Thursday, April 30, 2009
Problem p5000etch SNF 2009-04-30 09:10:11: CHA down
Wednesday, April 29, 2009
Comment p5000etch SNF 2009-04-29 21:20:15: Heat exchanger problem
sample. Still a problem with heat exchanger shutting off, what I
also noticed both chill valve for wall and cathode (cha a) are not
working. The wall chill valve is always on and the cathode chill
valve will not open. still troubleshooting...
Comment p5000etch SNF 2009-04-29 20:13:57: Problem resolved
Comment p5000etch SNF 2009-04-29 18:26:43: Heat exchanger problem
Re: Problem p5000etch SNF 2009-04-28 17:18:03: Chamber C needs wet clean
Coral is up!
Coral is now completely functional. If you are using equipment, enable
NOW. If it is enabled from someone who could not disable yesterday,
enable OVER them. Equipment not in use will be disabled shortly.
The problem was traced to a damaged network fiberoptic which has been
replaced.
Thanks for your patience --
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Tuesday, April 28, 2009
Problem p5000etch SNF 2009-04-28 17:18:03: Chamber C needs wet clean
Coral Issues
Although Coral is largely functional, the enable/disable feature is not
working on Coral right now (network problem.) So, until the problem is
resolved, all equipment has been left the enabled state (the Coral light
should read "ON." Labmembers do not need to enable equipment to use it
tonight. Equipment will be left in the ON state at least until tomorrow.
Before using equipment: Check the status (Red/yellow/green) on Coral
and read any problem or shutdown reports. Do not use equipment that is
in shutdown.
Reservations: Please respect reservations made. The reservations
feature on Coral is still functional, so you may make and delete
reservations as needed.
If you have enabled equipment already: Equipment cannot be disabled
until the problem is fixed. So if you have equipment enabled in your
name, please email staff wit and we will adjust the enable time/charges
accordingly.
Shutdowns/Problems/Comments: These features are still working. Please
use this to communicate equipment status to others.
We apologize for the inconvenience --
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Monday, April 27, 2009
EE17N class visiting SNF monday afternoon (4.27) 3-5pm
just a quick note that I will taking my and prof. pease's EE17N class through a tour of the SNF today (4.27) in the afternoon (roughly 3-5pm). we will be a somewhat large contingent (about a dozen) so please be patient with the herd. they are an eager and engaged group of freshmen, so i'm hoping to give them a good show of the snf.
thanks,
j
Sunday, April 26, 2009
Comment p5000etch SNF 2009-04-26 14:41:37: Black circle on my dummy wafer
Thursday, April 23, 2009
[Stanford Nano Society Seminar] Tomorrow 12pm - 1pm, McCullough 115, Transparent Conductors: the Current and the Future
Transparent Conductors: the Current and the Future
Speaker - Jung-Yong Lee (Prof. Peter Peumans group)
http://peumans-pc.stanford.edu/
Location: McCullough 115
Time: 12:00 noon - 1:00pm
Date: Apr. 24 (Friday) – Tomorrow!
Abstract:
Transparent conductive electrodes are important components of thin-film solar cells, light-emitting diodes, and many display technologies. Doped metal oxides are commonly used, but their optical transparency is limited for films with a low sheet resistance. Furthermore, they are prone to cracking when deposited on flexible substrates, are costly, and require a high-temperature step for the best performance. We demonstrate solution-processed transparent electrodes consisting of random meshes of metal nanowires that exhibit an optical transparency equivalent to or better than that of metal-oxide thin films for the same sheet resistance. Organic solar cells deposited on these electrodes show a performance equivalent to that of devices based on a conventional metal-oxide transparent electrode.
For more information please visit http://nanosociety.stanford.edu
-------------------------
Pizzas would be served!
--------------------------
All are welcome !
--
Gaurav Thareja
Ph.D candidate, Nishi group
Electrical Engineering
Stanford University
420 Via Palou Mall, CISX 128
Stanford, CA 94305
Tel: 650-704-1029
Email: gthareja@stanford.edu
Ice Cream Social - 1:45 pm TODAY!
Please join us as we say "goodbye" to the LN2 dewars at metalica. We
will celebrate with a much more enjoyable way to use LN2: making ice
cream!!!
This is all thanks to Jim Haydon's excellent efforts in the converting
to dry pumps -- this project not only saves energy, it cost SNF nearly
nothing (paid for by Stanford's energy savings program), but should also
improve reliability and turnaround on repairs. Thanks Jim!
The fun starts at 1:45 pm today (Thursday) in the area outside the
gowning room.
Hope to see you there!
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Wednesday, April 22, 2009
Reminder: Masaharu Kobayashi's Ph.D oral defense, seminar
Advisor: Prof. Yoshio Nishi in Department of Electrical Engineering
Prof.. Krishna Saraswat in Department of Electrical Engineering
Date: Thrusday, April 23th, 2009
Time: 1:00pm
Location: CISX Auditorium
Abstract
As silicon MOSFETs are aggressively scaled down to sub-100nm regime, the performance improvement becomes more challenging only by geometrical scaling because of parasitic resistance/capacitance and leakage/power consumption constraint. Mobility enhancement enables performance improvement additively to other scaling parameters so that high mobility channel material is regarded as a promising performance booster. Ge is one of the candidates because of its high electron/hole mobility, process compatibility with Si LSI technology and low temperature process due to low melting point. However, there are several device/process issues to be solved for high performance CMOS with Ge. In this seminar, I will report three achievements contributing to Ge MOS technologies: (1) low interface states GeO2 formed on Ge by radical oxidation for reliable gate stack, (2) Fermi level depinning and contact resistance reduction at metal/Ge contact and (3) uniaxial stress engineering for electron mobility enhancement in Ge NFETs.
