Problems with Remote Coral:

SNF Lab Members:

I've received a handful of reports over the last week or so about Remote
Coral failing to run. Although I don't fully understand the cause of
this problem, most people have noticed that it has occurred shortly
after their machine was updated to the latest version of the Java
Runtime Environment (JRE). I've received different error reports but
most of them seem to indicate problems with one or more of the signed
jar files ... even though I believe that all of the jar files are
properly signed. There have been reports of problems such as these on
the Oracle Java Web Start discussion forums but, thus far, no details of
what is wrong in the latest JREs. Nonetheless, you should be able to
get Remote Coral running again without resorting to the more drastic
step of removing that JRE.

Thus far, most people have been able to restore Remote Coral
functionality by simply emptying the Java Web Start cache and then
reloading it. Note: thus far this has affected only Windows XP or
Windows 7 machines, so here are instructions for clearing the Java Web
Start cache on thos platforms:


Look for the "Run ..." menu item on your Start menu. When that comes
up, enter the command "javaws -viewer".

That will open a window name Java Control Panel and a second one named
the Java Cache Viewer.

In the Java Cache Viewer you will see the Remote Coral entry named
"Remote Coral (SNF)". Click on that, and then select the large red "X"
at the top-center of that window. That will delete Remote Coral from
your cache.

Then click "Close" on the Java Cache Viewer to close it and "OK" on the
Java Control Panel to close it.

Then point a browser to:

http://snf.stanford.edu/coral/etc/coral.jnlp

A fresh Remote Roral will be installed. I think that there is a 80-90%
chance that this will fix your problem. If not, I can describe more
diagnostics and additional steps that should resolve this for you. Send
me email if this does not work for you.

Note: when you download the fresh version of Remote Coral, you may get a
pop-up window that is a Security Warning. That will be asking you if
you trust software from us (Stanford Nanofabrication Facility) or the
Legion of the Bouncy Castle. The Legion of the Bouncy Castle
(www.bouncycastle.org) is the third-party, open source encryption
package that we use to encrypt/decrypt your Remote Coral passwords. I
certainly trust the code that is contained in their JAR files.

Good luck,

John

PRS1000 Alert: Please conserve!

To users of wbmetal,wbgen2, wbgeneral and wbgaas:

Our chemical distributor informs us that our regular allotment of
PRS1000 will be delayed by a few weeks. We are trying to find stock
elsewhere, but it seems to be a problem with manufacturer so little luck
so far. Please, please conserve your use of PRS1000 as our supplies are
very low.

- Do not drain/change the shared PRS1000 baths unless OK'ed by staff.
- At general wet benches, use PRX-127 if your process allows.

Thanks for your cooperation and patience --

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Engineering Intern Position

Dear Labmates,

 

If you know someone who might be interested in the following Engineering Intern Position:

http://www.coriumgroup.com/jobs.html

 

Please ask them to contact me.

 

Thanks,

Ashutosh

 

Ashutosh Shastry, Ph.D.

Director, Engineering

Corium International, Inc.

235 Constitution Drive,

Menlo Park, CA 94025

ashutoshs@coriumintl.com

650-353-7193

 

--
Ashutosh Shastry, Ph.D.

Science & Strategy for Medical Device Development

http://www.linkedin.com/in/AshutoshShastry

Engineering Intern Position

 

Dear Labmates,

 

If you know someone who might be interested in the following Engineering Intern Position:

http://www.coriumgroup.com/jobs.html

 

Please ask them to contact me.

 

Thanks,

Ashutosh

 

Ashutosh Shastry, Ph.D.

Director, Engineering

Corium International, Inc.

235 Constitution Drive,

Menlo Park, CA 94025

ashutoshs@coriumintl.com

650-353-7193

 

Problem p5000etch SNF 2012-06-27 13:42:43: BCl3 down-

Will update

Re: New Gowning Service Contract. Need your help ASAP to initiate. With attachment

All,

Please use REPLY, not REPLY ALL when emailing out. In other words, don't include labmembers or labstaff in your replies, otherwise EVERYONE keeps getting the same excel file with a new entry!!

Brett, alternatively you can try using the Google Survey to maintain privacy while avoiding getting tons of excel sheets. It will plug in the entries into a single excel sheet that has limited access based on who you want to see it. Please email me back if you're interested and I can help you set one up.

Thanks,

Robert

On Tue, Jun 26, 2012 at 3:25 PM, Ashish Pal <apal@stanford.edu> wrote:

Hi,
Please find the attached excel sheet with my entry.
Best Regards
Ashish

----- Original Message -----
From: "Brett E. Huff" <bhuff@stanford.edu>
To: labmembers@snf.stanford.edu, labstaff@snf.stanford.edu
Cc: "John Bumgarner" <jwb2005@stanford.edu>
Sent: Tuesday, June 26, 2012 12:37:25 PM
Subject: Re: New Gowning Service Contract.  Need your help ASAP to initiate.  With attachment







On Jun 26, 2012, at 12:30 PM, Brett E. Huff wrote:




SNF Lab Users,
Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements
Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone. No guessing please.


Lab Staff please reply and specify the following:
Gown Size:
Boot Size:
Hood Size:


This should help resolve the existing low stock issue we are currently having on boots...



Brett E. Huff
SNF Clean Room Manager
Stanford University
©510-612-8670
bhuff@stanford.edu


Brett E. Huff
SNF Clean Room Manager
Stanford University
©510-612-8670
bhuff@stanford.edu

Re: New Gowning Service Contract. Need your help ASAP to initiate. With attachment

Hi,
Please find the attached excel sheet with my entry.
Best Regards
Ashish

----- Original Message -----
From: "Brett E. Huff" <bhuff@stanford.edu>
To: labmembers@snf.stanford.edu, labstaff@snf.stanford.edu
Cc: "John Bumgarner" <jwb2005@stanford.edu>
Sent: Tuesday, June 26, 2012 12:37:25 PM
Subject: Re: New Gowning Service Contract. Need your help ASAP to initiate. With attachment







On Jun 26, 2012, at 12:30 PM, Brett E. Huff wrote:




SNF Lab Users,
Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements
Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone. No guessing please.


Lab Staff please reply and specify the following:
Gown Size:
Boot Size:
Hood Size:


This should help resolve the existing low stock issue we are currently having on boots...



