Nathan Klejwa from my group is defending tomorrow afternoon from 4-6 in
202 Packard. Be there to cheer him on and learn about alternatives to
photolithography for prototyping and perhaps, manufacturing, low-cost
microsystems.
Roger
Here's his title and brief abstract:
Rapid Microsystem Prototyping
This work focuses on developing tools and processes to decrease the time
it takes to create microsystem prototypes by using printing and CNC
micromilling as mask-free "rapid prototyping" alternatives to
photolithography, deposition, and etching. Printing allows for the
maskless deposition of a patterned polymer layer in a matter of seconds,
which can be used for etch masking, liftoff patterning, or as an active
microstructural material. CNC micromilling acts as a highly selective
and anisotropic etch for difficult-to-etch materials like PDMS, without
the need for a masking layer. These two processes can individually
create microdevices such as laser scanners or pump-free microfluidic
systems, but when combined allow for the creation of complex,
electromechanical devices in days rather than months. In addition to
their use for prototyping, these processes can be extended into mass
production for extremely low-cost, large-area, reel-to-reel compatible
polymer-based devices.
No comments:
Post a Comment