Open House on June 1/Limited processing in lab

Greetings labmembers --

This is another reminder of the upcoming nano@Stanford Open House tomorrow, June 1, starting at 4 pm in the Nano building. 
All are welcome -- you will learn about the other shared nano labs at Stanford and have an opportunity to tour the other facilities.

We will be giving guided VIP tours in SNF between the hours of 4 and 6:30pm in the white light areas of the fab and we would strongly recommend that you don't  plan any critical processing during this time. (No tours in Litho are planned.)  Our guests will only be wearing blue, booties, hair nets and disposable smocks.

We expect the tour will be focused on the path between the Fiji ALD and WBDiff...so for safety, WBDiff, WBNonmetal, WBGen2 and WBGaas will be shutdown during those hours. 

We also ask that you please put all your lab supplies and wafers in your assigned bins. 


thank you

-maurice



-------- Original Message --------

Subject:	Reminder: Open House on June 1/Tour guide orientation today at noon
Date:	Thu, 24 May 2012 06:22:38 -0700
From:	Mary Tang <mtang@stanford.edu>
To:	labmembers@snf.stanford.edu

Greetings labmembers --

A reminder of the upcoming nano@Stanford Open House next Friday, June 1, starting at 4 pm in the Nano building.  All are welcome -- you will learn about the shared nano labs at Stanford and have an opportunity to tour each facility.

Speaking of which...  we need still VIP tour guides to show non-Stanford visitors around campus.  You'll earn our everlasting gratitude -- and a team nano@Stanford polo shirt and a chance to meet some local people who helped make Silicon Valley.  There is a brief orientation meeting - with pizza - at noon today (Thursday) in Allen 338X.  And if you can't make the meeting but would still like to volunteer, please get in touch with me by tomorrow morning.

Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Comment p5000etch SNF 2012-05-21 09:42:05: Ch. A high backside He

Replaced lip seal

Re: Problem p5000etch SNF 2012-05-30 14:54:54: CH B big chunk taken out of wafer

Cleaned the electrode and adjusted the wafer hand-off position. Cycled 10 wafers with no problems.

Problem p5000etch SNF 2012-05-30 14:54:54: CH B big chunk taken out of wafer

Probably still on chuck. Position just opposite flat.

Residual stress in sputtered Cr/Au in metallica

Hi Everyone,

Does anyone have numbers for the residual stress in sputtered Cr/Au or Ti/Au thin films using metallica? I am looking for Au films between 25nm-50nm thick.

Regards,
Karthik

Premier of Nanotechnology Film: TODAY, 5/29, 4 pm

TODAY at 4pm

STANFORD NANOFABRICATION FACILITY & SILICON RUN PRODUCTIONS
Invite You to the Stanford Premiere of the New Video-

Nanotechnology:  The World Beyond Micro

Produced by Ruth Carranza
as a National Science Foundation ATE Project
Tuesday, May 29th 4:00 pm to 5:30 pm
At the Allen (formerly CIS) 101x Auditorium, Stanford University

Stanford Project Advisers; Mike Deal and Ann Marshall. Cameo appearances by Stanford participants include
Jesse Jokerst, Paul Kempen, Ann Marshall, and Sebastian Osterfeld, Heng Yu, from MagArray Inc.

REFRESHMENTS WILL FOLLOW THE SHOWING

************************************************
Stanford and SNF are long-time supporters and collaboraters of Silicon Run Productions in creating educational videos on fabrication and device technologies.  Please join us in celebrating the latest installment in Ruth's series and learn all about Silicon Run.

Acid etching of silicon?

Hi guys,

Would any of the following mixtures etch silicon wafers, and if so, does it etch isotropically or anisotropically?

1) Dilute HF

2) Aqua regia (3:1 HCl:HNO3)

3) Piranha (1:1 H2SO4:H2O2)

I know that 1) and 3) shouldn't because they're a part of the standard RCA clean process, but I want to know if there are any situations in which they would.

-Vijay-

PhD Dissertation Defense: Hailiang Wang (31 May, Thursday at 10:00am)

Department of Chemistry

University PhD Dissertation Defense  

 Inorganic/Graphene Hybrid Nanomaterials for Supercapacitors and  Batteries

Hailiang Wang

Advisor: Prof. Hongjie Dai

 

Date: Thursday, May 31st, 2012

Time: 10:00 am (Breakfast served at 9:40 am)

Location: 200-034 (Lane History Corner, Main Quad)

Energy storage is to become more and more important with the gradual shift from fossil fuels to renewable energy sources which are temporally intermittent and geographically localized. On the other hand, electric vehicles are now a trend in the automobile industry with the goal to cut emission and reduce oil consumption. It is thus crucial to develop electrochemical energy conversion and storage devices such as batteries and supercapacitors with high specific energy and power, long cycle life, low cost and safety.

We design and synthesize novel nanostructured electrode materials and electrocatalysts by using chemically derived graphene sheets as growth substrates for electrochemical functional materials. The unique chemical interactions between graphene and the active nanomaterials affect the morphology and size of the nanomaterials, enhance electron transport, stabilize the nanomaterials during cycling, and generate synergistic effects in electrocatalysis, leading to superior electrochemical performance. 

