Dear All,
A concerned Allen building dweller has found a set of keys in the ladies room across from Conference Room 101 on the first floor. I don’t think you will get far without them because all 3 keys have GM on them. I have them at my desk and I’m in cubicle # 41.
Maureen
Maureen Baran
Stanford Nanofabrication Facility
Lab Services Administrator
mbaran@stanford.edu
650-725-3664
RESEARCH POSITIONS
PALO ALTO RESEARCH CENTER (PARC)
ELECTRONIC MATERIALS & DEVICES LABORATORY
The Palo Alto Research Center (PARC), a subsidiary of Xerox Corporation, is famous for creating many of the paradigms of modern information technology. Its mission is to invent and develop disruptive technologies in all areas of hardware, software, and information technology. Our staff enjoy the opportunity to publish externally, start companies, and create their own futures. We are currently accepting applications from outstanding students and researchers who desire to work in a scientifically and entrepreneurially challenging environment in the Electronic Materials and Devices Laboratory (EMDL).
EMDL RESEARCHER - Applicants should have a Ph.D. or equivalent and a strong research background demonstrating innovation and high impact contributions towards their field. Backgrounds in physics, chemistry, materials, engineering and related fields are encouraged. Experience in the biomedical field, as well as entrepreneurship or fundraising (including government grants) are a plus. Both recent PhDs and senior researchers are encouraged to apply.
EMDL ENGINEER - Applicants should have an M.S. or equivalent and strong hands-on engineering background. The position involves working with researchers on the hardware aspects of experiments.
To apply, submit your resume, references, and samples of recent publications to echow@parc.com.. Posted March, 2011.
On Mar 30, 2011, at 2:31 PM, Anu Chandran wrote:
> Hi All,
> This is a question for all who are/will be interested in metal etching. We are in the process of nailing down the specs for a new inductively coupled plasma metal etcher for SNF. I would like to solicit input from lab members as to what would be critical for them.
> In the wish list we already have the following:
>
> Metals to be etched :
>
> Au,Ag,Pt, Ti, Cr, Ni, Al
>
> Wafer Size:
> 4" to pieces
>
> Etch depth:
> up to 400nm
>
> Uniformity:
> 5% over wafer
>
> Roughness:
> Shooting for <5nm rms. Seems like it varies a lot with metals and chemistry vs sputter etc.
>
> Profile:
> >85 deg
>
> Selectivity:
> Depends on chemistry and metal. Quite a range
>
> Please go ahead and add whatever you feel is important so that we can try to include it in the new system.
>
> Thanks a lot,
> Regards
> Anu
>
> --
> Anu Chandran
> Materials Science & Engineering
> 476 Lomita Mall,McCullough Building
> Stanford CA 94305-4045
> T:6507236466 Lab
> T:6507234874 Office
> F:6507249851
>
> !DSPAM:4d93cf2088725532616921!
James S. Harris '64
James & Ellenor Chesebrough Professor E-Mail:Harris@snow.stanford.edu
Department of Electrical Engineering http://www-ee.stanford.edu/~harris/
ALLEN Rm 328, 420 Via Palou Mall Ph: (650)723-9775
Stanford, CA 94305-4075 Fax: (650)723-4659
Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983
I think the ability to use the system for pieces would be critical for many of us.
Thanks,
Altamash--On Wed, Mar 30, 2011 at 2:31 PM, Anu Chandran <chandran@stanford.edu> wrote:
Hi All,This is a question for all who are/will be interested in metal etching. We are in the process of nailing down the specs for a new inductively coupled plasma metal etcher for SNF. I would like to solicit input from lab members as to what would be critical for them.In the wish list we already have the following:Metals to be etched :Au,Ag,Pt, Ti, Cr, Ni, AlWafer Size:4" to piecesEtch depth:up to 400nmUniformity:5% over waferRoughness:Shooting for <5nm rms. Seems like it varies a lot with metals and chemistry vs sputter etc.Profile:>85 degSelectivity:Depends on chemistry and metal. Quite a range
Please go ahead and add whatever you feel is important so that we can try to include it in the new system.Thanks a lot,RegardsAnu
--
Anu Chandran
Materials Science & Engineering
476 Lomita Mall,McCullough Building
Stanford CA 94305-4045
T:6507236466 Lab
T:6507234874 Office
F:6507249851
Altamash Janjua,
PhD Candidate, Harris Group,
Stanford University.
Hi All,This is a question for all who are/will be interested in metal etching. We are in the process of nailing down the specs for a new inductively coupled plasma metal etcher for SNF. I would like to solicit input from lab members as to what would be critical for them.In the wish list we already have the following:Metals to be etched :Au,Ag,Pt, Ti, Cr, Ni, AlWafer Size:4" to piecesEtch depth:up to 400nmUniformity:5% over waferRoughness:Shooting for <5nm rms. Seems like it varies a lot with metals and chemistry vs sputter etc.Profile:>85 degSelectivity:Depends on chemistry and metal. Quite a range
Please go ahead and add whatever you feel is important so that we can try to include it in the new system.Thanks a lot,RegardsAnu
--
Anu Chandran
Materials Science & Engineering
476 Lomita Mall,McCullough Building
Stanford CA 94305-4045
T:6507236466 Lab
T:6507234874 Office
F:6507249851
The first class of E204 will be held Wednesday, March 30, in Building 160, Room 322
(note room change from previous announcements.)
This class is sponsored in part by the NNIN and will cover practical topics, such as:
- How is authorship on a paper decided? Who gets to be first author?
What are the responsibilities of a contributors to jointly authored paper?
- Who should be included as an inventor on a patent?
- Is it OK to omit "bad" data points from an analysis?
- What can and should you do if you suspect fraudulent data?
- How should peer review be handled? How is it actually done?
- Are you responsible for anticipating the ways, good and bad, that your
research might be used? What are a researcher's responsibilities to society?
- What are the responsibilities of mentors and mentees?
- What kinds of conflicts of interest are important to avoid?
This course is 1-2 units. The instructor is
Prof. Robert McGinn, Director of the Program in Science, Technology&
Society. For more information, see the Bulletin or contact Prof. McGinn,
Mary Tang, or Mike Deal. This course is sponsored in part by NNIN.
For students supported by NSF fellowships, this course satisfies the NSF
requirement for "Training in the responsible and ethical conduct of
research."
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Several labmembers (and a few staff members) have commented on the
triangle icon currently seen on lampoly, pquest, and p5000etch. This
denotes that "Optional support facilities for this tool are down", in
this case, chlorine gas. Otherwise, the tools are OK to use. For an
icon decoder, click on "Help" on the top menu bar.
By the way, Elmer and Ted are still working on that chlorine -- check
Coral for updates.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Contractors for the upcoming renovation project will be back this morning
and we suspect will be taking another look inside the cleanroom.
They will likely be in the cleanroom some time between 9:30 and 11 am
conducting a second job walk to observe the existing conditions in the
lab.
They will be looking at the HEPA filter housing in the litho area and
by the drytek4 (where the visqueen curtains are hanging from the ceiling)
and looking in the fingerwalls. There should otherwise no disruption to
regular operations or equipment.
If you have structures that are particularly sensitive to airborne
particulate contamination, you may wish to avoid this time window.
We apologize for this inconvenience and will do our best to complete
this activity in a timely fashion.
Thanks,
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Is there anyone who have polyimide PI-2611 that I can use to process one wafer? Thanks.
to Cathy, thank you very much for offering me PI-2611 and VM-651. But I can not find PI-2611 in the refrigerator. Maybe someone moved your bottle.
Best,
Yongliang
----- Original Message -----
From: "Yongliang Yang" <ylyang@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Friday, March 25, 2011 12:36:25 PM
Subject: Anyone who have polyimide- PI-2611 (polyimide) and VM-651 (adhesion promoter)
Hi, all,
I have one wafer that need to spin coat polyimide. Does anyone who have PI-2611 (polyimide) and VM-651 (adhesion promoter) that can let me use. Thank you very much!
Best,
Yongliang
Next generation proteomics:While the genomics revolution has had sweeping impact on our understanding of life processes, the arguably more important "proteomics revolution" remains unrealized. Proteins are more directly linked to function than genes, but proteins are also dynamic and more biochemically complex. Consequently, protein analysis often demands multi-stage biochemical assays to measure not one, but multiple physicochemical properties (e.g., Western blot, 2D electrophoresis). Unfortunately, benchtop assays consume significant resources, making the biological sciences protein 'data limited'. To surmount these challenges and realize an era of high throughput proteomics, innovation in instrumentation is needed.
