Completed major chamber wet clean (removed and cleaned the process kit) + wiped down the entire chamber.
- Particle test still bad using Ch.A Metal recipe
- Ran a variety of different test to partition the source of the particles. The source of particle is NOT the gases, NOT the loadlock, NOT the wafer transfer.
- Particles are deposition only when the plasma is on.
- We will continue to troubleshoot tomorrow. Next to try is to run a plasma process using only an inert gas. Also need to investigate if the showerhead's anodization has worn
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