Problem p5000etch SNF 2011-03-18 15:41:05: Chamber C needs wet wipe clean

While running Ch. C POLY ETCH I began to notice a lot of crud deposited in the areas I had etched. I ran the Ch. C CLEAN recipe with 4 wafers, alternating a plan Si dummy and a resist-coated dummy and this didn't seem to help much at all.
Nancy said this is evidence that the chamber needs to be wiped down.