Friday, July 29, 2011

Fwd: Fwd: Nanosphere Lithography for the Fabrication of Ultranarrow Graphene Nanoribbons and On-Chip Bandgap Tuning of Graphene - Liu - 2011 - Advanced Materials - Wiley Online Library



-------- Original Message --------
Subject: Fwd: Nanosphere Lithography for the Fabrication of Ultranarrow Graphene Nanoribbons and On-Chip Bandgap Tuning of Graphene - Liu - 2011 - Advanced Materials - Wiley Online Library
Date: Fri, 29 Jul 2011 22:56:13 -0700
From: James W. Conway <jwc@snf.stanford.edu>
Organization: Stanford Nanofabrication Facility
To: Mehdi Javanmard <mehdij@stanford.edu>


Take a look at this and come see me when I return to Stanford after Thursday next week.  I am away on business to GaTech...

Hongjie Dai  Xinran Wang and Lu Li (?) also published in 2008 see the references in the attached paper...

James Conway
Ebeam Technology Group


-------- Original Message --------
Subject: Nanosphere Lithography for the Fabrication of Ultranarrow Graphene Nanoribbons and On-Chip Bandgap Tuning of Graphene - Liu - 2011 - Advanced Materials - Wiley Online Library
Date: Fri, 29 Jul 2011 07:45:59 -0700
From: ToeCutter <toecutter4ranger@gmail.com>
To: James W. Conway <jwc@snf.stanford.edu>


http://onlinelibrary.wiley.com/doi/10.1002/adma.201003847/abstract 

Re: Problem p5000etch SNF 2011-07-28 14:43:51: CHF3 is unavailable

back on line

Thursday, July 28, 2011

Problem p5000etch SNF 2011-07-28 14:43:51: CHF3 is unavailable

New cylinder should be here by noon tomorrow.

question about how to remove dust from Si wafer surface

Dear labmembers,

Are there anyone who knows how to remove dust on Si wafer that is not blown out with air gun?
Is there any way I can wipe dust out if possible?

Thanks,

Insun

Building access during construction ....

SNF Lab Members and Allen Building Occupants:

While the construction team working on the Bio/Chem-E building will
likely send out an announcement later this week, I wanted to send you
all as much advance warning as possible:

Starting on or about August 5, the construction fence along Via Pueblo
will be moved very close to the breezeway along that side of the
building. When that happens, you will not be able to get to the parking
structure by exiting the door that faces the former Ginzton Building.
You can still get out that door, but you will have to walk to the left
towards the Packard Building and will no longer be able to turn right as
you exit from that door to get to Via Ortega. The fence will likely be
in that location for approximately the next year.

Thanks,

John

Wednesday, July 27, 2011

More Stuff Found in the Lab...

Dear Lab Members,

 

Once again, a concerned lab member found a USB stick on the floor of the AFM Room.  If you think you have misplaced yours please come back and expect to describe it before you take ownership.  I’m in cubicle # 41 next to the doors that faces the construction site.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Tuesday, July 26, 2011

Do you have a n-type Si wafer with around 0.1~1 ohm.cm resistivity?

Hi, labmembers

I'm trying to buy some n-type wafers with lower resistivity than those from SNF stock room.
Before I buy one batch, I wanna test some properties with my structure.

Is there anyone who has n-type wafers with resistivity around 0.1~1ohm.cm?

Thanks,
Sangmoo

Monday, July 25, 2011

nanophere lithography

Hi All,
I was wondering if anybody on this list has any experience with nanosphere lithography.  If so, please let me know.  I have a couple of brief questions I'd like to ask.
thanks,
mehdi

--
Mehdi Javanmard, PhD
Engineering Research Associate
Stanford Genome Technology Center
(510)364-5147

Sunday, July 24, 2011

PhD Oral Examination: (Mon. July 25, 1:00pm, CIS-X 101) Elizabeth Hager-Barnard

University PhD Dissertation Defense

New AFM Methods for Characterizing Drug Delivery Agents

 

Elizabeth A. Hager-Barnard

Department of Materials Science & Engineering

Advisor: Prof. Nicholas A. Melosh

 

Monday July 25th 2011

1:00 pm

(Refreshments at 12:45 pm)

 

Location: Paul G. Allen Auditorium (CIS-X 101)

http://cis.stanford.edu/directions/

 

Abstract: 

Understanding how cell-penetrating peptides (CPPs) can pass through cell membranes is critical for designing drug delivery agents. While CPPs like HIV-TAT have been widely studied, their ability to penetrate membranes directly, without active transport, is still a matter of considerable debate.  New direct contact methods that report the interactions during translocation are needed to end this debate.