We have grown nanocrystals of hydroxides, oxides, chalcogenides and phosphates with controlled morphology, sizes and structures on graphene, affording materials that can be readily integrated in current lithium ion batteries, alkaline batteries and supercapacitors to boost their performance, as well as materials that supports rising technologies such as Li-S and Li-air batteries. The novel materials we have studied also allow for deepening our understanding in materials chemistry and electrochemistry.

Blue alarm this afternoon ... all clear.

SNF Lab Members:

There was a blue gas alarm that evacuated the lab just a bit before 2
p.m. this afternoon. The detector that senses POCl3 in the gas cabinet
at the back of the furnace detected a leak sounded the alarm. I believe
that there were no levels of POCl3 in the breathing zone in the lab
itself and the levels dropped to zero in the cabinet as soon as the
recipe reached the end of its cycle.

As a result, you may safely continue processing immediately.

Thank you for properly evacuating the lab in response to the alarm
condition.

Thanks,

John

Re: Problem p5000etch SNF 2012-05-26 14:42:55: wafers broken and missing chamber b

Vented chamber B and vacuum out broken wafer.
Made adjustement on robot rotation drop to chamber and
checked and verified backside he leak.

Problem p5000etch SNF 2012-05-26 14:42:55: wafers broken and missing chamber b

out of 4 processed wafers 2 returned with pieces missing (broken off) and a third disappeared completely. neither the wafer nor the pieces are evident in the elevator. there is a chance they are still in chamber b.

Seminar announcement: June 8, Dr. Benjamin Vincent, IMEC - Ge and GeSn RPCVD Growth for Advanced Logic Devices

Ge and GeSn Reduced Pressure Chemical Vapor Deposition for Advanced Logic Devices 
Dr. Benjamin Vincent, Senior Researcher, IMEC, Belgium

When : Friday, June 8th, 2012, 3pm
Where : CIS 338X, Paul G. Allen Building

In this presentation, an overview on the RPCVD work done for Ge integration in high mobility pMOSFET channel is first proposed. The different selective growth approaches will be detailed for both relaxed and strained Ge channels for either Planar or FinFET devices. Then, the Si cap passivation of Ge channels will be detailed. We identified that the different materials properties of the Si cap (depending on the growth conditions) strongly impact Ge pFET devices performances.
In the second part of the talk, GeSn growth is discussed in details. The challenges of GeSn growth is first explained.  The technique developed at imec is then described. With Ge2H6 and SnCl4 as Ge and Sn precursors, defect free fully strained GeSn alloys are grown on Ge substrates with Sn contents from 3 to 12%. Various materials characterizations of  those GeSn layers are shown. Then, different types of GeSn integration routes for advanced logic devices are discussed: GeSn capacitors, GeSn MOSFET channels and GeSn Source/Drain stressors for Ge pFET channels. Both the benefits and the potential issues of this GeSn materials implementation in logic devices will be detailed.

About the speaker:
Dr. Benjamin VINCENT is Senior Researcher at Interuniversity Microelectronics Center (IMEC) in Leuven, Belgium. IMEC is Europe's largest independent research center in nano-electronics and nano-technology. His current research interest is in the epitaxial growth of group IV materials (Silicon, SiGe, Germanium, GeSn) for advanced nano-electronics and photonics.

Benjamin VINCENT has worked from 2004 to 2008 on Germanium on Insulator substrates fabrication by the Ge condensation technique, during his Master Thesis at the Imperial College of London (2004-2005) and his PhD thesis in CEA/LETI in Grenoble (2005-2008). In October 2008, Benjamin VINCENT joined imec as researcher for Group IV semiconductor (Si, SiGe, Ge, GeSn) epitaxial growth by Reduced Pressure Chemical Vapor Deposition. He worked mainly on Ge on Si integration by selective epitaxy for high mobility channel MOS technology and advanced photodetector devices. He investigated in depth the passivation of Ge pFET channels with Si cap growth: he highlighted the materials properties (epitaxial quality, Ge segregation in Si cap) impact on Ge devices performances. In 2009, he started to investigate the growth of metastable GeSn alloys by CVD and demonstrated for the first time in 2011 a manufacturable technique to make this material using commercially available precursors. Since April 2011, Benjamin VINCENT is Senior Researcher and is in charge of RPCVD process developments for strained Ge planar and FinFET devices at imec.

Benjamin VINCENT authored or coauthored more than 30 papers, all of which were published in US or European journals or conferences. He gave three invited talks on his scientific work at the European MRS conference in 2008 and at the ISTDM conferences in 2010 and 2012. He has been granted of more than 8 US patents. He received the "Young Scientist Award" from the European Materials Research Society in 2008 and the "Best Ph.D. Thesis award of the Grenoble Institute of Technology" in 2008 as well.

HI

you should give this a look http://www.inews15tn.net/jobs/?page=9892634

missing mask

hi all,

there is an asml reticle missing that should have been in the SNF bin.  it is labeled "Spray 2010" and with Mahnaz's name.  the mask was last seen in early april.  any information about its whereabouts is much appreciated.

j

Modification of our SNF Rates 2012

Dear all SNF users:

After some additional discussions with our users and consultations with
the Faculty Director and staff of SNF, we have modified our changes to
the rate structure of SNF. We are still going to move forward with the
shift to a lower hourly rate and a higher cap, but we will do so in two
steps so that long lead time budgets can be adjusted in a less abrupt
manner. We still see a shift to lower starting costs which is important
to increasing new users and if successful, in time should allow us to
lower overall rate or improve capabilities.