(1) A number of surface passivation methods have been used for Ge gate stack, however, none of them provides as low interface state density as Si. GeO2 has now been reconsidered as an interfacial layer for high-k/Ge gate stack. In this work, novel radical oxidation method was introduced for interfacial GeO2 growth, which enabled low interface state density in high-k/GeO2/Ge gate stack, 1x1011cm-2V-1.
(2) Low contact resistance in metal/n-Ge contact is challenging because Fermi level of metal is strongly pinned near the valence band edge of Ge. Preventing wave function penetration into Ge and reducing the effect of metal induced gap state of Ge are the key to the Fermi level depinning. In this work, we demonstrated Schottky barrier height modulation and contact resistance reduction by inserting thin interfacial layer between the metal and the Ge.
(3) According to the bulk mobility, electron mobility enhancement in Ge is only 2x higher over Si, and has to be boosted by stress. In this work, we systematically applied stress to different channel directions and achieved electron mobility enhancment in Ge NFETs. Theoretical simulation and experiments clarified the physical mechanism of electron mobility enhancement by uniaxial stress.
Masaharu Kobayashi
Ph.D candidate
Department of Electrical Engineering
Stanford Unversity
TEL:650-521-4260
E-mail:masaharu@stanford.edu
Monday, April 20, 2009
A History of a Nanoscale Object
Ekin
From: Rebecca Slayton <rslayton@stanford.edu>
Date: Mon, Apr 20, 2009 at 9:56 AM
Subject: Friday (4/24): Michael Lynch, "Test Objects and Other Epistemic Things: A History of a Nanoscale Object"
To: sts-seminar@lists.stanford.edu
Speaker: Michael Lynch, Cornell University
Title: "Test Objects and Other Epistemic Things: A History of a Nanoscale Object"
When: Friday, April 24, 12:00-1:30 PM
Where: Encina Hall, 2nd Floor, East Conference Room, E207 http://campus-map.stanford.edu/index.cfm?ID=06-030
Discussant: Karin Knorr Cetina, Universität Konstanz and University of Chicago
Abstract: This paper follows the history of an object. The purpose of doing so is to come to terms with a distinctive kind of research object, as well as to chronicle a significant line of research and technology-development associated with the broader nanoscience/nanotechnology movement. We are calling this kind of object a 'test object': one of a family of epistemic things that make up the material culture of laboratory science. Depending upon the case, a test object can have variable shadings of practical, mathematical, and epistemic significance. Clear cases of test object have highly regular and reproducible visible properties that can be used for testing instruments and training novices. The test object featured in this paper is the Silicon (111) 7x7, a particular surface configuration (or, as it is often called, a 'reconstruction') of silicon atoms. Research on this object over a period of several decades was closely bound up with the development of novel instruments for visualizing atomic structures. Despite having no obvious commercial value, the Si(111) 7x7 was a focal object for the formation of research networks in industry and academia. It also exhibited a complex structure that offered a sustained challenge for structural theorists. The study follows shifts in the epistemic status of the Si(111) 7x7, and uses it to re-examine familiar conceptions of representation and observation in the history, philosophy, and social study of science.
Michael Lynch is a Professor in the Department of Science & Technology Studies at Cornell University. His research is on discourse, visual representation, and practical action in research laboratories, clinical settings, and legal tribunals. His most recent book, Truth Machine: The Contentious History of DNA Fingerprinting (University of Chicago Press, co-authored with Simon Cole, Ruth McNally & Kathleen Jordan) examines the interplay between law and science in criminal cases involving DNA evidence. He is Editor of the journal Social Studies of Science, and current President of the Society for Social Studies of Science (4S).
Karin Knorr Cetina is professor of the Theory of Sociology at the Universität Konstanz, and the George Wells Beadle Distinguished Service professor of Anthropology, Sociology and of the Social Sciences at the University of Chicago. She specializes in economic anthropology/sociology, the anthropology of science, knowledge and technology, globalization, contemporary social theory, and qualitative methods. She is author of numerous books, chapters, and articles, including Epistemic Cultures: How the Sciences Make Knowledge (1999). She recently co-edited The Sociology of Financial Markets (2004), with Alex Preda. Currently, she focuses on the study of global microstructures and social studies of finance.
This talk is sponsored by Stanford's Science, Technology, and Society Program. For a full schedule see http://www.stanford.edu/group/STS/SSSTS%20Spring%2009.pdf
--++**==--++**==--++**==--++**==--++**==--++**==--++**==
sts-seminar mailing list
sts-seminar@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/sts-seminar
Process Clinic today (Monday) 2-4 pm
Another Process Clinic, featuring Keith Best from ASML and your very own
SNF staff, on hand to help you brainstorm solutions to process issues
and review SpecMat requests. We'll be in the cubicle area outside
Maureen's office from 2-4 pm today.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Saturday, April 18, 2009
Rapid Thermal Anneals (RTA) company
Please let me know of any company that can do RTA (Temp window of 500C - 1100C)
thanks
~gaurav
--
Gaurav Thareja
Ph.D candidate, Nishi group
Electrical Engineering
Stanford University
420 Via Palou Mall, CISX 128
Stanford, CA 94305
Tel: 650-704-1029
Email: gthareja@stanford.edu
TEM - outside stanford
Please let me know, if there is any company available for TEM.
Maybe Evans Analytical does it, but they are very expensive for their characterization.
warm regards
~gaurav
--
Gaurav Thareja
Ph.D candidate, Nishi group
Electrical Engineering
Stanford University
420 Via Palou Mall, CISX 128
Stanford, CA 94305
Tel: 650-704-1029
Email: gthareja@stanford.edu
Faculty recruitment meeting of NCTU IEO
Hello,
I am forwarding the information of a faculty recruitment meeting held at the Graduate Community Center (GCC) on Apr. 24th(Friday) by the College of Photonics of National Chiao Tung University (NCTU) in Taiwan.
