Tuesday, June 30, 2009
Re: Problem p5000etch SNF 2009-06-13 00:10:22: ChA Magnets not functional
Comment p5000etch SNF 2009-06-30 20:18:43: Magnet Driver
There alot of request for chamber A, I got permission from
John Shott. I removed chamber A and C magnet driver and
installed chamber C magnet driver on chamber A. Working
on magnet driver replacement for chamber C.
Cesar
Problem p5000etch SNF 2009-06-30 18:29:40: Ch. B Magnet fault
Monday, June 29, 2009
Delicious post-lunch treats in Nancy's office
Ease your way into the work week with a delicious post-lunch treat! The SNF bake sale is on in Nancy’s office (Allen 145) now! A large variety of homemade items (listed below) are available for sale, courtesy of several generous staff and lab members. Come enjoy some special goods (including Scottish and Turkish pastries) and support the Leukemia & Lymphoma Society!
Panna cotta (Marika)
Mango orange fruit preserves (Marika)
Blueberry scones (Robin)
Cranberry orange scones (Robin)
Spinach & Feta Cheese Borek (Nevran)
Scottish flapjacks (Debbie)
Apple, walnut, and cinnamon pastry with powdered sugar (Nevran)
Chocolate rum balls (Robin)
Chocolate and double-chocolate chip cookies (Maureen)
Ginger cookies (Serene)
Double-chocolate chip cookies (Raja)
Zucchini, chocolate, and walnut muffins (Linda O.)
Blueberry muffins (Maureen)
Brownies (Maureen)
Rice-Krispie Treats (Maureen)
Sunday, June 28, 2009
SNF Bake Sale Tomorrow for Leukemia & Lymphoma Society
Hi All,
SNF will be hosting a bake sale tomorrow, Monday, June 29, in Nancy’s office (Allen 145). Proceeds of the sale will support the Leukemia & Lymphoma Society, which helps cancer research and patient services.
There will be treats prepared by a number of staff, student, and industrial members, so come enjoy some tasty goods and support an important cause. Additional donations of food and funds will certainly be welcome, so don’t hesitate to let the philanthropic bug bite!
(Apologies to those receiving this email twice)
Re: Shutdown p5000etch SNF 2009-06-26 20:34:10: Wafer broke during etching in chamber B
with water and ipa.
Process Clinic, Monday, 2-4 pm
Greetings Labmembers --
Process Clinic, Monday, June 28, 2-4 pm, in the cubicle area outside
Maureen's office. Bring process questions, mask layouts, SpecMat
requests. New labmembers are especially encouraged to come and review
process flows and runsheets. The experts from ASML will also be on hand.
See you there!
Your SNF and ASML staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Friday, June 26, 2009
Shutdown p5000etch SNF 2009-06-26 20:34:10: Wafer broke during etching in chamber B
The wafer included a bonded interface and the breakage may have occured because the bond quality was poor. On the other hand, I have never had problems with similar bonded wafers in the past.
Problem p5000etch SNF 2009-06-26 14:56:12: handler wafer broken in Chamber B
Dimethyl Sulfoxide
I was wondering if anyone would have about 150-200ml of Dimethylsulfoxide to share with me.
Most likely I will order some more in the near future so you could have it back if needed.
Thank you very much for your response
Marlene
Wednesday, June 24, 2009
Metal based wafer bonding
Re: Vacuum furnace
Thanks, Wei --- On Wed, 6/24/09, Jung-Sub Wi <jswi@stanford.edu> wrote:
|
Vacuum furnace
I wonder if anyone has (or know) a vacuum furnace to anneal some coupon samples upto 800oC.
In my samples, there are no volatile species at this temperature range.
It is just a Si coupon with some Fe and Pt.
I really appreciate for your time and kind consideration, in advance.
With my best wishes
Jung-Sub Wi, Ph.D.
Department of Materials Science and Engineering
Stanford University
Monday, June 22, 2009
Nano Facilities equipment survey
survey, please join the over 100 people who have done so
already. The survey will be available until Friday, 6/26.
-------------------------------------------------------------------------------------------------------------------------------------------------------------
On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of
the Shared Nano-facilities Committee, please complement the data
being gathered from a faculty survey by taking the survey found at:
http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d
This survey will indicate the most urgent needs for new shared tools.
Stanford has made great progress on shared nano-facilities in the
past year. Your inputs will help the committee decide which tools
are most important for future grant opportunities. On the first page
are five candidates for the next NSF Major Research Instrumentation
grant competition.
Five candidate tools (listed alphabetically):
1. Chemically assisted ion beam etcher (CAIBE) - Enables high
precision dry etching of semiconductors (Si, III-V, II-VI),
chalcogenide materials, magnetic materials and metal oxides using a
combination of reactive gases and ion beam. Provides a controllable
etch by giving independent control of ion energy, current density,
and incident angle.
2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB
allows imaging, etching and deposition of materials on length scales
at 100 nm. Electron column enables non-destructive imaging of high
resolution samples to achieve three-dimensional imaging with
high-resolution SEM.
3. Electron microprobe - Provides quantitative chemical analysis of
major and minor elements and qualitative analysis of trace elements
in sample. The combination wavelength-dispersive and
energy-dispersive spectrometers with backscattered and secondary
electron imaging allows detection of elements from Beryllium through Uranium.
4. Plasma etcher - Modern r&d plasma etch tools to support etch of
silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI,
photoresist and other materials. This equipment would replace the
ones installed in 1988 in SNF and will be better able to reproduce
the fine structures fabricated in lithography.
5. Scanning electron microscope (SEM) (high resolution and/or
environmental) - Will provide more capacity for high resolution
scanning electron microscopy with resolution to 0.8 nm. The
environmental SEM provides for the capability to work at lower vacuum
for high-resolution imaging of insulating and non-solid materials.
Highlights of progress on Stanford nanofacilities:
Tools ordered:
1. workhorse/training TEM (installation underway)
2. aberration-corrected FEI Titan TEM (expected in 2010)
3. JEOL 6300 ebeam lithography system (expected in September, 2009)
Proposals submitted:
1. NanoSIMS (submitted to NSF MRI competition in January, 2009)
2. nanofab tools (submitted to NSF through the NNIN in May, 2009)
3. Academic Research Infrastructure for facilities upgrades (no
equipment) (in progress).
The nanobuilding construction is proceeding rapidly. The new
nanobuilding includes 9000 square feet of shared facilities. The
design team is working hard to meet the sensitive specifications for
the quiet environment necessary for many modern tools.
Shared Nano-facilities Committee
Chris Chidsey, Chemisty
Curt Frank, Engineering
Sam Gambhir, Radiology, BioX, and Molecular Imaging
David Goldhaber-Gordon, Physics
Paul McIntyre, Materials Science and Engineering
Kam Moler, Applied Physics and Physics
Jody Puglisi, Structural Biology
Olav Solgaard, Electrical Engineering
Jonathan Stebbins, Geological and Environmental Sciences
Jelena Vuckovic, Electrical Engineering
H.-S. Philip Wong, Electrical Engineering
Remote Coral from behind firewalls ....