Here we show that atomic force microscopy (AFM) is an excellent direct contact method for characterizing CPPs.  By pushing CPP-functionalized AFM probes through lipid bilayers we directly measure CPP-lipid interactions during the actual membrane translocation event.  Furthermore with our custom AFM probes it is possible to track the CPP location inside the bilayer over time.  We exploit this ability in a new method, Penetration Pathway Analysis (PPA), that creates probability maps that illustrate the paths CPP take as they penetrate through lipid bilayers.  In addition to tracking CPP position, AFM results can also characterize the mechanics and energetics of bilayer penetration through a method called dynamic force spectroscopy (DFS).  

Our results show that PPA combined with DFS is an excellent method for studying drug delivery agents like CPPs.  For example, PPA combined with DFS can differentiate between CPPs that can directly penetrate bilayers and those that cannot.  By using this new method it will be possible to directly characterize, with microsecond resolution, the dynamics and energetics of the interactions between lipid bilayers and a wide range of peptides and molecular species.

Friday, July 22, 2011

Found Jewelry in Computer Room 151

Dear Labmembers,

 

Another concerned lab member (we have lots of them) found some jewelry in the Computer room 151.  If you have misplaced your jewelry item please come to my cubicle #41 and be prepared to describe it before you can claim it.

 

Thank you,

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Thursday, July 21, 2011

FW: Construction updates

Current Construction updates...

Maureen

Maureen Baran
Stanford Nanofabrication Facility
Lab Services Administrator
mbaran@stanford.edu
650-725-3664

-----Original Message-----
From: Marjorie Alfs [mailto:mmalfs@cis.stanford.edu]
Sent: Thursday, July 21, 2011 9:41 AM
To: cis-building@cis.stanford.edu
Subject: Construction updates


Marjorie M. Alfs, Programs and Administration Manager Paul G. Allen Building
Center for Integrated Systems, Room 104 420 Via Palou Mall Stanford, CA
94305
MC: 4070
Phone: (650) 725-3617
FAX: (650) 725-0991
mmalfs@cis.stanford.edu

RCA Clean: Changes to the prefurnace clean

Dear Labmembers:

We would like you to be aware of upcoming changes in the standard pre-furnace clean procedures.  Instead of the 4:1 sulfuric-peroxide/HCl-SC2/HF dip sequence that has been standard at SNF for many years, the plan is to change to a standard RCA SC1/SC2/HF dip clean at 50C.  Experiments are underway to validate procedures.  The scheduled date for implementation is Aug.2. 

The reasons for this change are: 

  1. Safety – SC1 runs at a lower temperature and much lower concentration than piranha.
  2. Better quality clean –Over 40 years of research and practice have gone into silicon wafer cleans; but best known practices remain based on the RCA mix.  In fact, the RCA clean is being routinely used by some labmembers now. 
  3. Requirements of new research – Sulfur from the standard clean has long been known to be contaminant in our lab appearing even in furnaces.   With more researchers in nanowires, organic transistors, and biodevices, sulfur contamination is becoming a serious concern. 
  4. Lower chemical costs – We can expect to save over $20K/year at the usage rates of 2009-2010.  And this allows us to reduce our chemical inventories in preparation for the lab renovation.

The plan:

1.       One hot pot at wbsilicide will be converted over to the new RCA SC-1 clean, effective Friday, July 22.  Users for the last 6 months have been notified. 

2.      The station at wbdiff will be converted to the new RCA clean on August 2.  Training materials will be updated and and a “white paper” describing the rationale and implementation will be posted for labmembers.

Several EE faculty and senior staff fully endorse this change; key AdCom faculty have been notified.  No change is completely without risk, but this is believed to be minute.

Please do let us know if you have any concerns.

Thanks for your attention,

Your SNF Staff

Wednesday, July 20, 2011

Found Cell Phone by the building doors that face the Construction Site

Dear All,

 

A concerned citizen of the building found a cell phone by the side doors that face the construction site / near my cubicle #41.  If you are missing your phone please come and claim it.

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Si surface smoothing

Good morning, labmembers

I'm planning to do some wet etching to smooth out the Si surface after RIE etching.
Si is a single-crystalline wafer.
Is there anyone who has experiences on that?
Please let me know if you have any information.

