Wednesday, November 30, 2011
Comment p5000etch SNF 2011-11-30 19:21:49: resist burn in chamber B
new fiji ald system brought into the snf this am
j
Re: Problem p5000etch SNF 2011-11-30 02:28:13: Ch A - BCl3 stabilization problem
Problem p5000etch SNF 2011-11-30 02:28:13: Ch A - BCl3 stabilization problem
Tuesday, November 29, 2011
Bake Sale for a Good Cause - Here in the Allen Building
What: BAKE SALE…I know what you’re thinking wow, when the last time we had a bake sale. We were thinking the same thing so; we decided to have a bake sale.
Who: Friends of SNF are putting together this incredible eatable bake sale
When: Tuesday, December 6th from 8:00A to 1:00P
Why: Because this is the season to do good things for those less fortunate
Where: Nancy Latta’s Office #145 on the first floor of the Allen Building
Please come by and support your SNF Staff and Friends and purchase often through the morning and lunch hour.
Sincerely,
Maureen
On behalf of the SNF Staff and Friends of SNF
Annual Holiday Party! Friday, Dec. 2, 1-3 pm
You are invited to the annual Allen Building holiday party, this Friday, Dec. 2, from 1-3 pm.
This will be in the Allen building, just outside the yellow window area of the lab.
Enjoy snacks, traditional games (the famous "wafer toss"), create your own silicon wafer
ornament, and just spend some time reconnecting before heading off for the holidays.
Stop on by for an afternoon break (generously sponsored by the CIS Affiliates.)
Your CIS party committee
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Monday, November 28, 2011
Tool Shutdown Schedule
Renovation Countdown: 16 days!
As you know, the lab becomes a construction zone starting Thursday, Dec.
15. In preparation for construction, staff will need to ensure that all
equipment is safe (all toxic gases are purged from tools and process
lines, wet benches decontaminated) and ready for an extended shutdown
(chambers cleaned, pumps PM'ed, etc.) Also, all small tools, like
microscopes, will be removed from the lab. With over 100 tools in the
lab, we'll need to stage all these activities to ensure a smooth,
on-time handover. Attached is the current plan for tool shutdown.
Hopefully, this will help in your planning for any activities in
December -- please be aware this schedule is subject to change, but that
any changes will be communicated via regular updates and on Coral.
Thanks for your patience as we ramp up our shutdown plans.
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Re: Shutdown p5000etch SNF 2011-11-26 00:37:48: wafer slipped off in tranfer chamber
Saturday, November 26, 2011
Shutdown p5000etch SNF 2011-11-26 00:37:48: wafer slipped off in tranfer chamber
Friday, November 25, 2011
Re: Problem p5000etch SNF 2011-11-24 04:33:57: Ch. C handler timeout
Thursday, November 24, 2011
Infra-red imaging solutions
Happy Thanksgiving!
May I know if anyone has access to an infra-red imaging camera or know
if any such facility exists on campus?
Thanks in advance for any replies!
Ben
--
Benjamin Tee
Ph.D Candidate, Electrical Engineering
Stanford University
Cell: 650-704-4300
M.S (EE) Stanford University '07
B.S.E (EE) University of Michigan - Ann Arbor '06
Bao Research Group - http://baogroup.stanford.edu
Address:
381 North South Mall Rm 209
Stanford CA 94305
USA
Problem p5000etch SNF 2011-11-24 04:33:57: Ch. C handler timeout
"Ch C valve did not open in maximum allowed time"
"Ch C wafer lifter did cannot reach release position within timeout"
"Process chamber failed with error code 236"
Had to abort automatic mode and manually return the wafers. Chamber was also sometimes stuck "waiting for blade in" and had to be reset.
Wednesday, November 23, 2011
Re: Problem p5000etch SNF 2011-11-22 16:50:11: HT EX fault in Chamber B
Re: Problem p5000etch SNF 2011-11-22 17:48:22: Ch B has HT EX fault error, won't run
Imina Technologies miBots Nanomanipulation Workshop
While you are resting up over the long weekend, now would be a great
time to sign up for the miBots Workshop.
The SNF Staff in conjunction with Imina Technologies is pleased to present:
NANOMANIPULATION WORKSHOP
Monday December 5, 2011
The miBots™ are coming! Do you have a need for manipulation or sensing
small samples in a microscope? If so, we invite you to see these novel
nanopositioners for yourself at the Stanford NanoFabrication Facility in
a FREE, hands-on workshop on December 5th in the Paul Allen Building,
Auditorium Room 101X. Designed especially for light microscopy, SEMs and
FIBs, these affordable, easy-to-use mini robots are virtually untethered
and free to move independently, opening new vistas for manipulation and
testing at the macro, micro, or nanoscale. Working individually or in
groups, the miBot™ uses a variety of tools such as grippers, probes, and
optical fibers so that, in addition to manipulating the sample, they can
illuminate a nano workspace and conduct force or electrical
measurements. Robust, mechanically and thermally stable, and
vacuum-ready, these tiny trojans are a great, customizable solution for
maneuvering and testing cells, nanostructures, semiconductor devices,
LEDs, and MEMs.
miBots will be working in the Paul Allen Building, Auditorium Room 101X
from 10 AM till Noon.