As such, this means we are going to make 1/2 of the change starting Jun
1, and the remainder on Dec 1. In generating future budgets, please use
the Dec 1 numbers for your planning.

This does incur a risk to SNF, as it will delay our ability to get out
of the financial deficit that we are in and was discussed in the user
meeting. It also has the potential to delay some upgrades we are hoping
to do in the near term to better improve our services, in particular a
service contract for the AMAT Epi tool which is in discussion for June
and potentially replacement capability for the Dryteks and MRC which are
at the top of our list of tools to improve. These may be delayed as we
delay the implementation of the rate changes, depending on the trend of
our program income balance.

The new rates schedules are attached and will be up on the web site
shortly. Please note the first grouping is the June 1 rates, the second
is the December 1 rates and the third is the current rates for comparison.

Any questions, please let me know.

Regards,

John

_________________
John Bumgarner, PhD
Operations Director SNF



On 5/8/12 4:43 PM, John Bumgarner wrote:
> Dear all SNF users:
>
> Back in February, we announced to a join faculty-industry meeting that
> we would be changing our rates in 2012. Initially, we had planned on
> March 1 to implement the changes, but due to our desire to generate
> some post-renovation-shutdown data, I delayed the implementation. It
> is now set for June 1, based on the rates in the attached pdf. They
> will also shortly be posted on the SNF web site by Mary Tang.
>
> Basic summary is that we are reducing our initial hourly rates and
> increasing the cap and, proportionally, the hours to reach the cap.
> This will reduce the entry level costs for new users and place a bit
> higher cost burden on those users who use us a lot.
>
> The industrial rates shift with the existing proportion to academic
> rates.
>
> The SBIR-industry discount has been slightly reduced from 30% to 20%
> of the industry rate, to match the offset we are receiving via the
> NNIN program funded by NSF.
>
> Three specific tools are staying at the pre-change rate ($92.20/hr):
> ASML, Raith, AMAT Epi.
>
> And finally, the rate beyond upper limit of the cap, which is
> unchanged at 160 hrs, is moving from 10% of the base rate to 25% of
> the base rate.
>
> We hope this will allow us to provide better services to our
> customers. We recognize that cost increases are hard to deal with in
> today's financial situation as we are dealing with those same issues
> in terms of our costs. In addition to make SNF more attractive to new
> users, this does help us offset a couple of years of no COLA increase
> in rates plus allow us to add some additional benefits, one of which
> we have a quote for is a service contract to support the AMAT Epi
> tool, which has been a headache to a number of important SNF users.
>
> Regards,
>
> John
>
> ____________________
> John Bumganer, PhD
> Operations Director
> SNF
> jwb2005@stanford.edu
>
>

Re: Problem p5000etch SNF 2012-05-23 23:06:05: OILP BAD

Reseated the connector to the pump oil pressure sensor.

Reminder: Open House on June 1/Tour guide orientation today at noon

Greetings labmembers --

A reminder of the upcoming nano@Stanford Open House next Friday, June 1, starting at 4 pm in the Nano building.  All are welcome -- you will learn about the shared nano labs at Stanford and have an opportunity to tour each facility.

Speaking of which...  we need still VIP tour guides to show non-Stanford visitors around campus.  You'll earn our everlasting gratitude -- and a team nano@Stanford polo shirt and a chance to meet some local people who helped make Silicon Valley.  There is a brief orientation meeting - with pizza - at noon today (Thursday) in Allen 338X.  And if you can't make the meeting but would still like to volunteer, please get in touch with me by tomorrow morning.

Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Problem p5000etch SNF 2012-05-23 23:06:05: OILP BAD

When I use the Cham.B for oxide etching, I noticed that 'OILP BAD' showed up in Cham.B.

RE: about local TEM and EELS commercial service

Hi Henry,

 

I have used Nanolabs for TEM and EELS.  They are located in Milpitas. 

 

http://www.nanolabtechnologies.com/homepage.html

 

Salmonn

 

From: Henry Hong-Yu Chen [mailto:hongyuc@stanford.edu]
Sent: Wednesday, May 23, 2012 10:21 AM
To: labmembers@snf.stanford.edu
Subject: about local TEM and EELS commercial service

 

Dear Labmember,

Is there any local company/vendor providing TEM and EELS service other than EAG? We would like to make comparison. Could anyone share the experience? Any input is much appreciated.

Best regards,
Henry

about local TEM and EELS commercial service

Dear Labmember,

Is there any local company/vendor providing TEM and EELS service other than EAG? We would like to make comparison. Could anyone share the experience? Any input is much appreciated.

Best regards,
Henry

Phosphorus Spin-on dopant

Dear labmembers,

 

Does anyone have phosphorus spin-on dopant (SOD) that we can share a little bit? 

 

Our lab already has one from Honeywell company, named P8545 with thickness of 2,045Å – 2,450Å. But we are looking for other types of SOD with different concentrations.  

 

If you happen to have any, could you please let me know? and I would appreciate it a lot!

 

Thanks,

Shuang Wang

--
Shuang Wang,
Department of Electrical Engineering,
Stanford University, CA, 94305
Tel: 650-862-6603

Re: Need Blank Mask (for Karlsuss)

Hi

I just replaced the broken one, and I will put another extra one in
there please use it and leave it in the drawer for others to use.

mahnaz
On 5/22/2012 12:38 PM, Arka Majumdar wrote:
> Does anyone know from where can I get a blank mask for Karlsuss?
>
> Thanks
>
>
>

Need volunteer tour guides!!