Towards high-throughput protein analysis via microfluidic integration
Microfluidic technology has advanced separations science, yet progress in multi-stage separations has lagged. Accepted multi-stage design approaches suffer from inherent information loss owing to strategies that 'discretize' first-stage separations by mapping readouts to discrete compartments in a second-stage. At UC Berkeley, we are introducing novel non-discretizing integration strategies. This talk will highlight multi-stage assays uniquely enabled by our 'µMosaic' fabrication technique: an approach that allows us to regionally photopattern 2D microchambers with heterogeneous, discrete nanomaterials. Our design strategy yields low-dispersion, near lossless electrokinetic material transport between disparate assay stages. In one example, I will summarize our recent progress towards fast, hands-free and perhaps even quantitative Western blotting, employed here for analysis of specimens from clinical sample repositories. Our ultimate goal being to advance the understanding of life processes – including development and disease – through quantitative bioinstrumentation.
![[]](cid:6.2.5.6.2.20110328091334.0262b7a8@stanford.edu.1)
Microfluidic integration strategies advance automated, quantitative native Western blotting. (a) Glass microfluidic device. Inset: Photopatterned polymers in 1 x 1.5 mm2 chamber. (b) Automated operation via programmable voltage control (PAGE: polyacrylamide gel electrophoreses). Scale bar is 250 um.
Brief Bio: Amy E. Herr received her BS degree from Caltech and her MS (1999) and PhD (2002) degrees from Stanford in Mechanical Engineering. At UC Berkeley, her research focuses on instrumentation innovation to advance quantitation in life sciences and clinical problems. Translational impact of her research program spans from tools for fundamental research (cell signaling) to near-patient disease diagnostics. Her major awards include the NIH New Innovator Award (2010-15), the NSF CAREER Award (2011), the Eli Lilly & Co. New Investigator Award in analytical chemistry, the Alfred P. Sloan Research Fellowship (2010-12, chemistry), the DARPA Young Faculty Award (2009-11), the 2009 Hellman Family Faculty Fund Award from UC Berkeley, and the 2008 Regents' Junior Faculty Fellowship from UC. In 2007 she was recognized as an Outstanding Mentor by Sandia National Labs. She Chaired (2009) & Vice-chaired (2007) the Gordon Research Conference (GRC) on the Physics & Chemistry of Microfluidics, has served on the technical program committee for various conferences (microTAS, Hilton Head, Transducers, IEEE Sensors, AIChE, and BMES) and as a guest editor for Lab Chip & JMM.
The senor monitoring the gas cabinet for the chlorine etch gas went
in to fault this morning. This type of event automatically shutdown
the gas cabinet, preventing any gas flow. I did not see any obvious
leak during my inspection of the cabinet.
I am leaving the cabinet shutdown, so no chlorine gas will be
available for the etch tools, such as PQuest, Lampoly and the
P5000. I placed a note on the door to the fab entrance, trying to
inform anyone planning on using the etch tools.
Regards,
SNF Staff
Did any of you misplace a lot of change? I found a collection of over
$20 in change in the men's restroom near Allen 101. Describe the
container I found it in and it is yours ....
Thanks,
John
I have one wafer that need to spin coat polyimide. Does anyone who have PI-2611 (polyimide) and VM-651 (adhesion promoter) that can let me use. Thank you very much!
Best,
Yongliang
EE412 returns this Spring term, with Profs. Olav Solgaard and Roger Howe at the helm.
This is a team-project-based course with the aim to develop, characterize and document
processes that will be of value to the SNF labmember community. Students can select
from available projects or work with staff member or other approved mentor to come up
with their own. Students will receive not only course credit, but lab time and supplies
in support of their projects -- and of course the satisfaction of contributing to the
lab community knowledge base.
For more information, see the attached syllabus.
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Have you ever wondered:
- How is authorship on a paper decided? Who gets to be first author?
What are the responsibilities of a contributors to jointly authored paper?
- Who should be included as an inventor on a patent?
- Is it OK to omit "bad" data points from an analysis?
- What can and should you do if you suspect fraudulent data?
- How should peer review be handled? How is it actually done?
- Are you responsible for anticipating the ways, good and bad, that your
research might be used? What are a researcher's responsibilities to society?
- What are the responsibilities of mentors and mentees?
- What kinds of conflicts of interest are important to avoid?