For more information, or to register for workshop, click here
http://imina.ch/events/registration-form-workshops-california-december-2011.
Imina will contact you in the week before the workshop to confirm and
provide a map and directions.
Want to learn more? Visit us at www.imina.ch or give Tom Levesque a call
at (972) 318-0196.
Regards, SNF Staff
High pressure and High Temp Anneal
Hi all,
I would like to have some wafers to be annealed in High pressure (>=100bar) and high temperature (1000C-1400C) at N2 ambient, does anyone know any company or institute provide such service?
Your input and comments will be much appreciated.
Wish you all have a great thanksgiving holiday!
Gavin
Tuesday, November 22, 2011
Renovation countdown: 23 days!
You may have noticed a number of people walking around the building in
construction helmets and orange vests. Construction is well underway in
the basement and in the area above the lab. Here's a quick update of
activities which may be relevant to your work here.
The former CAD room will soon house the new maintenance office area and
workshop. The ASML emulator and CAD desktops are now located in the
cube area near the Maureen's office. The probe
station/micromanipulator6000 is now located in room 144, near the cube
area (thanks to Andreas for setting it back up and even cleaning the
dust!) These are still available for your use - please remember to
clean up when you are done.
We hand over the keys to the lab to contractors on Thursday, Dec. 15. To
make equipment safe to exist in a construction zone, process gases will
need to be purged, wet benches drained and rinsed, microscopes will be
removed, etc. All this takes time, so tools will be shutdown in the
days leading up to 12/15. We should have a schedule of planned tool
shutdown early next week, to help plan your work in December accordingly.
Please remember to remove all your personal items from bins and WIP
shelves by the morning of Monday, Dec. 12. Items left in the lab will
be removed by staff. (Remember, this will be a construction zone - any
damage to equipment will be covered by liability, but damaged masks and
wafers will not be.) There will be no bin charges in December; bins
will assigned again when the lab reopens.
Lastly, the red lockers can be used for storing personal items, but they
will not be accessible during construction. So anything you leave in
them will have to stay until the lab reopens. We'd like to encourage
you to turn in you locker key if you don't think you will use it.
One more thing -- many thanks to everyone who cleaned up items in the
former CAD room and the cube area -- it helped enormously in staging our
moves. And your understanding and support (which we will need more of
in coming weeks!) are greatly appreciated.
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Problem p5000etch SNF 2011-11-22 16:50:11: HT EX fault in Chamber B
Re: Shutdown p5000etch SNF 2011-11-21 17:50:03:
Re: Problem p5000etch SNF 2011-11-21 17:41:37: helium valve is not open and can not run any process.
attending IEDM ?
While attending IEDM over the years (or any big conference for that matter), selecting which papers to attend has been a drudgery. Going back and forth between the conference leaflet and the abstract booklet, and then discovering that their exists an conflict between the papers i wanted to attend and finally loosing the piece of paper with my schedule on the first day of the conference.
This motivated me to create a iPhone/iPad/iPod which will allow the participants to browse the schedule : showing them all the sessions going on at a particular time and then choose one, browse the papers by the category, find which room to go to next to attend the next paper.
The app is live on the Appstore now and you can search for it by typing "IEDM" in the Appstore. Alternatively you can get it use this link : http://itunes.apple.com/us/app/iedm-2011/id478640054?ls=1&mt=8
App Description :
This app allows you to browse through the schedule of IEDM 2011 conference, select the papers you want to attend and make your conference calendar. Browse all the papers being presented at a particular time slot or alternatively browse the papers by conference categories. You can read through the abstract of the papers and select the ones you want to attend to make your conference itinerary. This app also allows you to do a live search over the extended abstracts to quickly narrow all the papers on a particular topic (e.g. Flash Memory) or from a particular institution (e.g. Stanford University).
The App for IEDM 2011 is sponsored by Applied Materials.
Please have fun using the app and let me know of your feedback.
Best Regards,
Aneesh
Re: ion implantation question
From: John Shott <shott@stanford.edu>
To: Stephanie Claussen <sclaussen@stanford.edu>
Cc: "labmembers@snf.stanford.edu" <labmembers@snf.stanford.edu>
Sent: Monday, November 21, 2011 6:59 PM
Subject: Re: ion implantation question
Stephanie:
What are the dose and energy of the implant that you plan to do?
To first order, the implant depth in oxide is comparable to that in silicon. As I recall (don't take this as an accurate number) the mean implant depth of 100 keV phosphorus is about 125 nm. However, if you tried to use 125 nm of masking oxide, you'd be in serious trouble because fully half of the dopant would penetrate the oxide. Absent more accurate numbers, I'd suggest that a masking oxide thickness of 2.5 to 3.0 times the mean implant depth in silicon. For 100 keV phosphorus, I'd suggest that about 400 nm of oxide is probably safe. Note: heat treatment following implant also needs to be considered but is often a second order consideration unless post-implant heat treatment is really hot or long.
Let me know if you have other questions or are worried about trusting my now-addled memory about such matters.