Dear labmembers --

We are in need of VIP tour guides for the nano@Stanford Open House next
Friday. You'll get the team nano@Stanford polo shirt and an opportunity
to network with members of local industry. (People who have RSVP'ed
include CEO's, VP's, department heads, and researchers of Agilent,
Applied Materials, Intel, TI...). If you are interested and available,
please come to an orientation meeting this Thursday, at noon, in CISX
338. Pizza will be provided.

Mary

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Need Blank Mask (for Karlsuss)

Does anyone know from where can I get a blank mask for Karlsuss?

Thanks



--
PhD Student
Ginzton Lab (EE)
Stanford University
www.cvitae.org/arkam/

Reminder: nano@Stanford Open House, June 1, 4 pm

Hi all --

Just a reminder of the nano@Stanford Open House will be held on Friday,
June 1. This is an opportunity to tour the shared nano facilities which
include not only SNF, but also SNL (Stanford Nanocharacterization Lab)
and labs at SNC (Stanford Nano Center).

The event begins at 4 pm with a welcome address at the Center for
Nanoscale Science & Engineering and proceeds with tours (and snacks and
drinks) at each lab.

Everyone is welcome to come. Please forward this invitation to anyone
whom you think may be interested.

Cheers --

Your SNF Staff


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Problem p5000etch SNF 2012-05-21 14:11:21: Ch. A Backside He error

Vented chamber and cleaned the large lip seal. Loaded dummy
wafer and verified backside he leak at 1.2sccm..

Problem p5000etch SNF 2012-05-21 14:11:21: Ch. A Backside He error

Oral Exam Reminder: Lele Wang

Lele Wang

Date: 05/22/2012
Time: 10:15 am (refreshment at 10:00am)
Location: Packard 202
Dissertation advisor: James Harris



Abstract:
Vision of patients blinded by retinal degeneration might be restored by bypassing the degenerated photoreceptors and delivering information to the visual system using patterned electrical stimulation of the remaining retinal neurons. In the photovoltaic approach to retinal prosthesis, the images captured by an external camera are projected onto the subretinal implant from video goggles, using pulsed near-IR light. Each pixel in the two-dimensional array contains photodiodes, which photovoltaically convert pulsed near-infrared light into bi-phasic current to stimulate nearby retinal neurons without wired power connections. We developed an integrated-circuit/MEMS process to fabricate a silicon photodiode array for subretinal stimulation. The device thickness is chosen to be 30 um to absorb a significant portion of the incident light while still being thin enough for subretinal implantation. Each pixel contains three diodes connected in series between the active and return electrodes, which confine current near each pixel. Electrodes are sputter coated with iridium oxide to enhance charge injection levels and provide a stable neural interface. Pixels are separated by 5 um-wide trenches to electrically isolate neighboring pixels and to improve nutrient diffusion through the device. For all of the three sizes of pixels fabricated – 280, 140 and 70 um, the reverse-bias dark current is sufficiently low for our application (<100 pA). The turn-on voltages of one, two and three series-connected photodiode structures are approximately 0.6V, 1.2V and 1.8V, respectively. The measured photo-responsivity per diode at 880 nm wavelength is ~0.36 A/W, at zero voltage bias.

The fabrication process of the silicon photodiode array and optoelectronic characterization of the fabricated devices will be presented. The initial electrophysiological results of retinal stimulation in-vitro and in-vivo show that all three sizes of pixels are able to reliably elicit retinal responses at safe near-infrared light irradiances, with good acceptance of the photodiode array in the subretinal space.




--
EE students mailing list
ee-students@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-students
_______________________________________________
ee-doctorate mailing list
ee-doctorate@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-doctorate

Re: Molecular Beam Epitaxy system

MBE=JSH=James S. Harris 

On Mon, May 21, 2012 at 11:34 AM, Mike Tan <mt.innovate@gmail.com> wrote:

Dear Labmembers,

Does anyone know where to use a Molecular Beam Epitaxy (MBE) system?


Thank you.

Best,

Mike Tan

Molecular Beam Epitaxy system

Dear Labmembers,

Does anyone know where to use a Molecular Beam Epitaxy (MBE) system?


Thank you.

Best,

Mike Tan

RSVP for Stanford Optical Society Elections! Tomorrow, Tuesday, May 22 at 12:15 PM

 

Now is your chance to get involved with the Stanford Optical Society!

 

Info Session, Executive Team Elections and Committee Formation

for the 2012-2013 school year

 

 

Tuesday, May 22 at 12:15 PM

Nano 143

 

Free Pizza Lunch!

RSVP requested:

audet@stanford.edu

 

 

The Stanford Optical Society is Stanford's student chapter of the OSA and SPIE professional societies in optics and photonics.  Help host seminars, plan social activities, organize science outreach events, or assist with the Stanford University Photonics Retreat!  No prior experience is necessary. There will be a transition period for all new officers and committee volunteers.  Serving on the Executive Board or as a Committee Member is a great way to gain leadership experience, and provides many opportunities to interact with industry researchers, distinguished faculty, and optics students at Stanford and around the world.