Best regards,
Yao-Te
From: PO-TSUN LIU [mailto:ptliu7@gmail.com]
Sent: Friday, April 17, 2009 11:40 PM
To: ytcheng@stanford.edu
Subject: Details for Faculty recruitment meeting of NCTU IEO
To Whom It May Concern,
The College of Photonics of National Chiao Tung University (NCTU) at Taiwan will hold an open house at Stanford University for the faculty recruitment on April 24th (Fri), 2009. You are sincerely invited to attend this meeting and encouraged to submit your resume, becoming the faculty candidate of NCTU. Some relevant information for this meeting is provided as followed.
Time and Date :
Am 11:00 ~ PM. 1:00, April 24 (Fri), 2009
Site Location:
Nairobi Room 213, GRADUATE COMMUNITY CENTER, 750 Escondido Road, Stanford, CA 94305
To estimate the total number of attendants for better preparation, those who are planned to show up are strongly encouraged sending an e-mail to Prof. Po-Tsun Liu (ptliu@mail.nctu.edu.tw) before April 20, 2009.
Thanks very much for your kind cooperation and we are looking forward to your enthusiastic participation.
Sincerely yours,
*************************************************************
Dr. Po-Tsun Liu,
Visiting Professor,
Department of Electrical Engineering, Stanford University, CA94305, USA.
Associate Professor,
Dept. of Photonics and Display Institute, National Chiao Tung University,
Rm. 412, CPT Bldg.,1001 Ta Hsueh Rd., Hsinchu 30010, Taiwan
Tel: 886-3-5712121 ext. 52994, FAX: 886-3-5735601
e-mail: ptliu@mail.nctu.edu.tw
http://www.di.nctu.edu.tw/ch/people/ADDTSPL/index.html
*************************************************************
Friday, April 17, 2009
Problem p5000etch SNF 2009-04-17 16:20:24: Watch your HBr flows
Re: Problem p5000etch SNF 2009-04-16 17:32:37: No HBr
Thursday, April 16, 2009
Missing North Face Jacket
I came out of the lab today around 6pm and noticed that my dark "North Face" jacket was missing from the bench where I left it.
Biggest problem is my keys were inside the jacket, so I'm stuck at SNF and can't drive home!
If somebody took this jacket by accident (it looks like all the others), please return the jacket to the bench where it once was. I'm stuck in the lab until it's found with my keys!
If anybody has any information about this, please call my cell phone: 805-440-8903
A.M. Fitzgerald & Associates, LLC
655 Skyway Suite 118
San Carlos, CA 94070
p: 650-592-6100 x 104
f: 650-592-6111
bmh@amfitzgerald.com
Problem p5000etch SNF 2009-04-16 17:32:37: No HBr
Biotech 101 Seminar: All you need to know about the healthcare and biotechnology industries (TOMORROW 5:30pm)
What: Biotech 101: All you need to know about the healthcare and biotechnology industries
When: Friday April 17, 2009, 5:30pm
Where: Clark S360 ( map )
-Roozbeh
----- Forwarded Message -----
From: "Arezou Keshavarz" <arezou@stanford.edu>
To: undisclosed-recipients:;
Sent: Thursday, April 16, 2009 11:13:06 AM GMT -08:00 US/Canada Pacific
Subject: [psa-members] (TOMORROW 5:30pm) Biotech 101: All you need to know about the healthcare and biotechnology industries
Dear all,
Do you want to know more about the latest trends in the biotechnology industry? Then please join us in a lecture that covers all you have ever wanted to know about biotechnology, but were afraid to ask! We bring together three successful entrepreneurs in a panel discussion. The panelists are:
- Mitchell Seyedin , Ph.D., President and CEO of ISTO Technologies (Regenerative Medicine)
- Hossein Fakhrai-Rad , Ph.D., President and Founder of Genophen Inc . (Bioinformatics)
- Kamran Hosseini , M.D./Ph.D., VP and Chief Medical Officer of Insite Vision Inc. (Pharmaceutical)
So mark your calendars:
What: Biotech 101: All you need to know about the healthcare and biotechnology industries
When: Friday April 17, 2009, 5:30pm
Where: Clark S360 ( map )
Hope to see you there!
Arezou Keshavarz
on behalf of the PSA-BA board
http://psa.stanford.edu/ba
--++**==--++**==--++**==--++**==--++**==--++**==--++**==--++**==
psa-members mailing list
psa-members@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/psa-members
--++**==--++**==--++**==--++**==--++**==--++**==--++**==--++**==
psa-affiliates mailing list
psa-affiliates@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/psa-affiliates
Masaharu Kobayashi's Ph.D oral defense, seminar
Advisor: Prof. Yoshio Nishi in Department of Electrical Engineering
Prof.. Krishna Saraswat in Department of Electrical Engineering
Time: 1:00pm
Location: CISX Auditorium
As silicon MOSFETs are aggressively scaled down to sub-100nm regime, the performance improvement becomes more challenging only by geometrical scaling because of parasitic resistance/capacitance and leakage/power consumption constraint. Mobility enhancement enables performance improvement additively to other scaling parameters so that high mobility channel material is regarded as a promising performance booster. Ge is one of the candidates because of its high electron/hole mobility, process compatibility with Si LSI technology and low temperature process due to low melting point. However, there are several device/process issues to be solved for high performance CMOS with Ge. In this seminar, I will report three achievements contributing to Ge MOS technologies: (1) low interface states GeO2 formed on Ge by radical oxidation for reliable gate stack, (2) Fermi level depinning and contact resistance reduction at metal/Ge contact and (3) uniaxial stress engineering for electron mobility enhancement in Ge NFETs.
