Monday, August 31, 2009

Announcement for changes in SNF for a new fiscal year

SNF Lab Members:

As Tuesday represents the start of a new fiscal year, I wanted to alert
you to a couple of items of note:

First, we have decided that because of overall financial challenges,
both within and outside the university, we will have NO rate increase
this year. We hope that this will provide a measure of relief to our
entire user community during this critical time.

Second, after discussing matters with Dean Plummer and key SNF faculty
Members and users, we will reorganize SNF operation for several key
technical functions by combining process and maintenance together. I have
asked John Shott to assume the position of SNF Interim Director, and have
decided to step down as Director of SNF, while I will continue to
supervise the senior SNF staff for NSF-sponsored NNIN program and a variety

of collaborative research programs as NNIN Stanford Site Director.

I am confident that John and our technical staff will strive to make our
tools and processes meet the research needs of the broadest possible
research community.

Should you have any questions, please do not hesitate to contact John or
me. We will each be happy to meet with you.

Thank you,

Yoshio

REMINDER: Chen Fang Ph.D. Dissertation Defense Today, 1:30pm, MERL Rm.203

Department of Mechanical Engineering
University PhD Dissertation Defense

Impact of Surface Tension on Microchannel Two-Phase Flow

Chen Fang

Research Advisor: Professor Kenneth E. Goodson

Time: Monday August 31, 2009 @ 1:30 p.m. (Refreshments at 1:15 p.m.)
Location: MERL(Mechanical Engineering Research Lab) Conference Room (Rm. 203)

Abstract

Understanding the physics of microchannel two-phase flow is important for a broad variety of engineering problems. At microscale, small Bond number, Capillary number and Weber number indicate that the surface tension force dominates gravity, viscous force, and inertial force. In the confined space with complex geometry, i.e. porous media, the interaction between fluid phase and solid phase is of particular importance, and the surface hydrophobicity and contact angle hysteresis effect plays a significant role. In micro-devices involving phase change process, the inter-phase mass transfer coupled with the interfacial force further adds to the complexity of the problem, leading to many unique characteristics of the microchannel two-phase flow.

The first part of the work aims at developing a numerical model within the frame work of volume-of-fluid method to simulate the contact angle hysteresis effect governing the microchannel two-phase flow. The model is validated against two engineering problems, i.e. the sidewall water injection in the microchannel and the droplet detachment on a spinning plate. The comparison between model prediction and the experimental visualization shows that the new model accounting for the contact angle hysteresis effect can dramatically improve the simulation accuracy.

The second part of the talk is dedicated to the development and validation of the capillary force model used for simulating the multiphase flow in porous with controlled hydrophobicity. The model is then applied to the simulation of boiling flow in the vapor-venting microchannel, which enables the capillary-aided phase separation for heat removal capacity enhancement. The simulation replicates the capillary-induced vapor-venting process, and clearly shows that the vapor-venting microchannel can effectively suppress the channel clogging and dry-out.

The third part of the talk explores the impact of surface tension and channel hydrophobicity on the microchannel condensation. High speed imaging technique in conjunction with the interferometry is employed to study the flow pattern and construct the 3D liquid-vapor interface profile. The measured exotic interface shape is compared with the prediction of a compact model accounting for the capillary-assisted liquid transfer effect. The agreement clearly shows the dominant effect of the surface tension on the condensation flow in the microchannel.The influence of channel hydrophobicity on the heat transfer characteristic is also investigated.

Saturday, August 29, 2009

Problem p5000etch SNF 2009-08-29 23:53:54: issues with Ch.A

In addition to seeing the same thing as Nancy (i.e. high BCl3 flow), also getting low pressure error. (Pressure was ~150-180 mT vs. setpoint of 200 mT)

Friday, August 28, 2009

Problem p5000etch SNF 2009-08-28 12:17:45: BCl3 flow high

During post clitch check out BCl3 is running high- set pt = 40, actual = 50. Enough to alarm system.

SNF is again open following the power outage ....

SNF Lab Members:

The lab is once again open for business following this morning's power outage. With very few exceptions, virtually all tools should be functional. Of course, as is the case after every "event" of this type, you should carefully check tool status, examine recipes, and run a test prior to committing important samples to any step.

We don't yet know the full story as to what caused this, but we understand that it was a brief power outage that affected much, if not all, of the campus.

Happy processing,

John

Thursday, August 27, 2009

amorphous silicon depositon - outsourcing

Dear SNF community:

 

We are looking for places who can do amorphous silicon depositions on “non clean” substrates. Please let me know, if you know any leads.

 

Thanks,

Rainer

 

 

Rainer Fasching, PhD

Cons. Associate Professor

Mechanical Engineering and Design

Stanford University

Phone: 415-505-3385

Fax: 650-723-5034

Skype: rfasch

Email: rfasch@stanford.edu

 

 

 

 

Ph.D. Defense announcement: Chen Fang (Monday August 31 @ 1:30pm)

Department of Mechanical Engineering

University PhD Dissertation Defense

Impact of Surface Tension on Microchannel Two-Phase Flow

Chen Fang

Research Advisor: Professor Kenneth E. Goodson

Time: Monday August 31, 2009 @ 1:30 p.m. (Refreshments at 1:15 p.m.)
Location: MERL(Mechanical Engineering Research Lab) Conference Room (Rm. 203)

Abstract

Understanding the physics of microchannel two-phase flow is important for a broad variety of engineering problems. At microscale, small Bond number, Capillary number and Weber number indicate that the surface tension force dominates gravity, viscous force, and inertial force. In the confined space with complex geometry, i.e. porous media, the interaction between fluid phase and solid phase is of particular importance, and the surface hydrophobicity and contact angle hysteresis effect plays a significant role. In micro-devices involving phase change process, the inter-phase mass transfer coupled with the interfacial force further adds to the complexity of the problem, leading to many unique characteristics of the microchannel two-phase flow.