John
Sent from my iPhone
On Nov 21, 2011, at 5:04 PM, Stephanie Claussen <sclaussen@stanford.edu> wrote:
> Hi all,
>
> I am planning on doing phosphorous ion implantation this week at INNOViON in San Jose. This will be on an already-fabricated vertical pin structure. I was planning to deposit LPCVD oxide over my entire structure, then pattern and etch it to open up the n regions where I want the ions implanted.
>
> Can anyone tell me how thick this oxide should be to prevent P doping in my p region? Your prompt responses are greatly appreciated, as this is a process I was planning on carrying out over the next day or two.
>
> Thanks so much,
> Stephanie
Monday, November 21, 2011
Re: ion implantation question
What are the dose and energy of the implant that you plan to do?
To first order, the implant depth in oxide is comparable to that in silicon. As I recall (don't take this as an accurate number) the mean implant depth of 100 keV phosphorus is about 125 nm. However, if you tried to use 125 nm of masking oxide, you'd be in serious trouble because fully half of the dopant would penetrate the oxide. Absent more accurate numbers, I'd suggest that a masking oxide thickness of 2.5 to 3.0 times the mean implant depth in silicon. For 100 keV phosphorus, I'd suggest that about 400 nm of oxide is probably safe. Note: heat treatment following implant also needs to be considered but is often a second order consideration unless post-implant heat treatment is really hot or long.
Let me know if you have other questions or are worried about trusting my now-addled memory about such matters.
John
Sent from my iPhone
On Nov 21, 2011, at 5:04 PM, Stephanie Claussen <sclaussen@stanford.edu> wrote:
> Hi all,
>
> I am planning on doing phosphorous ion implantation this week at INNOViON in San Jose. This will be on an already-fabricated vertical pin structure. I was planning to deposit LPCVD oxide over my entire structure, then pattern and etch it to open up the n regions where I want the ions implanted.
>
> Can anyone tell me how thick this oxide should be to prevent P doping in my p region? Your prompt responses are greatly appreciated, as this is a process I was planning on carrying out over the next day or two.
>
> Thanks so much,
> Stephanie
Shutdown p5000etch SNF 2011-11-21 17:50:03:
ion implantation question
I am planning on doing phosphorous ion implantation this week at INNOViON in San Jose. This will be on an already-fabricated vertical pin structure. I was planning to deposit LPCVD oxide over my entire structure, then pattern and etch it to open up the n regions where I want the ions implanted.
Can anyone tell me how thick this oxide should be to prevent P doping in my p region? Your prompt responses are greatly appreciated, as this is a process I was planning on carrying out over the next day or two.
Thanks so much,
Stephanie
Found in the Gowning Room Miscellaneous Costume Earrings
With the cleanup going on in, out and around the lab, a concerned labmember has given me two mismatched non pierced earrings that have been in the gowning room for some time. One has rhinestones and a teardrop pearl and the other is an outline of a bow with a heart on the end of one of the strings.
If either or both are yours, please come by my cubicle to claim.
Thank you,
Maureen
Comment p5000etch SNF 2011-11-21 12:00:30: Ch.A Argon MFC
Friday, November 18, 2011
Re: Problem p5000etch SNF 2011-11-17 16:51:57: No Chlorine
Thursday, November 17, 2011
Problem p5000etch SNF 2011-11-17 16:51:57: No Chlorine
missing wafers
me again, I have a labmember totally stressed.
Will you please look around and see if you can find a small box that
contains
Two 6" boxes, one of the box contains 25 wafers and the other box is empty.
There should be a mask in the box as well.
Please if you find it, give it or leave it in front of any staff's or
Maureen's office.
Any help in this matter is much appreciated.
mahnaz
Wednesday, November 16, 2011
missing wafers
A labmember is missing a full box of 6" wafers that was in a cardboard
box along with an empty 6" box on her desk.
The box was sitting on the desk and I saw the box in the morning.
If you have taken the wafers by mistake, please bring it back.
mahnaz
Imina Technologies miBots Nanomanipulation Workshop
NANOMANIPULATION WORKSHOP
Monday December 5, 2011
The miBots™ are coming! Do you have a need for manipulation or sensing
small samples in a microscope? If so, we invite you to see these novel
nanopositioners for yourself at the Stanford NanoFabrication Facility in
a FREE, hands-on workshop on December 5th in the Paul Allen Building,
Auditorium Room 101X.
Designed especially for light microscopy, SEMs and FIBs, these
affordable, easy-to-use mini robots are virtually untethered and free to
move independently, opening new vistas for manipulation and testing at
the macro, micro, or nanoscale. Working individually or in groups, the
miBot™ uses a variety of tools such as grippers, probes, and optical
fibers so that, in addition to manipulating the sample, they can
illuminate a nano workspace and conduct force or electrical
measurements. Robust, mechanically and thermally stable, and
vacuum-ready, these tiny trojans are a great, customizable solution for
maneuvering and testing cells, nanostructures, semiconductor devices,
LEDs, and MEMs.
miBots will be working in the Paul Allen Building, Auditorium Room 101X
from 10 AM till Noon.
