Problem p5000etch SNF 2008-03-03 15:07:15: Chamber B Pressure

I tried to process 10 wafers for about 45 seconds in Chamber B. Half the wafers processed fine; the other half had wildly fluctuating pressure from 200 mT to 270 mT, sometimes causing an error and stopping the etch. Sometimes I could restart the process, and it would begin, but sometimes not. This is similar to what maryamzm experienced earlier.