The first part of the work aims at developing a numerical model within the frame work of volume-of-fluid method to simulate the contact angle hysteresis effect governing the microchannel two-phase flow. The model is validated against two engineering problems, i.e. the sidewall water injection in the microchannel and the droplet detachment on a spinning plate. The comparison between model prediction and the experimental visualization shows that the new model accounting for the contact angle hysteresis effect can dramatically improve the simulation accuracy.

The second part of the talk is dedicated to the development and validation of the capillary force model used for simulating the multiphase flow in porous with controlled hydrophobicity. The model is then applied to the simulation of boiling flow in the vapor-venting microchannel, which enables the capillary-aided phase separation for heat removal capacity enhancement. The simulation replicates the capillary-induced vapor-venting process, and clearly shows that the vapor-venting microchannel can effectively suppress the channel clogging and dry-out.

The third part of the talk explores the impact of surface tension and channel hydrophobicity on the microchannel condensation. High speed imaging technique in conjunction with the interferometry is employed to study the flow pattern and construct the 3D liquid-vapor interface profile. The measured exotic interface shape is compared with the prediction of a compact model accounting for the capillary-assisted liquid transfer effect. The agreement clearly shows the dominant effect of the surface tension on the condensation flow in the microchannel.The influence of channel hydrophobicity on the heat transfer characteristic is also investigated.

Wednesday, August 26, 2009

Re: Comment p5000etch SNF 2009-08-25 15:13:32: Update

archived

Re: Shutdown p5000etch SNF 2009-08-24 15:19:05: Computer reboot

Reseated the SBC board. Tested all chambers.

RTA question

Dear labmembers,

Does any one know whether SNF has a RTA which can go as high as 1050 C or even higher. Anneal in air is good enough. Thank you very much.

Shuang

Tuesday, August 25, 2009

Comment p5000etch SNF 2009-08-25 15:13:32: Update

Unable to start-up the system. Unable to turn on Ch.A and Ch. B pumps. Also cant turn on the heat exchangers. Will call field service tomorrow.

Thesis Defense - Li Zhang

 
Quasi-One Dimensional Nano-Materials for Nanoelectronic Devices
 
Li Zhang
Department of Chemistry, Stanford University
Advisor: Prof. Hongjie Dai
 
Date: Thursday August 27th, 2009
 
Time: 10:00 AM (Refreshments at 9:45 AM)
 
Location: BrauLec (in Mudd chemistry building)
 
 
Abstract
 


As the scaling of silicon based electronic devices is approaching limitation set by the physical and materials properties, several high mobility materials have gained much interest as possible substitutions of silicon for future electronics. This thesis focuses on single walled carbon nanotubes (SWNTs), graphene nanoribons (GNRs) and germanium nanowires (GeNWs) due to their unique properties.

Germanium nanowires (GeNWs) are one potential material to address the future device scaling limitation owing to their high hole and electron mobilities. However, the device performance is limited due to the insufficient electrostatic control over charge carriers in the channel in the typical back-gate or top-gate geometry. And the mobility analysis based on capacitance modeling alone without direct measurement could give errors due to a lot of uncertainties. In the first part of this dissertation, I will demonstrate a novel surround gate structure of GeNW FETs using a novel self-aligned fabrication approach. Individual SG GeNW FETs show improved switching over GeNW FETs with planar gate stacks owing to improved electrostatics. FET devices comprised of multiple quasi-aligned SG GeNWs in parallel afford on-currents exceeding 0.1 mA at low source-drain bias voltages. Direct experimental evidence show that SG nanowire transistors exhibit higher capacitance and better electrostatic gate control than top-gated devices, and are the most promising structure for future high performance nanoelectronics.
 

Single walled carbon nanotubes are molecular quantum wires (diameter ~ 1nm) which are highly chemically stable and exhibit outstanding electrical conductivity. However, typical synthesis of SWNTs yields a mixture of both metallic and semiconducting varieties with a range of diameters. Several methods have been reported to separate SWNTs and anion exchange (IEC) chromatography has shown the most promise for electronic type separation . In the second part of the dissertation, I will discuss the characterization of IEC separation efficiency by combining spectroscopy and electrical measurents. In the early experiement, the SWNTs were separated according to diameter and electronic types and the separation efficiency decreased with increasing tube diameter. The separation efficiency was much improved by using the new DNA sequence to suspend the SWNTs and single-chirality-enrichment were achieved.

Graphene is single layer graphite, which is predicted to exhibit bandgaps useful for room temperature transistor operations with excellent switching speed and high mobilities when made into narrow ribbons (sub-10 nm). And the all-semiconducting nature of sub-10 nm GNRs could bypass the problem of extreme chirality dependence of metal or semiconductor nature of carbon nanotubes (CNTs) for future electronics. Currently, making GNRs remains challenging by lithographic, chemical or sonochemical methods. It is difficult to obtain GNRs with controllable width at high yields. In the third part of the thesis, I will show an interesting approach to making GNRs by using plasma etching to unzip multiwalled carbon nanotubes partially embedded in a polymer film. The GNRs exhibit a narrow width distribution between 10-20 nm. Electrical transport measurements confirmed the bandgap opening in narrow GNRs.

 
--
Li
---------------------------------------
Li Zhang
Dai's Group
Department of Chemistry
Stanford University

Monday, August 24, 2009

Shutdown p5000etch SNF 2009-08-24 15:19:05: Computer reboot

System computer has rebooted and is in the boot-up screen. Did not have time to work on it.

Process Clinic Today (Monday, 8/24) 2 pm

Greetings Labmembers --


Process Clinic today, Monday, Aug 24, 2 pm, in the cubicle area outside
Maureen's office. Bring process questions, mask layouts, SpecMat
requests. New labmembers are especially encouraged to come and review
process flows and runsheets. Experienced people will be on hand for discussion.


Your SNF staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

International Winter School for Graduates

Once again, NNIN will conduct an International Winter School for Graduate Students, this year in Mumbai at  IIT-Bombay,  Nov 30-Dec 13, 2009. Travel will begin on Friday Nov. 27.  This year's topic will be Nanoelectronics.  This follows last years inaugural offering on Organic Electronics and Optoelectronics held at IIT-Kanpur.

The School will consist on an intense technical course on Nanoelectronics at the graduate level--a one semester course taught over an intense 6 days. The course will be taught by leading faculty from US and Indian institutions.  Approximately 10 outstanding graduate students from across the US will be chosen to participate. They will be joined by 50 or more students and faculty from India.

After the technical course, the US and Indian participants will participate in a field experience for 4 or 5 days in an Indian village, working with a local NGO.

We encourage applications from serious, adventurous, advanced graduate students with an interest in Nanoelectronics, in the international aspects of scientific research, and in the impact of science and technology on the 3d world.

Participants DO NOT have to be from NNIN institutions and DO NOT have to be NNIN users. We encourage all outstanding graduate students ( US citizens and permanent residents only) to apply. Travel expenses will be paid by NNIN.

Application information is available at http://www.nnin.org/nnin_iwsg_2009.html .

The application deadline is September 14, 2009.

For questions, please contact Rathbun@cnf.cornell.edu.

Lynn Rathbun
NNIN Program Manager

**************************************************************
Dr. Lynn Rathbun                                        Rathbun@cnf.cornell.edu
NNIN  Program Manager                     (607)-254-4872
CNF Laboratory Manager                                     
Duffield Hall                                                (607)-255-8601 Fax
Cornell University                                       (607)-592-1549 Work Cell
Ithaca, New York 14853                      (607)-342-1880 Personal Cell




Friday, August 21, 2009

looking for holder for one-side liquid etching from Uli

All,

I am looking for the wafer holder that allows you to etch only one side
of a wafer in liquids. Normally, Uli has it in her office, but she is
on vacation. I had
a look in the spot in her office where she stores it with Maureen, but
it is not there.

I would like to use it later today and on the weekend, please if you
know
where it is let me know. Thank you


Mario

Thursday, August 20, 2009

REMINDER: Jeremy Rowlette PhD dissertation defense Today 1:00 PM, CIS-X Aud.

Department of Electrical Engineering
University PhD Dissertation Defense

Energy Conversion and Transport in Silicon Nanostructures

Jeremy A. Rowlette

Research Advisor: Professor Ken Goodson

Thursday August 20, 2009 @ 1:00 p.m. (Refreshments at 12:45 p.m.)
Paul Allen Building (formerly CIS-X), Auditorium

Abstract

We examine fundamental energy conversion and transport processes in silicon nanostructures which are relevant to the operation of emerging silicon-based nanoelectronic and nanophotonic devices. The theoretical and experimental work presented here will facilitate the design of improved nanodevices ranging from compact transistors, to quantum dot-based optical sources, detectors, and modulators.

In the first half of the talk, we discuss electron-phonon and phonon-phonon energy conversion within nanoscale silicon transistors under conditions of strong departure from thermal equilibrium. As "hot" electron relaxation tends to favor optical phonon (OP) emission, the conversion from OPs to the acoustic phonons (APs) responsible for heat conduction can yield an energy conversion bottleneck in the drain leading to reduced drive currents and even negative differential conductance effects [1]. We determine the conditions necessary for reaching this critical state in silicon-based nanodevices by developing self-consistent Monte Carlo device simulations which fully couple the electron and phonon systems while accurately accounting for electron and phonon energy dispersion [2]. To assist these calculations, we use anharmonic perturbation theory to compute the two-phonon final-states spectrum and lifetime for selected longitudinal OPs, which have high occupancies during transistor switching.

In the second half of the talk, we discuss photon-electron and electron-electron energy conversion within dense (~10^18 cm^-3) systems of small (~5 nm) luminescent silicon nanocrystals (NCs) embedded in amorphous dielectric films, a family of materials which includes annealed silicon rich oxides and nitrides (SRO, SRN), as well as porous silicon (PS). These materials exhibit stable, room-temperature visible and near-infrared luminescence as well as the ability to sensitize codoped Er3+ ions and are therefore promising for the development of inexpensive, CMOS-compatible short-range optical sources. Despite their promise, it has been shown that fast (< ns) nonradiative carrier recombination (NRCR), coupled with long (> µs) photoluminescence lifetimes, severely limit the prospects for achieving practical levels of optical gain. We characterize these NRCR and associated energy conversion processes by measuring the excited carrier dynamics of optically pumped NCs using a custom-built, two-color picosecond pump-probe measurement system. The unique dependence of the excited carrier losses vs. pump-probe delay and vs. pump intensity reveals enhanced NRCR at high NC occupancies, which we determine to be caused by long–range Coulombic dipole-dipole (d-d) interaction and energy transfer between excited NCs [3]. Finally, we derive the scaling of the effective d-d interaction strength of the NC ensemble in low-dimensional systems and present recent experimental results on quasi-2D SRO films which further supports the interacting d-d model. Monte Carlo analysis is used to provide additional insight into the spatially distributed d-d energy conversion in selected low-dimensional systems.

[1] E. Pop, D. Mann, J. Cao, Q. Wang, K. Goodson, H. Dai. Phys. Rev. Lett. 95 155505 (2005)
[2] J. Rowlette and K. Goodson. IEEE Trans. Elect. Dev. 55 220 (2008)
[3] J. Rowlette, R. Kekatpure, M. Panzer, M. Brongersma, K. Goodson. Phys. Rev. B 80 045314 (2009)

Tuesday, August 18, 2009

Molecular Foundry Presentation

Reminder - Now! Please bring your lunch and join us.

