-------- Original Message --------
| Subject: | Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) |
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| Date: | Thu, 09 Aug 2012 16:28:22 -0700 |
| From: | Ed Myers <edmyers@stanford.edu> |
| To: | labmembers@snf.stanford.edu |
| CC: | Lishan, David (Plasma-Therm LLC) <david.lishan@plasmatherm.com> |
All, SNF and Plasma-Therm would like to invite you and your team members to attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition) to be held at the Stanford University on September 10 and 11, 2012. The Workshop is intended to provide understanding and insight to those working with plasma etching and deposition processes and equipment. The goal is to help researchers make faster progress on projects requiring plasma processing. The course has been very well received at Harvard, UC Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University. Graduate students, post docs, professors, and staff have all found the material useful. The format encourages questions and we hope attendees take advantage of the opportunity for networking and discussing their projects. The workshop is meant to encourage cooperation within the academic and industrial research communities. Please be assured that the course is not an advertisement about Plasma-Therm products. Aside from a very brief 15 min introduction to Plasma-Therm, the rest of the day is dedicated to education on fundamentals and advanced etching and plasma-enhanced chemical vapor deposition technology. Presentation materials are equally useful to those that do and do not have our equipment. Details regarding the Workshop objectives, agenda, location, and speaker can be found on the attached flyer. Please note that the workshop is free and registration is requested online by August 31, 2012 at the website: http://www.surveymonkey.com/s/FPQLZPQ Regards, SNF Staff and Plasma-Therm
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