There have been a small number of you who have been unable to run Remote
Coral because of firewall issues .... particularly from industrial
concerns or government labs with tightly locked down firewalls. We
believe that we have been able to control the ports that the Coral
servers are using in hopes that your local IT staff will be able to open
up your firewalls in order to be able to run Remote Coral.
We are now able to tell you that the Coral servers will be running on
the range of ports from 50000 to 50014 on the server shine.stanford.edu
(171.64.101.141).
In other words, if your firewall folks are willing to open your local
firewall to the range of ports 50000:50014 when the destination IP
address is (171.64.101.141) you should be able to run the SNF version of
Remote Coral.
Note, if you also wish to run the SNL version of Remote Coral, that will
be the same port range (50000:50014) but the destination address is
(171.67.100.167).
Let me know if this allows you to run remote coral when you had
previously been blocked.
Thanks,
John
Sunday, June 21, 2009
Comment p5000etch SNF 2009-06-21 21:13:58: RF power inconsistent
Re: Problem p5000etch SNF 2009-06-21 04:34:50: piece fallen in chamber B
down chamber with water and ipa.
Problem p5000etch SNF 2009-06-21 04:34:50: piece fallen in chamber B
(it's a handler piece so not important for me)
Friday, June 19, 2009
Comment p5000etch SNF 2009-06-19 14:58:50: Bad magnet driver
look for a replacement..
OSA/SPIE bbq!
Lana Lau
OSA/SPIE Membership Chair
--
Lana Lau
PhD candidate
W. E. Moerner Lab
Stanford University
mailing address:
Stanford University
Department of Chemistry
333 Campus Drive #121
mailbox 99
Stanford, CA 94305
(650) 724-4052 office
(650) 724-4051 lab
--
Lana Lau
PhD candidate
W. E. Moerner Lab
Stanford University
mailing address:
Stanford University
Department of Chemistry
333 Campus Drive #121
mailbox 99
Stanford, CA 94305
(650) 724-4052 office
(650) 724-4051 lab
Re: Comment p5000etch SNF 2009-06-17 00:45:01: Casette won't clamp properly
Re: Problem p5000etch SNF 2009-06-17 10:50:00: helium leak rate error
Thursday, June 18, 2009
Important Notice - Please Read
As Ed Myers indicated in an earlier Email, We are critically low on several chemicals in the lab. In particular, we are very low on MF-26A developer and do not have enough to sustain us until our next delivery , expected July 6th. In an effort to keep the Litho area up and running, we have received a large quantity of LDD26W developer. This was the standard developer for all 3612 resist processes prior to the change-over at the beginning of the year. We will temporarily change over to this developer for use with all 3612 resist processing. The MF26A developer will still be available for use with Shipley 955-7 photo-resist. This change-over will take place on Friday, June 19th between 7:30AM and 9:30 AM. All necessary program changes will be done at this time. There will also be copies of the recipes at the SVG develop tracks for your reference. Please review the recipes carefully and make sure you select the appropriate developer program for your resist process. We do not anticipate any problems, as this was the process of record last year. However, it is advised that you develop a test wafer to verify your process. If you have any problem, please report them in coral. Also, please contact a staff member if you have any questions or concerns.
Thanks... Your SNF Staff
Comment p5000etch SNF 2009-06-18 11:10:31: Ch. B seems to run okay
PhD Oral Examination: "Modeling of Nanometallic Waveguides," 3pm, AP200
Department of Electrical Engineering
Stanford University
Speaker: S. Ekin Kocabas, kocabas@stanford.edu
Title: Modeling of Nanometallic Waveguides
Date: Thursday, June 18, 2009
Time: 3:15pm (refreshments at 3:00pm)
Location: Applied Physics, Rm 200 http://campus-map.stanford.edu/index.cfm?ID=04-230
Abstract:
Plasmonics is a new and vibrant branch of optics that tries to understand and design metallic structures to focus and guide light at the nanometer level, below the diffraction limit, with applications covering a wide range of fields from bio-sensing to optical interconnects. The optical interconnect applications will require a dense integration between the optical and the electrical components which necessitates a solid understanding of the way electromagnetic waves propagate and scatter as they flow through the system.
In this talk, I will focus on one of the most popular waveguiding geometries in plasmonics: the metal-insulator-metal (MIM) waveguide. The talk will illustrate the use of the ideas developed in the microwave domain to design waveguiding components at optical wavelengths. As an example, I will provide the details on the use of the Smith Chart to build a mode converter that transforms the mode of a large waveguide to that of a smaller waveguide with no energy loss [1]. Circuit models for waveguide junctions will be derived and their physical significance will be discussed as well. Lastly, the modes of the MIM waveguide will be at the focus of our theoretical lens [2]. I will compare and contrast the rich set of modes that exists in the MIM waveguide to those that exist in the dielectric slab and the parallel plate waveguides. The importance of using the full set of supported modes---which form a complete basis set---will be illustrated by mode-matching calculations.
[1] http://tinyurl.com/l4f54y
[2] http://tinyurl.com/l2u32o
Wednesday, June 17, 2009
Problem p5000etch SNF 2009-06-17 19:39:32: Chamber C etch
I will also monitor leak rates more carefully next time.
Comment p5000etch SNF 2009-06-17 16:52:39: Chamber A update
the user is done with the tool.
Problem p5000etch SNF 2009-06-17 10:50:00: helium leak rate error
Comment p5000etch SNF 2009-06-17 00:45:01: Casette won't clamp properly
alternatives to Gasonics and Drytek2
Considering both equipments are down, please let me know the "Dry" alternative equipment to
1. Gasonics - PR stripping
2. Drytek 2 - Descumming the PR
thanks
~gaurav
Tuesday, June 16, 2009
Comment p5000etch SNF 2009-06-16 15:26:09: Update system reset
silver wet etching rate
==================================
Kevin Huang
Ph.D. Candidate
Stanford Organic Electronics Lab
Dept. of Electrical Engineering
Email: kevhuang@stanford.edu
Phone: (650) 725-6924
==================================
Monday, June 15, 2009
Free Bio-Nano-MEMS Technology Talks -- TFUG Meeting June 17; San Jose
(www.avsusergroups.org <http://www.avsusergroups.org/> )
FREE ADMISSION-No need to register, just show up!!
TOPIC: Bio-Nano-MEMS Technology
Meeting Date: June 17, 2009
EARLY START TIME: 1:30 - 5:00 pm
Location: SEMI Global Headquarters
Seminar Rooms 1 & 2
3081 Zanker Road
San Jose, CA 95134
**Park in front or behind the
vacant building across from SEMI**
Co-Chairs: Roc Blumenthal, roc@rocsolidsoln.com
Hok-kin Choi, Hokkin.choi@intel.com
Connie Wang, connie_wang@amat.com
Agenda:
1:30 - 1:35 Welcome/Announcements
1:35-2:05 "Development of Nano Biosensors for Diverse Applications" Dr.
M. Meyyappan, NASA Ames Research Center, m.meyyappan@nasa.gov
Abstract: Biosensors are needed in biomedical, water quality
monitoring, agricultural and food quality testing, environmental
monitoring, pathogen detection, general lab-on-a-chip needs and related
applications.