Brett E. Huff
SNF Clean Room Manager
Stanford University
©510-612-8670
bhuff@stanford.edu


Brett E. Huff
SNF Clean Room Manager
Stanford University
©510-612-8670
bhuff@stanford.edu

Found Apple Charger in the Lab

Dear Labmembers,

 

One of the Lab Staff found an Apple Charger in the lab.  If this is yours please come by my cubicle and let me know.  I am leaving for the day however, I will be back tomorrow.  In the meantime, I will lock the Apple charger up for the evening.

 

Maureen

Re: Yes, Google Docs may have been the way to go. But...

In my eastern culture, fat=p.h.a.t.=pretty.hot.and.tempting.
I am 5''6+-.5 and weigh 127lbs+-5lb, please reserve an XXL everything
for me Brett.
Thanks!

Sonny

On 6/26/12, Brett E. Huff <bhuff@stanford.edu> wrote:
> I was taught by my mother to never ask a woman her age or weight. I
> considered dress size and clean room gown to be similar…
> And sometime the boys like to seem beefed up rather than comfortable.
>
> This way it is only my business what you are choosing.
>
> Keep the emails coming.
>
>
>
> Brett E. Huff
> SNF Clean Room Manager
> Stanford University
> ©510-612-8670
> bhuff@stanford.edu
>
>

Yes, Google Docs may have been the way to go. But...

I was taught by my mother to never ask a woman her age or weight.  I considered dress size and clean room gown to be similar…

And sometime the boys like to seem beefed up rather than comfortable.  

This way it is only my business what you are choosing.  

Keep the emails coming.

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

Yes, some names may not be on this list. This data was taken from cleanroom door entry data.

All,

The access data was taken for a 4 week period to sample a fixed period in time.  If you are missing you either skipped badging into the gown room (I hope not) or you were otherwise busy elsewhere during our random 4 week pull.  Please provide your user id name and sizing and you will be counted amongst the user roll.

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

Re: New Gowning Service Contract. Need your help ASAP to initiate. With attachment

New Gowning Service Contract. Need your help ASAP to initiate.

SNF Lab Users,

Please find your ID in the attached Excel spreadsheet and complete the information on your desired clean room garment size requirements

Understand that if you request a particular size and change your mind later it will be difficult to meet the needs of everyone.  No guessing please.

Lab Staff please reply and specify the following:

Gown Size:

Boot Size:

Hood Size:

This should help resolve the existing low stock issue we are currently having on boots...

Brett E. Huff

SNG Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

Stanford Optical Society Summer BBQ, Thurs, June 28 @ 4:30 PM, Allen Bldg patio

Raman spectroscopy

Hi All

Has anyone used Raman spectroscopy in Stanford? I'm now looking for Raman to analyze my graphene samples.

Thanks,

Boram

Han-Bo-Ram Lee, Ph.D
Bent Research Group
Department of Chemical Engineering
Stanford University

Mail : Rm 113, Stauffer III Bldg., 381 North South Mall, Stanford, CA 94305
Email : sixram[at]stanford.edu or sixram[at]gmail.com
WWW : bentgroup.stanford.edu/

More PRS-1000 needed this weekend

Hi Sir:


I wonder if there is anyone who happened to be here this Sunday and have the authorization to get more PRS-1000 to the chemical store area.


Thanks a lot


Calvinli

Re: Lab is back on (mostly)

Hi again --

Sorry, I forgot two things:

- Furnaces and Epi2 will be addressed Monday -- the toxic gas service
group will be coming in late Monday morning to troubleshoot.

- Tony in Facilities is also a champ for all the work done today.

M

On 6/23/2012 3:31 PM, Mary Tang wrote:
> Hi all --
>
> The lab is mostly back on. Please check Coral for down tools
> (primarily furnaces and epi2). Make sure to read the comments for wet
> benches, as new chemicals will need to be poured. There is still a
> faint odor of sulfur around the building, but this should dissipate
> with a little time.
>
> The scrubber exhaust maintenance procedure took a bit longer than
> expected, due to some excitement with our toxic gas detection system.
> No, despite the odors, there was no toxic gas release event. But we
> find we are unable to reset some of the toxic gas sensors, so some
> furnaces and epi remain down. Again, please check Coral.
>
> Many thanks for Jose in Facilities for being on the ball and John
> Shott for just being there and knowing the answers to everything.
>
> Please record your observations on Coral or send a note to staff.
>
> Thanks for your patience --
>
> Your SNF Staff
>


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Lab is back on (mostly)

Hi all --

The lab is mostly back on. Please check Coral for down tools (primarily
furnaces and epi2). Make sure to read the comments for wet benches, as
new chemicals will need to be poured. There is still a faint odor of
sulfur around the building, but this should dissipate with a little time.

The scrubber exhaust maintenance procedure took a bit longer than
expected, due to some excitement with our toxic gas detection system.
No, despite the odors, there was no toxic gas release event. But we
find we are unable to reset some of the toxic gas sensors, so some
furnaces and epi remain down. Again, please check Coral.

Many thanks for Jose in Facilities for being on the ball and John Shott
for just being there and knowing the answers to everything.

Please record your observations on Coral or send a note to staff.

Thanks for your patience --

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Lab is mostly shutdown, until ~2 pm

Hi all --

The scrubber exhaust maintenance has begun (and a delightful aroma it is.) Most tools in the lab are shutdown. Check Coral (if tools are reserved during this time, even tools you don't normally enable, do not use.) Work should be done by 2 pm; we'll keep you posted.

Thanks for your attention --

Your SNF Staff

Patterning mask 0 in silica using ASML

Hey labmembers,

Has anyone patterned mask 0 in silica (silicon dioxide) using ASML? I want to make alignment marks (mask 0) in 300nm silica on silicon substrate. I plan to evaporate ~100nm silver onto silica and then deposit ~20nm alumina. I am not sure about the depth of the alignment marks for obtaining best contrast. I would be extremely grateful for any suggestions/recipe.

thanks,

--

~Vrinda

Vrinda Thareja

Ph.D. Candidate

Brongersma Group

Department of Materials Science and Engineering

Stanford University

Partial Lab Shutdown, Saturday, 6/23/12

Dear labmembers --

The scrubber exhaust system requires unexpected maintenance. This will
take place from 7:30-2 pm tomorrow, Saturday, June 23. Most tools in
the lab require scrubber exhaust and so will not be available during
this time. Wet benches will be shutdown earlier, to allow for bath
draining in advance of the scrubber shutdown. The few tools remaining
that do not require scrubber exhaust will remain in operation (see list
below). Please also be aware that scrubber maintenance often results in
strong, unpleasant, sulfurous odors in the vicinity of this building -
you may want to avoid coming in. We deeply apologize for the
inconvenience this causes in your scheduling.

