Friday, September 19, 2008

Problem p5000etch SNF 2008-09-19 12:45:11: CH B qual- uniformity not good

Etch rate of oxide is 3507A/min
Etch rate of resist is 2262A/min
Selectivity of SiO2 to PR is 1.6:1
But, top to bottom uniformity is bad, about 20%.

No comments: