technology - Friday 3/7 - 10 AM - CIS 101

Fernando Mendez, VP of Sales/Marketing for Image Technology will be here

Friday, March 7
10 AM
CIS 101

to answer questions about mask making at their company. Here is the
material to be covered:

>1) Job setup requirements such as data formats, paperwork, and PO
>2) Equipment tool sets and capability
>3) Instruction on how to complete our MOF (mask order form)
>4) Answer any particular questions students may have

Tomorrow : Lab Presentation: Chemically Amplified Molecular Resists for E-Beam Lithography , Dr. Alex Robinson University of Birmingham, UK. Tuesday March 4 , 20081:30 PM CIS 101

Special Ebeam Lab Presentation: 
Chemically Amplified Molecular Resists for E-Beam Lithography
Dr. Alex P.G. Robinson University of Birmingham, UK.
Tuesday March 4, 2008 1:30 PM in CIS 101

It is my pleasure to announce that Dr. Alex P.G. Robinson will be visiting the Stanford Nanofabrication Facility next Tuesday afternoon and will present his work on Chemically Amplified Molecular Resists. He has also promised to give us an introduction and an update on activities at the Nanoscale Physics Research Laboratory at the University of Birmingham.

All interested parties are invited to attend.  There will be ample time for discussions after his presentation and we have the room through 3 PM.


James W. Conway
Ebeam Lab
Stanford Nanofabrication Facility
650-725-7075
-------------------------------------------------------

Chemically Amplified Molecular Resists for E-Beam Lithography

J. Manyam^a, F.P. Gibbons^a, S. Diegoli^b, M. Manickam^b, J.A. Preece^b, R.E. Palmer^a, A.P.G. Robinson^a

 

^aNanoscale Physics Research Laboratory, School of Physics and Astronomy, The University of Birmingham, Birmingham, B15 2TT, UK

phone: +44 (0)121 414 4641   e-mail: a.p.g.robinson@bham.ac.uk

^bSchool of Chemistry, The University of Birmingham, Birmingham, B15 2TT, UK

 

Key words:  Electron Beam Lithography, Molecular Resist, Fullerene, Chemically Amplified Resist

 

The minimum lithographic feature size for microelectronic fabrication continues to shrink, and resist properties are beginning to dominate the achievable resolution. There is a strong need for a high resolution, high sensitivity resist for the 32 nm node, and beyond, that is not met by conventional polymeric resists at this time. The line width roughness (LWR) requirements at the 32 nm node [1] are already equal to the radius of gyration of a typical resist polymer, [2] whilst the resolution itself will be less than the polymer molecule size at future nodes. Molecular resists, such as oglimers and molecular glasses rely on smaller molecules, giving the potential for lower LWR and improved resolution. Fullerene derivative molecules have a diameter of approximately 1 nm and have been shown to act as negative tone resists with high etch durability and a resolution of 10 nm when exposed via electron beam lithography.  However, the sensitivity of such resists is extremely poor and significant improvements would have to be made to make the material commercially viable.  A common way to improve resist sensitivity is chemical amplification (CA) by addition of a photosensitizer, and optionally a cross-linker. Here we present a fullerene based three component chemically amplified resist system, which shows high resolution and sensitivity, wide process latitude, and etch durability comparable with commercial novolac resists.

 

Fullerene resist films were prepared on hydrogen terminated silicon by spin coating and were irradiated using a Philips XL30SFEG scanning electron microscope equipped with a Raith lithography system. The fullerene CA resist consisted of the derivative MF03-04, an epoxide cross-linker and a photoacid generator.  The sensitivity of this resist was shown to be between 5 and 10 µC/cm² at 20 keV for various combinations of post application bake and post exposure bake conditions.  Using 30 keV electron beam exposure, sparse patterns with 12 nm resolution were demonstrated, at a line dose of 300 pC/cm, whilst dense patterns with half-pitch 20 nm were achieved at 200 pC/cm, as shown in figure 1. The LWR for the densely patterned resist (measured at hp 25 nm) is approximately 4 nm. The etch durability of the fullerene resist was comparable to SAL601, a common novolac resist.