Your SNF Staff

Tools OK to run: Raith, sem4160, svgcoat, svgdev, exposure/align tools,
metal deposition tools.

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Fwd: J.A. Woollam WVASE Short Course

All,

Here is a great chance to learn more about the Woollam ellipsometer.  The SNF system does run the VWVASE software.

Please contact Veronica directly if you are interested.

Regards,
Ed

-------- Original Message --------

Subject:	J.A. Woollam WVASE Short Course
Date:	Wed, 20 Jun 2012 10:40:46 -0500
From:	Veronica Cockerill <vcockerill@jawoollam.com>
To:	WoollamMailList@jawoollam.com

Dear J.A. Woollam Customers,

We would like to invite those of you who use our WVASE software to the next WVASE Data Analysis Fundamentals Short Course. It will be held August 7-10, 2012 at the Harvard University in Cambridge, Massachusetts. I have attached a course description and registration form. If you would like to attend, please fill out the registration form completely and fax or email to me by July 26, 2012. Once I receive your registration form, I will send a confirmation email.

This course will focus on data analysis methods for spectroscopic ellipsometry, using WVASE software, with a significant amount of "hands-on" computer time. For this reason, participants should be familiar with WVASE software.

NOTE: Many of you use our other data analysis software, CompleteEASE. A course dedicated to WVASE will NOT be of benefit to you if you use CompleteEASE. They are two completely different programs. The next CompleteEASE short course has not been scheduled yet. Once it is, I will notify you of that course. Thank you for your patience.

If you have any questions, please let me know.

Best regards,
Veronica

--

*******************************
Veronica Cockerill
Marketing Coordinator
J. A. Woollam Co., Inc.
645 M Street, Suite 102
Lincoln, NE 68508
vcockerill@jawoollam.com
Phone: (402)477-7501 x101
Fax: (402)477-8214

laser cutting

Hello all,

Does anyone know, where can I slice a piece of wafer with a laser cutter?

thanks,
ilya

Higher temperatures in the lab observed

Dear Labmembers --

You may have noticed that the temperature is running high in one or more
areas of the lab over the past week or so (especially noted over the
past week by lampoly/intlvac's). Facilities knows about this. It looks
like a more extensive problem than originally thought, so they are
continuing to work on it. We will update you as soon as we hear more.

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Wireless access point update

AP is in place and active. You can use either Stanford or EE-WiFi networks, and remember, no third party APs should be in the fab.

On Jun 20, 2012, at 9:37 AM, J Provine <jprovine@stanford.edu> wrote:

feedback from the trenches, the wireless is still terrible.  i can get neither Stanford nor EE-WiFi wireless over the last ~hour.  and should i manage to get connected, i'm right back out on my ear within minutes.  i hope the ongoing efforts improve this, but for now it is not improved.  i'm working (or trying to) near the chemical pass through/gowning room.
j

On Mon, Jun 18, 2012 at 1:52 PM, John Bumgarner <jwb2005@stanford.edu> wrote:

Just FYI,  Joe Little installed a new box this morning and the rest of the info is below.  Hope this helps with access in the fab. -- John

-------- Original Message --------

Subject:	Wireless access point update
Date:	Mon, 18 Jun 2012 11:20:34 -0700
From:	Joe Little <jlittle@ee.stanford.edu>
To:	jwb2005@stanford.edu

John,    We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.      

Re: shortage of medium size booties

Agree. Not only medium but large booties (brown and white) are also in shortage, especially in the morning.

Thanks,
Chien-Yu

----- Original Message -----
From: "Nikhil Apte" <npapte@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Wednesday, June 20, 2012 10:18:13 AM
Subject: shortage of medium size booties

Hi,


Since the last month or so, there has been quite a shortage of medium size (blue & yellow) booties. It is almost impossible to find a pair during prime time. Often users have to wear larger booties. This is a safety issue as it is easy to trip with these larger booties. We had ample medium booties before. Whatever happened to those?


Thanks,
Nikhil

shortage of medium size booties

Hi,

Since the last month or so, there has been quite a shortage of medium size (blue & yellow) booties. It is almost impossible to find a pair during prime time. Often users have to wear larger booties. This is a safety issue as it is easy to trip with these larger booties. We had ample medium booties before. Whatever happened to those?

Thanks,

Nikhil

Re: Wireless access point update

feedback from the trenches, the wireless is still terrible.  i can get neither Stanford nor EE-WiFi wireless over the last ~hour.  and should i manage to get connected, i'm right back out on my ear within minutes.  i hope the ongoing efforts improve this, but for now it is not improved.  i'm working (or trying to) near the chemical pass through/gowning room.
j

On Mon, Jun 18, 2012 at 1:52 PM, John Bumgarner <jwb2005@stanford.edu> wrote:

Just FYI,  Joe Little installed a new box this morning and the rest of the info is below.  Hope this helps with access in the fab. -- John

-------- Original Message --------

Subject:	Wireless access point update
Date:	Mon, 18 Jun 2012 11:20:34 -0700
From:	Joe Little <jlittle@ee.stanford.edu>
To:	jwb2005@stanford.edu

John,    We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.      

noxious smell in lab

Hey everyone,
For those late-night fabbers, there is a very bad smell in the lab that is quite strong by and around lampoly and that hall way. The smell is very strong by lampoly, and can even be smelled out into litho. It has been described as burned electronics, or very similar to the inside of MRC after running freon.
It has started to dissipate a bit, but still smells awful.
Happy processing,
Max

New Summer Course!

Hi all --

Fellow labmember, Rainer Fasching,  is teaching a new course on electrochemistry!

******************************************************************************
Applied Electrochemistry – Advanced Batteries ME420 - Syllabus, Summer 2012.
 
This class is build around applied electrochemistry with focus on energy conversion and storage. Basic concepts of electrochemistry are presented, of which the fundamentals of electrochemical energy conversion/storage are built. Electrochemical methods of energy conversion and storage are discussed with emphasis on thescaling behaviors.

 

Advanced battery concepts/systems and their applications (electrical vehicle and grid) will be a main subject of this year. High energy density battery technologies (beyond intercalation materials) and the influence on nano-structured materials/architecture will be discussed. Here the class will focus on challenges, solutions, and future perspectives of high capacity materials in closed systems (e.g. Li-ion, F-ion, flow batteries) as well as open systems (e.g. Li-air).

In addtion solid-state electrolytes with their potential for all solid-state batteries will be introduced this year.