--------------------------------------------------------------------------------------------------------------


Dr. David Bunzow, head of the User Program, and Dr. Aditi Risbud, a
material scientist who
oversees the PR/Outreach, both from the Lawrence Berkeley National
Laboratory Molecular Foundry, will be here to talk about
opportunities for SNF users to access the Foundry for their work:

Tuesday, August 18th
noon
Allen (formerly CIS) 101 (The Linville Room)

Here is an abstract of the talk:

This presentation will provide an overview of The Molecular Foundry
and the user program through which it provides researchers from
academia, industry and government no-cost access to expert scientific
personnel, and state-of-the-art instrumentation and techniques for
the advancement of nanoscale materials research. The Foundry is an
especially valuable resource for users pursuing multidisciplinary
research in the fields of biology, energy, engineering and physics.
Researchers can access six in-house user facilities for the
investigation of biological, organic, inorganic and microfabricated
nanoscale building blocks and their integration into complex
functional assemblies. The Foundry provides unique capabilities in
nanoimaging and spectroscopy, nanointerfaces, nanofabrication and
combinatorial nanoscience. Projects are considered in three basic
categories that include options for sample-only and instrument-only
collaborations in addition to fully supported standard programs. The
Foundry conducts three announced call for proposals cycles per calendar year.

Molecular Foundry Presentation

Reminder - Today! Please bring your lunch and join us.

--------------------------------------------------------------------------------------------------------------


Dr. David Bunzow, head of the User Program, and Dr. Aditi Risbud, a
material scientist who
oversees the PR/Outreach, both from the Lawrence Berkeley National
Laboratory Molecular Foundry, will be here to talk about
opportunities for SNF users to access the Foundry for their work:

Tuesday, August 18th
noon
Allen (formerly CIS) 101 (The Linville Room)

Here is an abstract of the talk:

This presentation will provide an overview of The Molecular Foundry
and the user program through which it provides researchers from
academia, industry and government no-cost access to expert scientific
personnel, and state-of-the-art instrumentation and techniques for
the advancement of nanoscale materials research. The Foundry is an
especially valuable resource for users pursuing multidisciplinary
research in the fields of biology, energy, engineering and physics.
Researchers can access six in-house user facilities for the
investigation of biological, organic, inorganic and microfabricated
nanoscale building blocks and their integration into complex
functional assemblies. The Foundry provides unique capabilities in
nanoimaging and spectroscopy, nanointerfaces, nanofabrication and
combinatorial nanoscience. Projects are considered in three basic
categories that include options for sample-only and instrument-only
collaborations in addition to fully supported standard programs. The
Foundry conducts three announced call for proposals cycles per calendar year.

Monday, August 17, 2009

PhD dissertation defense : Hyun-Yong Yu

Selective Heteroepitaxial Growth of Ge for Monolithic Integration of MOSFETs and Optical Devices

Hyun-Yong Yu

Department of Electrical Engineering, Stanford University

Advisor: Prof. Krishna C. Saraswat

 

Date: Thursday August 20th, 2009

Time: 9:30 AM (Refreshments at 9:15 AM)

Location: Paul Allen Building(Formerly CIS-X) CISX auditorium

 

Abstract

As Si bulk CMOS devices approach their fundamental scaling limit, diverse research is being done to introduce novel structures and materials. Its high carrier mobility and possible monolithic integration with Si based devices have prompted renewed interest in Ge based devices. For optical applications, it was challenging to make conventional Si photodetectors operate in 1.3-1.55μm wavelength range, due to its relatively large indirect (1.1eV) and direct (3.4eV) bandgaps. However, Ge’s smaller direct band gap energy (0.8eV) corresponding to ~1.55μm in wavelength and possible monolithic integration with Si CMOS technology make Ge a strong candidate for photodetectors. I demonstrate high performance Ge MOSFETs and optical devices which can be monolithically integrated to Si technology, by employing novel Ge heteroepitaxial growth and in-situ dopoing technique.

In the first part of this talk, we will talk about selective Ge heteroepitaxial growth on Si and in-situ doping technique for n+/p junction. Surface roughness of heteroepitaxially gorwn Ge on Si is considerably reduced by high temperature hydrogen annealing. Ge growth and hydrogen annealing steps are repeated until desired epi layer thickness is reached. High quality Ge film (minimal dislocation (1x107cm-2) and very smooth surface (0.65nm (RMS)) is achieved selectively on Si using SiO2 window. For abrupt and box shaped n+/p junction in Ge, in-situ phosphorus doping using PH3 is employed during the epitaxial growth. Temperature dependency of the dopant activation was investigated associated with the shallower and abrupt junction formation. This diode shows better characteristics (on/off ratio and on current density) compared with conventional ion-implanted junction.

In the second part of the talk, we will talk about high performance Ge MOSFETs and optic devices fabricated using selective Ge heteroepitaxial growth on Si. For n-MOSFETs, in-situ doping technique is used to form source and drain with very low series resistance and shallow junctions. p-MOSFET is fabricated with high-k/metal gate stack. Results show the highest electron mobility ever reported on (100) Ge n-MOSFETs and ~80% enhancement of hole mobility over Si universal mobility for p-MOSFETs. I also demonstrate normal incidence p-i-n photodiodes on selectively grown Ge. Enhanced efficiency in the near infrared regime and the absorption edge shifting to longer wavelength is achieved due to residual tensile strain. Measured responsivities are promising towards monolithically integrated on-chip optical links and in telecommunications.