 

[1] International Technology Road map for Semiconductors, 2006 Update, http://www.itrs.net.

[2] R.L. Brainard, G.G. Barclay, E.H. Anderson, L.E. Ocola, Microelectron. Eng., 2002, 61-62, 707.

 

Figure 1:         20 nm half-pitch lines and spaces exposed with a dose of 200 pC/cm at 30 keV, developed in MCB (1:1) IPA for 10 s, with a 10 s IPA rinse.

Re: Ferric Chloride (FeCl3) Etch Mask?

I have some extra sheets of the blue printer film if you want to test it out right away.  It works pretty well for large features printed from a laser printer (and you can use a sharpie to correct for problems in the transferring).

 

-Meredith

On Mon, Mar 3, 2008 at 8:11 AM, Mary Tang <mtang@stanford.edu> wrote:

Hi all --

YES! Some of my favorite stuff (next to PDMS) is the "Press-n-Peel" PCB
film (http://www.techniks.com/).  It's a film that you can run through a
laser printer.  The ink stays on the film, but is easily transferred
when you iron it onto your substrate,  It is not high resolution (maybe
100 um), but is easy and cheap and stands up to standard copper etchant.

M

Chong Xie wrote:
> Go a bit further from this point. You could transfer laser printed
> pattern to your surface by transparency films easily. The ink works
> fine as mask. This may give you a little better resolution and make
> your design easier.
>
> Chong
>
> Clifford Hicks wrote:
>>
>> Probably not what you are looking for, but a Sharpie pen works well,
>> the kind that writes on metal or other smooth surfaces. If it's a big,
>> simple design you can draw it by hand and the pen ink itself is a pretty
>> good resist.
>>
>>     - Clifford
>>
>>
>>> Hello,
>>> I'm hoping to etch patterns into/through copper, nickel, and/or
>>> aluminum
>>> foils using an aqueous solution of FeCl3.  I was wondering if anybody
>>> has
>>> any experience etching any metals with FeCl3, and which masks work for
>>> this
>>> process.  Any help would be greatly appreciated!  Thanks,
>>> Kevin
>>> kcrabb@stanford.edu
>>>
>>>
>>
>>
>>
>>
>

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

--
--------------------------------------------------
Meredith M. Lee
Stanford University
Ph.D. Candidate, Dept. of Electrical Engineering
President, Stanford Student OSA/SPIE

Center for Integrated Systems
420 Via Ortega, Stanford, CA 94305-4075
Fax: (650) 723-4659
mmlee@stanford.edu

Re: Ferric Chloride (FeCl3) Etch Mask?

Hi all --

YES! Some of my favorite stuff (next to PDMS) is the "Press-n-Peel" PCB
film (http://www.techniks.com/). It's a film that you can run through a
laser printer. The ink stays on the film, but is easily transferred
when you iron it onto your substrate, It is not high resolution (maybe
100 um), but is easy and cheap and stands up to standard copper etchant.

M

Chong Xie wrote:
> Go a bit further from this point. You could transfer laser printed
> pattern to your surface by transparency films easily. The ink works
> fine as mask. This may give you a little better resolution and make
> your design easier.
>
> Chong
>
> Clifford Hicks wrote:
>>
>> Probably not what you are looking for, but a Sharpie pen works well,
>> the kind that writes on metal or other smooth surfaces. If it's a big,
>> simple design you can draw it by hand and the pen ink itself is a pretty
>> good resist.
>>
>> - Clifford
>>
>>
>>> Hello,
>>> I'm hoping to etch patterns into/through copper, nickel, and/or
>>> aluminum
>>> foils using an aqueous solution of FeCl3. I was wondering if anybody
>>> has
>>> any experience etching any metals with FeCl3, and which masks work for
>>> this
>>> process. Any help would be greatly appreciated! Thanks,
>>> Kevin
>>> kcrabb@stanford.edu
>>>
>>>
>>
>>
>>
>>
>

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Ferric Chloride (FeCl3) Etch Mask?