Explore these issues and more, in E204, Research Ethics for Engineers
and Scientists, a new course that examines the practical aspects of
ethics for researchers with lectures, discussions, guest speakers, and
real case studies. This course is 1-2 units and will be held Spring
term, on Wednesdays, 4:15-6 pm, in Allen 101. The course instructor is
Prof. Robert McGinn, Director of the Program in Science, Technology&
Society. For more information, see the Bulletin or contact Prof. McGinn,
Mary Tang, or Mike Deal. This course is sponsored in part by NNIN.
For students supported by NSF fellowships, this course satisfies the NSF
requirement for "Training in the responsible and ethical conduct of
research."
With the Intlvac sputtering system up for a week now, there's an
opportunity to work on a 412 project with Ed Myers to define a baseline
process for a metal deposition (e.g., rate, uniformity, ...). Enroll
today!
Anyone who has a project that might add to the SNF's capabilities should
email Olav Solgaard and me and see if it will work for EE412.
Thanks,
Roger
Between 10 and 11 a.m. this morning, we will have a collection of
contractors in the lab conducting a "job walk" as they prepare bids for
the upcoming SNF facility renovation project. While we do not have a
specific head count, there may be a total of 15 or more folks in the lab
at that time.
We will be in many areas of the lab including several of the fingerwalls.
You will also notice that there are two areas of the lab .... one near
the entrance to the e-beam lithography room and one near drytek4 ...
that have what appear to be plastic shower curtains hanging from the
ceiling. This area will allow the contractors to inspect the area above
the HEPA filters with, hopefully, minimal adverse impact on the
integrity of the cleanroom.
If you have structures that are particularly sensitive to airborne
particulate contamination, you may wish to avoid this time window.
We apologize for this inconvenience and will do our best to complete
this activity in a timely fashion.
Thanks,
John
Plasmonic Optical Antennas
For Enhanced Light Detection and Emission
Edward S. Barnard
Stanford University
Department of Materials Science & Engineering
Advisor: Prof. Mark L. Brongersma
Wednesday April 6th 2011
3:30 pm
(Refreshments at 3:15 pm)
Location: Paul G. Allen Auditorium (CIS-X 101)
Abstract:
Antennas are used in a wide range of frequencies in the electromagnetic spectrum to concentrate wave energy into electronic circuits. The principles that govern RF antennas can be applied to much higher frequencies and be applied to produce nanoscale plasmonic antennas that act as "receivers" and "transmitters" for visible light. This near-field concentration makes them excellent candidates for light trapping in solar cells, light concentration in sub-wavelength photodetectors, or even localized heating for cancer therapies. However the optical properties of metals at visible frequencies make it difficult to apply traditional antenna design rules. Using full-field electromagnetic simulations and analytical antenna models, we developed new design rules for producing optical antennas with a desired set of optical properties. We then applied these design rules to create antennas that resonantly enhance both absorption of thin silicon photodetectors and emission of cathodo-luminescence (CL) photons. Through spatial and spectral mapping of both photocurrent and CL we clearly show the fundamental and higher-order resonant modes of these antennas. With CL we are also able to map the spatial distribution of these resonant modes with nanometer resolution. In addition to these specific demonstrated applications, the results of this study enable optical engineers to more easily design a myriad of plasmonic devices that employ optical antenna structures, including nanoscale photodetectors, light sources, sensors, and modulators.
There's a Process Clinic today (Monday) at 2 pm in the cubicle area next
to Maureen's office. Bring your process, equipment, and SpecMat
questions. Staff and senior labmembers will be on hand to brainstorm ideas.
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Lab members,
I would like to announce a new program called the Litho Help Desk (LHD). The goal of the LHD is to minimize the number of times staff is interrupted with frequently asked questions, thus allowing them to focus on long-term goals for the litho area. During LHD hours, an experienced lab member, identified with a sign, will be in the litho area to answer your questions. These questions and their answers will be compiled, vetted by staff, and posted onto the wiki. Occasionally, the LHD guru will also walk through the litho area to make sure that proper protocols are being followed. The current LHD times and gurus are as follows:
Tuesdays, 1:00-3:00 pm, Nahid Harjee (nharjee)Wednesdays, 8:00-11:00 am, J Provine (jprovine)
You may have already seen J in the lab in his time, as he has piloted the program for the past two weeks.