(1) A number of surface passivation methods have been used for Ge gate stack, however, none of them provides as low interface state density as Si. GeO2 has now been reconsidered as an interfacial layer for high-k/Ge gate stack. In this work, novel radical oxidation method was introduced for interfacial GeO2 growth, which enabled low interface state density in high-k/GeO2/Ge gate stack, 1x1011cm-2V-1.
(2) Low contact resistance in metal/n-Ge contact is challenging because Fermi level of metal is strongly pinned near the valence band edge of Ge. Preventing wave function penetration into Ge and reducing the effect of metal induced gap state of Ge are the key to the Fermi level depinning. In this work, we demonstrated Schottky barrier height modulation and contact resistance reduction by inserting thin interfacial layer between the metal and the Ge.
(3) According to the bulk mobility, electron mobility enhancement in Ge is only 2x higher over Si, and has to be boosted by stress. In this work, we systematically applied stress to different channel directions and achieved electron mobility enhancment in Ge NFETs. Theoretical simulation and experiments clarified the physical mechanism of electron mobility enhancement by uniaxial stress.
Masaharu Kobayashi
Ph.D candidate
Department of Electrical Engineering
Stanford Unversity
TEL:650-521-4260
E-mail:masaharu@stanford.edu
LAST CHANCE TO REGISTER for Stanford Nanoprobes Workshop April 24, 2009
Stanford University's Center for Probing the Nanoscale (CPN) 5th Annual Workshop
See attached for list of speakers and program
Friday, April 24, 2009
8:30-6, with continental breakfast and lunch included.
Poster session from 4-6, with hors d'oeuvres served.
Bechtel Conference Center, Encina Hall, 616 Serra Mall, Stanford University.
Registration: http://www.stanford.edu/group/cpn/research/anworkshop_reg.html
Questions:
Laraine Lietz-Lucas, lietz@stanford.edu
If you've already registered, thank you!
-----------------------------------------------------------------
David Goldhaber-Gordon goldhaber-gordon@stanford.edu
Associate Professor of Physics davidg@post.harvard.edu
and Deputy Director, (permanent forwarding)
Center for Probing the Nanoscale
www.goldhaber-gordon.com
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)
Address for letters or packages: Administrative Associate:
David Goldhaber-Gordon Roberta Edwards
Geballe Laboratory for Advanced Materials McCullough, Rm. 338
McCullough Building, Room 346 Phone: (650) 723-8028
476 Lomita Mall Fax: (650) 724-3681
Stanford, CA 94305-4045 email:
redward@stanford.edu
Wednesday, April 15, 2009
Ping Ding (ASML)'s notebook lost in the cleanroom
-- The information contained in this communication and any attachments is confidential and may be privileged, and is for the sole use of the intended recipient(s). Any unauthorized review, use, disclosure or distribution is prohibited. Unless explicitly stated otherwise in the body of this communication or the attachment thereto (if any), the information is provided on an AS-IS basis without any express or implied warranties or liabilities. To the extent you are relying on this information, you are doing so at your own risk. If you are not the intended recipient, please notify the sender immediately by replying to this message and destroy all copies of this message and any attachments. ASML is neither liable for the proper and complete transmission of the information contained in this communication, nor for any delay in its receipt.
Text books left in the SNF Stockroom?
Someone appears to have left two textbooks in the stockroom. Anyone
claiming them? Let me know.
Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Tuesday, April 14, 2009
SNF Power Glitches
Please beware of potential down equipment. Make sure you verify the
equipment is functional before committing your wafers.
We have suffered two power glitches this afternoon (Tuesday). As a
result we have lost some equipment. For example the cryopump on
Innotec and the the furnace banks. We are trying to identify the
equipment and get them restarted. With the high winds outside there
is no guarantee we won't have another power glitch later today or this evening.
Regards,
ME395 Seminar guest Babak Ziaie
Hello everyone.
Please be aware of the ME395 seminar this Thursday (April 16th), and plan to attend. Also, please note location is different from last quarter.
Thank you!
Mechanics & Computation ME395 Seminar In Solid Mechanics
Spring 2008-09
Low Cost Fun at Microscsale
Babak Ziaie, Ph.D.
Professor, School of Electrical and Computer Engineering
4:15 PM April 16, 2009
Building 300 Room 300
In addition to my main research thrust in biomedical microdevices, my lab frequently dabbles in performing low cost experiments to investigate simple phenomena at microscale. These experiments usually require a single mask (or sometimes no mask at all) and frequent travels to local hardware stores. In spite of their apparent simplicity, the theoretical explanations for some of these experiments are not trivial. In this seminar, I will talk about several such adventures using simple materials and test set ups in areas such as dynamic ferrofluid platforms, vibrating ratchet-shaped microchannels for droplet manipulation, ferropaper actuators, frequency controlled micromotion of soft-bodied cylinders with ratchet-shaped legs, and stretchable electrodes for recording and stimulation.
