TMAH Si etch selectivity to LTO and Nitride

Hi lab members,

I'm planning an experiment that requires me to etch trenches in Si
handle wafer. I am planning to use LTO or Low stress nitride for the
etch mask. Can someone who has experience with this tell me what etch
rates I should expect for LTO and Low Stress Nitride in the standard
20% TMAH solution at 95-100 degrees C.

Thanks a lot,
Arunanshu