If you have any questions, please feel free to contact me.
Thanks,
A lab evacuation was invoked around 1:30 am early Sunday morning. This appears to have been caused by a faulty toxic gas alarm sensor for dichlorosilane. The gas has been shut off while the sensor is being investigated. All other gases have been turned back on and the lab is back open.
Apologies for the inconvenience --
John & Mary
SNF is supporting JA Woollam by hosting their WVASE32 short course
here on campus. I want to remind you this is a great opportunity to
learn from the experts and to become an analysis expert. If you are
interested in attending, you need to contact JA Woollam directly.
Regards,
>From: Veronica Cockerill <vcockerill@jawoollam.com>
>Subject: WVASE32 Short Course Announcement
>
>Dear J.A. Woollam Customers,
>
>We would like to invite you to our next WVASE32 Data Analysis
>Fundamentals Short Course being held April 5-8 at the Stanford
>University in Stanford, California. I have attached a course
>description and registration form. If you would like to attend,
>please fill out the registration form completely and fax back to me
>at +1(402)-477-8214 by March 25, 2011. Once I receive your
>registration form, I will send a confirmation email.
>
>This course will focus on data analysis methods for spectroscopic
>ellipsometry with a significant amount of "hands-on" computer time.
>For this reason, participants should be familiar with WVASE32 software.
>
>If you have any questions, please let me know.
>
>Best regards,
>Veronica
>
>*******************************
>Veronica Cockerill
>Marketing Coordinator
>J. A. Woollam Co., Inc.
>645 M Street, Suite 102
>Lincoln, NE 68508
>vcockerill@jawoollam.com
>Phone: (402)477-7501 x101
>Fax: (402)477-8214
The lab renovation is getting underway... Tomorrow morning (Friday),
contractors will be removing two ceiling HEPA filters in the lab, one
near the ebeam room entrance and the other near drytek4. The areas will
be blocked off and enclosed in visqueen to control dust. The filters
will be replaced with temporary plexiglas coverings and the areas will
be reopened when work is done. (Because the renovation involves a lot
of work in the ceiling space, the contractors will need to get a good
look at what's up in there.)
Next Tuesday morning, we expect to be escorting more contractors to
inspect the lab for the work that will be done and this will no doubt
include allowing them to poke their heads into the two new openings in
the ceiling area.
We will try to minimize these disruptions and inform you in advance.
Please bear with us as the renovation activities ramp up.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Come and hear the final presentations of this term's EE412 projects.
These will be held starting at 3 pm, Wed. 3/16, in the Allen X Auditorium.
The agenda:
3 pm - Pizza
3:15-3:20 - Introduction - Prof. Pruitt
3:20-3:40 - Characterization of EV Spraycoater: Conformal Coating in
Deep Trenches (Ehsan Sadeghipour)
3:40-4:00 - Development of Low Stress Amorphous SiGe Films (Scott Lee
and Chen Chen)
4:00-4:20 - ALD for Conformal and High Aspect Ratio Coverage (Bryan Park
and Wanki Kim)
4:20-4:40 - Characterization of Interface States in ALD Processing
(Lucky Liyanage and Henry Chen)
By the way, we are also soliciting projects for Spring Term, to be
taught by Profs. Solgaard and Howe.
All members of the lab community are welcome --
The EE412 class
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
If you did this before, please drop me a hint.
Thanks,
Dinh Ton
Come and hear the final presentations of this term's EE412 projects.
These will be held starting at 3 pm, Wed. 3/16, in the Allen X Auditorium.
The agenda:
3 pm - Pizza
3:15-3:20 - Introduction - Prof. Pruitt
3:20-3:40 - Characterization of EV Spraycoater: Conformal Coating in
Deep Trenches (Ehsan Sadeghipour)
3:40-4:00 - Development of Low Stress Amorphous SiGe Films (Scott Lee
and Chen Chen)
4:00-4:20 - ALD for Conformal and High Aspect Ratio Coverage (Bryan Park
and Wanki Kim)
4:20-4:40 - Characterization of Interface States in ALD Processing
(Lucky Liyanage and Henry Chen)
By the way, we are also soliciting projects for Spring Term, to be
taught by Profs. Solgaard and Howe.