Journals articles and book chapters will be used for in class discussion to emphasize on current research and challenges.

 

Goal of the course:
To introduce you to the fundamentals, modern methods, and current
trends of applied electrochemistry:
Understand the basic concepts of electrochemistry for energy storage
Gain familiarity with advanced battery technologies and current trends
Build confidence and knowledge to deal independently with electrochemical problems
 
Classroom: Will be announced
Time: Tuesday and Thursday
10:00-12:00 AM
Instructor: Rainer Fasching
Building 530, Room 220
Tel: 650-723-0084
Fax: 650-723-5034
Email: rfasch@stanford.edu <mailto:rfasch@stanford.edu>
 

Silicon on Insulator wafer

Hi

I am looking for a SOI wafer (220nm thick Silicon on 1micron oxide preferably). I talked to SOItech, but they do not sell anything less than 10 wafers. That is too much for my processing, as I will not need more than one.

Please let me know if I can get one wafer from anyone, or, if you know someone who might have one.

Thanks
Arka

--
PhD Student
Ginzton Lab (EE)
Stanford University
www.stanford.edu/~arkam

Fwd: Wireless access point update

Just FYI,  Joe Little installed a new box this morning and the rest of the info is below.  Hope this helps with access in the fab. -- John

-------- Original Message --------

Subject:	Wireless access point update
Date:	Mon, 18 Jun 2012 11:20:34 -0700
From:	Joe Little <jlittle@ee.stanford.edu>
To:	jwb2005@stanford.edu

John,    We've installed an additional access point to provide coverage to all four sides of the nano fab. This provides support for 802.11g and above wireless networks. Stanford is also in the process of updating their access points this summer for better stability and range, and should still support legacy wireless. Hopefully this will be completed some time in the next month or so.      

Re: wifi in SNF

I've also seen this several times recently and agree it would be awesome if Stanford could address it.  

Andrew

On Sat, Jun 16, 2012 at 11:54 PM, Yongliang Yang <ylyang@stanford.edu> wrote:

Hi, all,

The wifi in SNF is bad recently. One can only connect to internet in lith area. In other places, the computer shows that the wifi is connected, but can not access to internet.

I think it should be fixed.

Best,
Yongliang

wifi in SNF

Hi, all,

The wifi in SNF is bad recently. One can only connect to internet in lith area. In other places, the computer shows that the wifi is connected, but can not access to internet.

I think it should be fixed.

Best,
Yongliang

Etcher Installation Update -June 2012

Lab Members,

I want to let everyone know a major hurdle to the start-up of the four
new dry etch systems has been passed. This week we received the
installation permit from Santa Clara County. This allows us to move
forward. If you have been watching the installation process you will
see most of the mechanical work has been completed (process gas, cooling
water, exhaust, pump lines and electrical). Only a few items such as
certification of the gas lines, seismic bracing and smaller items such
as labeling and protective decking need to be completed. We are close
enough that we have contacted the equipment vendors to schedule their
first visit. The first visit is the service group to verify the tool
hook-ups and the mechanical functionality of the systems. We will not
run any process work at this time.

The second hurdle yet ahead of us is the Toxic Gas Ordinance (TGO)
permit. This permit is in review with Santa Clara County. We must have
this permit issued before we can charge any of the new lines with
process gases. If the timing works out correctly, we should receive the
TGO permit right about the time the service groups have completed there
tool functionality verification. Optimistically this means process
development could commence in 6 to 8 weeks. Yes, we are working to
pull this in.

You have most likely noticed the new ALD and MVD systems are also
waiting. The first PO's for their installation was submitted last
week. This PO is for the design and permit package preparation. The PO
covers the drawings and calculations for all the piping, exhaust,
electrical, seismic and code analysis for both tools. The next
objective for the ALD/MVD project is to issue PO's and get started on
the electrical and mechanical work. Just as with the etchers, we hope
to be nearly completed with the installation when the permits arrive.

Regards,
SNF Staff

Schedules Litho facilities work on 6/18

Greetings Lab-members ..

    On Monday, June 18th, the facilities group will be servicing the transfer fan T-6 which provides conditioned air to Aisle L-100. This is the Headway, Laurell and Blue-M oven aisle in the Litho area. The repair work is scheduled to start at 6:30am and be completed by 10:30am. During this time period, there will be no temperature or humidity control in the L-100 aisle. We strongly recommend that you refrain from processing your work in this aisle during this time to avoid any unstable or unpredictable results. If you choose to do process work at this time, please take a test wafer if possible. Litho staff members will be available on Monday to address any questions or concerns that you may have. Thank you in advance for your patience and understanding.

        The Litho Team

Bake condition before ion implantation

Hi all,

Does anyone know the bake conditions for AZ3612 before 20keV 4e15 ion-implantation?

I was using 115C 30min (on hot plate) last night but found wrinkles on my photoresist.

Any suggestion is appreciated. Thanks!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University

Reminder: Process Clinic at 10 am today

Hi all --

Process Clinic today at 10 am, in the cube area next to Maureen's
office. Staff members will be on hand to offer processing advice.
(Senior labmembers are welcome to add their experienced perspectives!)
All labmembers are welcome to bring processing questions, materials and
process requests, mask layouts for all to brainstorm.

Your SNF Staff

Re: Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?

HI Katie,

Not sure if the iphone email response made it to you.  My phone ran out of batteries as I was sending it out this morning.

So to remove very cross linked PMMA you can employ O2 plasma RIE at low pressures and moderate power.
If your materials are compatible you can also completely remove it soaking in Piranha etch made up fresh and heated to over 100 degrees C.

Finally, and this is likely the best thing to try first, use heated Microchem Remover PG with ultrasonic at a temperature between 40 and 65 degrees Celsius. I simply heat it up in the ultrasonic heater on wbsolvent with a set point of 65 C. Follow this soak with Acetone and Isopropanol to remove anything else that did not come off.

Please let me know how you make out.

James Conway
SNF


On 6/13/2012 5:22 PM, Katie Chang wrote:

Hello SNF users,

I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.

Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?

Thanks for your help!

--Katie

Re: Re: Does anyone know how to remove or de-cross-link PMMA that hasbeen UV crosslinked?

I didn't know they are also offering silicone solvents & removers. Cool.

 

Kangning

 

 

2012-06-13

---

kangning

---

发件人： Paul Park

发送时间： 2012-06-13  18:01:43

收件人： Roger Fabian Pease

抄送： Katie Chang; labmembers@snf.stanford.edu

主题： Re: Does anyone know how to remove or de-cross-link PMMA that hasbeen UV crosslinked?