For more information, or to register for workshop, click here
http://imina.ch/events/registration-form-workshops-california-december-2011.
Imina will contact you in the week before the workshop to confirm and
provide a map and directions.
Want to learn more? Visit us at www.imina.ch or give Tom Levesque a call
at (972) 318-0196.
Regards,
SNF Staff
Tuesday, November 15, 2011
want to borrow proTEK (protective coating)
Sorry to spam. I am doing a KOH etch from the backside of the wafer. But my front side of wafer has Al, which can't survive in a long time KOH etch. I am wondering if anyone have proTEK (http://www.brewerscience.com/products/protective-coatings) or have used the proTEK before to protect the frontside of the wafer? Any comments and suggestions are welcomed.
Best,
Helen
Qiushi(Helen) Ran
=========================================
Department of Electrical Engineering
Stanford University, Stanford, CA 94305.
Mobile: +1-650-796-1439
Email: qran@stanford.edu
want to borrow proTEK (protective coating)
Qiushi(Helen) Ran
------------------------------------------------------------------------------
Department of Electrical Engineering,
Stanford, CA, 94305
Presentation slides: Dr. Mike Stopa's "Modeling the electronic structure of semiconductor devices"
Re: Shutdown p5000etch SNF 2011-11-14 18:41:25: wafer didn't come out properly
Monday, November 14, 2011
Has anyone seen this USB key?
--K
Shutdown p5000etch SNF 2011-11-14 18:41:25: wafer didn't come out properly
Sunday, November 13, 2011
Local Glue Challenge
Good Afternoon! I am working on an ambitious project to spread peace and love across our pale blue dot of a planet. The only thing stopping me from succeeding is the inability to merge two plastic sheets together locally, meaning, gluing it to within a 1mm diameter BUT still keep this spot transparent. I believe this is a non-trivial challenge so
*if you recommend a technique or machine that can do this successfully AND easily, i will hand deliver a lunch of your choice and give you a 5 minutes back massage while you enjoy lunch since you are the super star of SNF in my eyes (see p.s. note for details of this lunch)*
details of challenge:
Take for example, two transparency sheets (mylar). i JUST need to glue them/merge them together at a specified point between them that is less than or around 1mm in diameter. It's just as simple as that. i'd also like it to be as optically transparent as possible. If you absolutely need the reason for such a strange request, just convince yourselves that i am designing posters for the Occupy Wall Street movements.
Anyhow, I have used all sorts of glue: plastic-plastic specialty glue, 'gorilla glue', 'krazy glue', 'let's get gluing,' 'glue-on it,' etc. but it's quite difficult to get a local 1mm spot since these glues smear. pipette methods, double-sided tape have their deficiencies. I'd like to do this with higher precision and have the glued spot to stick together permanently (like a laminator machine but local!-This will win the lunch if you can give me the details!).
I tried soldering iron which works but leaves behind a burned spot.
Thanks!
Regards,
Sonny
*( lunch has to be an on campus eatery and no more than $10); only winner will be notified*
Re: Computer terminals in SNF not working
While I don't yet know what caused the Sunrays to be unresponsive, I've
reset them (on the server) and they seem to be functional once again. I
apologize for the outage and will try to resolve what may have caused
this tomorrow.
John
On 11/12/2011 9:29 PM, J. Jason Lin wrote:
> Can a staff member troubleshoot the problem?
Saturday, November 12, 2011
Thursday, November 10, 2011
Renovation Countdown: 35 Days!!!!
Yes, it's only a month away... Thanks to all who have cleaned up the
151/CAD room and the shared cubicle area -- it is much appreciated by
staff.
Please remember that the lab will belong to the contractors starting
Dec. 15, so staff will need to put all the equipment into a safe
condition for long term shutdown before 7 am that day. This means that
individual tools may be shutdown several days before this date,
depending on what needs to be done. We plan to post a schedule in
coming weeks.
Please also remember to remove ALL PERSONAL BELONGINGS from your lab
bins, roll-around carts, WIP racks, and mask bins. There will be major
construction done in the lab and we will not be able to ensure that your
items will be safe. We will also take the opportunity to remove lab
bins to allow installation of new equipment -- so bins will be
reassigned to active labmembers when the lab reopens Feb. 1. (Be
assured, there will be no bin charges in Dec./Jan.)
Thanks for your attention and patience --
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
silver selenide
selenide Ag2Se ?
Thanks,
Shibing
--
Shibing Wang
Postdoctoral Scholar
Geological and Environmental Sciences
Stanford University
450 Serra Mall
Braun Hall, Building 320
Stanford University
Stanford, CA 94305-2115
shibingw@stanford.edu
650-862-3001
Reminder: EE Ph.D. Dissertation Defense: Meredith M. Lee (Friday Nov. 11, 10AM, CIS-X Auditorium)
--------------------------------------------------
Meredith M. Lee
Stanford University
Ph.D. Candidate, Dept. of Electrical Engineering
Center for Integrated Systems
420 Via Ortega, Stanford, CA 94305-4075
Fax: (650) 723-4659
mmlee@stanford.edu
University Ph.D. Dissertation Defense
Department of Electrical Engineering
Tunable Photonic Crystal Biosensors for Portable Label-Free Diagnostics
Meredith M. Lee
Advisor: Professor James S. Harris
Co-Advisor: Professor Shanhui Fan
Friday, November 11, 2011
10 AM (refreshments at 9:45 AM)
Allen (Center for Integrated Systems-X) Auditorium
Re: BioMEMS seminar "Emergent Functionality of Cellular Buildup Wet Robotics" tomorrow
I'm sorry for my fool mistake but seminar is starting at "Allen 101",
not "Allen 101X".