 

Reminder: PhD dissertation defense today

Department of Applied Physics
University PhD Dissertation Defense


Dielectric Optical Antenna Emitters and Metamaterials


Jonathan Aaron Schuller

Research Advisor: Professor Mark Brongersma

17 August 2009 @ 2:00 p.m. (refreshments @ 1:45)
in
Allen Building (formerly CIS-X), Room 101

Abstract
Optical antennas are critical components in nanophotonics research due to their unparalleled ability to concentrate electromagnetic energy into nanoscale volumes. Researchers typically construct such antennas from wavelength-size metallic structures. However, recent research has begun to exploit the scattering resonances of high-permittivity particles to realize all-dielectric optical antennas, emitters, and metamaterials. In this talk, we experimentally and theoretically characterize the resonant modes of subwavelength rod-shaped dielectric particles and demonstrate their use in negative index metamaterials and novel infrared light emitters.
At mid-infrared frequencies, Silicon Carbide (SiC) is an ideal system for studying the behavior of dielectric optical antennas. At frequencies below the TO phonon resonance, SiC behaves like a dielectric with very large refractive index. Using infrared spectroscopy and analytical Mie calculations we show that individual rod-shaped SiC particles exhibit a multitude of resonant modes. Detailed investigations of these SiC optical antennas reveal a wealth of new physics and applications. We discuss the distinct electromagnetic field profile for each mode, and demonstrate that two of the dielectric-type Mie resonances can be combined in a particle array to form a negative index metamaterial. We further show that these particles can serve as "broadcasting" antennas. Using a custom-built thermal emission microscope we collect emissivity spectra from single SiC particles at elevated temperatures, highlighting their use as subwavelength resonant light emitters.
Finally, we derive and verify a variety of general analytical results applicable to all cylindrical dielectric antennas and discuss extensions of the demonstrated concepts to different materials systems and frequency regimes

Sunday, August 16, 2009

PhD dissertation defense: Jeremy A. Rowlette

Department of Electrical Engineering
University PhD Dissertation Defense

Energy Conversion and Transport in Silicon Nanostructures

Jeremy A. Rowlette

Research Advisor: Professor Ken Goodson

Thursday August 20, 2009 @ 1:00 p.m. (Refreshments at 12:45 p.m.)
Paul Allen Building (formerly CIS-X), Auditorium

Abstract

We examine fundamental energy conversion and transport processes in silicon nanostructures which are relevant to the operation of emerging silicon-based nanoelectronic and nanophotonic devices. The theoretical and experimental work presented here will facilitate the design of improved nanodevices ranging from compact transistors, to quantum dot-based optical sources, detectors, and modulators.

In the first half of the talk, we discuss electron-phonon and phonon-phonon energy conversion within nanoscale silicon transistors under conditions of strong departure from thermal equilibrium. As "hot" electron relaxation tends to favor optical phonon (OP) emission, the conversion from OPs to the acoustic phonons (APs) responsible for heat conduction can yield an energy conversion bottleneck in the drain leading to reduced drive currents and even negative differential conductance effects [1]. We determine the conditions necessary for reaching this critical state in silicon-based nanodevices by developing self-consistent Monte Carlo device simulations which fully couple the electron and phonon systems while accurately accounting for electron and phonon energy dispersion [2]. To assist these calculations, we use third-order anharmonic perturbation theory to compute the two-phonon final-states spectrum and lifetime for selected longitudinal OPs, which have high occupancies during transistor switching.

In the second half of the talk, we discuss photon-electron and electron-electron energy conversion within dense (~10^18 cm^-3) systems of small (~5 nm) luminescent silicon nanocrystals (NCs) embedded in amorphous dielectric films, a family of materials which includes annealed silicon rich oxides and nitrides (SRO, SRN), as well as porous silicon (PS). These materials exhibit stable, room-temperature visible and near-infrared luminescence as well as the ability to sensitize codoped Er3+ ions and are therefore promising for the development of inexpensive, CMOS-compatible short-range optical sources. Despite their promise, it has been shown that fast (< ns) nonradiative carrier recombination (NRCR), coupled with long (> µs) photoluminescence lifetimes, severely limit the prospects for achieving practical levels of optical gain. We characterize these NRCR and associated energy conversion processes by measuring the excited carrier dynamics of optically pumped NCs using a custom-built, two-color picosecond pump-probe measurement system. The unique dependence of the excited carrier losses vs. pump-probe delay and vs. pump intensity reveals enhanced NRCR at high NC occupancies, which we determine to be caused by long–range Coulombic dipole-dipole (d-d) interaction and energy transfer between excited NCs [3]. Finally, we derive the scaling of the effective d-d interaction strength of the NC ensemble in low-dimensional systems and present recent experimental results on quasi-2D SRO films which further supports the interacting d-d model. Monte Carlo analysis is used to provide additional insight into the spatially distributed d-d energy conversion in selected low-dimensional systems.

[1] E. Pop, D. Mann, J. Cao, Q. Wang, K. Goodson, H. Dai. Phys. Rev. Lett. 95 155505 (2005)
[2] J. Rowlette and K. Goodson. IEEE Trans. Elect. Dev. 55 220 (2008)
[3] J. Rowlette, R. Kekatpure, M. Panzer, M. Brongersma, K. Goodson. Phys. Rev. B 80 045314 (2009)

Friday, August 14, 2009

Looking for missing reticle

Hi all,

I've lost my ASML recticle. The reticle's name is 'RMG' and is in red COMPUGRAPHIC case.
If you happened to see this reticle, please notice me.

Thanks in advance,
Yeul

Thursday, August 13, 2009

2009-10 Department Sponsorship Apps Available

Dear Lab Members,

 

The new 2009-10 Department Sponsorship application is available now.  You can either come over to my cubicle (#41) located on the first floor of the Paul G. Allen building and pick one up from the hanging folder outside my cubicle or print the attached application.   This form must be renewed annually and submitted to Parking and Transportation by September 1st 2009 along with a completed 2009-10 Parking Permit Application in order to purchase your new Parking Permit.

