AW610 RTP system release

All,

I have completed the high temperature oxide growth qualification for
both of our new aw610 systems. I've attached a spread sheet showing
the resulting oxide thickness for 5 consecutive wafers along with the
data from the last AG4100 qualification run. As you can see all
three systems are within 10angstroms.

I am releasing the second system, aw610-r (the gold contaminated
system) for develop recipe development. I want to start with recipes
which are controlled by the pyrometer, or recipes with steady state
temperatures greater than 600C. Once we get these recipes installed
and running, I will convert the system to thermocouple control for
recipes less than 600C. My to finish the pyrometer work this week
and do the TC work next week.

Please contact me and schedule a time for your recipe development,
testing, annealing and training.

Regards,
Ed