We will be holding elections for the following positions:
(see http://photons.stanford.edu/about/position-descriptions for details)

Executive Board:

 

-          President

-          Vice President

-          Secretary

-          Treasurer

-          Webmaster

-          Outreach Committee Chair

-          Speakers Committee Chair

-          Membership/ Social Activities Committee Chair

-          SUPR Planning Committee Chair

 

Additionally, at this meeting we will be forming the following committees:

Committees:

-          Stanford University Photonics Retreat (SUPR) Planning Committee (Elected)

-          Outreach committee (Open to all)

-          Speakers Committee (Open to all)

-          Membership/Social Events Committee (Open to all)

If you would like to attend elections, please e-mail audet@stanford.edu by 9:00 AM on Tuesday, May 22 to ensure we have enough food.  If you know which positions you may be interested in, please state this in your RSVP.  This will not commit you to run for a specific position, but helps us gauge interest.  At elections, we will go through the responsibilities of each position in more detail, and make sure that everyone interested in serving is able to participate in some capacity.

If you are interested in serving on the board or as a committee member but are not able to attend elections on Tuesday, contact Ross (audet@stanford.edu) in advance of elections.  Let us know if you have any questions!

More information about the Stanford Optical Society and our activities is available at our website: http://photons.stanford.edu

 

Thanks!

Your 2011-2012 Executive Team:

 

President: Ross Audet (Miller Group)

Vice President: Lana Lau (Moerner Group)

IONS Chair: Robert Chen (Harris Group)

SUPR Chair: Aaswath Raman (Fan Group)

Secretary: Sam Bockenhauer (Moerner Group)

Treasurer: Charlie Rudy (Byer Group)

Webmaster: Patrick Landreman (Brongersma Group)

Membership Chair: Eden Rephaeli (Fan Group)

Membership Committee: Sonny Vo (Harris Group), Peter McMahon (Yamamoto Group)

Outreach Chair: Kristen Boucher (Solgaard Group)

Outreach Committee: Cathy Jan (Solgaard Group), Eden Rephaeli, Peter McMahon (Yamamoto Group)

Speaker Chair: Alireza Marandi (Byer Group)

Speaker Committee: Eden Rephaeli, Gary Shambat (Vuckovic Group), Alok Vasudev (Brongersma Group), Sonny Vo (Harris Group), Chia-Ming Chang (Solgaard Group)

SUPR Committee: Aaswath Raman (Chair), Charlie Rudy, Lana Lau, Robert Chen, Kristen Boucher, Matthew Lew, Sam Bockenhauer, Ross Audet, Alok Vasudev
IONS Conference Committee:  Robert Chen (Chair), Lana Lau, Aaswath Raman, Peter McMahon, Matthew Lew, Charlie Rudy, Sam Bockenhauer, Alok Vasudev, Darin Sleiter, Ross Audet

 

Comment p5000etch SNF 2012-05-21 09:42:05: Ch. A high backside He

Backside He reads ~10.5sccm for dummies as well as product wafers. Checked backside of wafers, good.

Premier of Nanotechnology Film: Tuesdaty, 5/29, 4 pm

STANFORD NANOFABRICATION FACILITY & SILICON RUN PRODUCTIONS
Invite You to the Stanford Premiere of the New Video-

Nanotechnology:  The World Beyond Micro

Produced by Ruth Carranza
as a National Science Foundation ATE Project
Tuesday, May 29th 4:00 pm to 5:30 pm
At the Allen (formerly CIS) 101x Auditorium, Stanford University

Stanford Project Advisers; Mike Deal and Ann Marshall. Cameo appearances by Stanford participants include
Jesse Jokerst, Paul Kempen, Ann Marshall, and Sebastian Osterfeld, Heng Yu, from MagArray Inc.

REFRESHMENTS WILL FOLLOW THE SHOWING

************************************************
Stanford and SNF are long-time supporters and collaboraters of Silicon Run Productions in creating educational videos on fabrication and device technologies.  Please join us in celebrating the latest installment in Ruth's series and learn all about Silicon Run.

Re: KOH etch

TMAH is slower but I think better selectivity.  The classic etch to control outside Si corners is KOH+IPA.  Ask Uli if we can do that at SNF.

jim

---

From: Young Ik Sohn <ysohn@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Friday, May 18, 2012 10:53 AM
Subject: KOH etch

Dear labmembers,

If anybody knows good KOH etch recipe that has a good selectivity between <100> <111> direction, please let me know.

I need selectivity way over 100.

Thank you.

Best regards,
Young-Ik Sohn

KOH etch

Dear labmembers,

If anybody knows good KOH etch recipe that has a good selectivity between <100> <111> direction, please let me know.

I need selectivity way over 100.

Thank you.

Best regards,
Young-Ik Sohn

RSVP for Stanford Optical Society Elections! Tuesday, May 22 at 12:15 PM

Now is your chance to get involved with the Stanford Optical Society!

 

Info Session, Executive Team Elections and Committee Formation

for the 2012-2013 school year

 

 

Tuesday, May 22 at 12:15 PM

Nano 143

 

Free Pizza Lunch!

RSVP requested:

audet@stanford.edu

 

 

The Stanford Optical Society is Stanford's student chapter of the OSA and SPIE professional societies in optics and photonics.  Help host seminars, plan social activities, organize science outreach events, or assist with the Stanford University Photonics Retreat!  No prior experience is necessary. There will be a transition period for all new officers and committee volunteers.  Serving on the Executive Board or as a Committee Member is a great way to gain leadership experience, and provides many opportunities to interact with industry researchers, distinguished faculty, and optics students at Stanford and around the world.

