EIPBN 2011 Announcing The EIPBN Entrepreneur’s Challenge for Students, Post-Docs and Researchers - 1st Call  1. Present business plan to leading venture capitalists, industry experts & angel investors 2. Explore entrepreneurial dreams in a supportive environment 3. Winners will receive $ cash $ prizes at EIPBN banquet dinner Competition Timeline and Requirements The competition consists of two rounds: First Round: Two Page Executive Summary Last date of Submission: April 15, 2011 Announcement of Results: April 30th, 2011 Final Round: Business Plan Presentation Last date of Submission: May 20, 2011 Final Round Presentation: June 2, 2011 Announcement of Results: June 2, 2011 at the Banquet Details on the Website (www.eipbn.org) 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication www.eipbn.org May 31 – June 3, 2011 JW Marriot Resort, Las Vegas, Nevada The World's Leading Symposium on Lithography and Nanofabrication EIPBN — the ‘THREE-BEAMS’ conference — is recognized as the premier conference dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends. Plenary Speakers Prof. Ahmed Zewail is Linus Pauling Chair Professor of Chemistry and Professor of Physics Director, Centre for Physical Biology California Institute of Technology. Professor Zewail was awarded the 1999 Nobel Prize in Chemistry for his work using ultrafast optics, showing that it is possible with rapid laser technique to see how atoms in a molecule move during a chemical reaction. More recently, he and his group have developed the field of 4D electron microscopy for the direct visualization of matter’s behavior, from atoms to biological cells, in the four dimensions of space and time. Dr. Nicholas P. Economou  President PointSpectrum Inc. a developer and manufacturer of advanced optical devices for the solar energy, lighting and display industries. He was co-founder of the venture capital funded start-up ALIS Corporation, which developed the helium ion microscope and was acquired by Zeiss in July 2006. Dr. Sam Sivakumar Intel Fellow, Technology and Manufacturing Group, Director, Lithography, Intel Corporation, Hilsboro, Oregon is an Intel Fellow and Director of Lithography in Intel’s Portland Technology Development Group in Oregon. He is responsible for the definition and development of Intel’s next generation lithography processes, resolution enhancement techniques and OPC. Conference Registration: Open from January 16, 2011 Abstract submission details and further information about the conference can be found at: www.eipbn.org Abstracts representing high-quality original research are invited in the following areas: Micro- and Nanolithography · Electron-beam lithography · Ion-beam patterning · Optical lithography · Nano-imprint lithography · Extreme UV lithography · Masked and maskless lithography · Directed self-assembly · Novel or emerging lithographic techniques Process Technologies · Electron or ion beam technologies · Metrology and imaging · Resists · Pattern transfer · Process simulation and modeling · Novel beam-based processing Applications · Nanoelectronics · Patterned media and data storage · Nanophotonics · Nanobiology · Micro- and nano-fluidics · Novel or emerging applications We look forward to seeing you in Las Vegas! Alan D. Brodie EIPBN 2011 Conference Chair Richard Blaikie EIPBN 2011 Program Chair |
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