Detection of gases or vapors may rely on intelligent pattern recognition
approach using a sensor array. But biosensors in a fluidic environment
should preferably work using a "lock and key" approach wherein a probe
molecule, selected a priori for the target of interest, is attached to
an electrode or a device. Upon hybridization, either electrical or
electrochemical signal can be measured, though most biosensors to date
have relied on optical signal transduction. Electronic approach is more
amenable to wafer scale fabrication as well as for integration with
microfluidics for sample delivery. This brief talk outlines general
requirements and presents some examples from our lab. The author
acknowledges contributions from Hua Chen, Prabhu Arumugam, Jun Li, Y. Lu
and Jing Li.
2:05 - 2:35 "Biomimeticaly Engineered Nanomedical Systems", Demir Akin,
DVM, Ph.D,
Deputy Director, Center for Cancer Nanotechnology Excellence focused on
Therapy Response (CCNE-TR), School of Medicine, Department of Radiology,
Stanford University, Demir.Akin@stanford.edu
Abstract: Dramatic changes occur in the material properties and
unexpected behaviors emerge as the material dimensions approach
nanometer size. Biological systems capitalize on these nanophenomena in
the forms of naturally evolved life sustaining functions. Towards the
realization of personalized medicine, nanotechnology promise amazing
possibilities which can all be collectively named under Nanomedicine. In
this talk, I will give some examples of these natural nanodevices and
also some of our own man-made biomimetic micro to nanoscale nanomedical
devices. As a highly cohesive, interdisciplinary group of researchers,
we have been designing, fabricating and studying diagnostic and
therapeutic applications of various BioMEMS and BioNEMS-based devices
ranging from silicon-based nanocantilevers, nanopores to nanowires as
biosensors, active biomimetic nanodevices that utilize phi29 DNA
packaging machinery for novel biomolecule sensing, capture and sorting
functions to novel multifunctional nanodevices utilizing microbal
robotics (microbotics) for targeted delivery and controlled drug
release. Systems level integration of a mixture of these modalities, as
Lab-on-a Chip devices, will also be presented as well as some
nanomaterials biocompatibility studies. Brief but specific examples from
each of these Nanomedicine domains will be given in the hopes that this
talk will lead us to explore future collaborative "nano-possibilities"
under the umbrella of Stanford's Center for Cancer Nanotechnology
Excellence.
2:35-3:05 "An Investigation into the "World-to-chip" Interface", Sammy
S. Datwani, Ph.D, Labcyte Inc., datwani@gmail.com
Abstract: Two arenas of the "World-to-chip" interface will be discussed
with relevant applications to nanoscale biotechnology. In the first
half of this presentation - a novel micro-fluidic interconnector system
will be discussed that is capable of holding high pressure (up to 7,000
psi) for a fully integrated chip based micro-fluidic high pressure
liquid chromatography (HPLC) system. Technical aspects of the
interconnect system, design, materials and utility will be discussed.
In the second half of this presentation - a newly developed method,
acoustic droplet ejection (ADE) for precisely generating nanoliter and
picoliter volume droplets using focused acoustic energy at, or near, a
liquid surface will be discussed. Since both micro-fluidic devices and
micro-plate wells are compatible with this method - a wide range of
experimental results will be shown to elucidate how ADE enables precise
dispensing of small fluid volumes into the "micro and nano" world to aid
in drug discovery and improve experimental results in biochemistry.
3:05-3:30 Break
3:30-4:00 "Biophysics: Looking forward from the past", S. Jeffrey
Rosner, Ph.D,
Agilent Technologies, jeff_rosner@agilent.com
Abstract: The field of biophysics has been responsible for a large
number of the biology-related Nobel prizes in the 20th century, yet the
promise of quantitative, deterministic measurements in the biological
sciences is only slowly beginning to take hold. This talk will discuss
some of the reasons behind this and show examples of some of the most
exciting current research in biological measurements deriving from the
physics community.
4:00-4:30 "Transdermal delivery of macromolecules using Macroflux(r)
technology - system requirements with emphasis on microfabrication,
surface chemical properties, drug-specific requirements, and the
interaction with human skin and systemic biology",
Russell Ford, Ph.D, Zosano Pharma, RFord@zosanopharma.com
Abstract: Transdermal drug delivery offers unique advantages compared
to alternate routes such as oral, parenteral, and pulmonary. Transdermal
systems have traditionally been limited to pharmaceuticals with
molecular weight of 500 Daltons or less. Much focus has been centered on
microneedle, microporation, iontophoretic, and other approaches to
increasing the size of candidate drugs that can be transdermally
administered. The Macroflux technology, originally developed by Alza
Corporation, a division of Johnson & Johnson, is at the forefront of
microneedle-based transdermal drug delivery. The basic principle of
operation involves a dynamic mechanical actuator, microfabricated array
of microprojections on an adhesive patch, and special-purpose drug
formulation. This total system addresses the numerous and varied
requirements for a drug delivery system across a wide spectrum of drug
candidates. This presentation outlines the numerous disciplines and
technology elements necessary to ensure the total system functions as
intended. Special emphasis will be placed on the roles of
microfabrication, surface chemical properties, drug-specific
requirements, and the interaction with human skin and systemic biology.
4:30 - 5:00 "Micro stereolithography system for 3D micro modeling",
Norihiko Saitou, JSR Corporation, Norihiko_Saitou@jsr.co.jp
Abstract: ACCULAS, developed by D-MEC Co., Ltd. is the world's first
industrial micro stereolithography technology which can create
micro-structures with resolution down to 1um. A large variety of 3D
items such as curved shapes, air bridge structures, overhang structures
and so on, can be created with a singular process by using ACCULAS.
Sample applications include simulation modeling of micro machines, micro
arrays, probe pins and other micro devices. Also, with the addition of
surface metal deposition, the master form can be used as a mold and can
be used to create replicas of itself. We will introduce the features of
the micro stereolithography equipment ACCULAS and provide a number of
modeling examples. (D-MEC is wholly-owned subsidiary of JSR
Corporation.)
Speaker Biographies:
Dr. M. Meyyappan
Meyya Meyyappan is Chief Scientist for Exploration Technology at the
Center for Nanotechnology, NASA Ames Research Center in Moffett Field,
CA. Until June 2006, he served as the Director of the Center for
Nanotechnology as well as Senior Scientist. He is a founding member of
the Interagency Working Group on Nanotechnology (IWGN) established by
the Office of Science and Technology Policy (OSTP). The IWGN is
responsible for putting together the National Nanotechnology Initiative.
Dr. Meyyappan has authored or co-authored over 175 articles in peer
reviewed journals and made over 200 Invited/Keynote/Plenary Talks in
nanotechnology subjects across the world. His research interests
include carbon nanotubes and various inorganic nanowires, their growth
and characterization, and application development in chemical and
biosensors, instrumentation, electronics and optoelectronics. Dr.
Meyyappan is a Fellow of the Institute of Electrical and Electronics
Engineers (IEEE), the Electrochemical Society (ECS), AVS, Materials
Research Society, and the California Council of Science and Technology.
