Hi Liangliang,
Putting photoresist in H2O2 wouldn't be my first choice, as it can lift off badly, even in dilute solutions or with HMDS.
Maybe someone at SNF will have a workaround for you.
Best wishes,
Robin King
From: Zhangll.ime <zhangll.ime@gmail.com>
To: "labmembers@snf.stanford.edu" <labmembers@snf.stanford.edu>
Sent: Thursday, June 7, 2012 11:29 AM
Subject: H2O2 etch photoresist rate
To: "labmembers@snf.stanford.edu" <labmembers@snf.stanford.edu>
Sent: Thursday, June 7, 2012 11:29 AM
Subject: H2O2 etch photoresist rate
Hi all,
Does anyone know the etch rate of photoresist (for example, 3612) in H2O2 ?
Thanks a lot!
Sincerely yours,
Liangliang
-------------------------
Liangliang Zhang
Ph. D candidate,
Electrical Engineering,
Stanford University
No comments:
Post a Comment