Hello:
I am trying to wet-etch off about 0.1-0.5um of Titanium deposited on Si substrate wafer - with Kapton (a polyimide, Teflon-like chemically resistant film) masking off areas that I dont want etched off.
Any suggestions on which chemistry/ bench I should use to etch Ti (I dont think the wbenches have the combination 10H2O:1H2O2:1H2SO4 - that is often suggested) - mix my own?
thanks for any suggestions,
Ramesh Gopalan
(rgopalan)
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