Ken
On Wed, 09 Nov 2011 18:57:28 -0800
Kentaro Iwami <iwami@stanford.edu> wrote:
> Hi All,
>
> Prof. Keisuke Morishima, former SNF labmember from Osaka University will visit Stanford tomorrow.
> He is an authority of BioMEMS and will be speaking "Emergent Functionality of Cellular Buildup Wet
> Robotics", including MEMS-fabricated muscle-powered bioactuator and biochemical energy source.
> I strongly recommend to join it!
>
> Title: Emergent Functionality of Cellular Buildup Wet Robotics
> Author: Keisuke Morishima, Department of Mechanical Engineering,
> Osaka University, 2-1 Yamadaoka, Suita 565-0871, JAPAN
> Place Allen 101X, 11/10/2011 (Thu), 1:30pm-2:30pm
> Abstract:
> We have demonstrated an environmentally robust hybrid (biotic?abiotic) robotic system that uses
> living components, called "Cellular Build Up Wet Nano Robotics". Our group has already presented
> a bioactuator using rat heart muscle cells, but it is difficult to keep rat heart muscle cells
> contracting spontaneously without maintaining the culture conditions carefully. By contrast, insect
> cells are much robust over a range of culture conditions (temperature, osmotic pressure and pH)
> compared to mammalian cells. Therefore, insect cells are more practical use of a hybrid wet robotic
> system, and they can be driven without precise environmental control. From this point of view, to
> utilize robust biological components as a functional systems and self assembly process and their
> emergent functionality, and to build up such a soft and wet machines will lead us an innovative
> fundamental change and produce a new principle and design to future man-made systems. We
> demonstrate the example of a micro bioactuator and mechanical systems driven by biochemical energy.
> This novel muscle-powered bioactuator successfully show autonomous beating at room temperature for
> a long time without maintenance. Experimental results suggest the possibility of constructing an
> environmentally robust hybrid wet robotic system with living components and open up a new science
> and technology, biorobotic approach, medical, environmental monitoring, agriculture and industrial
> application.
>
>
>
> -------------------------------------------------------------------------
> Kentaro IWAMI, Ph. D.
> Visiting scholar, Center for Integrated Systems, Stanford University
> Paul G. Allen Building, 420 Via Palou Mall, Room 113, Stanford, CA 94305-4070 USA
> Tel: 650-223-3817 E-mail: iwami@stanford.edu
>
> Assistant Professor, Department of Mechanical Systems Engineering,
> Tokyo University of Agriculture and Technology
> 2-24-16 Nakacho, Koganei, Tokyo 184-8588 Japan
> Tel: +81-42-388-7422 Fax: +81-42-388-7093 E-mail:k_iwami@cc.tuat.ac.jp
> -------------------------------------------------------------------------
Litho Back on at 2 pm
There was report of an odor in the litho area around 12:50.
After evacuating the litho area, Mary, Maurice and i realized that is
Electrical and the source seems to be coming from ASML.
We have powered down the ASML and Linda has called FSE for help.
Litho will be open at 2 pm and we will update you as what the status of
the ASML will be.
mahnaz
Wednesday, November 9, 2011
BioMEMS seminar "Emergent Functionality of Cellular Buildup Wet Robotics" tomorrow
Prof. Keisuke Morishima, former SNF labmember from Osaka University will visit Stanford tomorrow.
He is an authority of BioMEMS and will be speaking "Emergent Functionality of Cellular Buildup Wet
Robotics", including MEMS-fabricated muscle-powered bioactuator and biochemical energy source.
I strongly recommend to join it!
Title: Emergent Functionality of Cellular Buildup Wet Robotics
Author: Keisuke Morishima, Department of Mechanical Engineering,
Osaka University, 2-1 Yamadaoka, Suita 565-0871, JAPAN
Place Allen 101X, 11/10/2011 (Thu), 1:30pm-2:30pm
Abstract:
We have demonstrated an environmentally robust hybrid (biotic?abiotic) robotic system that uses
living components, called "Cellular Build Up Wet Nano Robotics". Our group has already presented
a bioactuator using rat heart muscle cells, but it is difficult to keep rat heart muscle cells
contracting spontaneously without maintaining the culture conditions carefully. By contrast, insect
cells are much robust over a range of culture conditions (temperature, osmotic pressure and pH)
compared to mammalian cells. Therefore, insect cells are more practical use of a hybrid wet robotic
system, and they can be driven without precise environmental control. From this point of view, to
utilize robust biological components as a functional systems and self assembly process and their
emergent functionality, and to build up such a soft and wet machines will lead us an innovative
fundamental change and produce a new principle and design to future man-made systems. We
demonstrate the example of a micro bioactuator and mechanical systems driven by biochemical energy.
