Here are the Feb quals for chambers B and C;
Chamber B- CH.B OXIDE, 60s
Thermal Ox = 3559A/min
PR = 1728A/min
Si nitride = 2994A/min
Poly Si = 1079A/min
Sel PR = 2.1
Sel SiN = 1.2
Sel Poly = 3.3
Chamber C- CH.C POLY ETCH, 60s
Poly Si = 4740A/min
PR = 597A/min
Thermal ox = 442A/min
Sel PR = 7.9
Sel Th ox = 10.7
These results are also posted on the wiki.
Friday, February 18, 2011
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