In addition, he is a member of the American Society of Mechanical
Engineers (ASME) and American Institute of Chemical Engineers. He is
the IEEE Nanotechnology Council Distinguished Lecturer on
Nanotechnology, IEEE Electron Devices Society Distinguished Lecturer,
and ASME's Distinguished Lecturer on Nanotechnology (2004-2006). He
served as the President of the IEEE's Nanotechnology Council in
2006-2007. For his contributions and leadership in nanotechnology, he
has received numerous awards including: a Presidential Meritorious
Award; NASA's Outstanding Leadership Medal; Arthur Flemming Award given
by the Arthur Flemming Foundation and the George Washington University;
2008 IEEE Judith Resnick Award; IEEE-USA Harry Diamond Award; AIChE
Nanoscale Science and Engineering Forum Award. For his sustained
contributions to nanotechnology, he was inducted into the Silicon Valley
Engineering Council Hall of Fame in February 2009. For his educational
contributions, he has received: Outstanding Recognition Award from the
NASA Office of Education; the Engineer of the Year Award(2004) by the
San Francisco Section of the American Institute of Aeronautics and
Astronautics(AIAA); IEEE-EDS Education Award.
Demir Akin, D.V.M, Ph.D.
Dr. Demir Akin is and internationally recognized expert in
Nanobiotechnology and a pioneer nanomedical scientist in the areas of
bioinspired diagnostic and therapeutic devices and their applications in
cancer as well as infectious diseases. His formal education includes a
doctorate in veterinary medicine, a master's in clinical and diagnostic
microbiology and a doctorate in comparative pathobiology and molecular
virology. Most recently he was at the Biomedical Engineering Department
at Purdue University as an assistant research professor (Nanomedicine)
and there he also managed the BioMEMS and Nanobio laboratories of the
Birck Nanotechnology Center. He currently serves as the Deputy Director
of the Center for Cancer Nanotechnology Excellence focused on Therapy
Response (CCNE-TR) in the School of Medicine at Stanford University. Dr.
Akin worked in the areas of molecular virology and viral bioinformatics
of coronaviruses and other RNA viruses from 1998 to 2000 for his
postdoctoral work at Purdue University. He became a Research Scientist
in the School of Nuclear Engineering at Purdue University in 2001 and
worked on artificial intelligence-based In-Silico Biology and Genomics
software development with a cancer focus. He joined the Electrical and
Computer Engineering Department at Purdue University in 2002 as a Senior
Research Scientist and the Manager of the BioMEMS Laboratories. He was
instrumental in the ground-up design, operation and leadership of the
Birck Nanotechnology Center at Purdue and served as the Manager of the
BioMEMS and Nanobio Laboratories from 2003 to 2008. Among other
responsibilities at Birck, he instructed formal Nanobio and BSL-2
training to the shared facility users, provided biomedical expertise to
the engineering research groups and he was responsible for the
compliance assurances for federal, state and institutional regulations
and biocontainment/biosafety practices. Dr. Akin carried out research in
the areas of diagnostic and therapeutic micro/nano-medical devices,
microchip and microfluidics-based devices for biothreat agent detection,
nanomedical robotics via biomimetic devices, biosensing and single
molecule imaging studies of biological entities at nanomaterials
interfaces and biological engineering for synthetic biology during his
Research Assistant Professor appointment at the Weldon School of
Biomedical Engineering at Purdue. Among his other distinctions, he is a
founding member of the American Academy of Nanomedicine, a member of NCI
Alliance for Nanotechnology in Cancer and serves as panelist on numerous
grant/scientific review boards nationally and internationally. His
research interests include integration of biology and engineering for
realization of biomimetic and bioinspired medical devices, Nanomedicine
(BioMEMS-based sensors and devices with medical diagnostic and
therapeutic potential, early cancer detection and antineoplastic therapy
response monitoring, smart nanodrugs and their targeted delivery and
controlled release), synthetic biology, single molecule sensing, imaging
and their mechanoelastic/biophysical characterization using atomic force
microscopy, advanced optical microscopy and electro-mechanical sensing,
and infectious agent diagnostics for biothreat agents and viral
pathogens with pandemic potential.
Sammy S. Datwani, Ph.D.
Dr. Datwani is a Staff Engineer and the Chemistry Department Manager in
the R&D Division of Labcyte Inc., a biotechnology start-up company
located in the bay area. Dr. Datwani has over fifteen years of
experience managing & applying cutting edge research and development in
industry & academia. Dr. Datwani's research interests include an
in-depth understanding of fluid mechanics, interfacial transport,
surface chemistry, thin films, microfluidics, microdevice design,
laboratory automation, high throughput drug screening, microarraying,
polymer chemistry and materials science. Prior to joining Labcyte, Dr.
Datwani was the technical lead for the development of an integrated high
performance liquid chromatography on a chip (cHiPLCTM) system in the
Advanced Development Group at Eksigent Technologies, LLC. Prior to
that, Dr. Datwani led the development of the Library CardTM product
which married high throughput drug discovery on a microfluidic chip with
a high density reagent storage array. Dr. Datwani earned his Ph.D. in
Chemical and Biomolecular Engineering from The Johns Hopkins University
and a M.S. in Chemical Engineering and Polymer Science from The Columbia
University.
S. Jeffrey Rosner, Ph.D.
After a several opportunities with startups, government, and other
corporations, Jeff Rosner joined Hewlett-Packard (HP) in 1978. There he
has held a variety of management and individual contributor positions in
operating divisions and the corporate laboratories. When Agilent was
formed from the instrumentation core of HP's business, Jeff joined the
new company, where he has been deeply involved in technology
acquisition. He has authored or co-authored over 50 journal articles and
holds 13 U.S. patents. He holds a BS in Electrical Engineering from the
Massachusetts Institute of Technology and an MS and Ph.D. from Stanford
University in Materials Science.
Russell Ford, Ph.D.
Russell Ford has been at Zosano Pharma (formerly The Macroflux
Corporation) since 2006 as Associate Director System Design and
Development, responsible for design, integration, and manufacturability
of non-drug components including the microprojection array, applicator,
adhesive patch, and primary packaging. During this time, numerous design
improvements have been implemented that increase drug delivery payload,
manufacturability of the array, ease-of-use, and patient compliance.
Prior to Zosano, he spent over 6 years at Cygnus Therapeutics, working
on the GlucoWatch, the first-ever FDA approved automatic semicontinuous
glucose monitoring system. Using reverse iontophoresis, the devise
implemented a disposable hydrogel and screen-printed electrodes to
sample interstitial fluid through the skin. He has also designed
minimally invasive neurovascular intervention products at Boston
Scientific. Prior to this medical device experience, he has worked on a
variety of manufacturing technologies, including some time with Applied
Materials on their robotic mechanisms for wafer processing equipment.
Dr. Ford earned his Masters and PhD degrees in Mechanical
Engineering/Design Division at Stanford University.
Norihiko Saitou
Mr. Norihito Saitou graduated from Keio University Japan at 1988. After
that He got the master degree at 1990 from Keio University and joined to
JSR corporation immediately. He worked in JSR research center around
5years to develop the UV curable resin development. After that, until
now, he has been managing business of this UV curable resin in JSR
Corporation.