 

Maureen

 

Maureen Baran

Stanford Nanofabrication Facility

Lab Services Administrator

mbaran@stanford.edu

650-725-3664

 

Wednesday, August 12, 2009

Re: DLTS and Hall measurement

Hello Hui,

He is not really "local", but the resident Hall mobility profile measurement person in CA is Si Prussin, an adjunct prof at UCLA.   See attached IIT08 paper.   You can email him at pru@ee.ucla.edu.

And very much not local, but very interesting is the work by the folks in and near Copenhagen, at DTU and CAPRES, see attached papers.   You can contact Dirch Petersen at  dhpe@nanotech.dtu.dk. 

I do not know any active DLTSers.

these folks should be able to help and guide you.

Good luck.

Michael Current
1729 Comstock Way, San Jose, CA 95124
tel; 408-265-6192


-----Original Message-----
From: Hui Nie <huin@altadevices.com>
To: labmembers@snf.stanford.edu <labmembers@snf.stanford.edu>
Sent: Wed, Aug 12, 2009 12:28 pm
Subject: DLTS and Hall measurement

Hi All,

Do you know SNF has DLTS and Hall measurement tool? If not, is there any local
lab for DLTS and hall measurement service?

Thanks,

Hui


This e-mail message and attachments from Alta Devices, Inc is for the sole use
of the intended recipient(s). It may contain privileged or confidential
information. If you are not an intended recipient, or a person authorized to
receive this e-mail for an intended recipient, notify the sender immediately by
reply e-mail and delete this message and any attachments. Any unauthorized
dissemination or use of this message or any of its contents is strictly
prohibited.

DLTS and Hall measurement

Hi All,

Do you know SNF has DLTS and Hall measurement tool? If not, is there any local lab for DLTS and hall measurement service?

Thanks,

Hui


This e-mail message and attachments from Alta Devices, Inc is for the sole use of the intended recipient(s). It may contain privileged or confidential information. If you are not an intended recipient, or a person authorized to receive this e-mail for an intended recipient, notify the sender immediately by reply e-mail and delete this message and any attachments. Any unauthorized dissemination or use of this message or any of its contents is strictly prohibited.

Does anyone have SU8-2075?

Does anyone have any SU8-2075 that I can borrow?  I just need enough for 2-3 wafers.  I'm ordering a new bottle and can replace whatever amount I use when it arrives, but that won't be for another week or so.

Thanks,
Kat

Tuesday, August 11, 2009

Re: Reminder: PhD defense - Irene Goldthorpe

Mani,

I was going to pick up my nephew at the airport, but just got a VM
saying they are stuck for the night in Toronto.
So not yet sure what is going on.

I might swing by the gym and perhaps even climb. When are you going to
be there?

Andreas


On Aug 11, 2009, at 3:11 PM, Irene Goldthorpe wrote:

> SYNTHESIS AND CHARACTERIZATION OF GERMANIUM NANOWIRES AND GERMANIUM/
> SILICON RADIALLY HETEROSTRUCTURED NANOWIRES
>
> Irene Goldthorpe
> Department of Materials Science and Engineering
> Advisor: Prof. Paul McIntyre
>
> Thursday, August 13th, 10:00 am (refreshments at 9:45 am)
> Location: McCullough 115
>
> ABSTRACT:
>
> Because semiconductor nanowires possess a variety of technologically
> useful properties and can be synthesized with relative ease, they
> are attractive candidates for a wide range of electronic, optical,
> sensing, and energy applications. The first part of this talk will
> focus on germanium nanowires, because of germanium's compatibility
> with standard integrated circuit fabrication processes, its high
> electron and hole mobilities, and the low temperature required for
> germanium nanowire growth. The chemical vapor deposition of
> epitaxially-aligned germanium nanowires with uniform diameters
> between 5 and 50 nm will be discussed. Next, I will demonstrate the
> synthesis of a radial heterostructure, where silicon is
> heteroepitaxially deposited around a germanium nanowire. This
> silicon shell passivates the germanium nanowire surface, creates an
> electronic band offset to confine holes away the surface where they
> can scatter or recombine, and induces strain which could allow for
> the engineering of properties such as carrier mobilities and band
> gap. Detailed transmission electron microscopy and x-ray
> diffraction characterization of various Ge-core/Si-shell nanowire
> samples show that, analogous to planar heteroepitaxy, surface
> roughening and misfit dislocations relax misfit strain. Lessons
> learned generated strategies to avoid the strain-induced surface
> roughening that promotes dislocation nucleation, resulting in the
> fabrication of metastably strained, dislocation-free core-shell
> nanowires.

---
Andreas Goebel
cell 408-464-2790

Reminder: PhD defense - Irene Goldthorpe

SYNTHESIS AND CHARACTERIZATION OF GERMANIUM NANOWIRES AND GERMANIUM/SILICON RADIALLY HETEROSTRUCTURED NANOWIRES

Irene Goldthorpe
Department of Materials Science and Engineering
Advisor: Prof. Paul McIntyre

Thursday, August 13th, 10:00 am (refreshments at 9:45 am)
Location: McCullough 115

ABSTRACT:

Because semiconductor nanowires possess a variety of technologically useful properties and can be synthesized with relative ease, they are attractive candidates for a wide range of electronic, optical, sensing, and energy applications. The first part of this talk will focus on germanium nanowires, because of germanium's compatibility with standard integrated circuit fabrication processes, its high electron and hole mobilities, and the low temperature required for germanium nanowire growth. The chemical vapor deposition of epitaxially-aligned germanium nanowires with uniform diameters between 5 and 50 nm will be discussed. Next, I will demonstrate the synthesis of a radial heterostructure, where silicon is heteroepitaxially deposited around a germanium nanowire. This silicon shell passivates the germanium nanowire surface, creates an electronic band offset to confine holes away the surface where they can scatter or recombine, and induces strain which could allow for the engineering of properties such as carrier mobilities and band gap. Detailed transmission electron microscopy and x-ray diffraction characterization of various Ge-core/Si-shell nanowire samples show that, analogous to planar heteroepitaxy, surface roughening and misfit dislocations relax misfit strain. Lessons learned generated strategies to avoid the strain-induced surface roughening that promotes dislocation nucleation, resulting in the fabrication of metastably strained, dislocation-free core-shell nanowires.