Go a bit further from this point. You could transfer laser printed
pattern to your surface by transparency films easily. The ink works fine
as mask. This may give you a little better resolution and make your
design easier.

Chong

Clifford Hicks wrote:
>
> Probably not what you are looking for, but a Sharpie pen works well,
> the kind that writes on metal or other smooth surfaces. If it's a big,
> simple design you can draw it by hand and the pen ink itself is a pretty
> good resist.
>
> - Clifford
>
>
>> Hello,
>> I'm hoping to etch patterns into/through copper, nickel, and/or aluminum
>> foils using an aqueous solution of FeCl3. I was wondering if anybody
>> has
>> any experience etching any metals with FeCl3, and which masks work for
>> this
>> process. Any help would be greatly appreciated! Thanks,
>> Kevin
>> kcrabb@stanford.edu
>>
>>
>
>
>
>

Re: Resolution of Alphastep.

The AlphaStep can show a 100nm step but it is
difficult to get much accuracy at his level
(roughness, vibrations).

The Zygo has ~ 1 nm precison but will only work on
metals or semiconductors. For dielectrics, it is
easily confused by the multiple reflections. The Zygo
uses "white light" interference centered at about
600nm. Some metals or semiconductors are
semi-transparent at this wave length. If the material
is not optically opaque on both side of the step
measured, a systematic, thickness dependent, error can
result. If you need to measure a thin metal or a
dielectric step, overcoat the step with a (smooth)
metal thick enough to be opaque at 600 nm.

AFM is also possible but is even more trouble (in my
opinion).

jimkruger
--- Ying Chen <mihuhou@stanford.edu> wrote:

> Hi, labmembers,
>
> I am trying to measure step heights (40~50nm) on a
> partly etched sample. Can
> anyone tell me whether the alphastep could measure
> such small steps?
>
> Thanks!
>
> Ying
>
>
>
>
> ----- Original Message -----
> From: "Jim McVittie" <mcvittie@cis.Stanford.EDU>
> To: <mihuhou@stanford.edu>
> Sent: Thursday, February 28, 2008 9:29 AM
> Subject: Re: Gold substrate in Rudolph.
>
>
> > Ying,
> >
> > 6328A is not a great place to do measurements on
> Au since it has a
> > transition in this its optical properities in this
> region. The Wollam will
> > give better results since you can change the
> wavelength. The following
> > results are from http://www.luxpop.com/.

Jim
> >
> > First set of refs:
> > At a wavelength of 6328 nm (0.196 eV), the index
> of refraction of gold is
> > n = 5.21, k = 43.82.
> >
> > Note that for thin films the index can vary
> depending on deposition
> > parameters.
> >
> > References:
> > [1] L. G. Shulz, "The optical constants of silver,
> gold, copper and
> > aluminum. 1) the absorption coefficient k and 2)
> the index of refraction
> > n," J. Opt. Soc. Am. , Vol. 44, No. 5, pp. 357-362
> and 362-368,
> > [2] M. A. Ordal, L. L. Long, R. J. Bell, S. E.
> Bell, R. W. Alexander, Jr.,
> > and C. A. Ward, "Optical properties of the metals
> Al, Co, Cu, Au, Fe, Pb,
> > Ni, Pd, Pt, Ag, Ti, and W in the infrared and far
> infrared," Appl. Opt. ,
> > Vol. 22, No. 7, 1 April 1983, pp. 1099-1119
> (Molutevich et al).
> >
> > Second set of refs:
> > At a wavelength of 6328 nm (0.196 eV), the index
> of refraction of gold is
> > n = 5.635, k = 38.1493.
> >
> > Note that for thin films the index can vary
> greatly depending on
> > deposition parameters.
> > References:
> > [1] E. D. Palik, "Handbook of Optical Constants of
> Solids, " Academic
> > Press.
> >
> >
> > On Wed, 27 Feb 2008 mihuhou@stanford.edu wrote:
> >
> >> Hi, Jim,
> >>
> >> Can you check up the gold optical information and
> show me how to use
> >> it with Rudolph? I am available tomorrow
> afternoon.
> >>
> >> Thanks a lot!
> >> Ying
> >>
> >
> > --
> >
>
--------------------------------------------------------------
> > Jim McVittie, Ph.D. Senior Research Scientist
> > Allen Center for Integrated Systems Electrical
> Engineering
> > Stanford University
> jmcvittie@stanford.edu
> > Rm. 336, 330 Serra Mall Fax: (650) 723-4659
> > Stanford, CA 94305-4075 Tel: (650) 725-3640
> >
> >
>
>