This novel muscle-powered bioactuator successfully show autonomous beating at room temperature for
a long time without maintenance. Experimental results suggest the possibility of constructing an
environmentally robust hybrid wet robotic system with living components and open up a new science
and technology, biorobotic approach, medical, environmental monitoring, agriculture and industrial
application.
-------------------------------------------------------------------------
Kentaro IWAMI, Ph. D.
Visiting scholar, Center for Integrated Systems, Stanford University
Paul G. Allen Building, 420 Via Palou Mall, Room 113, Stanford, CA 94305-4070 USA
Tel: 650-223-3817 E-mail: iwami@stanford.edu
Assistant Professor, Department of Mechanical Systems Engineering,
Tokyo University of Agriculture and Technology
2-24-16 Nakacho, Koganei, Tokyo 184-8588 Japan
Tel: +81-42-388-7422 Fax: +81-42-388-7093 E-mail:k_iwami@cc.tuat.ac.jp
-------------------------------------------------------------------------
Tuesday, November 8, 2011
Re: Shutdown p5000etch SNF 2011-11-07 19:22:37: could not remove wafer.
The P5000 cannot process quartz wafers in Auto mode. If you need to process quartz wafers, please contact the etch staff for assistance.
Monday, November 7, 2011
Shutdown p5000etch SNF 2011-11-07 19:22:37: could not remove wafer.
Computational Seminar on Semiconductor Device Modeling
Modeling the electronic structure of semiconductor devices
Dr. Mike Stopa
Director of National Nanotechnology Infrastructure Network Computation Project
Center for Nanoscale Systems
Harvard University
Time: 10 am, Thursday November 10, 2011
Modeling of the electronic structure of nano-scale semiconductor devices is a both conceptually and practically difficult task that is invaluable for experimentalists and device engineers. The complexity and variety of semiconductor devices, in their morphology or material composition or in the specific features that are under investigation, generally inhibit the development of any "all purpose code" that simulates all properties of all devices. The SETE code, which I will discuss in this talk, was initially developed to model GaAs-AlGaAs heterostructure-based two dimensional electron gas (2DEG) devices, but has since been applied to other systems. Modification to other systems typically means that only the most fundamental features of the SETE code are transferable. A brief list of some of the systems, materials and properties that have been modeled by SETE and its variants is:
· Semiconductor nanowires;
· Configuration interaction calculation in quantum dots;
· Magnetic terraces (compressible and incompressible regions) in the 2DEG in the quantum Hall regime;
· Complicated band structure using k dot p (Luttinger Hamiltonian) formalism;
· Förster transfer process between semiconductor nanoparticles;
· Strain effect on electronic structure;
· Molecular systems adjacent to (adsorbed on) metal surfaces.
Reminder: MSE Ph.D. Dissertation Defense: Angie C. Lin (Tues Nov 8, 10am, CISX Auditorium)
University Ph.D. Dissertation Defense
Department of Materials Science and Engineering
All-epitaxial orientation-patterned III-V semiconductors for nonlinear optics
Angie C. Lin
Advisor: Professor James S. Harris
Tuesday, November 8, 2011
10 am (refreshments at 9:45 am)
CIS-X Auditorium, Paul G. Allen building
Applications such as airborne countermeasures, chemical spectroscopy, and imaging require high-power, compact, and tunable light sources in the infrared (IR) and Terahertz (THz) spectral ranges. While laser sources exist at certain frequencies in this range, they are bulky and require low temperature operation. Another solution is to generate the desired IR and THz frequencies through nonlinear optical frequency conversion in orientation-patterned III-V semiconductors, from readily available high-power lasers in the near-IR. Achieving high conversion efficiencies requires the optical signals to be quasi-phase-matched (QPM) inside the semiconductor.
Orientation-patterning is an all-epitaxial technique in which we fabricate QPM semiconductor structures by the following steps: growth by molecular beam epitaxy (MBE), lithography, etching, and regrowth by MBE. Previous work on orientation-patterned GaAs has led to demonstration of a variety of nonlinear optical devices; however, there is a push to develop orientation-patterned GaP (OP-GaP) to overcome inherent material limitations in GaAs. This thesis work has been focused on the development of OP-GaP, including MBE growth and characterization of GaP films on Si and processing of OP-GaP structures. Improvements in material quality have been made through the course of studying the nucleation and growth conditions of GaP on Si to control the formation and annihilation of antiphase domain defects. Understanding the growth of GaP on Si has not only enabled the development of OP-GaP as a platform for nonlinear optical devices, but also for III-V epitaxial mirrors on Si substrates for optical coatings.
Process Clinic 11/7/11
The SNF staff wants to remind you we will be holding the Process Clinic
weekly until the shutdown. The Process Clinic is held between 2pm-3pm,
so please bring your process, equipment or miscellaneous questions.
Due to lack of conference rooms, today's Process Clinic will be held in
the cubicles outside of the staff offices.