**********************************************************
Corporate Sponsorship Opportunities for TFUG Meetings!
For details please contact meeting Co-Chairs listed above or Heather
Korff, NCCAVS Office,
530-896-0477, heather@avs.org.
**********************************************************
2009 TFUG Meeting Schedule: (www.avsusergroups.org
<http://www.avsusergroups.org/> - Dates/location subject to change)
All Meetings at SEMI Global Headquarters, unless otherwise indicated.
August 19-Display (Image/OELD/LED), submit abstracts to Co-Chairs, Qian
Wang, Edith Ong, and Ketan Itchhaporia, qwang@parc.com,
edithong@comcast.net, gkfly@aol.com.
November 8-13-AVS 56th International Symposium & Exhibition, San Jose,
CA. For details visit www.avs.org <http://www.avs.org/>
December 9-BEOL Integration, submit abstracts to Co-Chairs:
Brett Cruden, Roc Blumenthal, and Kapila Wijekoon; bcruden@arc.nasa.gov,
roc@rocsolidsoln.com, kapila_wijekoon@amat.com
**********************************************************
NCCAVS User Group website: www.avsusergroups.org
<http://www.avsusergroups.org/>
Find: Meeting Schedules, Announcements, Call for Papers, Committee
Contact Information, Proceedings from monthly meetings, and more.
Sign up for a User Group: www.avsusergroups.org
<http://www.avsusergroups.org/>
***********************************************************
Process Clinic Today (Monday) 2-4 pm
Process Clinic today, Monday, June 15, 2 pm, in the cubicle area
outside Maureen's office. Bring process questions, mask layouts, SpecMat
requests. New labmembers are especially encouraged to come and for
process flow and runsheet reviews. Experienced people will be on hand
for discussion. Keith Best from ASML will also be here offering
processing advice on just about everything, including the ASML.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Sunday, June 14, 2009
Delamination problem with Pd
I am using Pd in my process (~360A evaporated with Innotec) for S/D fingers and probing pads, I can get a clean lift off however probing the pads almost destroys them as they seem to come off very easily even with a tiny scratch from the probe tips. Due to the nature of these devices I have to use Pd directly on the surface. I would appreciate if anyone has a solution for this issue.
Thanks,
Arash
----------------------------------------------------------------------------------
Arash Hazeghi
PhD Candidate
Stanford Center for Integrated Systems
CIS-X 300, 420 Via Palou Mall,
Stanford, CA 94305
phone: +1-650-725-0418
web: http://www.stanford.edu/~ahazeghi
Saturday, June 13, 2009
Problem p5000etch SNF 2009-06-13 00:10:22: ChA Magnets not functional
Thursday, June 11, 2009
Critically Low Chemical Inventory
This spring we have had extreme difficulty in receiving delivery on a
number of critical chemicals. Many of you may have seen the staff
mixing 50:1 HF. We are forced in to this approach because of HF
mixing equipment failures at the manufacture. This is close to being
resolved, but we still have a week or so to go.
What you may not know is the problems we are having with our supplier
of photolithography chemicals. The critical chemicals where we are
in a shortage situation include the MF-26A the 3612 developer, EC13
the edge bead removal and PRX127. As a result we will be limiting
the availability of these chemicals.
Currently we only have inventory of MF-26A to support two weeks of
usage on the coat tracks (this does not include any manual develop
usage). The email we received yesterday from the chemical supplier
gave a 4 week delivery date. This leaves us with a 2 week short
fall. Please note, these chemicals were ordered in time. It is the
supplier who is not able to support their normal delivery schedule.
As a result we are immediately implementing MF-26A restrictions which
includes the removal from the area of the deep beakers used for
manual develop. These beakers are being replaced by short glassware
until we receive our delivery. Often we see huge amounts of
developer being used for single or very few wafers. The SVG
developer tracks use ~50 ml per wafer for development (that is 50ml
total for both develop steps and not each step). There is no need to
pour two or three inches of developer into a beaker when manual
developing. Also, we will only leave one bottle of MF-26A in the fab
for manual develop. Please use it sparingly.
What you can do regarding MF-26A conservation
1) Develop your wafers on the SVG track. You will use thousands
times more developer if you used a beaker.
2) Use the correct sized beaker for your sample. Don't develop
pieces in a 4" beaker.
3) Gently remind your lab members their excessive use of developer
may result in no one being to develop their wafers in a couple of weeks.
Remember each bottle which is used for manual develop cost about 1
day of track usage and as a result we will run out a day earlier.
We will also see a short fall with ED-13. This chemical is only used
in the coat tracks, so changes made to control it's usage will not be
obvious to the lab member community.
Finally, we are also struggling with PRX127. Our inventory and the
delivery date will put us in a close situation. If we follow normal
usage trends, the scheduled delivery will arrive just as we will be
running out. If we see a spike in usage, like we did last weekend,
or a delay in the delivery date we could also run out of this
chemical. Especially during this time (and we would hope at all
times) please adhere to the chemical change out schedule. It is
important that we do not drain and replenish the pots before they have expired.
Most of the delivery problems we are facing has resulted from the
consolidation of the older product lines and the lower demand for
some of these chemicals. The chemical supplier request long range
forecasts from it's customers. Depending on the customers forecast
the company schedules their manufacturing runs. As a result we are
all placed on a balancing act tied to their manufacturing
facility. Any problems the manufacturing line has, or any poor
forecasting has a huge impact on the end of line customers such as SNF.
Thank you for your understanding and most importantly your chemical
conservation during this shortfall.
Regards,
Your SNF Staff
Tuesday, June 9, 2009
Re: Problem p5000etch SNF 2009-06-06 14:14:51: wafer lost in system
and also no wafer on the load lock.
Re: Comment p5000etch SNF 2009-06-08 14:04:45: Ch.A is down for high RF reflected pwr
Re: Problem p5000etch SNF 2009-06-09 10:41:15: Ch A detected RF fault while running step2
rf using cha a metal recipe.
Reminder: PhD Orals - Yuan Zhang, June 10, 2009, 9am, Packard 101
Nanoscale Phase Change Memory: Device Structure and Materials Characterization
PhD Oral Examination
Speaker: Yuan Zhang, Department of Electrical Engineering,
PhD Advisor: Prof. H.-S. Philip Wong
Time: 9am (refreshments served at 8:45am)
Date: Wednesday, June 10, 2009
Location: Packard 101
Abstract:
Modern digital system requires the capability of storing and retrieving large amounts of information at very high speed. Non-volatile solid state memories retains information when the power is turned off and is now the mainstream data storage device for many applications including personal electronics such as iPOD, mobile phones, and netbooks. The market for non-volatile memory (NVM) technology has grown substantially in recent years. However, Flash memory, the dominant NVM technology, is facing fundamental scaling challenges. In view of this, research in various new memory technologies have been explored and accelerated. Among these exploratory memory technologies, phase change memory (PCM) is one of the most promising candidates, given its simple structure, good scalability, high speed, and long endurance.
