Re: photo resist pretreatment before ion implantation

Thank you for those who sent me the reply. I found a recipe from ee410 class runsheet, which you can find at http://www.stanford.edu/class/ee410/#HO thanks to Mary's help.

0) After developing 1um thick 3612,
1) 30mins at 110C
2) 15mins UV exposure
3) 30mins at 110C
4) Ion implantation

SangBum


SangBum Kim wrote:

Dear SNF labmembers,

 

 Could anyone give me some advice on typical photoresist pretreatment before ion implantation, please?

 For example, do I need 1) UV hardening of resist or 2) heat treatment? Any other suggestions?

 

 I plan to use ion implantation service from Innovion and use 1.6um thick SPR 3612 as a photoresist with maximum As ion energy of 180keV.

 

Thanks,

SangBum