Thanks.

Tuesday, July 19, 2011

Reminder: Save a life -- Take CPR!

Hi all --

There are still some spaces left, especially for Monday's session.

M

********************************
Dear labmembers --

Did you know that:
- you don't have to have a heart condition: cardiac arrest can occur as
a result of accident (fall, allergic reaction, electric shock)?
- only about 1/4 of those suffering unexpected cardiac arrest receive
CPR before reaching the hospital?
- receiving CPR within the first few minutes of an attack can
dramatically increase survival?

...and that the SNF is in the only structure on Stanford campus with two
AED units?

We invite you to learn about AED's, CPR and First Aid in one of two
classes being given by CPRescue. The classes are 8 am-3 pm on Thursday,
July 21 and Monday, July 25. Space is limited. Classes are free to
labmembers with Stanford ID. Non-Stanford labmembers are welcome, but
will have to pay the class fee (about $60).

To register, please send me an email.

Mary


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Monday, July 18, 2011

please welcome our new Operations Director, John Bumgarner!

SNF Labmembers and Staff,

John Bumgarner started today as the Operations Director of the SNF. We
are looking forward to his leadership as the SNF goes through a major
overhaul and upgrade over the next year -- and beyond. His experience
in start-ups, at Intel, in starting and running a university fab, and
most recently as Director of Microfabrication at SRI are going to be a
great foundation for his making the SNF a more effective research lab.

Please join me in welcoming John to the SNF! (His Stanford email isn't
set up yet, so he's not cc'ed.)

Thanks,
Roger

* A couple of overdue updates:

The NSF ARI-R2 + Stanford-funded renovation project is in the design
phase, with the general contractor and critical subs selected a couple
of weeks ago. Helena Cipres-Palacin is the new project manager. A
preliminary meeting was held last Wednesday in San Jose between the
project team (with contractors) and the Santa Clara County fire,
building, and health & safety officials, to present the plan for a
six-week long shut down from Dec. 15, 2011 - Jan. 31, 2012. This
meeting wasn't to ask for formal approval, but the general strategy was
given a verbal OK. Unfortunately, we will not know for sure whether the
shutdown will happen as planned until the permits are granted by the
County. I am assuming that all or a major part of the work (the new
TGO, power, gas distribution, new process chilled water, replacement of
the HEPA filters, ...) will occur during this period.

Four new dry etchers are being ordered this week or next, with
contributions for many faculty, dept. chairs, and deans here ... Plasma
Therm silicon DRIE, dielectric DRIE, and metal ICP etcher and an Oxford
III-V etcher. Grace Wu has spent a huge amount of time pushing this
large and complex order through the accounting and purchasing systems.
These etchers will be brought into the lab during the shutdown and
installed early in 2012. Needless to say, these new tools will have a
major impact on our dry etch capabilities.

Sunday, July 17, 2011

spin-on oxides

Hello everyone,
I'm Max Shulaker, a member in the SNF.
I was wondering if anyone is working with spin-on oxides, and wouldn't mind meeting with me briefly to talk some things over?  If you have experience/ are working with thicker films (10-50um), or are working with photosensitive BCB, I would be especially interested in hearing from you....
Thanks,
Max

Learn to save someone's life!

Dear labmembers --

Did you know that:
- you don't have to have a heart condition: cardiac arrest can occur as
a result of accident (fall, allergic reaction, electric shock)?
- only about 1/4 of those suffering unexpected cardiac arrest receive
CPR before reaching the hospital?
- receiving CPR within the first few minutes of an attack can
dramatically increase survival?

...and that the SNF is in the only structure on Stanford campus with two
AED units?

We invite you to learn about AED's, CPR and First Aid in one of two
classes being given by CPRescue. The classes are 8 am-3 pm on Thursday,
July 21 and Monday, July 25. Space is limited. Classes are free to
labmembers with Stanford ID. Non-Stanford labmembers are welcome, but
will have to pay the class fee (about $60).

To register, please send me an email.