This talk consists of two parts. In the first part, germanium nanowire diode was implemented as selection device for PCM array. Unidirectional programming and reading for PCM cell requires a selection device in a memory array structure to enable large array sizes. Having a diode selection device can not only reduce the read disturbance and leakage power, but also have the potential to further increase the array density, by three-dimensional stacking of cross-point memory layers. Germanium nanowire pn junction diode is a good candidate for selection device because it has good scalability, requires low processing temperature and has high conductivity. We demonstrated a phase change memory cell structure utilizing in-situ doped crystalline germanium nanowire diode integrated with a phase change memory cell. The vertical nanowire diode served as the bottom electrode and the memory cell selection device. Electrical measurement showed low reset current and rectifying programming behavior. This method provides a possible path toward high-density, 3D cross-point memory arrays.
In the second part of the talk, we addressed the scalability for both phase change materials and phase change memory devices. Phase transition properties of commonly used phase change materials for both thin blanket films and nanodot samples were studied using x-ray diffraction, and size dependence of the phase change properties was observed. We employed self-assembly diblock copolymer patterning to fabricate sub-20nm phase change nanodots. This diblock copolymer patterning technique was additionally utilized to fabricate devices with small contact areas to lower the reset programming current. Reduced reset current was achieved compared to a conventional structure. The device can be further scaled by patterning a single self-assembled contact hole in each cell to demonstrate device scalability below 20 nm.
2-inch wafer boats (gladys')
the black cabinet in the back alley. I used them yesterday, but this
morning they were gone. They have clean-room wipes on them that say
"Gladys 2-inch wafer boats". I use them very frequently so I would
really appreciate if they reappear.
Sorry for emailing everybody, but I have no idea who might have taken
them so I had to spam everyone..
Thanks,
--
Ahmet Tura
Reminder: Tomorrow PhD Dissertation Defense - Li Gao @ 2:00pm in Packard Building, Room 101
Spin Polarized Current Phenomena in Magnetic Tunnel Junctions
Li Gao
Department of Applied Physics
Research Advisors: Professor James Harris and Dr. Stuart Parkin
10 June 2009 @ 2:00p.m. in Packard Building, Room 101 (Refreshments @ 1:40p.m.)
Abstract
Spin polarized current is of significant importance both scientifically and technologically. Recent advances in film growth and device fabrication in spintronics make possible an entirely new class of spin-based devices. An indispensable element in all these devices is the magnetic tunnel junction (MTJ) which has two ferromagnetic electrodes separated by an insulator barrier of atomic scale. When electrons flow through an MTJ, they become spin-polarized by the first magnetic electrode. Thereafter, the interplay between the spin-polarized current and the second magnetic layer manifests itself via two phenomena:
i.) Tunneling magnetoresistance (TMR) effect. The relative alignment of the electrode moments determines the resistance and its change. This TMR effect is largely determined by the spin-polarized density states of the electrodes, interface states, tunneling matrix, and so on. However, despite extensive experimental and theoretical efforts, many aspects of TMR remain poorly understood. In my research, it is shown that thin CoFe alloy can be made amorphous by sandwiching the usually used crystalline CoFe electrode between two amorphous layers. Incorporating amorphous Co70Fe30 with Al2O3 to form MTJs, both the TMR and the tunneling spin polarization are significantly enhanced when the alloy is amorphous. The tunneling anisotropic magnetoresistance effect in both MgO and Al2O3 based MTJs was also investigated.
ii.) Spin-transfer torque (STT) effect. The spin-polarized current exerts a torque on the local moments and can thereby induce steady-state precessional excitation modes or complete switching of a nanomagnet. This effect has mostly been studied, to date, in metallic structures where the spin-valve magnetoresistance is small so that the output power is limited. However, the giant TMR in MgO base MTJs, which also have much higher resistance than spin-valves, can give rise to much higher rf power outputs. It is also found that the spectrum is very sensitive to small variations in device structures, even in those devices which exhibit similarly high TMR (~120%) and have similar resistance-area products (~4-10 Wm m2).
Nano Facilities equipment survey
survey, please join the many people who have done so already. The
survey will be available until Friday, 6/26.
-------------------------------------------------------------------------------------------------------------------------------------------------------------
On behalf of Professors Kam Moler and H.-S. Philip Wong, co-chairs of
the Shared Nano-facilities Committee, please complement the data
being gathered from a faculty survey by taking the survey found at:
http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d
This survey will indicate the most urgent needs for new shared tools.
Stanford has made great progress on shared nano-facilities in the
past year. Your inputs will help the committee decide which tools
are most important for future grant opportunities. On the first page
are five candidates for the next NSF Major Research Instrumentation
grant competition.
Five candidate tools (listed alphabetically):
1. Chemically assisted ion beam etcher (CAIBE) - Enables high
precision dry etching of semiconductors (Si, III-V, II-VI),
chalcogenide materials, magnetic materials and metal oxides using a
combination of reactive gases and ion beam. Provides a controllable
etch by giving independent control of ion energy, current density,
and incident angle.
2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB
allows imaging, etching and deposition of materials on length scales
at 100 nm. Electron column enables non-destructive imaging of high
resolution samples to achieve three-dimensional imaging with
high-resolution SEM.
3. Electron microprobe - Provides quantitative chemical analysis of
major and minor elements and qualitative analysis of trace elements
in sample. The combination wavelength-dispersive and
energy-dispersive spectrometers with backscattered and secondary
electron imaging allows detection of elements from Beryllium through Uranium.
4. Plasma etcher - Modern r&d plasma etch tools to support etch of
silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI,
photoresist and other materials. This equipment would replace the
ones installed in 1988 in SNF and will be better able to reproduce
the fine structures fabricated in lithography.
5. Scanning electron microscope (SEM) (high resolution and/or
environmental) - Will provide more capacity for high resolution
scanning electron microscopy with resolution to 0.8 nm. The
environmental SEM provides for the capability to work at lower vacuum
for high-resolution imaging of insulating and non-solid materials.
Highlights of progress on Stanford nanofacilities:
Tools ordered:
1. workhorse/training TEM (installation underway)
2. aberration-corrected FEI Titan TEM (expected in 2010)
3. JEOL 6300 ebeam lithography system (expected in September, 2009)
Proposals submitted:
1. NanoSIMS (submitted to NSF MRI competition in January, 2009)
2. nanofab tools (submitted to NSF through the NNIN in May, 2009)
3. Academic Research Infrastructure for facilities upgrades (no
equipment) (in progress).
The nanobuilding construction is proceeding rapidly. The new
nanobuilding includes 9000 square feet of shared facilities. The
design team is working hard to meet the sensitive specifications for
the quiet environment necessary for many modern tools.