All members of the lab community are welcome --
The EE412 class
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
As you know, there are two shared desktops in the CAD room (151) with
Tanner LEdit layout module. The left side desktop has the MEMS license
version which allows import/export to AutoCAD files as well as a few
other features. This desktop also has a LinkCAD license that allows
transfer between a variety of different standard layout file formats
(including AutoCAD, GDSII, CIF, postscript.) There should be a file on
the desktop explaining this.
By the way, these desktops also have JMP Experimental Design software as
well.
Mary
On 3/10/2011 6:53 PM, Sebastian Jeremias Osterfeld wrote:
> Why Autocad? Isn't that a bit expensive for mask design purposes?
>
> However, here is how you can do it:
>
> Option 1: Export your L-Edit files in L-Edit to DXF format. Autocad can open that. However, I am not sure if L-Edit at Stanford has the export-to-DXF capability or not.
>
> Option 2: Export your L-Edit files in L-Edit to GDSII (aka GDS2 ?) format. I know for a fact that I often used to do that in the past at Stanford's L-Edit workstation. You can then open the GDSII files in other layout editing programs, such as the open-source LayoutEditor. From within LayoutEditor, you can definitely save your file as DXF, which Autocad can then open.
>
> In general, I have always liked LayoutEditor for mask design. It has a live mouse button legend which helps you get started, and in many ways I find it to be better and more predictable than L-Edit. It used to be free, too. The last full-featured free version was saved buy some Stanford-affiliated guy and can be found here: http://guyslikedolls.com/tag/layouteditor/
>
> The newer versions cost between $20 and $600 for academic users, depending on the license, see here:
> http://juspertor.com/buylicenseusd.html
>
> One unusual feature is that the newer LayoutEditor can read and write Gerber files, and also save them as DXF and GDSII files. So you can even view, edit, and convert your Gerber PCB designs within LayoutEditor if necessary.
>
> Sebastian
>
> ----- Original Message -----
> From: "Michael Maloney"<maloney1@stanford.edu>
> To: labmembers@snf.stanford.edu
> Sent: Wednesday, March 9, 2011 9:56:16 AM
> Subject: AutoCAD mask design
>
> Lambmebers,
>
> I need to switch from LEdit to AutoCad for mask design. Can anyone give me a brief introduction tutorial on AutoCAD or help me to Convert L-Edit files to AutoCAD format?
>
> Thank you,
>
> Mike M
>
> Michael T. Maloney
> Postdoctoral Scholar
> Department of Neurology and Neurological Sciences
> Stanford University School of Medicine
> P259 MSLS
> office: (650) 736-1403
> cell: (650) 207-6119
>
>
>
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
However, here is how you can do it:
Option 1: Export your L-Edit files in L-Edit to DXF format. Autocad can open that. However, I am not sure if L-Edit at Stanford has the export-to-DXF capability or not.
Option 2: Export your L-Edit files in L-Edit to GDSII (aka GDS2 ?) format. I know for a fact that I often used to do that in the past at Stanford's L-Edit workstation. You can then open the GDSII files in other layout editing programs, such as the open-source LayoutEditor. From within LayoutEditor, you can definitely save your file as DXF, which Autocad can then open.
In general, I have always liked LayoutEditor for mask design. It has a live mouse button legend which helps you get started, and in many ways I find it to be better and more predictable than L-Edit. It used to be free, too. The last full-featured free version was saved buy some Stanford-affiliated guy and can be found here: http://guyslikedolls.com/tag/layouteditor/
The newer versions cost between $20 and $600 for academic users, depending on the license, see here:
http://juspertor.com/buylicenseusd.html
One unusual feature is that the newer LayoutEditor can read and write Gerber files, and also save them as DXF and GDSII files. So you can even view, edit, and convert your Gerber PCB designs within LayoutEditor if necessary.
Sebastian
----- Original Message -----
From: "Michael Maloney" <maloney1@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Wednesday, March 9, 2011 9:56:16 AM
Subject: AutoCAD mask design
Lambmebers,
I need to switch from LEdit to AutoCad for mask design. Can anyone give me a brief introduction tutorial on AutoCAD or help me to Convert L-Edit files to AutoCAD format?
Thank you,
Mike M
Michael T. Maloney
Postdoctoral Scholar
Department of Neurology and Neurological Sciences
Stanford University School of Medicine
P259 MSLS
office: (650) 736-1403
cell: (650) 207-6119
--
Sebastian J. Osterfeld, Ph.D.