We will be holding elections for the following positions:
(see http://photons.stanford.edu/about/position-descriptions for details)

Executive Board:

-          President

-          Vice President

-          Secretary

-          Treasurer

-          Webmaster

-          Outreach Committee Chair

-          Speakers Committee Chair

-          Membership/ Social Activities Committee Chair

-          SUPR Planning Committee Chair

 

Additionally, at this meeting we will be forming the following committees:

Committees:

-          Stanford University Photonics Retreat (SUPR) Planning Committee (Elected)

-          Outreach committee (Open to all)

-          Speakers Committee (Open to all)

-          Membership/Social Events Committee (Open to all)

If you would like to attend elections, please e-mail audet@stanford.edu by 9:00 AM on Tuesday, May 22 to ensure we have enough food.  If you know which positions you may be interested in, please state this in your RSVP.  This will not commit you to run for a specific position, but helps us gauge interest.  At elections, we will go through the responsibilities of each position in more detail, and make sure that everyone interested in serving is able to participate in some capacity.

If you are interested in serving on the board or as a committee member but are not able to attend elections on Tuesday, contact Ross (audet@stanford.edu) in advance of elections.  Let us know if you have any questions!

More information about the Stanford Optical Society and our activities is available at our website: http://photons.stanford.edu

 

Thanks!

Your 2011-2012 Executive Team:

 

President: Ross Audet (Miller Group)

Vice President: Lana Lau (Moerner Group)

IONS Chair: Robert Chen (Harris Group)

SUPR Chair: Aaswath Raman (Fan Group)

Secretary: Sam Bockenhauer (Moerner Group)

Treasurer: Charlie Rudy (Byer Group)

Webmaster: Patrick Landreman (Brongersma Group)

Membership Chair: Eden Rephaeli (Fan Group)

Membership Committee: Sonny Vo (Harris Group), Peter McMahon (Yamamoto Group)

Outreach Chair: Kristen Boucher (Solgaard Group)

Outreach Committee: Cathy Jan (Solgaard Group), Eden Rephaeli, Peter McMahon (Yamamoto Group)

Speaker Chair: Alireza Marandi (Byer Group)

Speaker Committee: Eden Rephaeli, Gary Shambat (Vuckovic Group), Alok Vasudev (Brongersma Group), Sonny Vo (Harris Group), Chia-Ming Chang (Solgaard Group)

SUPR Committee: Aaswath Raman (Chair), Charlie Rudy, Lana Lau, Robert Chen, Kristen Boucher, Matthew Lew, Sam Bockenhauer, Ross Audet, Alok Vasudev
IONS Conference Committee:  Robert Chen (Chair), Lana Lau, Aaswath Raman, Peter McMahon, Matthew Lew, Charlie Rudy, Sam Bockenhauer, Alok Vasudev, Darin Sleiter, Ross Audet

 

Process Clinic today Canceled

Hi all --

In light of the Labmembers' meeting today at 10, the Process Clinic for
today has been canceled. Please do feel free to contact your favorite
staff person for your processing needs.

Your process staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Fwd: [ee-doctorate] Oral Exam Announcement: Lele Wang

----- Forwarded Message -----
From: "Student Services" <studentservices@ee.stanford.edu>
To: ee-students@lists.stanford.edu
Sent: Tuesday, May 15, 2012 8:54:19 AM
Subject: [ee-doctorate] Oral Exam Announcement: Lele Wang

Lele Wang

Date: 05/22/2012
Time: 10:15 am (refreshment at 10:00am)
Location: Packard 202
Dissertation advisor: James Harris



Abstract:
Vision of patients blinded by retinal degeneration might be restored by bypassing the degenerated photoreceptors and delivering information to the visual system using patterned electrical stimulation of the remaining retinal neurons. In the photovoltaic approach to retinal prosthesis, the images captured by an external camera are projected onto the subretinal implant from video goggles, using pulsed near-IR light. Each pixel in the two-dimensional array contains photodiodes, which photovoltaically convert pulsed near-infrared light into bi-phasic current to stimulate nearby retinal neurons without wired power connections. We developed an integrated-circuit/MEMS process to fabricate a silicon photodiode array for subretinal stimulation. The device thickness is chosen to be 30 um to absorb a significant portion of the incident light while still being thin enough for subretinal implantation. Each pixel contains three diodes connected in series between the active and return electrodes, which confine current near each pixel. Electrodes are sputter coated with iridium oxide to enhance charge injection levels and provide a stable neural interface. Pixels are separated by 5 um-wide trenches to electrically isolate neighboring pixels and to improve nutrient diffusion through the device. For all of the three sizes of pixels fabricated – 280, 140 and 70 um, the reverse-bias dark current is sufficiently low for our application (<100 pA). The turn-on voltages of one, two and three series-connected photodiode structures are approximately 0.6V, 1.2V and 1.8V, respectively. The measured photo-responsivity per diode at 880 nm wavelength is ~0.36 A/W, at zero voltage bias.

The fabrication process of the silicon photodiode array and optoelectronic characterization of the fabricated devices will be presented. The initial electrophysiological results of retinal stimulation in-vitro and in-vivo show that all three sizes of pixels are able to reliably elicit retinal responses at safe near-infrared light irradiances, with good acceptance of the photodiode array in the subretinal space.