Shared Nano-facilities Committee
Chris Chidsey, Chemisty
Curt Frank, Engineering
Sam Gambhir, Radiology, BioX, and Molecular Imaging
David Goldhaber-Gordon, Physics
Paul McIntyre, Materials Science and Engineering
Kam Moler, Applied Physics and Physics
Jody Puglisi, Structural Biology
Olav Solgaard, Electrical Engineering
Jonathan Stebbins, Geological and Environmental Sciences
Jelena Vuckovic, Electrical Engineering
H.-S. Philip Wong, Electrical Engineering
Monday, June 8, 2009
Problem p5000etch SNF 2009-06-08 17:30:19: Chamber B shut down for processing
Comment p5000etch SNF 2009-06-08 14:04:45: Ch.A is down for high RF reflected pwr
PhD Orals - Nishant Patil, June 8, 2009, 3:30 pm, Packard 101
Reminder - Ph.D. Orals
Carbon Nanotube Digital VLSI Circuits
Nishant Patil
Advisor: Subhasish Mitra
Department of Electrical Engineering
Time: 3:30 pm (refreshments served at 3:15 pm)
Date: Monday, June 8, 2009
Location: Packard 101
Abstract
Carbon Nanotube Field Effect Transistors (CNFETs), consisting of semiconducting single walled Carbon Nanotubes (CNTs), have several promising applications such as extensions to silicon VLSI and large area electronics. While there has been significant progress at a single-device level, a major gap exists between such results and their transformation into VLSI CNFET technologies. Major CNFET technology challenges include mis-positioned CNTs, metallic CNTs, and wafer-scale integration. This work presents design and processing techniques to overcome these challenges. Experimental results demonstrate the effectiveness of the presented techniques.
Mis-positioned CNTs can result in incorrect logic functionality of CNFET circuits. A new layout design technique produces CNFET circuits for arbitrary logic functions that are immune to a large number of mis-positioned CNTs. This technique is significantly more efficient compared to traditional defect- and fault-tolerance techniques. Furthermore, it is VLSI-compatible and does not require changes to existing VLSI design and manufacturing flows.
A CNT can be semiconducting or metallic depending upon the arrangement of carbon atoms. Typical CNT synthesis techniques yield ~33% metallic CNTs. Metallic CNTs create source-drain shorts in CNFETs resulting in excessive leakage (Ion/Ioff < 5) and highly degraded noise margins. A new technique, VLSI-compatible Metallic-CNT Removal (VMR), overcomes challenges posed by metallic CNTs by combining layout design with CNFET processing. VMR produces CNFET circuits with Ion/Ioff in the range of 10^3-10^5, and overcomes the limitations of existing metallic-CNT removal approaches.
The above techniques are demonstrated for complex logic structures using wafer-scale growth and transfer of aligned CNTs. Such an integrated approach enables experimental demonstration of cascaded CNFET logic circuits.
Sunday, June 7, 2009
Limited DI use today ....
Last night a fitting in the DI system came loose (in wbmiscres) and
resulted in loss of a large amount of DI water in the storage tank so
that we have a "Low Level" warning in that tank.
While the DI system is still usable and fully functional today, I
encourage you to make sure that you use no more DI water than needed and
make sure that you don't accidentally leave any goosenecks on. This
will allow the storage tank to recover and refill so that we can start
with a full tank on Monday morning.
Thanks for your continued support,
John
Saturday, June 6, 2009
Problem p5000etch SNF 2009-06-06 14:14:51: wafer lost in system
Friday, June 5, 2009
Re: Problem p5000etch SNF 2009-06-03 14:45:44: Chamber A pressure fault
Re: Problem p5000etch SNF 2009-06-04 12:15:21: Chamber A wafer lifter cannot reach release position within timeout.
lift to release.
Fire Extinguisher Training, TODAY, at 1:30 pm
There's still room in the fire extinguisher training class today
(Friday). We meet at 1:30 pm in Allen/CIS 101. Training will be about
one hour and everyone gets to set off a real fire exinguisher on a real
fire.
Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
micron size particles
I know this is a bit out of date, as we are in the nano-age, but does
anybody use micron size (5 um) regular shape particles of Au, Pt, Re,
SiO2, or NaCl, or any other compounds in your research? Our group try to
study the deformation of these materials under high pressure in diamond
anvil cells using X-ray Microscopy in SSRL. A regular shape like cube or
sphere around 5 cubic-micron would be ideal for the diamond anvil cell
experiment.
Thank you very much,
Shibing Wang
FW: PhD Orals - Nishant Patil, June 8, 2009, 3:30 pm, Packard 101
Carbon Nanotube Digital VLSI Circuits
Nishant Patil
Advisor: Subhasish Mitra
Department of Electrical Engineering
Time: 3:30 pm (refreshments served at 3:15 pm)
Date: Monday, June 8, 2009
Location: Packard 101
Abstract
Carbon Nanotube Field Effect Transistors (CNFETs), consisting of semiconducting single walled Carbon Nanotubes (CNTs), have several promising applications such as extensions to silicon VLSI and large area electronics. While there has been significant progress at a single-device level, a major gap exists between such results and their transformation into VLSI CNFET technologies. Major CNFET technology challenges include mis-positioned CNTs, metallic CNTs, and wafer-scale integration. This work presents design and processing techniques to overcome these challenges. Experimental results demonstrate the effectiveness of the presented techniques.
Mis-positioned CNTs can result in incorrect logic functionality of CNFET circuits. A new layout design technique produces CNFET circuits for arbitrary logic functions that are immune to a large number of mis-positioned CNTs. This technique is significantly more efficient compared to traditional defect- and fault-tolerance techniques. Furthermore, it is VLSI-compatible and does not require changes to existing VLSI design and manufacturing flows.
A CNT can be semiconducting or metallic depending upon the arrangement of carbon atoms. Typical CNT synthesis techniques yield ~33% metallic CNTs. Metallic CNTs create source-drain shorts in CNFETs resulting in excessive leakage (Ion/Ioff < 5) and highly degraded noise margins. A new technique, VLSI-compatible Metallic-CNT Removal (VMR), overcomes challenges posed by metallic CNTs by combining layout design with CNFET processing. VMR produces CNFET circuits with Ion/Ioff in the range of 10^3-10^5, and overcomes the limitations of existing metallic-CNT removal approaches.
The above techniques are demonstrated for complex logic structures using wafer-scale growth and transfer of aligned CNTs. Such an integrated approach enables experimental demonstration of cascaded CNFET logic circuits.
Ph.D defense Candace K. Chan, Monday June 8 @ 2pm, Braun Lec
One-dimensional nanostructured materials for Li-ion battery and supercapacitor electrodes
Candace K. Chan (Dept. of Chemistry)
Adviser: Yi Cui (Dept. of Materials Science & Engineering)
Monday, June 8 @ 2 pm (Refreshments served at 1:45 pm)
Braun Lecture Hall (Mudd Chemistry Building)
Abstract
The need for improved electrochemical storage devices has necessitated research on new and advanced electrode materials. One-dimensional nanomaterials such as nanowires, nanotubes, and nanoribbons, can provide a unique opportunity to engineer electrochemical devices to have improved electronic and ionic conductivity as well as electrochemical and structural transformations. Several properties of nanomaterials, including 1) facile strain relaxation and phase transformation, 2) good ionic diffusion, and 3) good electronic conduction are important characteristics that allow for improvements in performance over bulk materials. Several examples of how nanomaterials are being used to improve problems in energy storage will be given, with discussion on fundamental and applied studies at the single nanowire and ensemble level all the way up to the nanocomposite level.