There is PMMA remover available.

 

Check out http://www.dynaloy.com/

 

Good luck!

 

Paul

On Wed, Jun 13, 2012 at 6:34 PM, Roger Fabian Pease <pease@cis.stanford.edu> wrote:

Oxygen plasma or Ozone and a hot plate were used many years ago. May still be.
FP

Sent from my iPhone

On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc@stanford.edu> wrote:

> Hello SNF users,
>
> I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.
>
> Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?
>
> Thanks for your help!
>
> --Katie

Re: Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?

There is PMMA remover available.

 

Check out http://www.dynaloy.com/

 

Good luck!

 

Paul

On Wed, Jun 13, 2012 at 6:34 PM, Roger Fabian Pease <pease@cis.stanford.edu> wrote:

Oxygen plasma or Ozone and a hot plate were used many years ago. May still be.
FP

Sent from my iPhone

On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc@stanford.edu> wrote:

> Hello SNF users,
>
> I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.
>
> Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?
>
> Thanks for your help!
>
> --Katie

Re: Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?

Oxygen plasma or Ozone and a hot plate were used many years ago. May still be.
FP

Sent from my iPhone

On Jun 13, 2012, at 5:22 PM, Katie Chang <kgc@stanford.edu> wrote:

> Hello SNF users,
>
> I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.
>
> Now it seems nothing will get it off! We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?
>
> Thanks for your help!
>
> --Katie

Does anyone know how to remove or de-cross-link PMMA that has been UV crosslinked?

Hello SNF users,

I was wondering if anyone had experience in removing crosslinked PMMA from a wafer (or in de-crosslinking it). We have some devices on which we accidentally forgot to use blue tape to cover up the contact pads when we were spinning our passivating PMMA layer. Then, to compound the issue, we gave them to a bio group that decided to sterilize them by pounding them with UV light for 8 hours.

Now it seems nothing will get it off!  We tried to selectively scrub off the PMMA from just the contact pads, which failed. Then, we tried to just remove all of the PMMA from the whole wafer, which failed. We've tried soaking and sonicating in acetone, PG remover, chloroform, chlorobenzene, and several other things, which all failed. Does anyone have any suggestions?

Thanks for your help!

--Katie

Re: Java Update and problems running Remote Coral ....

Same thing happened to the Badger system in SNC/SNL. People in charge said we just needed to upgrade to Java 7. Should be the same case here...so getting Java 7 will help you out in both coral-based systems (Badger for SNC and Coral for SNF).

Robert

On Wed, Jun 13, 2012 at 5:02 PM, James W. Conway <jwc@snf.stanford.edu> wrote:

I needed to do a restart of my PC after loading the Java update.

Best

JWC

On 6/13/2012 5:00 PM, Raisul Islam wrote:

Hi,
I am also having problems with updated Java. I have tried running fresh version of coral but that did not work.
So do I need to get back to older version of Java?
-Raisul

----- Original Message -----
From: "John Shott"<shott@stanford.edu>
To: "labmembers"<labmembers@snf.stanford.edu>
Cc: "James Conway"<jwc@snf.stanford.edu>, "Zhiping Zhang"<zzp@stanford.edu>
Sent: Wednesday, June 13, 2012 4:55:03 PM
Subject: Java Update and problems running Remote Coral ....

SNF Lab Members:

I have heard from James Conway and, indirectly, from Zhiping Zhang that
an overnight upgrade of Java has "broken" remote Coral on their desktop.

While I don't know whether there is actually something wrong with the
latest version of Java, I've been able to get Remote Coral running again
(after intentionally upgrading the version of Java 7 on my desktop and
breaking Remote Coral) by pushing out a fresh version of Remote Coral
including an updated version of the third-party library that we use to
securely encrypt/decrypt Remote Coral passwords.

The next time that you start Remote Coral, you may see that it either
downloads a couple of files or asks you if you want to upgrade.
Hopefully, those new files will resolve any problems you may encounter.

If that updated version doesn't resolve any problems you may be
experiencing, please let me know.  It's possible that some folks may
need to purge their Java Web Start cache to fully reload the
application, but I'm hopeful that this may not be required and the
updated files will simply fix any problems that you have been experiencing.

Thanks for your attention, but please let me know if you experience any
problems.

John

Re: Java Update and problems running Remote Coral ....

I needed to do a restart of my PC after loading the Java update.

Best

JWC

On 6/13/2012 5:00 PM, Raisul Islam wrote:
> Hi,
> I am also having problems with updated Java. I have tried running fresh version of coral but that did not work.
> So do I need to get back to older version of Java?
> -Raisul
>
> ----- Original Message -----
> From: "John Shott"<shott@stanford.edu>
> To: "labmembers"<labmembers@snf.stanford.edu>
> Cc: "James Conway"<jwc@snf.stanford.edu>, "Zhiping Zhang"<zzp@stanford.edu>
> Sent: Wednesday, June 13, 2012 4:55:03 PM
> Subject: Java Update and problems running Remote Coral ....
>
> SNF Lab Members:
>
> I have heard from James Conway and, indirectly, from Zhiping Zhang that
> an overnight upgrade of Java has "broken" remote Coral on their desktop.
>
> While I don't know whether there is actually something wrong with the
> latest version of Java, I've been able to get Remote Coral running again
> (after intentionally upgrading the version of Java 7 on my desktop and
> breaking Remote Coral) by pushing out a fresh version of Remote Coral
> including an updated version of the third-party library that we use to
> securely encrypt/decrypt Remote Coral passwords.
>
> The next time that you start Remote Coral, you may see that it either
> downloads a couple of files or asks you if you want to upgrade.
> Hopefully, those new files will resolve any problems you may encounter.
>
> If that updated version doesn't resolve any problems you may be
> experiencing, please let me know. It's possible that some folks may
> need to purge their Java Web Start cache to fully reload the
> application, but I'm hopeful that this may not be required and the
> updated files will simply fix any problems that you have been experiencing.
>
> Thanks for your attention, but please let me know if you experience any
> problems.
>
> John
>
>
>

Re: Java Update and problems running Remote Coral ....

Works for me after allowing it to update files.

Thanks John!