Regards,
SNF Staff
Re: Problem p5000etch SNF 2011-11-05 20:24:41: wafer not recognized after clamping the cassette A
reminder: seminar 4-5 in Allen 101X TODAY: Prof. Sindy Tang, ME Dept.
Reconfigurable Optics Based on Liquid-Liquid Interfaces
Prof. Sindy K. Y. Tang
Dept. of Mechanical Engineering, Stanford University
Abstract:
Optofluidics, a new class of optical devices with optical interfaces formed between two liquids, possess unique characteristics that are not achievable in conventional solid-state optical systems. In optofluidic systems, it is possible to reconfigure and fine-tune the optical output in real time by manipulating liquid composition or the shape of the liquid-liquid interface dynamically. In addition, liquid-liquid interfaces are intrinsically smooth as a result of minimization of interfacial energy. Polishing is thus unnecessary. Furthermore, it is straightforward to obtain a graded profile of refractive index by taking advantage of diffusion between miscible liquids possessing different refractive indices to create devices such as GRIN lenses. This talk focuses on the design and development of optical components based on dynamic liquid-liquid interfaces in microfluidic systems: liquid waveguides, lenses, and multi-color droplet dye lasers.
Sindy K.Y. Tang joined the faculty of Stanford University in September 2011 as an assistant professor in the Department of Mechanical Engineering. She received her B.S. degree in Electrical Engineering from California Institute of Technology in 2003, M.S. from Stanford University in 2004, and Ph.D. from Harvard University in Engineering Sciences in 2010. Dr. Tang’s research interests include optofluidics, microfluidics and nanophotonics for the development of tools for biology and smart materials.
Sunday, November 6, 2011
Dummy HSQ-patterned samples
Robert Chen
Electrical Engineering Ph.D. Candidate
Harris MBE Group, Stanford University
http://robochen.web.stanford.edu
Saturday, November 5, 2011
Problem p5000etch SNF 2011-11-05 20:24:41: wafer not recognized after clamping the cassette A
It seems something wrong with clamping sensing.
Friday, November 4, 2011
misplaced mask. nanopore2.0
It looks like I've misplaced my mask. the label on it should read "nanopore2.0".
If you've seen this mask in the fab could you drop me a note by email
or call me at 408 504 3402?
thanks
-Kee
EE Ph.D. Dissertation Defense: Meredith M. Lee (Friday Nov. 11, 10AM, CIS-X Auditorium)
University Ph.D. Dissertation Defense
Department of Electrical Engineering
Tunable Photonic Crystal Biosensors for Portable Label-Free Diagnostics
Meredith M. Lee
Advisor: Professor James S. Harris
Co-Advisor: Professor Shanhui Fan
Friday, November 11, 2011
10 AM (refreshments at 9:45 AM)
Allen (Center for Integrated Systems-X) Auditorium
Thursday, November 3, 2011
Dry film resist laminator
Wednesday, November 2, 2011
Open positions at Synaptics
Synaptics is hiring and they have a lot of open positions in the US (Santa Clara, New York, Austin), China, Taiwan, Japan and Korea (see below). If you are interested in any of the positions below, just send me your resume/CV and I will make sure that it gets to the right person (it is always better if the resume is handed internally). And if you have friends that are also looking for a job, I can forward their resume too. Please do not hesitate to write to me if you have any questions: elkallas@stanford.edu or pascale.kallassi@synaptics.com.
Best regards,
Pascale El Kallassi
-------------------------------------------------------------------------------------------------------------
Synaptics was recently named one of Forbes' Top 20 Small Public Companies! With leading-edge features, design, and systems engineering, Synaptics continues to pioneer into the next generation of interface design. The PC, slate, and mobile industries challenge us to differentiate in the expanding world of touch.
Our vision, enriching the interaction between humans and intelligent devices, has enabled some of the world's most innovative concepts and devices. We are excited to work on gadgets that we see every day and we look forward to making them fun and easier to use.