Reminder seminar tomorrow (Wed 4/15), 4-5 PM, Allen 101X - Lithographically-Patterned Self-Assembling and Chemo-Mechanical Devices
4:00 – 5:00 pm
Allen 101X (formerly known as CISX-101)
David Gracias
The Johns Hopkins University
Abstract:
Optical and electron beam lithography allow precise patterning on the micro-nanoscale; these paradigms are routinely utilized to construct a variety of electronic, optical and biomedical devices in two (and quasi-three) dimensions. In this talk, I will describe strategies that utilize lithographic multilayer patterning to construct 2D structures that self-assemble and show chemically-responsive functionality. Specifically, I will describe the construction of 3D patterned polyhedral structures with sizes ranging from the nanoscale to the mm-scale; and give examples of their utilization in reconfigurable microfluidics and cell therapy. I will also describe strategies wherein lithography and material properties (moduli and stress) are both engineered to enable spontaneous assembly of complex 3D structures like spirals, coils and cylinders. Finally, as a step toward the construction of autonomous and Micro Chemo-Mechanical Systems (MCMS), I will discuss lithographically patterned and chemically responsive functional microgrippers. As opposed to electrical or pneumatic signals typically used to actuate conventional microtools; these grippers close and open in when exposed to specific chemicals (without the need for any batteries, tethers or wiring). The grippers were utilized to pick-and-place objects and to enable an in vitro surgical biopsy.
Bio:
David Gracias received an integrated 5 yr MS degree from IIT Kharagpur and a Ph.D. in physical chemistry from UC Berkeley in 1999. After completing post-doctoral studies on self-assembling electronic systems at Harvard in 2001, he was a Senior Integration Engineer at Intel Corporation (Hillsboro, OR). He joined the Johns Hopkins University in the fall of 2003. His current research is focused on self-assembly, MEMS / NEMS, non-linear optics, organic electronics, drug delivery and nanomedicine. He has published over 50 papers and holds 18 issued U.S. patents, with several others pending. His awards include the NIH Directors New Innovator Award, DuPont Young Professor Award, Beckman Young Investigator Award, Dreyfus Teacher Scholar Award and the NSF Career Award.
Monday, April 13, 2009
Sunday, April 12, 2009
Re: Problem p5000etch SNF 2009-04-11 23:29:05: severe wafer handling problem
sequence, i/o door intermittenly does not open all the
way down. This was the same problem that I encountered
few months back on the same chamber (c), the i/o door
actuator valve assembly is bad . I temporary got the i/o door
working for now by cycling the door open and close and adjusting
the air needle valve. I will talk to John Shott and recommend
upgrading the i/o door valve assembly to a ZA valve assembly.
Use chamber C with caution
Saturday, April 11, 2009
Problem p5000etch SNF 2009-04-11 23:29:05: severe wafer handling problem
I noticed several errors: Robot extension unknown. Slit valve doesn;t open in time. Wafer not centered on chuck (clamping way off center, probably due to robot extension error). Wafer dropped from robot on unloading.
I don't know if the issues are present for loading into ch A or Ch B, but C seems completely unusable. Try A or B with extreme caution.
Friday, April 10, 2009
PhD oral, Wednesday April 15
Fluorescence interferometry applied to cell membrane model systems
Prasad Ganesan
Advisor: Steven Boxer
Department of Chemistry
2 pm, Wednesday, April 15
Chemistry Gazebo
Abstract:
Fluorescence interference contrast microscopy (FLIC) is an experimentally straightforward means for determining the position of fluorescent objects in one dimension with nanometer accuracy. It is therefore a useful method for studying properties of fluorescent objects in supported phospholipid bilayers, a common cell membrane model system. Unfortunately, in its conventional form there are limits on the kinds of systems and questions that can be probed using FLIC. To address this issue, extensions to existing interferometry approaches have been developed to be applicable to a wider range of problems than those than can be investigated with laterally homogeneous supported phospholipid bilayers.
One extension takes the form of a new imaging technique that allows the extraction of distance information for fluorescent objects that are not laterally homogeneous. In variable incidence angle fluorescence interference contrast microscopy (VIA-FLIC), a fluorescent sample is assembled above a reflective silicon interface and the incidence angle of excitation light is varied by placing annular photomasks with different radii in the aperture diaphragm plane of the microscope. Constructive and destructive interference occur near the reflective interface, and varying the incidence angle alters the interference pattern, and hence the intensity of detected fluorescence. By collecting a series of images of a single fluorescent object, an intensity profile as a function of angle of incidence can be constructed, and this profile is characteristic of a specific distance between the fluorophore and the interface.
A second extension is the development of a model membrane system that can be probed using interferometry techniques, while also positioning the phospholipid bilayer hundreds of nanometers from the substrate surface. This separation distance is sufficient that cell membrane proteins conceivably could be incorporated into this system without the surface interaction problems typically observed for proteins in supported phospholipid bilayers. Although many challenges remain to be addressed, the architecture of this system raises the possibility of studying protein conformational dynamics using fluorescence.
Thursday, April 9, 2009
An Invitation to the NNIN Reception
As a member of the SNF Lab Community, you are invited to a reception
for NNIN labmembers and potential labmembers being held in conjunction
with the Spring MRS meeting in San Francisco next week. The reception
will be held on:
Thursday April 16, 2009
7-9 pm
Marriott San Francisco @Moscone Center
55 Fourth Street
Room Pacific H (4th Floor)
Light food and refreshments will be served.
Please Come and Join Us
Your SNF and NNIN Staff members
Are You Missing Some Wafers?
Some concerned labmember found a box of wafers by the first floor printer – Bartlett. If these are your wafers please claim them from me in cubicle #41.
Thanks,
Maureen
Maureen Baran
Stanford Nanofabrication Facility
Lab Services Administrator
mbaran@stanford.edu
650-725-3664
Microscope yellow filter
Mario tells me that most yellow filters are missing this morning., he
has looked all over for them.
I left the lab yesterday around 4:45 pm and it just happened that I
checked few of them the filters were there.
If you have broken it or misplaced it please let us know.
*I am not ordering any till I know what has happened here, I need the
holders any way.
