Nano Facilities equipment survey

On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of
the Shared Nano-facilities Committee, please complement the data
being gathered from a faculty survey by taking the survey found at:

http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d

This survey will indicate the most urgent needs for new shared tools.

Stanford has made great progress on shared nano-facilities in the
past year. Your inputs will help the committee decide which tools
are most important for future grant opportunities. On the first page
are five candidates for the next NSF Major Research Instrumentation
grant competition.

Five candidate tools (listed alphabetically):

1. Chemically assisted ion beam etcher (CAIBE) - Enables high
precision dry etching of semiconductors (Si, III-V, II-VI),
chalcogenide materials, magnetic materials and metal oxides using a
combination of reactive gases and ion beam. Provides a controllable
etch by giving independent control of ion energy, current density,
and incident angle.

2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB
allows imaging, etching and deposition of materials on length scales
at 100 nm. Electron column enables non-destructive imaging of high
resolution samples to achieve three-dimensional imaging with
high-resolution SEM.

3. Electron microprobe - Provides quantitative chemical analysis of
major and minor elements and qualitative analysis of trace elements
in sample. The combination wavelength-dispersive and
energy-dispersive spectrometers with backscattered and secondary
electron imaging allows detection of elements from Beryllium through Uranium.

4. Plasma etcher - Modern r&d plasma etch tools to support etch of
silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI,
photoresist and other materials. This equipment would replace the
ones installed in 1988 in SNF and will be better able to reproduce
the fine structures fabricated in lithography.

5. Scanning electron microscope (SEM) (high resolution and/or
environmental) - Will provide more capacity for high resolution
scanning electron microscopy with resolution to 0.8 nm. The
environmental SEM provides for the capability to work at lower vacuum
for high-resolution imaging of insulating and non-solid materials.

Highlights of progress on Stanford nanofacilities:

Tools ordered:
1. workhorse/training TEM (installation underway)
2. aberration-corrected FEI Titan TEM (expected in 2010)
3. JEOL 6300 ebeam lithography system (expected in September, 2009)

Proposals submitted:
1. NanoSIMS (submitted to NSF MRI competition in January, 2009)
2. nanofab tools (submitted to NSF through the NNIN in May, 2009)
3. Academic Research Infrastructure for facilities upgrades (no
equipment) (in progress).

The nanobuilding construction is proceeding rapidly. The new
nanobuilding includes 9000 square feet of shared facilities. The
design team is working hard to meet the sensitive specifications for
the quiet environment necessary for many modern tools.

Shared Nano-facilities Committee
Chris Chidsey, Chemisty
Curt Frank, Engineering
Sam Gambhir, Radiology, BioX, and Molecular Imaging
David Goldhaber-Gordon, Physics
Paul McIntyre, Materials Science and Engineering
Kam Moler, Applied Physics and Physics
Jody Puglisi, Structural Biology
Olav Solgaard, Electrical Engineering
Jonathan Stebbins, Geological and Environmental Sciences
Jelena Vuckovic, Electrical Engineering
H.-S. Philip Wong, Electrical Engineering