Shan X. Wang Group
Dept. of Materials Science & Engineering
Stanford University
McCullough Building, Room 208A
476 Lomita Mall
Stanford, CA 94305-4045
Phone: (650) 906-1946
Fax: (650) 736-1984
Email: sjo@stanford.edu
Office: http://maps.google.com/maps?f=q&hl=en&q=w122.1732+n37.4275&ll=37.427502,-122.173204&spn=0.006296,0.013561&t=h
Dear All,
Attached is a photo of a key that was found last Friday in the Patio area of CISX. The number on the key is 538. If this key is yours, please let me know and I will direct you to the person that has it.
Thank you,
Maureen
Maureen Baran
Stanford Nanofabrication Facility
Lab Services Administrator
mbaran@stanford.edu
650-725-3664
I need to switch from LEdit to AutoCad for mask design. Can anyone give me a brief introduction tutorial on AutoCAD or help me to Convert L-Edit files to AutoCAD format?
Thank you,
Mike M
Michael T. Maloney
Postdoctoral Scholar
Department of Neurology and Neurological Sciences
Stanford University School of Medicine
P259 MSLS
office: (650) 736-1403
cell: (650) 207-6119
| Subject: | EIPBN 2011 Entrepreneurs Challenge |
|---|---|
| Date: | Mon, 28 Feb 2011 12:55:22 -0500 |
| From: | EIPBN <eipbn.chair@gmail.com> |
| Reply-To: | EIPBN <eipbn.chair@gmail.com> |
| To: | James <jwc@snf.stanford.edu> |
|
I am canceling tomorrows Take A Spin with Me Class on the Headway 2
coater. I have removed my reservations on wbnonmetal from 10 - 11 and
the Headway coater from 11 - 12:30...
Other SNF business has created a conflict for my time ...
See you in two weeks from tomorrow for the next training session....
Best,
James Conway
Stanford Nanofabrication Facility.
Does anybody know a good source/company for fluorine doped tin oxide (FTO)?
Thanks in advance!
Best,
Isabell
Dr. Isabell Thomann
Postdoctoral Scholar
Department of Materials Science and Engineering
Stanford University
----- Original Message -----
From: "Mary Tang" <mtang@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Monday, March 7, 2011 8:11:08 AM
Subject: Process Clinic today 3 pm (Note time change!)
Greetings labmembers --
Process Clinic today (Monday) from 3-4 pm (NOTE TIME CHANGE). We meet in the cubicle area near Maureen's
office. Bring your processing questions, SpecMat requests, and mask layout questions. Staff, experienced
labmembers will be on hand to help brainstorm solutions and review requests. All in the lab community are welcome.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Process Clinic today (Monday) from 3-4 pm (NOTE TIME CHANGE). We meet in the cubicle area near Maureen's
office. Bring your processing questions, SpecMat requests, and mask layout questions. Staff, experienced
labmembers will be on hand to help brainstorm solutions and review requests. All in the lab community are welcome.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Electrical and Optical Characterization of Molecular Junctions
Nazanin Davani
Stanford University PhD Dissertation Defense-Department of Chemical Engineering
Research Advisor: Professor Nicholas A. Melosh
March 7th (Monday), 2011 @ 11 am
(Refreshments served at 10:45 am)
Location: Packard 202
http://ee.stanford.edu/directions.php?bld=packard
Electronic transport through molecules has been intensively studied in recent years, due to scientific interest in fundamental questions about charge transport and the technological promise of nanoscale circuitry. A variety of experimental platforms have been developed to electronically probe molecular junctions. However, it remains challenging to fabricate reliable electronic contacts to molecules, and the vast majority of molecular electronic architectures are not amenable to standard characterization techniques, such as optical spectroscopy. Interesting phenomena like switching and rectification are observed in molecular junctions. However, due to limited quantitative information about the junction, the mechanism remains unknown and many fundamental questions about electronic transport remain unanswered.
The first part of the presentation will introduce the fabrication of Metal-Insulator-Metal (MIM) cross bar junctions using soft deposition technique. In this method, we softly deposit the premade metal contacts that are being supported with a polymer backing layer onto the organic layer. Using this method, we can efficiently fabricate large area, non-shorting devices, which are required for optical characterization of the molecular junctions.
