Problem p5000etch SNF 2010-03-25 13:57:03: He leak update

He leak error on first wafer, no error on remaining 11 wafers.
It appears the helium leak rate is not calculated until 10sec into the etch step where the valve is opened. If there is a leak problem the error happens and stops the etch at this point. It would be better if the leak rate was checked prior to etch step, so error would not happen after 10sec of the etch step.