Open positions:
CHINA – Shenzhen
IRC27900 - Sr. Manufacturing Engineer - Lemke, David
IRC28564 - System Engineer - Rehn, Chris
IRC25918 - System Design Engineer - Yim, Simon
JAPAN
IRC29940 - System Engineer - Mera, Yuhka
KOREA
IRC27340 - Field Applications Engineer - Cho, Donald
IRC25920 – System Engineer – Kim, Ilsun
TAIWAN
IRC29600 - System Engineer - Yau, David
IRC25910 - Senior SW Engineer - Srinivasan, Mahesh
US – Austin
IRC25932 - Sr. Mixed Signal IC Design Engineer - Kozak, Mujo
US – New York
IRC28200 - Analog/MXS Design Engineer - Knausz, Imre
US – Santa Clara
IRC21410 - Senior Analog Mixed-Signal Design Engineer - Lo, Steve
IRC24060 - Sr. Product Marketing Manager - Brady, John
IRC24080 - Applications Engineer - Constable, Dave
IRC24420 - Sr. System Architect - Schwartz, Adam
IRC24509 - Sr. Firmware Engineer - Eryilmaz, Erol
IRC25861 - Sr. Digital Design Engineer - Pearce, Mark
IRC25905 - Director, WW Field Applications Engineering - Long, Dave
IRC25908 - Platform Embedded Firmware Manager - Hodgson, Robin
IRC25914 - Applications Engineer - Lim, Chin
IRC26199 - Test Methodology Engineer - McCoy, Tom
IRC26700 - System Architect - Kumar, Shwetank
IRC27080 - Sr. Digital Design Engineer - Pearce, Mark
IRC27120 - Sr. Windows Software Engineer - Jones, Russ
IRC28320 - Systems Design Engineer - Spray, Andrew
IRC28340 - Sr. Firmware Engineer - Peng, Earl
IRC28720 - Sr. Windows Software Engineer - Jones, Russ
IRC30480 - Sr. Firmware Engineer - Satriya, Hari
IRC30500 - Firmware Manager - Eryilmaz, Erol
IRC30820 - Sr. QA Automation Engineer - Gregoire, Donald
IRC30900 - Sr. Software Engineer - Chilamakuri, Chenchu
IRC31421 - Sr. CAD Engineer - Musunuri, Rao
Re: Problem p5000etch SNF 2011-11-01 09:08:00: Ch.A is down for a BCl3 cylinder change
MSE Ph.D. Dissertation Defense: Angie C. Lin (Tues Nov 8, 10am, CISX Auditorium)
University Ph.D. Dissertation Defense
Department of Materials Science and Engineering
All-epitaxial orientation-patterned III-V semiconductors for nonlinear optics
Angie C. Lin
Advisor: Professor James S. Harris
Tuesday, November 8, 2011
10 am (refreshments at 9:45 am)
CIS-X Auditorium, Paul G. Allen building
Applications such as airborne countermeasures, chemical spectroscopy, and imaging require high-power, compact, and tunable light sources in the infrared (IR) and Terahertz (THz) spectral ranges. While laser sources exist at certain frequencies in this range, they are bulky and require low temperature operation. Another solution is to generate the desired IR and THz frequencies through nonlinear optical frequency conversion in orientation-patterned III-V semiconductors, from readily available high-power lasers in the near-IR. Achieving high conversion efficiencies requires the optical signals to be quasi-phase-matched (QPM) inside the semiconductor.
Orientation-patterning is an all-epitaxial technique in which we fabricate QPM semiconductor structures by the following steps: growth by molecular beam epitaxy (MBE), lithography, etching, and regrowth by MBE. Previous work on orientation-patterned GaAs has led to demonstration of a variety of nonlinear optical devices; however, there is a push to develop orientation-patterned GaP (OP-GaP) to overcome inherent material limitations in GaAs. This thesis work has been focused on the development of OP-GaP, including MBE growth and characterization of GaP films on Si and processing of OP-GaP structures. Improvements in material quality have been made through the course of studying the nucleation and growth conditions of GaP on Si to control the formation and annihilation of antiphase domain defects. Understanding the growth of GaP on Si has not only enabled the development of OP-GaP as a platform for nonlinear optical devices, but also for III-V epitaxial mirrors on Si substrates for optical coatings.
Tuesday, November 1, 2011
ME395 Seminar 11/3; Evelyn Wang from MIT
Autumn 2011-2012
Nanoengineered Surfaces: Transport Phenomena and Energy Applications
Presented by
Evelyn N. Wang
Associate Professor of Mechanical Engineering
Massachusetts Institute of Technology
Thursday, November 3, 2011
4:15 PM in Bldg. 380 room 380Y
Nanoengineered surfaces offer new possibilities to manipulate fluidic and thermal transport processes for a variety of applications including lab-on-a-chip, thermal management, and energy conversion systems. In particular, nanostructures on these surfaces can be harnessed to achieve superhydrophilicity and superhydrophobicity, as well as to control liquid spreading, droplet wetting, and bubble dynamics. In this talk, I will discuss fundamental studies of droplet and bubble behavior on nanoengineered surfaces, and the effect of such fluid-structure interactions on boiling and condensation heat transfer. Three-dimensional micro, nano, and hierarchical structured arrays were fabricated to create superhydrophilic and superhydrophobic surfaces with unique properties. For example, with asymmetric superhydrophilic nanopillars, uni-directional spreading of water droplets was achieved where the liquid spreads only in the direction of the pillar deflection. With hierarchical superhydrophobic surfaces that mimic the superior non-wettability of a lotus leaf, water droplets rebound at velocities greater than 4 m/s. Energy-based models were developed to explain and predict such behavior as functions of pertinent parameters. Furthermore, we investigated the effect of nanostructure design to enhance heat transfer during pool boiling and dropwise condensation. A critical heat flux of 196 W/cm2 with a heat transfer coefficient greater than 80 kW/m2K was achieved during pool boiling. In addition, with stable dropwise condensation surfaces, heat transfer enhancements of 4-6x were demonstrated with partially suspended droplet morphologies. These studies provide insights into the complex physical processes underlying fluid-nanostructure interactions. Furthermore, this work shows significant potential for the development and integration of nanoengineered surfaces to advance next generation energy systems.
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