James

On 6/13/2012 4:55 PM, John Shott wrote:
> SNF Lab Members:
>
> I have heard from James Conway and, indirectly, from Zhiping Zhang
> that an overnight upgrade of Java has "broken" remote Coral on their
> desktop.
>
> While I don't know whether there is actually something wrong with the
> latest version of Java, I've been able to get Remote Coral running
> again (after intentionally upgrading the version of Java 7 on my
> desktop and breaking Remote Coral) by pushing out a fresh version of
> Remote Coral including an updated version of the third-party library
> that we use to securely encrypt/decrypt Remote Coral passwords.
>
> The next time that you start Remote Coral, you may see that it either
> downloads a couple of files or asks you if you want to upgrade.
> Hopefully, those new files will resolve any problems you may encounter.
>
> If that updated version doesn't resolve any problems you may be
> experiencing, please let me know. It's possible that some folks may
> need to purge their Java Web Start cache to fully reload the
> application, but I'm hopeful that this may not be required and the
> updated files will simply fix any problems that you have been
> experiencing.
>
> Thanks for your attention, but please let me know if you experience
> any problems.
>
> John
>
>
>

Re: Java Update and problems running Remote Coral ....

Hi,
I am also having problems with updated Java. I have tried running fresh version of coral but that did not work.
So do I need to get back to older version of Java?
-Raisul

----- Original Message -----
From: "John Shott" <shott@stanford.edu>
To: "labmembers" <labmembers@snf.stanford.edu>
Cc: "James Conway" <jwc@snf.stanford.edu>, "Zhiping Zhang" <zzp@stanford.edu>
Sent: Wednesday, June 13, 2012 4:55:03 PM
Subject: Java Update and problems running Remote Coral ....

SNF Lab Members:

I have heard from James Conway and, indirectly, from Zhiping Zhang that
an overnight upgrade of Java has "broken" remote Coral on their desktop.

While I don't know whether there is actually something wrong with the
latest version of Java, I've been able to get Remote Coral running again
(after intentionally upgrading the version of Java 7 on my desktop and
breaking Remote Coral) by pushing out a fresh version of Remote Coral
including an updated version of the third-party library that we use to
securely encrypt/decrypt Remote Coral passwords.

The next time that you start Remote Coral, you may see that it either
downloads a couple of files or asks you if you want to upgrade.
Hopefully, those new files will resolve any problems you may encounter.

If that updated version doesn't resolve any problems you may be
experiencing, please let me know. It's possible that some folks may
need to purge their Java Web Start cache to fully reload the
application, but I'm hopeful that this may not be required and the
updated files will simply fix any problems that you have been experiencing.

Thanks for your attention, but please let me know if you experience any
problems.

John

Java Update and problems running Remote Coral ....

SNF Lab Members:

I have heard from James Conway and, indirectly, from Zhiping Zhang that
an overnight upgrade of Java has "broken" remote Coral on their desktop.

While I don't know whether there is actually something wrong with the
latest version of Java, I've been able to get Remote Coral running again
(after intentionally upgrading the version of Java 7 on my desktop and
breaking Remote Coral) by pushing out a fresh version of Remote Coral
including an updated version of the third-party library that we use to
securely encrypt/decrypt Remote Coral passwords.

The next time that you start Remote Coral, you may see that it either
downloads a couple of files or asks you if you want to upgrade.
Hopefully, those new files will resolve any problems you may encounter.

If that updated version doesn't resolve any problems you may be
experiencing, please let me know. It's possible that some folks may
need to purge their Java Web Start cache to fully reload the
application, but I'm hopeful that this may not be required and the
updated files will simply fix any problems that you have been experiencing.

Thanks for your attention, but please let me know if you experience any
problems.

John

New Plasmatherm PECVD "ccp" and "icp" tools

All,

This is notification that if you want to use the new Plasmatherm PECVD
tools, please see Nancy Latta for training prior to any usage (hard
requirement). Jim McVittle is the technical expert, but Nancy must
approve all users.

Use of these tools will meet the following general criteria.

For our cross contamination control strategy, we all calling these "All"
tools. This does not mean all materials are allowed. It means that you
can run "Au contaminated," "Semiclean" and "Clean" wafers and they will
come out in the same category as they went in.

Important for "Clean" users - you must assume the tool is dirty when you
enable and as such, you MUST run both the recipe to clean the chamber
and the recipe to coat the chamber (and insure no cross contamination)
prior to running your wafers. Please see Nancy for details.

The only materials that may be run in these tools are the same as have
been previously approved to run in STS Dep tool. This is subject to
change over time only through the Spec Mat/CCB process. Additional
information will be added to the Wiki for the tools over time.

Any questions, please see Nancy first before proceeding.

These are new tools, please follow the rules and keep them in good
condition. As a reminder, failure to follow the usage rules will result
in your access to SNF being deactivated for a period of time.

Regards,

John


_____________________
John Bumgarner, PhD
Operations Director SNF

Resist wafer bonding weights in Litho

I have attached a Thermocouple to one of the weights for use in measuring delta T and time constants.

Please use the other one.  If it is in use and not available, use the one with the TC, but please be careful not to damage the TC.

I hope to be finished in  about 1 week.

Thanks,

jim

Fwd: Re: XLab is Interviewing Prospective Students

This might be of interest to some labmembers.

-Karthik

> >The EXtreme Environment Microsystems Laboratory (XLab) is
> >interviewing prospective graduate students!  The lab website
> >(http://xlab.stanford.edu) has officially launched and students can
> >find brief descriptions of future research projects there.
> >
> >If you are interested in learning more about the research projects,
> >please contact Prof. Debbie G. Senesky  at
> >dsenesky@stanford.edu.  My office hours are on Tuesday and Thursday
> >(1:00pm to 2:30pm) and I would like to schedule meetings during those periods.
> >
> >Many thanks.
> >
> >-Debbie
> >________________________________________
> >Debbie G. Senesky, Ph.D.
> >Assistant Professor
> >Aeronautics and Astronautics Department
> >Stanford University
> >Email: dsenesky@stanford.edu
> >URL: http://xlab.stanford.edu
>

Re: Selective dry etching of SiN from silicon

Donguk,

In a CHF3/O2 process if you up the O2 percentage you will increase your sel of nitride to oxide (See Stocker paper for work done on AMT type etcher). By using N2 instead of O2, you can get high sel of nitr to poly-Si at high percentages of N2 (See Li paper for work done in (MRC/Drytek4)RIE type tool. You can also get high sel to Si using CF4 or NF3 in high percentages of O2 (See Kastenmeier paper fpr work done in a downstream uwave etcher. The Gasonic is the closest tool like this which have but it dose not have Cf4 or NF3.).

