Has anyone patterned mask 0 in silica (silicon dioxide) using ASML? I want to make alignment marks (mask 0) in 300nm silica on silicon substrate. I plan to evaporate ~100nm silver onto silica and then deposit ~20nm alumina. I am not sure about the depth of the alignment marks for obtaining best contrast. I would be extremely grateful for any suggestions/recipe.
thanks,
-- ~Vrinda
Vrinda Thareja
Ph.D. Candidate
Brongersma Group
Department of Materials Science and Engineering
Stanford University
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