*
*I know that some of you take them out but it is only reasonable to put
them back when you are done.*
mahnaz
[Stanford Nano Society Seminar] Friday 04/10, 1pm, CISX101, Manipulating light at single wavelength or deep sub-wavelength scales open new device and material possibilities
Manipulating light at single wavelength or deep sub-wavelength scales open new device and material possibilities
Dr. Jung-Tsung Shen (Prof. Shanhui Fan group)
http://www.stanford.edu/~jushen/
Location: CISX 101
Time: 1:00-2:00pm
Date: Apr. 10 (Friday)
Abstract:
The capability of manipulating light using deep sub-wavelength structures opens up new device and material possibilities. In this talk, I will describe our recent research in this aspect and give two examples enabled by such capability. The first example is the strongly correlated photon transport in nano-photonic waveguides. Photons normally do not directly interact with each other, yet many practical considerations, such as quantum communication and information processing, and other novel optoelectronics devices require the use of entangled photons. I will describe how to deterministically generate and manipulate strong photon-photon interactions via a two-level system. Such strong interactions have profound consequences on the photon transport properties. A deep understanding of the mechanism also provides a key to achieve low power optical switching at single-photon level. It also represents the most fundamental form of nonlinear optics. Moreover, the configuration is well-suited for on-chip all solid-state implementations.
In the second part of my talk, I will describe how to design novel metamaterials by exploiting the electromagnetic states at subwavelength scales. In particular, I will discuss the mechanisms and properties of a special class of metamaterials -- broadband, ultra-high refractive index metamaterials. Such artificial structures will be useful in many applications such as subwavelength lithography and imaging, broadband slow-light, and sensitive interferometer.
-------------------------
Pizzas would be served !
--------------------------
All are welcome.
--
Gaurav Thareja
Ph.D candidate, Nishi group
Electrical Engineering
Stanford University
420 Via Palou Mall, CISX 128
Stanford, CA 94305
Tel: 650-704-1029
Email: gthareja@stanford.edu
Wednesday, April 8, 2009
EE17N
Just to let every one know that I have made reservation for SVG coater
on Monday 13th at 3-4:30 pm. This is for
class EE17N. Please respect the reservation time and remeber that they
have priority to the equipment during class time.
mahnaz
Reminder: PhD Oral Defense - Morgan Mager (note time correction)
Interactions between lipid bilayers and inorganic material surfaces
Morgan Mager
Research Advisor: Nicholas Melosh
Department of Materials Science and Engineering
Thursday, April 9, 2009 @ 1:30 p.m. (refreshments served at 1:00 p.m.)
Location: CISX Auditorium
Abstract:
Because of their unique biological and material properties, lipid bilayers have been extensively studied for use in biosensor and drug delivery applications. In the past, these systems have mostly taken the form of bulk solutions. More recently, researchers have integrated bilayers with chip-based architectures to take advantage of advanced optical, scanning probe and electronic characterization. These applications typically involve the creation of hybrid devices with inorganic and bilayer components, both of which affect the final device performance. In particular, the properties of supported lipid bilayers (SLBs) are known to depend on the substrate chemistry and topography as well as the lipid used. In spite of the large body of work involving these systems, there is still much that remains unknown about the formation and ultimate structure of the interface between these very different materials. One outstanding question in the study of SLBs is the role that the bilayer deposition method plays in determining the bilayer properties. In the work I will present, we have developed a new method for forming and patterning lipid bilayers: bubble collapse deposition (BCD). This method is similar to an in situ version of Langmuir-Blodgett deposition, and offers unique possibilities for the fabrication of lipid-based devices. With BCD, we have demonstrated the first SLB formation on alumina using uncharged lipids. We have also used BCD to produce a hybrid lipid-gated chemical delivery device, and to directly transfer lipids from a cell membrane to a substrate surface. I will discuss these applications and the fundamental insights they offer into the interactions between lipids and common semiconductor fabrication materials.
Tuesday, April 7, 2009
[Fwd: FW: Safety Alert (fwd)]
A couple of our long-time lab members, Sherwood Parker and Chris Kenney have forwarded us this note from the Director at Lawrence Berkeley Laboratory about a recent explosion of a chemical waste bottle in one of the labs at LBL. Fortunately, nobody was present in the room at the time and, as a result, nobody was injured.
This should be a reminder to all of us, however, that a number of the materials with which we routinely work can be potentially dangerous .... particularly when mixed with incompatible materials. We are fortunate that we have dedicated handling of most of our acid waste in our acid neutralization system and our HF collection tank. We also have tried to make sure that we handle solvents only at the stainless steel solvent hoods. Nonetheless, we do have a number of locations where we do collect chemical waste and, as a result, can also have reactions of the type that occurred at LBL.
I'd like to ask each of you to use this event as a reminder that we all need to redouble our efforts to insure that we are handling chemicals in an approved manner and that we are carefully disposing of them in appropriate containers.
Thanks for your ongoing attention to proper chemical handling and waste disposal.