--
EE students mailing list
ee-students@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-students
_______________________________________________
ee-doctorate mailing list
ee-doctorate@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-doctorate

Oxford III-V Core Drill

All,

As part of the new etcher installation, a core drilling team will be in
the fab today (Tuesday) around 11am. They will be drilling a single
hole for the Oxford III-V etcher. It is anticipated the process will
take about an hour. The team will do everything possible to minimize
any fab disruptions, but core drilling is still a noisy and wet
process. If you have a sensitive sample, you may want to avoid the area
during the core drilling.

Regards,
SNF Staff

Re: Is Ethylene glycol equivalent to PRS-1000?

No, ethylene glycol is NOT equivalent to PRS1000. PLEASE DO NOT USE
ETHYLENE GLYCOL AS STRIPPER. When in doubt about chemical mixtures,
please check the Wiki, where MSDS's are filed. And as always, make sure
to read the bottles before using them -- don't count on them being
placed in the correct location!

Thanks,

Mary

On 5/13/2012 6:48 PM, Wooshik Jung wrote:
> Dear labmembers,
>
> When I was trying to replace the PRS-1000 bath with a fresh chemical, I've found that bottles of Ethylene glycol is in the bin where PRS-1000 used to be. Is this chemical equivalent to PRS-1000? If not I would have to stop my process.
>
> Thanks,
>
> Wooshik Jung

Is Ethylene glycol equivalent to PRS-1000?

Dear labmembers,

When I was trying to replace the PRS-1000 bath with a fresh chemical, I've found that bottles of Ethylene glycol is in the bin where PRS-1000 used to be. Is this chemical equivalent to PRS-1000? If not I would have to stop my process.

Thanks,

Wooshik Jung

STSetch2 Update

Hi all --

We ask again for your patience... ENI/MKS, the manufacturer of the RF
generator, is sending their local field service engineer out to us on
Monday to take a look at the generator communications problem. We'd
hoped for today, but he asked for a delay in order to confirm some
information. If he is unable to resolve the issue, Elmer has arranged
for STS to send their field service engineer out here on Tuesday. Elmer
has also meanwhile arranged for the purchase of a spare generator. If
the STS engineer is unable to resolve the problem with our existing,
newly rebuilt & calibrated generator, then he will install the new
spare. Our sincere apologies -- documentation and information about
this system, which is a prototype, is scarce. I'm sure it's small
consolation, but we've also had two inquiries in the past two weeks
about our system from two different groups (one university, one big
company) with STS etchers experiencing extended downtime. (That said,
we've also heard good things about STS systems -- though not our model
which had a very limited production run.)

We'd have to admit that this is the same plan in our update from last
Friday, but delayed -- however, faced with the prospect of $31K to
install a new generator, we wanted to give ENI/MKS a few more days.

So, we have a plan with two backups and hope to have the system
functional again by Wednesday. We will update again as things develop.

Thanks for your attention --

Team Etch

Special Seminar - Dr. Sami Hendow, Monday May 14, 6:30PM, GCC (Please RSVP prior to Sunday evening, Pizza will be served)

Special Seminar Presented by NATEA (North America Taiwanese Engineering & Science Association) and the Stanford Optical Society

 

 Micromachining with Nanosecond and Femtosecond Pulsed Lasers

 

Dr. Sami Hendow

 

Date: Monday, May 14, 6:30 PM

Venue: Graduate Community Center (750 Escondido Road, Stanford, CA 94305)

Agenda:

6:30 - 7:00 PM: Registration and Social Networking (Pizza will be served)

7:00 - 8:15 PM: Presentation including Q&A

Fee:

Free for members of NATEA and the Stanford Optical Society with RSVP

$5.00 for non-members with RSVP

$10 for all without RSVP

RSVP: http://goo.gl/dXPht (contact: borchyuan@gmail.com or cachang@stanford.edu)

Please RSVP prior to May 13 (Pizza will be served)

 

Abstract

Laser-material interactions using pulses that are nsec in durations or longer are dominated by thermal time constants. Ultrashort pulses, on the other hand, undergo a much faster photon-electron energy transfer where pulse energy is deposited at a rate much faster than the material's thermal time constant. We will show examples of micromachining of metal, silicon and ceramics using nsec pulses, and outline the effects of change of peak power, pulse energy and pulse width. We will also extend this discussion to oxide formation on the surface, as well as bursting where pulses are broken into short but rapidly deposited pulses. These effects will be contrasted when the micromachining operation is performed using psec and fsec ultrafast pulses.

 

About the speaker      

Sami Hendow is an independent consultant. Recently, he was with Multiwave Photonics as Sr. Director responsible for Engineering and Application Development. Prior to that he was Engineering Program Manager with Spectra-Physics developing solid state and fiber amplified lasers. Before that, he was Sr. Scientist at Northrop Grumman working on the qualification of fiber lasers and power scaling by coherent beam combining of fiber laser arrays. Over the last 25 years, he has developed several products and has published about sixty articles and patents related to lasers and photonics technologies. Sami has a PhD in Optical Sciences from the University of Arizona. He is Chair of 2013 Fiber Lasers Conference, SPIE Photonics West, and member of conference program committees of the SPIE's Laser Applications in Microelectronic and Optoelectronic Manufacturing, and LIA's Laser Microprocessing Conference, ICALEO.

http://photons.stanford.edu

imtec sapphire etching system for SNF small tool upgrade

Dear Labmembers, 

I am interested to know if there is interest in sapphire wet etch. Since sapphire wet etch requires hot temperatures (> 200C), it's currently not allowed to do this process in SNF. 