Molecular Foundry Presentation

Leonce Gaiter from the Lawrence Berkeley National Laboratory will be
here to talk about opportunities for SNF users to access the
Molecular Foundry for their work:

Tuesday, August 18th
noon
Allen (formerly) CIS 101 (The Linville Room)

Here is an abstract of the talk:

This presentation will provide an overview of The Molecular Foundry
and the user program through which it provides researchers from
academia, industry and government no-cost access to expert scientific
personnel, and state-of-the-art instrumentation and techniques for
the advancement of nanoscale materials research. The Foundry is an
especially valuable resource for users pursuing multidisciplinary
research in the fields of biology, energy, engineering and physics.
Researchers can access six in-house user facilities for the
investigation of biological, organic, inorganic and microfabricated
nanoscale building blocks and their integration into complex
functional assemblies. The Foundry provides unique capabilities in
nanoimaging and spectroscopy, nanointerfaces, nanofabrication and
combinatorial nanoscience. Projects are considered in three basic
categories that include options for sample-only and instrument-only
collaborations in addition to fully supported standard programs. The
Foundry conducts three announced call for proposals cycles per calendar year.

Monday, August 10, 2009

University PhD Dissertation Defense for Jonathan A. Schuller

Department of Applied Physics
University PhD Dissertation Defense


Dielectric Optical Antenna Emitters and Metamaterials


Jonathan Aaron Schuller

Research Advisor: Professor Mark Brongersma

17 August 2009 @ 2:00 p.m.
in
Allen Building (formerly CIS-X), Room 101

Abstract
Optical antennas are critical components in nanophotonics research due to their unparalleled ability to concentrate electromagnetic energy into nanoscale volumes. Researchers typically construct such antennas from wavelength-size metallic structures. However, recent research has begun to exploit the scattering resonances of high-permittivity particles to realize all-dielectric optical antennas, emitters, and metamaterials. In this talk, we experimentally and theoretically characterize the resonant modes of subwavelength rod-shaped dielectric particles and demonstrate their use in negative index metamaterials and novel infrared light emitters.
At mid-infrared frequencies, Silicon Carbide (SiC) is an ideal system for studying the behavior of dielectric optical antennas. At frequencies below the TO phonon resonance, SiC behaves like a dielectric with very large refractive index. Using infrared spectroscopy and analytical Mie calculations we show that individual rod-shaped SiC particles exhibit a multitude of resonant modes. Detailed investigations of these SiC optical antennas reveal a wealth of new physics and applications. We discuss the distinct electromagnetic field profile for each mode, and demonstrate that two of the dielectric-type Mie resonances can be combined in a particle array to form a negative index metamaterial. We further show that these particles can serve as "broadcasting" antennas. Using a custom-built thermal emission microscope we collect emissivity spectra from single SiC particles at elevated temperatures, highlighting their use as subwavelength resonant light emitters.
Finally, we derive and verify a variety of general analytical results applicable to all cylindrical dielectric antennas and discuss extensions of the demonstrated concepts to different materials systems and frequency regimes.

si deposition question

Hi all,

I have two short questions. I am trying to deposit 80nm si on Au.

 

1.       When depositing si in innotec, what’s the ballpark power that it will evaporate (the log book doesn’t have much si deposition)

 

2.       What recipe have you tried for si removal. According to the snf website, drytek1 will do the job….

 

 

I tried 80nm sio2 using sts but I get grainy clusters. My goal is to get 80nm of si or sio2 or SiNx , on Au with relatively okay uniformity and be able to remove this successfully.

 

 

Thank you!

 

Best Regards,

Sonny

__________________________________________________

 

"What makes the desert beautiful," said the Little Prince ,"is that somewhere it hides a well ."

    _.--.  _

   ;,-   `' (            ,,,

  (  E#=====#############=: ]

   :_"'  ,._(         ```

     `--'         rock on    

Sonny Vo

Department of Applied Physics, Stanford University

(626) 202-8379

Harris Research Group: http://snow.stanford.edu/index.html

 

 

 

Sunday, August 9, 2009

Re: Comment p5000etch SNF 2009-08-07 08:58:08: Ch.A is down

Reset mfc ribbon cable and flowed bcl3 at 20, 40, 60 and 80 %
and run flow verify w/out problem.

Friday, August 7, 2009

Updated Java Runtime Environment for Remote Coral on Windows ....

SNF Lab Members:

As a number of you will recall, Sun had recently released a version of the Java Runtime Environment (JRE) that contains Java Web Start that deploys Remote Coral.  That version failed to run and reported the error: "Unable to make a secure connection, please contact the lab staff." The solution required a downgrade to a previous version of the Java Runtime Environment.

Sun has released a new version of the Java Runtime Environment that appears to have resolved this issue.  While you do NOT need to upgrade to the latest version for any reason, if you choose to upgrade (or if the monthly Java Upgrade feature does an upgrade for you) here are a couple of things that may be of use to you.

First, the latest version is JRE 1.6.0_15 and can be downloaded from:

https://cds.sun.com/is-bin/INTERSHOP.enfinity/WFS/CDS-CDS_Developer-Site/en_US/-/USD/ViewProductDetail-Start?ProductRef=jre-6u15-oth-JPR@CDS-CDS_Developer

After you download this updated version, depending on the condition of your Java Web Start cache, you may find that you still get the error, "Unable to make a secure connection, please contact the lab staff."