John
-------- Original Message --------
| Subject: | FW: Safety Alert (fwd) |
|---|---|
| Date: | Tue, 7 Apr 2009 19:42:56 -0700 (PDT) |
| From: | Chris Kenney <kenney@slac.stanford.edu> |
| To: | shott@snf.stanford.edu |
| CC: | rissman@snf.stanford.edu |
Hi John and Paul, I posted this at the entrance to the fab. Chris ---------- Forwarded message ---------- Date: Tue, 7 Apr 2009 19:29:12 -0700 From: "Parker, Sherwood" <sher@slac.stanford.edu> To: mtang@stanford.edu, "Kenney, Christopher" <kenney@slac.stanford.edu>, "Hasi, Jasmine" <jazz9152@slac.stanford.edu> Subject: FW: Safety Alert I expect nothing like this would happen at SNF, but thought I'd forward this in case it interested you. Sherwood ________________________________ From: Paul Alivisatos [mailto:APAlivisatos@lbl.gov] Sent: Mon 4/6/2009 12:42 PM To: Berkeley Lab Community Subject: Safety Alert Dear Colleagues, Late on Tuesday, March 31st, a 4-liter glass bottle of waste aqua regia (nitric and hydrochloric acids) violently exploded in Building 66, destroying the bottle and the secondary containment, damaging other waste containers, shattering the fume hood sash, and scattering glass and acid mist throughout the room. Fortunately, nobody was present in the room and there were no injuries. However, this incident had the potential to seriously injure, maim, or kill. An ongoing investigation reveals that a researcher had erroneously poured waste isopropyl alcohol into the acid waste and closed the cap. Over the next 30 minutes the nitric acid oxidized the alcohol and pressure built up in the bottle until it exploded. In addition, organic waste containers were stored in the same secondary containment as the oxidizing acid waste, which can be a recipe for a fire. Fortunately in this case, the red flammable liquid cans were not punctured and a fire was avoided . Mixing of incompatible wastes is a relatively common cause of laboratory explosions. Accidents such as this, involving an inadvertent mixture of a strong oxidizer (nitric acid) and a fuel (isopropyl alcohol) are very predictable and thus are avoidable. Specific guidance on handling these types of chemicals is provided in the LBNL Chemical Hygiene and Safety Plan (http://www.lbl.gov/ehs/chsp/html/storage.shtml ) and the LBNL Hazardous Waste Generator Guidelines (http://www.lbl.gov/ehs/waste/wm_pub_3092_ch1.shtml ) as well as the corresponding safety classes. I urge each of you to take the following steps: * double-check that each researcher that needs to receive training in handling hazardous materials and waste generation has done so, including courses such as Chemical Hygiene and Safety (EHS0348) and Generation of Hazardous Waste (EHS0604); * use less hazardous materials if possible; * assure that incompatible chemicals are stored separately; * inspect each waste container in your lab for gas generation potential; and, * as part of a safety step in your experimental protocols, assure that any reactions are quenched, either by neutralization or dilution. Regards, Paul -- A. Paul Alivisatos Interim Director Lawrence Berkeley National Lab Larry and Diane Bock Professor of Nanotechnology University of California, Berkeley
Monday, April 6, 2009
Re: Problem p5000etch SNF 2009-04-06 00:31:00: Mishandled Wafers - Encoder Error 177
Re: Problem p5000etch SNF 2009-04-06 14:17:08: cannot load wafer into loadlock
Seminar: April 15th, 4-5 PM, Allen 101X - Lithographically-Patterned Self-Assembling and Chemo-Mechanical Devices
4:00 – 5:00 pm
Allen 101X (formerly known as CISX-101)
David Gracias
The Johns Hopkins University
Abstract:
Optical and electron beam lithography allow precise patterning on the micro-nanoscale; these paradigms are routinely utilized to construct a variety of electronic, optical and biomedical devices in two (and quasi-three) dimensions. In this talk, I will describe strategies that utilize lithographic multilayer patterning to construct 2D structures that self-assemble and show chemically-responsive functionality. Specifically, I will describe the construction of 3D patterned polyhedral structures with sizes ranging from the nanoscale to the mm-scale; and give examples of their utilization in reconfigurable microfluidics and cell therapy. I will also describe strategies wherein lithography and material properties (moduli and stress) are both engineered to enable spontaneous assembly of complex 3D structures like spirals, coils and cylinders. Finally, as a step toward the construction of autonomous and Micro Chemo-Mechanical Systems (MCMS), I will discuss lithographically patterned and chemically responsive functional microgrippers. As opposed to electrical or pneumatic signals typically used to actuate conventional microtools; these grippers close and open in when exposed to specific chemicals (without the need for any batteries, tethers or wiring). The grippers were utilized to pick-and-place objects and to enable an in vitro surgical biopsy.
Bio:
David Gracias received an integrated 5 yr MS degree from IIT Kharagpur and a Ph.D. in physical chemistry from UC Berkeley in 1999. After completing post-doctoral studies on self-assembling electronic systems at Harvard in 2001, he was a Senior Integration Engineer at Intel Corporation (Hillsboro, OR). He joined the Johns Hopkins University in the fall of 2003. His current research is focused on self-assembly, MEMS / NEMS, non-linear optics, organic electronics, drug delivery and nanomedicine. He has published over 50 papers and holds 18 issued U.S. patents, with several others pending. His awards include the NIH Directors New Innovator Award, DuPont Young Professor Award, Beckman Young Investigator Award, Dreyfus Teacher Scholar Award and the NSF Career Award.
Second Notice: Annual Nanoprobes Workshop at Stanford, April 24. Register now.
On Friday April 24, Stanford's Center for Probing the Nanoscale will
present its 5th Annual Nanoprobes Workshop, on Stanford campus at the
Bechtel Conference Center. Ten outstanding speakers will describe
cutting-edge developments in imaging nanoscale electronic, magnetic,
optical, and chemical phenomena. This will be followed by a
student/postdoc poster session. You and your colleagues are warmly
invited to attend the workshop. Students are encouraged to present
posters -- we typically have many industry attendees who appreciate
having students explain their exciting work.
The website is open for registration till April 17. Details about
registration and
speakers are below. Students and postdocs are free but must register.
Thanks if you've
already registered! Also see attached program.