Jim

Stocker, H.J. et al. "Selective reactive ion etching of silicon nitride on
oxide in a multifacet ('HEX') plasma etching machine" 35th National
Symposium of the American Vacuum Society. Held: Atlanta, GA, USA 2-7
Oct. 1988. J. Vac. Sci. Technol. A, Vac. Surf. Films (USA), Journal of
Vacuum Science & Technology A (Vacuum, Surfaces, and Films) (May-June
1989) vol.7, no.3, pt.1 p. 1145-9

Li, Y.X. et al. "Selective reactive ion etching of silicon nitride over
silicon using CHF/sub 3/ with N/sub 2/ addition" JOURNAL OF VACUUM
SCIENCE & TECHNOLOGY B (MICROELECTRONICS AND NANOMETER STRUCTURES)
Sept.-Oct. 1995. vol.13, no.5, p. 2008-12

Kastenmeier, B.E.E. et al. "Highly selective etching of silicon nitride
over silicon and silicon dioxide" JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
A (VACUUM, SURFACES, AND FILMS) AIP for American Vacuum Soc, Nov. 1999.
vol.17, no.6, p. 3179-84

----- Original Message -----
From: "Donguk Nam" <dwnam83@gmail.com>
To: labmembers@snf.stanford.edu
Sent: Monday, June 11, 2012 11:07:53 PM
Subject: Selective dry etching of SiN from silicon

Dear Labmembers,

Does anyone have any experience in selective dry etching of SiN from silicon? I have been using CHF3/O2 in Drytek4 but the etch selectivity is not high enough for my process.

Please let me know if anyone has some experience.

Best regards,
Donguk

Selective dry etching of SiN from silicon

Dear Labmembers,

Does anyone have any experience in selective dry etching of SiN from silicon? I have been using CHF3/O2 in Drytek4 but the etch selectivity is not high enough for my process.

Please let me know if anyone has some experience.

Best regards,
Donguk

Do NOT turn off power to wetbench General

Dear labmembers,

If the wbgen-ctb is in use, please do NOT turn off the wetbench power when you finish with wbgen-hpr.  It turns off power to both and the heater will turn off.  Please be careful when working in this shared environment.

Thanks,
Jason

Re: H2O2 etch photoresist rate

Hi Liangliang,

 

Putting photoresist in H2O2 wouldn't be my first choice, as it can lift off badly, even in dilute solutions or with HMDS. 

Maybe someone at SNF will have a workaround for you.

 

Best wishes,

Robin King

 

 

From: Zhangll.ime <zhangll.ime@gmail.com>
To: "labmembers@snf.stanford.edu" <labmembers@snf.stanford.edu>
Sent: Thursday, June 7, 2012 11:29 AM
Subject: H2O2 etch photoresist rate

Hi all,

Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?

Thanks a lot!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University

watch out a big bug!

Dear SNF labmembers

When I loaded my wafers into tylan1 and put the tube in,
I found one bug flying around the furnace.
It was around 8:40am.

The bug looked like a big mosquito, not a fly.
I tried to catch it but I lost it soon. I seriously hope that it didn't go into the furnace.

I'm not sure it is still flying around in the cleanroom.
I have no idea how it visits here,
but please be careful when you load your samples into the chambers or furnaces.



Best

Sangmoo

E240-Poster session

Hi All,

The E240 poster presentation is today in the outdoor area outside AllenX from 3-5pm.

The future users of the SNF will be presenting on a wide variety of MEMS designs and topics; everything from energy harvesting to tunable lasers.

Also, there will be snacks.

Best,
E240 Teaching Team

H2O2 etch photoresist rate

Hi all,

Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?

Thanks a lot!

Sincerely yours,
Liangliang

-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University

Wet etchant for silver

Hey labmembers,

Does anyone know a wet etchant for silver films? I need to etch a 40nm groove in a 100nm silver film.

thanks,

--

~Vrinda

Vrinda Thareja

Ph.D. Candidate

Brongersma Group

Department of Materials Science and Engineering

Stanford University

June 7 is the tenth Anniversary of 'First Light' on the RAITH 150 Ebeam Lithography and Metrology System at Stanford Nanofabrication Facility

Greetings Raith Community:

Today is the Tenth Anniversary of 'First Light' on the Stanford Raith
150 system.

In the course of the last ten years the Raith 150 tool and I have made
significant contributions to basic research in Nano-Antennas, Photonic
Crystals and Integrated Photonic Platforms, and more recently in
Plasmonic devices in addition to all the normal device fabrications for
MEMS, NEMS, and microelectronics.

To date over 350 Users have been trained with nearly 200 currently
working on the tool. More than 50 peer reviewed Journal articles in
Photonics and Plasmonics have resulted from this effort and I have been
credited with significant contributions in more than 35 PhD thesis and
defenses in the last five years.

In looking back at many successes here at Stanford, I believe my biggest
contribution here at Stanford has been in the creation and support of a
large community of researchers working in rabid collaboration on the
RAITH 150 system.

I look forward to further engagement with lab members in the next decade
of research here at Stanford and hope to add Ion Beam Lithography
capability to the Ebeam Lab this decade.

Thank you for your support!

James Conway
Ebeam Technology Group
Stanford nanofabrication Facility

Re: Ru deposition

Hi Scott,
I've used this company for interesting material needs.
http://lebowcompany.com/

They are amazing.
Good luck, Betty Young (Physics)

----- Original Message -----
From: "Scott Lee" <wslee@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Tuesday, June 5, 2012 2:46:22 PM
Subject: Ru deposition

Hi all,


I need to deposit about 20-50nm Ru ideally by ALD or CVD but sputtered Ru could also work. Does anyone have a source for depositing Ru or have experience with a company who deposits a wide array of thin films?


Thanks,
Scott

Ru deposition

Hi all,

I need to deposit about 20-50nm Ru ideally by ALD or CVD but sputtered Ru could also work. Does anyone have a source for depositing Ru or have experience with a company who deposits a wide array of thin films?

Thanks,

Scott

ROOM CHANGE Re: EE412 final presentations

Hello Labmembers,

on wednesday june 6 (tomorrow) at 11:30am-12:30 the EE412 class will present their results of their work this quarter.  any interested parties are welcome.  we will meet in Nano 143

Kim Harrison will present on her studies of carbon contamination in various SiO2 release processes.

Sam Emaminejad will present on his study of ALD dielectrics for fluidic encapsulation in AC fields and the effect of ALD layers on PDMS bonding.

to celebrate another quarter of hard work and added community knowledge for SNF pizza will be provided.

