After pumping the chamber for 2 hours, leak test was 75 mt/min. After closing and capping the manual vent........ the leak rate was < 1 mT/min.
Particle test wafers (oxide wafers) looked much cleaner.
Rostam ran his device wafer using Ch.A metal recipe and saw NO particles under the microscope.
We will repair the ballast purge valve tomorrow or Friday.
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