tried test wafer 3 times in a row and got the following errors about 3 seconds into etch step:
-Ch. B wafer cooling helium valve not opened when recipe started
-Ch. B detected magnet fault while running step 2
-Ch. B magnet phase current total rise is too low
oh, and I think wafers are still sticking coming out of Ch. B because they don't look positioned correctly on the robot arm when they come out. one time it looked fine, another it looked about 1.5cm too far back on the arm. missed the third time it came out.
Subscribe to:
Post Comments (Atom)
No comments:
Post a Comment