 

j

and note:  EE17N presentations still 2:15-5:05 in allen 338x wednesday june 6th. 

 

Re: EE412 final presentations

following up on two errors related to my email:

1) the room is allen 101

2) this is for EE412, not EE17N which is scheduled wednesday 2:15-5:05pm as prof. pease pointed out.  interested parties are welcome to come to see the presentations of the projects undertaken by the students in EE17N (a freshman introsem on nanofabrication taught by prof. pease and myself).  

in brief:

EE412: graduate SNF projects:  Allen 101:  11am-noon

EE17N:  undergraduate nanofabrication projects:  Allen 338x:  2:15-5:05pm
both wednesday june 6th, 2012.
j

On Tue, Jun 5, 2012 at 10:01 AM, pease <pease@cis.stanford.edu> wrote:

2:15 pm to 5:05pm!
fp

On 6/5/2012 9:53 AM, J Provine wrote:

Hello Labmembers,
on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will present their results of their work this quarter.  any interested parties are welcome.

Kim Harrison will present on her studies of carbon contamination in various SiO2 release processes.

Sam Emaminejad will present on his study of ALD dielectrics for fluidic encapsulation in AC fields and the effect of ALD layers on PDMS bonding.

to celebrate another quarter of hard work and added community knowledge for SNF pizza will be provided.

j

Re: EE412 final presentations

2:15 pm to 5:05pm!
fp


On 6/5/2012 9:53 AM, J Provine wrote:
> Hello Labmembers,
> on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will
> present their results of their work this quarter. any interested
> parties are welcome.
>
> Kim Harrison will present on her studies of carbon contamination in
> various SiO2 release processes.
>
> Sam Emaminejad will present on his study of ALD dielectrics for
> fluidic encapsulation in AC fields and the effect of ALD layers on
> PDMS bonding.
>
> to celebrate another quarter of hard work and added community
> knowledge for SNF pizza will be provided.
>
> j

EE412 final presentations

Hello Labmembers,

on wednesday june 6 (tomorrow) at 11am-noon the EE412 class will present their results of their work this quarter.  any interested parties are welcome.

Kim Harrison will present on her studies of carbon contamination in various SiO2 release processes.

Sam Emaminejad will present on his study of ALD dielectrics for fluidic encapsulation in AC fields and the effect of ALD layers on PDMS bonding.

to celebrate another quarter of hard work and added community knowledge for SNF pizza will be provided.

j 

Oral Exam Announcement: Jiale Liang

Stanford University Ph.D. Oral Examination – Department of Electrical Engineering

Title: Phase Change Memory Towards Sub-10nm - Device Structure and Array Analysis
Speaker: Jiale Liang
Advisor: H. -S. Philip Wong

Date: Wednesday, June 6, 2012
Time: 2:00 pm (Refreshments at 1:45pm)
Location: CIS-X Auditorium

Abstract:
Phase change memory (PCM) is a promising candidate for the next-generation nonvolatile-memory technology. Yet, questions remain unanswered as to what extent a functional PCM cell can be ultimately scaled to and what properties a PCM cell has at the single-digit nanometer scale. Moreover, for memory array implementation, array size limitations from sneak path leakage and wire scaling are severe. A careful co-design between memory device structure and array configuration beyond sub-10nm regime is hence imperative.

In the first part of my presentation, I will explore the scaling limit of PCM cells by demonstrating a fully functional cross-point memory cell using carbon nanotubes (CNTs) as the memory electrode. The use of CNT electrode brings the lithography-independent critical dimension down to 1.2 nm and contributes to a large reduction of programming current to 1.4 μA, which is two orders of magnitude smaller than the state-of-the-art, and a record-low programming energy to 210 fJ. Measured electrical characteristics validate the advantage of device scaling on reducing the programming current of PCM cells and confirm the potential viability of a highly scaled ultra-dense PCM array down to 1.8nm node technology.

In the second part of my presentation, I will extend the discussion from a single PCM device to the resistive cross-point memory array. First, the methodology for worst case analysis and the reduced circuit model for cross-point memory arrays are introduced. Using this model, the size limiting factors of cross-point memory arrays without selection devices are analyzed considering both the array data pattern dependence and memory cell parameter dependence. Next, the impact of bit line and word line wire scaling on the write/read margin, energy dissipation, speed and reliability of resistive cross-point memory array are quantitatively examined for wire sizes down to the sub-10nm node. The impending resistivity increase due to wire dimensional scaling results in significantly degraded write and read windows, substantial interconnect energy, increased wire latency and exacerbating reliability. Lastly, the concept of using local back gate (LBG) CNFET as memory electrode, interconnect, and selection device for cross-point memory arrays is proposed. The improvement in the cross-point array performance promises the possibility of an integrated memory-carbon structure for sizes beyond sub-10nm.

particle counts after tours

hi labmembers.  the tours of the labs have finished.  here was the particle count this morning:

particle size (um)      # of particles
>5.0                  =          0

>1.0                  =          1

>0.5                  =          13

>0.3                  =          41

now those measurements have been reached again.
during the height of the tours the reading was

particle size (um)      # of particles
>5.0                  =          0

>1.0                  =          4

>0.5                  =          29

>0.3                  =          112

this for .05m^3 so these fall within class 100 guidelines.

happy processing.

j & fabian

*measurements taken near fiji ald systems.

Re: Dry etch PECVD SiO2

You'll be fine. I do it routinely.

N
----- Original Message -----
From: Henry Hong-Yu Chen <hongyuc@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Fri, 01 Jun 2012 11:44:12 -0700 (PDT)
Subject: Dry etch PECVD SiO2

Dear Labmembers,

I plan to etch SiO2 (grown with STS) on the top of Pt (innotec). The
recipe I learned is CHF3/O2 PECVD SiO2 etching on wiki. If I want to
etch ~130nm SiO2, is 1um 3612 enough to for mask? Will the PR become
too hard to strip using aceton after etching?

In addition, I found mrc and drytek4 can do SiO2 etch. Which one gives
the better/steeper profile?

Thanks

Henry

Dry etch PECVD SiO2

Dear Labmembers,

I plan to etch SiO2 (grown with STS) on the top of Pt (innotec). The
recipe I learned is CHF3/O2 PECVD SiO2 etching on wiki. If I want to
etch ~130nm SiO2, is 1um 3612 enough to for mask? Will the PR become
too hard to strip using aceton after etching?

In addition, I found mrc and drytek4 can do SiO2 etch. Which one gives
the better/steeper profile?

Thanks

Henry