Re: STS nitride recipe

Can someone tell us the expected date for it to be installed, characterized and available to users? That would be useful info, thanks.

--- On Mon, 3/1/10, Jim McVittie <mcvittie@cis.Stanford.EDU> wrote:

> From: Jim McVittie <mcvittie@cis.Stanford.EDU>
> Subject: Re: STS nitride recipe
> To: "Tracy Fung" <tfung@silexos.com>
> Cc: labmembers@snf.stanford.edu
> Date: Monday, March 1, 2010, 11:27 AM
> Tracy,
>
> The SNF has just ordered a low temperature PECVD system
> from Plasma-Therm
> which deposits nitride at below 100C using N2 with SiH4.
> The Tool will be
> delivered in June. It also has a low temp oxide dep
> process.
>
>     Jim
>
> On Mon, 1 Mar 2010, Tracy Fung wrote:
>
> > Does anyone have experience with recipes for silicon
> nitride using STS
> > PECVD? 
> >
> > I'm currently using the standard ammonia recipe, are
> there any other
> > standard recipes that uses nitrogen?
> >
> > 
> >
> > Tracy Fung
> >
> > 
> >
> >
>
> --
> --------------------------------------------------------------
> James (Jim) P. McVittie, Ph.D.     
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