If you do get that error, don't despair, here is how to fix it:

1. Under your Start menu, select the "Run ...." item.

2. Enter the command "javaws -viewer" in the prompt area and hit "Enter".

3. After a few seconds, you will see a window labeled "Java Control Panel" and then, on top of it, one labeled "Java Cache Viewer".

4. Highlight "Coral Remote (SNF)" as shown below and remove it from the cache by clicking the big red X at the top of the viewer.

Image of Java Cache Viewer panel

5. Hit the "Close" button on the Java Cache Viewer.

6. Go to the Java Control Panel, select the "Security" tab and click the "Certificates" button as shown below:

View of Java Control Panel Security panel

7. Highlight the certificate named "The Legion of the Bouncy Castle" and click the "Remove" button at the bottom of the panel as shown below. (Note: Bouncy Castle is the name of the organization that produces the encryption/decryption package that allows your to securely authenticate yourself in Remote Coral).

Image of Trusted Certificates panel.

8. Click the "Close" button on the Certificates panel and then click "OK" in the Java Control Panel to close it.

9. Open a browser and point download a fresh copy of Remote Coral at

http://snf.stanford.edu/coral/etc/coral.jnlp

Let me know if you encounter any problems, but I have tested this and found it to work as advertised on two different Windows platforms.

Thanks,

John

Comment p5000etch SNF 2009-08-07 08:58:08: Ch.A is down

No BCl3 flow. Gas cylinder is OK. Might be a defective MFC. Will continue to troubleshoot.

Wednesday, August 5, 2009

PhD Defense: Irene Goldthorpe

SYNTHESIS AND CHARACTERIZATION OF GERMANIUM NANOWIRES AND GERMANIUM/SILICON RADIALLY HETEROSTRUCTURED NANOWIRES

Irene Goldthorpe
Department of Materials Science and Engineering
Advisor: Prof. Paul McIntyre

Thursday, August 13th, 10:00 am (refreshments at 9:45 am)
Location: McCullough 115

ABSTRACT:

Because semiconductor nanowires possess a variety of technologically useful properties and can be synthesized with relative ease, they are attractive candidates for a wide range of electronic, optical, sensing, and energy applications. The first part of this talk will focus on germanium nanowires, because of germanium's compatibility with standard integrated circuit fabrication processes, its high electron and hole mobilities, and the low temperature required for germanium nanowire growth. The chemical vapor deposition of epitaxially-aligned germanium nanowires with uniform diameters between 5 and 50 nm will be discussed. Next, I will demonstrate the synthesis of a radial heterostructure, where silicon is heteroepitaxially deposited around a germanium nanowire. This silicon shell passivates the germanium nanowire surface, creates an electronic band offset to confine holes away the surface where they can scatter or recombine, and induces strain which could allow for the engineering of properties such as carrier mobilities and band gap. Detailed transmission electron microscopy and x-ray diffraction characterization of various Ge-core/Si-shell nanowire samples show that, analogous to planar heteroepitaxy, surface roughening and misfit dislocations relax misfit strain. Lessons learned generated strategies to avoid the strain-induced surface roughening that promotes dislocation nucleation, resulting in the fabrication of metastably strained, dislocation-free core-shell nanowires.

Re: Comment p5000etch SNF 2009-08-05 02:09:49: additional info

Archived

Re: Shutdown p5000etch SNF 2009-08-05 01:53:05: wafer lost

Recoved wafer from Ch.C and placed in the user's wafer container. It looks like it completed the etch and was mis-handled during the unload. Adjusted the wafer placement in the chamber and cycled 12 wafers with no problems.

Comment p5000etch SNF 2009-08-05 02:09:49: additional info

BTW, last known location of the missing wafer is in Ch.C.

Shutdown p5000etch SNF 2009-08-05 01:53:05: wafer lost

It thinks it has the wafer in the elevator, but I didn't see it there. I've also asked it to find it in all chambers, but it can't find anything. Please find the wafer and put it in the box. Also, please let me know the location where the wafer is found. Thanks!

Monday, August 3, 2009

Nitride paterning with wet etch?

Dear Lab users,

I have one quick question (hopefully for a quick answer too) about SiN patterning using hot phosphoric acid. As far as I know hot phosphoric acid is for stripping SiN, but if possible, I like to use it to pattern nitride so that I can have good isotropic etch profile. Is it possible to pattern SiN in hot phosphoric acid with SiO2 or some other kind of mask? If you have experiences, please share it. Thank you.

--
----------------------------------------------
Hyeun-Su Kim
Mechanical Systems Engineer

Kateeva, Inc. (formerly TJet Tech.)

1430 O'Brien Dr. Suite A
Menlo Park, CA 94025
800-385-7802 x111
----------------------------------------------

wafer bonding/fusion

Hi all,
I am interested in bonding two Si wafers (coated with several microns of oxide, embedded with small features of silicon) with high alignment accuracy.  Does anyone have experience with this?  I assume the evbond would be suited for this, but the wiki only describes bonding between Si and glass.  I assume a post bond anneal would improve the bond b/w silicon features.  EVG website specs 2um (3sigma) alignment tolerances for backside alignment on the EVG620 aligner.  Is this level of precision important for others and has anybody actually observed the tool performing to these specs?
Thanks,
Chris

Saturday, August 1, 2009

missing wafers!

Dear labmembers,

During the last week, I have misplaced/lost a 4" cassette with 7 wafers in
it. It would have been labelled "Debbie - dgunning" and perhaps
"bed-of-nails". I left it next to the YES oven (since it wouldn't fit in
or on top of my storage box). If anyone has seen it, please let me know
as soon as possible.

Thanks,

Debbie