does anybody know or has some experience in changing the surface wettability towards a hydrophobic characteristics for silicon wafers?
Thanks for your help
--
Markus Buchgraber
Ph.D Candidate
Department of Energy Resources Engineering
367 Panama, Rm 065
Stanford University
Stanford, CA 94305-2220
(650) 644-6762 (mobile)
Office - Green Earth Sciences Rm. 159
e-mail: markus.buchgraber@stanford.edu
1 comment:
Hi,
You can deposit fluorocarbon from plasma state with the standard ICP-inductively coupled plasma chamber. or you can spin coat standard PDMS, silane, teflon or anyother hydrophobic polymers. tell me your capability, then we can decide what is the easy way.
Arun
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