Having established a means of fabricating reliable molecular devices, we have investigated the switching mechanism in molecular junctions based on n-type semiconductor Perylene tetracarboxylic diimide (TE-PTCDI) molecules. Using Surface Plasmon Resonance Spectroscopy (SPRS) we have been able to perform simultaneous optical-electrical measurements to study the molecular behavior quantitatively. Using in-situ optical spectroscopy on active molecular junctions, we find that only a small fraction of the molecules are actually switching in the junction. Finally, I present the results of our studies on the molecular rectification in C60-diamondoid hybrid molecules in large area junctions, as well as in smaller ensemble of molecules. The statistical studies along with a theoretical model show the origin of rectification in such molecular devices.
The registration deadline for SUPR has been extended to Wednesday, March 9. Sign up now!
The Stanford Optical Society and the Stanford Photonics Research Center cordially invite you to the
Stanford University Photonics Retreat
April 8-10, 2011
Marconi Conference Center
Marshall, CA
All Stanford students, post-docs, and faculty interested in optics and photonics are invited to gather together for a weekend retreat near beautiful Point Reyes!
For more information: http://supr.stanford.edu
Register Online: Registration deadline extended to Wednesday, March 9, 11:59 PM
Cost for students & post-docs*:
$60 (OSA or SPIE Member) or $150 (non-member)
*Interested faculty: please contact us at stanford-photons@stanford.edu
Registration includes two nights shared lodging at the Marconi Conference Center, all meals, and transportation. Sign up or renew your OSA or SPIE membership for large savings! Limited space is available, so sign up now. Late registrants will be put on a waiting list.
Find out more at http://supr.stanford.edu
Did anybody use Gaurav's s-TLM mask with capacitor structures recently? Does anyone knows where it is?
It is usually kept in "Kobayashi"s bin next to Metallica. A lot of people share this mask.
If you know where it is, or find it somewhere please let us know.
We borrowed the mask from Gaurav to finish our EE412 project. It is crucial that we find it ASAP.
Many thanks,
Lucky & Henry
Learn about the venture world. Discuss your startup ideas
with experienced venturists. Shahin Farschi of Lux Capital
and Gavin McCraley of Wilson, Sonsini will be on hand to
share insights and field questions at this Venture Clinic,
next Tuesday, March 8, at 4 pm in Allen 101.
All are welcome.
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Thanks
Noureddine
Electrical and Optical Characterization of Molecular Junctions
Nazanin Davani
Stanford University PhD Dissertation Defense- Department of Chemical Engineering
Research Advisor: Professor Nicholas A. Melosh
March 7th (Monday), 2011 @ 11 am
(Refreshments served at 10:45 am)
Location: Packard 202
http://ee.stanford.edu/directions.php?bld=packard
Electronic transport through molecules has been intensively studied in recent years, due to scientific interest in fundamental questions about charge transport and the technological promise of nanoscale circuitry. A variety of experimental platforms have been developed to electronically probe molecular junctions. However, it remains challenging to fabricate reliable electronic contacts to molecules, and the vast majority of molecular electronic architectures are not amenable to standard characterization techniques, such as optical spectroscopy. Interesting phenomena like switching and rectification are observed in molecular junctions. However, due to limited quantitative information about the junction, the mechanism remains unknown and many fundamental questions about electronic transport remain unanswered.
The first part of the presentation will introduce the fabrication of Metal-Insulator-Metal (MIM) cross bar junctions using soft deposition technique. In this method, we softly deposit the premade metal contacts that are being supported with a polymer backing layer onto the organic layer. Using this method, we can efficiently fabricate large area, non-shorting devices, which are required for optical characterization of the molecular junctions.
Having established a means of fabricating reliable molecular devices, we have investigated the switching mechanism in molecular junctions based on n-type semiconductor Perylene tetracarboxylic diimide (TE-PTCDI) molecules. Using Surface Plasmon Resonance Spectroscopy (SPRS) we have been able to perform simultaneous optical-electrical measurements to study the molecular behavior quantitatively. Using in-situ optical spectroscopy on active molecular junctions, we find that only a small fraction of the molecules are actually switching in the junction. Finally, I present the results of our studies on the molecular rectification in C60-diamondoid hybrid molecules in large area junctions, as well as in smaller ensemble of molecules. The statistical studies along with a theoretical model show the origin of rectification in such molecular devices.