Mary

Friday, July 15, 2011

PhD Oral Examination - New AFM Methods for Characterizing Drug Delivery Agents (Mon. July 25, 1:00pm, CIS-X 101)

University PhD Dissertation Defense

New AFM Methods for Characterizing Drug Delivery Agents

 

Elizabeth A. Hager-Barnard

Department of Materials Science & Engineering

Advisor: Prof. Nicholas A. Melosh

 

Monday July 25th 2011

1:00 pm

(Refreshments at 12:45 pm)

 

Location: Paul G. Allen Auditorium (CIS-X 101)

http://cis.stanford.edu/directions/

 

Abstract: 

Understanding how cell-penetrating peptides (CPPs) can pass through cell membranes is critical for designing drug delivery agents. While CPPs like HIV-TAT have been widely studied, their ability to penetrate membranes directly, without active transport, is still a matter of considerable debate.  New direct contact methods that report the interactions during translocation are needed to end this debate.

Here we show that atomic force microscopy (AFM) is an excellent direct contact method for characterizing CPPs.  By pushing CPP-functionalized AFM probes through lipid bilayers we directly measure CPP-lipid interactions during the actual membrane translocation event.  Furthermore with our custom AFM probes it is possible to track the CPP location inside the bilayer over time.  We exploit this ability in a new method, Penetration Pathway Analysis (PPA), that creates probability maps that illustrate the paths CPP take as they penetrate through lipid bilayers.  In addition to tracking CPP position, AFM results can also characterize the mechanics and energetics of bilayer penetration through a method called dynamic force spectroscopy (DFS).  

Our results show that PPA combined with DFS is an excellent method for studying drug delivery agents like CPPs.  For example, PPA combined with DFS can differentiate between CPPs that can directly penetrate bilayers and those that cannot.  By using this new method it will be possible to directly characterize, with microsecond resolution, the dynamics and energetics of the interactions between lipid bilayers and a wide range of peptides and molecular species.

Seeco Etchant

Dear Lab Members,
Does any one have Seeco Etchant.
I only need very small amount, just for one wafer.
Thank you
Pnataraj

Sent from my iPhone

Thursday, July 14, 2011

Re: Odor in the lab ... update.

SNF Lab Members and Allen building occupants:

After further investigation, it now appears that the source of the odor
in the labs, offices, and outside the building today is likely do to an
unusual algae bloom in the water that is used for irrigation of the
campus grounds and has nothing to do with the construction activities.
While somewhat unpleasant, this odor is not believed to be hazardous.

We are working with the appropriate campus experts to at least try to
get better notification when there is significant odor due to this
system. We are also working to learn more about the detailed irrigation
schedule for nearby locations to help us better correlate unknown odors
with nearby irrigation activities.

For folks working either in SNF or in the private labs in this building,
we encourage you to continue to report unusual smells to appropriate
staff members and not to simply assume that odors in the lab are the
result of "stinky irrigation water".

Thanks,

John

Looking for my cleanroom notebook ('insun' on the front cover page)

Dear labmembers, 

I am looking for my cleanroom notebook, and my name 'insun' is written on the first cover page of the notebook. 
Has anyone seen my notebook?

Thanks, 

Insun

Electronic Device Found in the Innotec Area of the Lab

Dear Lab Members,

 

A concerned lab member found an electronic device in the Innotec area of the lab.  If you think you have misplaced yours please come see me.  Also, be prepared to describe it when you come by my cubicle.

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Odor in the lab

Dear labmembers --

We've been told that construction work in the old Ginzton site has uncovered a particularly unpleasant, but not harmful, odor. Please be aware of a sewage type odor now making its way into the lab. We will follow up with the construction team as to how long this will last.

Your SNF Staff

Wednesday, July 13, 2011

Reminder: Venture Clinic Today at 4 pm

Dear labmembers --

Another Venture Clinic for anyone interested in learning about the
venture business. Gavin McCraley from Morrison& Foerster and
Shahin Farschi from Lux Capital will be on hand to talk about the
business and answer your questions.

The Venture clinic is today, Wednesday, 7/13 at 4 pm in the Allen 101
conference room and open to all.

Contact info for the discussion leaders are:

Shahin Farshchi, Ph.D.

http://www.luxcapital.com <http://www.luxcapital.com/>

C: 925.323.2784


and

Gavin McCraley
Morrison& Foerster LLP
Direct: 650-813-4105
gmccraley@mofo.com


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Tuesday, July 12, 2011

FW: BioE+ChemE Construction Update - Week of July 11th


Dear Labmembers,

Attached are some construction updates for the Week of July 11th.

