Comment p5000etch SNF 2009-12-09 19:17:30: Update chamber B

To minimize the wafer mis-handling from Ch.B, please add a this step to your recipe.
-10 sec, 50 W ,250 mT, Ar plasma step before the final pump down. I shortened the final pump down to 15 sec withou a problem
Ran 96, 200 sec etch (Via etch recipe) without any faults.