____________________________________________________________________________________
Never miss a thing. Make Yahoo your home page.

http://www.yahoo.com/r/hs

RE: Ferric Chloride (FeCl3) Etch Mask?

Probably not what you are looking for, but a Sharpie pen works well,
the kind that writes on metal or other smooth surfaces. If it's a big,
simple design you can draw it by hand and the pen ink itself is a pretty
good resist.

- Clifford

>
> Hello,
> I'm hoping to etch patterns into/through copper, nickel, and/or aluminum
> foils using an aqueous solution of FeCl3. I was wondering if anybody
> has
> any experience etching any metals with FeCl3, and which masks work for
> this
> process. Any help would be greatly appreciated! Thanks,
> Kevin
> kcrabb@stanford.edu
>

Resolution of Alphastep.

Hi, labmembers,

I am trying to measure step heights (40~50nm) on a partly etched sample. Can
anyone tell me whether the alphastep could measure such small steps?

Thanks!

Ying

----- Original Message -----
From: "Jim McVittie" <mcvittie@cis.Stanford.EDU>
To: <mihuhou@stanford.edu>
Sent: Thursday, February 28, 2008 9:29 AM
Subject: Re: Gold substrate in Rudolph.

> Ying,
>
> 6328A is not a great place to do measurements on Au since it has a
> transition in this its optical properities in this region. The Wollam will
> give better results since you can change the wavelength. The following
> results are from http://www.luxpop.com/.

Jim
>
> First set of refs:
> At a wavelength of 6328 nm (0.196 eV), the index of refraction of gold is
> n = 5.21, k = 43.82.
>
> Note that for thin films the index can vary depending on deposition
> parameters.
>
> References:
> [1] L. G. Shulz, "The optical constants of silver, gold, copper and
> aluminum. 1) the absorption coefficient k and 2) the index of refraction
> n," J. Opt. Soc. Am. , Vol. 44, No. 5, pp. 357-362 and 362-368,
> [2] M. A. Ordal, L. L. Long, R. J. Bell, S. E. Bell, R. W. Alexander, Jr.,
> and C. A. Ward, "Optical properties of the metals Al, Co, Cu, Au, Fe, Pb,
> Ni, Pd, Pt, Ag, Ti, and W in the infrared and far infrared," Appl. Opt. ,
> Vol. 22, No. 7, 1 April 1983, pp. 1099-1119 (Molutevich et al).
>
> Second set of refs:
> At a wavelength of 6328 nm (0.196 eV), the index of refraction of gold is
> n = 5.635, k = 38.1493.
>
> Note that for thin films the index can vary greatly depending on
> deposition parameters.
> References:
> [1] E. D. Palik, "Handbook of Optical Constants of Solids, " Academic
> Press.
>
>
> On Wed, 27 Feb 2008 mihuhou@stanford.edu wrote:
>
>> Hi, Jim,
>>
>> Can you check up the gold optical information and show me how to use
>> it with Rudolph? I am available tomorrow afternoon.
>>
>> Thanks a lot!
>> Ying
>>
>
> --
> --------------------------------------------------------------
> Jim McVittie, Ph.D. Senior Research Scientist
> Allen Center for Integrated Systems Electrical Engineering
> Stanford University jmcvittie@stanford.edu
> Rm. 336, 330 Serra Mall Fax: (650) 723-4659
> Stanford, CA 94305-4075 Tel: (650) 725-3640
>
>