Maureen

Maureen Baran
Stanford Nanofabrication Facility
Lab Services Administrator
mbaran@stanford.edu
650-725-3664

-----Original Message-----
From: Marjorie Alfs [mailto:mmalfs@cis.stanford.edu]
Sent: Friday, July 08, 2011 1:26 PM
To: cis-building@cis.stanford.edu
Subject: BioE+ChemE Construction Update - Week of July 11th


Marjorie M. Alfs, Programs and Administration Manager Paul G. Allen Building
Center for Integrated Systems, Room 104 420 Via Palou Mall Stanford, CA
94305
MC: 4070
Phone: (650) 725-3617
FAX: (650) 725-0991
mmalfs@cis.stanford.edu

Friday, July 8, 2011

mask with interdigitated-fingers pattern

Hi lab members,

I'm wondering if you have a mask with interdigitated-fingers pattern that I can borrow for a quick processing experiment. The dimensions of the pattern are not too critical for me.

Thank you for your help in advance!

Regards,

Alvin

Comment p5000etch SNF 2011-07-08 10:09:21: Checked Ch.C condition

Vented chamber C to verify that the chamber remained clean after the user who ran the 2000 sec etches ran a Chamber Clean after each wafer. Chamber C looks clean.

Wednesday, July 6, 2011

Re: Problem p5000etch SNF 2011-07-05 13:40:30: Particles on wafer

The chamber was heavily coated with a flacky polymer film. Wet cleaned the chamber and ran the chamber clean recipe 4 times.
The heavy polymer film most likely came from the wafers of the user who runs a 2000 second etch. Recommended that he ran a chamber clean after each wafer. I will re-open the chamber on Friday to check the chamber condition.

Tuesday, July 5, 2011

Problem p5000etch SNF 2011-07-05 13:40:30: Particles on wafer

Ran 1 wafer with CH.C POLY ETCH (10 s BT/27 s ME/0 s OE). Wafer was unloaded with numerous particles on it.

Re: Problem p5000etch SNF 2011-07-04 14:44:26: p5000

Mike and I added 14/6 fomblin oil and ramp up turbo...

Re: Problem p5000etch SNF 2011-07-04 00:01:36: Cannot pump down load lock

Pumped down load lo0ck w/out problem, system has to be
enable ..

Monday, July 4, 2011

Problem p5000etch SNF 2011-07-04 14:44:26: p5000

I shutdown the tool the same as I always do after etching ASML target wafers. I don't understand why it was left vented or why the chamber C turbo went off. I'll talk to Nancy about this tomorrow.

Problem p5000etch SNF 2011-07-04 00:01:36: Cannot pump down load lock

Found Chamber C turbo off and left vented. I was trying to run recipe in chamber A but load lock could not be pumped down to base pressure.

Friday, July 1, 2011

Re: silicon through etch using STSetch

hey ben,
i just did this last week with my REU.  we do not have another wafer scheduled for through wafer etch, but i'm going to be in the fab heavily starting next week and can help you if a better offer for you does not come along.  are you trained on the stsetch already?  if so we can work with your test wafer or we can practice/shadow with the pattern kelly made for her project.
j

On Fri, Jul 1, 2011 at 12:09 PM, Benjamin Tee <benjamin.tee@stanford.edu> wrote:
Dear Experienced Labmembers,

Happy July 4th!

I would like to etch through standard silicon wafers of 500um thick, and was hoping to learn from someone who is doing such a process on a regular basis to shadow. If anyone is willing to allow me to shadow, please drop me an email. 

Many thanks!

Ben

--
Benjamin Tee
Ph.D Candidate, Electrical Engineering
Stanford University
Cell: 650-704-4300
M.S (EE) Stanford University '07
B.S.E (EE) University of Michigan - Ann Arbor '06
Bao Research Group - http://baogroup.stanford.edu

Address:
381 North South Mall Rm 209
Stanford CA 94305
USA


silicon through etch using STSetch

Dear Experienced Labmembers,

Happy July 4th!

I would like to etch through standard silicon wafers of 500um thick, and was hoping to learn from someone who is doing such a process on a regular basis to shadow. If anyone is willing to allow me to shadow, please drop me an email. 

Many thanks!

Ben

--
Benjamin Tee
Ph.D Candidate, Electrical Engineering
Stanford University
Cell: 650-704-4300
M.S (EE) Stanford University '07
B.S.E (EE) University of Michigan - Ann Arbor '06
Bao Research Group - http://baogroup.stanford.edu

Address:
381 North South Mall Rm 209
Stanford CA 94305
USA