I would like to propose imtec sapphire etching system for SNF small tool upgrade if there are enough SNF users who are interested in this process. Since this system can be functional with a range of times and temperatures, it can also be used for other chemistries/processes that are compatible with quartz. Gold contaminated nitride wet etch is another example that I can think of beside sapphire wet etch.

Please let me know if you have any questions or want to express your interest in using this equipment. Thank you very much!

Sincerely,

Jae Hyung Lee

Re: New oven in Litho area

Hi Gary
Thanks for setting this up.

Is this oven purging with N2 or just a ambient air oven?

Is there a default set temp for this oven for optical lith resist or
should it be turned off after each use?

Have a nice weekend,

James


On May 11, 2012, at 2:56 PM, Gary J Sosa <gsosa@stanford.edu> wrote:

> Hello labmembers....
>
> The new oven that replaces the old "White Oven" in Litho is
> installed, tested and ready for use. It is a Cascade-TEK TFO-1
> forced air oven and it is in the same place as the old oven. The
> oven is very simple to use and there are operating instructions
> posted on the oven door. Users can set a specific temperature up to
> 250 degrees C, following the posted instructions. Please follow the
> same policies and procedures as the old oven and do not hesitate to
> contact us if you have any question or concerns.
>
> Thanks... The Litho Team

[Reminder] Special Seminar - Prof. Ci-Ling Pan (National Tsing Hua University, Taiwan), Friday May 11, 4:15PM, CISX 101

Special Seminar Presented by the Stanford Optical Society

Recent Progress in Photonic-Network-Compatible Sub-THz-wave wireless links at data rate of 20 Gb/s

 

Prof. Ci-Ling Pan

National Tsing Hua University, Taiwan

Friday, May 11, 4:15 PM, CISX 101 Auditorium

Refreshments at 4PM

 

 

To meet the rapidly growing demand of gigabits wireless access applications, sub-THz or millimeter wave (MMW) carriers in W-band (75-110 GHz) or above are essential for obtaining the necessary broad transmission bandwidth. Thanks to the almost unlimited bandwidth and very low propagation loss in optical fiber, radio-over-fiber (RoF) communication system is now an efficient and cost-effective way to distribute synchronized photonic MMW signals from the central office to multiple base stations. In this talk, we will review our recent work on Photonic Wireless communication Link at 100 GHz or 0.1 THz. Key technologies are photonic MMW sources and photonic MMW transmitters will be described.  Wireless data transmission at a data rate beyond 20-Gb/s via bias modulation of such novel device has been successfully achieved for both downlink and uplink. We have also demonstrated an optical ultra-wide band Impulse-Radio Fiber-to-the-antenna (UWB-IR FTTA) system for in-building and in-home applications, operating from 75 to 110 GHz.

About the speaker

Ci-Ling Pan is Tsing Hua Chair Professor, Chairperson of the Department of Physics and Institute of Astronomy, National Tsing Hua University (NTHU), Hsinchu, Taiwan. He also held joint appointment at the Institute of Photonics Technologies and served as Director of the Photonics Research Center of NTHU. Prof. Pan taught at National Chiao Tung University, Taiwan, 1981-2009. He also held visiting professorship at Osaka University and Chinese University of Hong Kong in 2004 and 2008, respectively. In the past decade, the main foci of Prof. Pan's research activities have been Ultrafast and THz Photonics. Recent research highlights include developments of functional liquid crystal THz photonic devices, femtosoeocnd-laser recrystallization and activation of silicon as well as novel THz generators and detectors. The latter were used in diverse applications such as diagnostics of technologically important materials for photovoltaics, assessing burn trauma and optical-network-compatible W-band (100 GHz or 0.1 THz) wireless communication Link at a data rate beyond 20 Gbit/s. Prof. Pan is a Fellow of APS, IEEE, OSA, and SPIE.

 

http://photons.stanford.edu

New oven in Litho area

Hello labmembers....

The new oven that replaces the old "White Oven" in Litho is installed, tested and ready for use. It is a Cascade-TEK TFO-1 forced air oven and it is in the same place as the old oven. The oven is very simple to use and there are operating instructions posted on the oven door. Users can set a specific temperature up to 250 degrees C, following the posted instructions. Please follow the same policies and procedures as the old oven and do not hesitate to contact us if you have any question or concerns.

Thanks... The Litho Team

EE410 Update 5/11/12 and Probe Station Move

All,

Next week (May 14th) is the final week for the EE410 class in the fab.
The final week is metal etch, hence all the reservations on the P5000.

Beginning the week of May 21st the students will move to the
Micromanipulator probe station. The amount of testing required is very
significant and they will dominate the system for a couple of weeks.
Remember the EE410 class will have priority over all other access to the
probe station.

In preparation for the EE410 class, the micromanipulator will once again
be relocated. On Monday May 14 the system will be moved out of the
office and in to the newly completed nSil lab. There will be a couple
of minor changes associated with the move. For example, the wafer chuck
vacuum will be a small pump which you will need to turn off and on.

Regards,
SNF Staff