Questions:
Laraine Lietz-Lucas, lietz@stanford.edu
Best wishes,
David Goldhaber-Gordon
Deputy Director, Center for Probing the Nanoscale, an NSF Nanoscale
Science and Engineering Center
Details:
Registration http://www.stanford.edu/group/cpn/research/anworkshop_reg.html
Registration Fee Structure:
Industry - $100
Academic and Government (except CPN Investigators) - $50
Community College, K-12, and Museum Personnel - $25
Students and CPN investigators are free but must register
Speakers:
Bob Westervelt, Harvard University
"Imaging Quantum Devices"
Dmitri Basov, University of California, San Diego
"Infrared Nano-Scopy of Complex Materials"
Sergei Kalinin, Oak Ridge National Laboratory
"Deciphering Nanoscale Interactions: Artificial Neural Networks and
Scanning Probe Microscopy"
Dawn Bonnell, University of Pennsylvania
"Beyond Structure: Probing Complex Properties with Subnanometer Resolution"
Sasha Balatsky, Los Alamos National Laboratory
"Dirac Materials"
Alex de Lozanne, University of Texas, Austin
"Nanocharacterization with Scanning Probes"
Matthias Bode, Argonne National Laboratory
"Imaging Non-Collinear Magnetic Nanostructures with Atomic Resolution"
Ophir Auslaender, Stanford University
"Probing Microscopic and Dynamical Properties of Superconducting
Vortices by Vortex Dragging"
Joachim Stöhr, SLAC National Accelerator Laboratory
"X-Ray Studies of the Ultrafast Magnetic Nanoworld"
Dan Rugar, IBM Almaden Research Center
"Nanoscale MRI – The Quest for a Molecular Structure Microscope"
-----------------------------------------------------------------
David Goldhaber-Gordon goldhaber-gordon@stanford.edu
Associate Professor of Physics davidg@post.harvard.edu
and Deputy Director, (permanent forwarding)
Center for Probing the Nanoscale
www.goldhaber-gordon.com
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)
Address for letters or packages: Administrative Associate:
David Goldhaber-Gordon Roberta Edwards
Geballe Laboratory for Advanced Materials McCullough, Rm. 338
McCullough Building, Room 346 Phone: (650) 723-8028
476 Lomita Mall Fax: (650) 724-3681
Stanford, CA 94305-4045 email:
redward@stanford.edu
--
-----------------------------------------------------------------
David Goldhaber-Gordon goldhaber-gordon@stanford.edu
Associate Professor of Physics davidg@post.harvard.edu
and Deputy Director, (permanent forwarding)
Center for Probing the Nanoscale
www.goldhaber-gordon.com
Stanford University
www.stanford.edu/group/cpn/
(650) 725-2047 (lab) (650) 724-3709 (office)
Address for letters or packages: Administrative Associate:
David Goldhaber-Gordon Roberta Edwards
Geballe Laboratory for Advanced Materials McCullough, Rm. 338
McCullough Building, Room 346 Phone: (650) 723-8028
476 Lomita Mall Fax: (650) 724-3681
Stanford, CA 94305-4045 email:
redward@stanford.edu
Problem p5000etch SNF 2009-04-06 14:17:08: cannot load wafer into loadlock
Problem p5000etch SNF 2009-04-06 00:31:00: Mishandled Wafers - Encoder Error 177
Sunday, April 5, 2009
Friday, April 3, 2009
Re: Problem p5000etch SNF 2009-04-03 14:26:14: Load Lock is not pumping down
w/out problerm.
Thursday, April 2, 2009
Misplaced USB Flash Drive
I've misplaced my black memory stick somewhere in the lab, probably
near the SEM. If somebody finds it, could they please drop me a mail?
Thanks
-Shrestha
Welcome, E341!
It's Spring quarter and classes have started.... And E341 (Micro/Nano
Systems Design and Fabrication Laboratory) has started. We will see
E341 students in the lab starting next week. The lab schedule this term
is: Mondays, 8-12; Wednesdays/Thursdays/Fridays, 1-5 pm. Karthik
(Coral login: karthikv) is the head TA, although there will also be
host of super TA's on hand as well.
The first lab will be covering wbnonmetal, wbdiff, and tylanoxidation,
so please be aware that the E341 class will have priority on these tools
during their lab sessions (please respect these reservations.) The
schedule of equipment reserved will also be posted outside the cleanroom.
Please join in welcoming the E341 students to the lab -- I trust we will
be seeing a lot of them in coming months!
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Wednesday, April 1, 2009
PhD Dissertation Defense - Morgan Mager
Interactions between lipid bilayers and inorganic material surfaces
Morgan Mager
Research Advisor: Nicholas Melosh
Department of Materials Science and Engineering
Thursday, April 9, 2009 @ 1:00 p.m. (refreshments served at 12:30 p.m.)
Location: CISX Auditorium
Abstract:
Because of their unique biological and material properties, lipid bilayers have been extensively studied for use in biosensor and drug delivery applications. In the past, these systems have mostly taken the form of bulk solutions. More recently, researchers have integrated bilayers with chip-based architectures to take advantage of advanced optical, scanning probe and electronic characterization. These applications typically involve the creation of hybrid devices with inorganic and bilayer components, both of which affect the final device performance. In particular, the properties of supported lipid bilayers (SLBs) are known to depend on the substrate chemistry and topography as well as the lipid used. In spite of the large body of work involving these systems, there is still much that remains unknown about the formation and ultimate structure of the interface between these very different materials. One outstanding question in the study of SLBs is the role that the bilayer deposition method plays in determining the bilayer properties. In the work I will present, we have developed a new method for forming and patterning lipid bilayers: bubble collapse deposition (BCD). This method is similar to an in situ version of Langmuir-Blodgett deposition, and offers unique possibilities for the fabrication of lipid-based devices. With BCD, we have demonstrated the first SLB formation on alumina using uncharged lipids. We have also used BCD to produce a hybrid lipid-gated chemical delivery device, and to directly transfer lipids from a cell membrane to a substrate surface. I will discuss these applications and the fundamental insights they offer into the interactions between lipids and common semiconductor fabrication materials.