A study on the phase transformations in V2O5 nanoribbons during reaction with lithium will be presented, with implications for Li-ion cathodes. Transformation of the V2O5 nanoribbons into the fully lithiated ω-Li3V2O5 phase was found to depend not only on the width but also the thickness of the nanoribbons. For the first time, complete delithiation of ω-Li3V2O5 back to the single-crystalline, pristine V2O5 nanoribbon was observed, indicating a 30% higher energy density.
For Li-ion battery anodes, the use of Si and Ge nanowires (NWs) as high capacity replacements for graphite will be discussed. By using a SiNW electrode, a 10X higher specific capacity was achieved. Problems plaguing bulk Si, such as pulverization and poor charge storage retention, were not observed in the SiNWs due to the NWs having improved accommodation of strain and volume expansion.
Finally, an entirely printable supercapacitor device will be presented based on high surface area carbons and a flexible, printable silver nanowire-based current collector. These devices demonstrate how nanomaterials can be integrated into a roll-to-roll manufacturing process while still displaying good performance.
-- Candace K. Chan Ph.D. Student, Department of Chemistry Stanford University McCullough Building Room 209 476 Lomita Mall Stanford, CA 94305
-- Candace K. Chan Ph.D. Student, Department of Chemistry Stanford University McCullough Building Room 209 476 Lomita Mall Stanford, CA 94305
Thursday, June 4, 2009
PhD Orals - Yuan Zhang, June 10, 2009, 9am, Packard 101
EE students mailing list
ee-students@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ee-students
Nanoscale Phase Change Memory: Device Structure and Materials Characterization
PhD Oral Examination
Speaker: Yuan Zhang, Department of Electrical Engineering,
PhD Advisor: Prof. H.-S. Philip Wong
Time: 9am (refreshments served at 8:45am)
Date: Wednesday, June 10, 2009
Location: Packard 101
Abstract:
Modern digital system requires the capability of storing and retrieving large amounts of information at very high speed. Non-volatile solid state memories retains information when the power is turned off and is now the mainstream data storage device for many applications including personal electronics such as iPOD, mobile phones, and netbooks. The market for non-volatile memory (NVM) technology has grown substantially in recent years. However, Flash memory, the dominant NVM technology, is facing fundamental scaling challenges. In view of this, research in various new memory technologies have been explored and accelerated. Among these exploratory memory technologies, phase change memory (PCM) is one of the most promising candidates, given its simple structure, good scalability, high speed, and long endurance.
This talk consists of two parts. In the first part, germanium nanowire diode was implemented as selection device for PCM array. Unidirectional programming and reading for PCM cell requires a selection device in a memory array structure to enable large array sizes. Having a diode selection device can not only reduce the read disturbance and leakage power, but also have the potential to further increase the array density, by three-dimensional stacking of cross-point memory layers. Germanium nanowire pn junction diode is a good candidate for selection device because it has good scalability, requires low processing temperature and has high conductivity. We demonstrated a phase change memory cell structure utilizing in-situ doped crystalline germanium nanowire diode integrated with a phase change memory cell. The vertical nanowire diode served as the bottom electrode and the memory cell selection device. Electrical measurement showed low reset current and rectifying programming behavior. This method provides a possible path toward high-density, 3D cross-point memory arrays.
In the second part of the talk, we addressed the scalability for both phase change materials and phase change memory devices. Phase transition properties of commonly used phase change materials for both thin blanket films and nanodot samples were studied using x-ray diffraction, and size dependence of the phase change properties was observed. We employed self-assembly diblock copolymer patterning to fabricate sub-20nm phase change nanodots. This diblock copolymer patterning technique was additionally utilized to fabricate devices with small contact areas to lower the reset programming current. Reduced reset current was achieved compared to a conventional structure. The device can be further scaled by patterning a single self-assembled contact hole in each cell to demonstrate device scalability below 20 nm.
Wednesday, June 3, 2009
PhD Dissertation Defense - Li Gao @ 2:00pm June 10th
Spin Polarized Current Phenomena in Magnetic Tunnel Junctions
Li Gao
Department of Applied Physics
Research Advisors: Professor James Harris and Dr. Stuart Parkin
10 June 2009 @ 2:00p.m. in Packard Building, Room 101 (Refreshments @ 1:40p.m.)
Abstract
Spin polarized current is of significant importance both scientifically and technologically. Recent advances in film growth and device fabrication in spintronics make possible an entirely new class of spin-based devices. An indispensable element in all these devices is the magnetic tunnel junction (MTJ) which has two ferromagnetic electrodes separated by an insulator barrier of atomic scale. When electrons flow through an MTJ, they become spin-polarized by the first magnetic electrode. Thereafter, the interplay between the spin-polarized current and the second magnetic layer manifests itself via two phenomena:
i.) Tunneling magnetoresistance (TMR) effect. The relative alignment of the electrode moments determines the resistance and its change. This TMR effect is largely determined by the spin-polarized density states of the electrodes, interface states, tunneling matrix, and so on. However, despite extensive experimental and theoretical efforts, many aspects of TMR remain poorly understood. In my research, it is shown that thin CoFe alloy can be made amorphous by sandwiching the usually used crystalline CoFe electrode between two amorphous layers. Incorporating amorphous Co70Fe30 with Al2O3 to form MTJs, both the TMR and the tunneling spin polarization are significantly enhanced when the alloy is amorphous. The tunneling anisotropic magnetoresistance effect in both MgO and Al2O3 based MTJs was also investigated.
ii.) Spin-transfer torque (STT) effect. The spin-polarized current exerts a torque on the local moments and can thereby induce steady-state precessional excitation modes or complete switching of a nanomagnet. This effect has mostly been studied, to date, in metallic structures where the spin-valve magnetoresistance is small so that the output power is limited. However, the giant TMR in MgO base MTJs, which also have much higher resistance than spin-valves, can give rise to much higher rf power outputs. It is also found that the spectrum is very sensitive to small variations in device structures, even in those devices which exhibit similarly high TMR (~120%) and have similar resistance-area products (~4-10 Wm m2).
Problem p5000etch SNF 2009-06-03 14:45:44: Chamber A pressure fault
Mask Clinic, today (Wed) 3 pm, Allen 101
Just a reminder that Bill Martin will be here this afternoon to discuss
maskmaking with anyone interested. He can cover everything from the
basics to checking your file before submission for maskmaking. He'll be
in Allen (CIS) 101 at 3 pm.
Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
SNF Users Advisory Committee
As you may have heard, a number of SNF users (academic and industrial)
have been meeting regularly to provide input from the "user perspective"
to SNF management regarding various issues surrounding the lab. These
may include equipment purchase/repair, staffing, training programs, and
others. The group meets once every 1-2 months, or as needed to discuss
new issues.
Are you interested in being part of this group? If so, please e-mail me
by next Friday, June 12th. Our next meeting is scheduled for June 16th.
Best regards,
Tom
--
Thomas D. O'Sullivan
Ph.D. Candidate, Electrical Engineering
Center for Integrated Systems
Stanford University
420 Via Palou, CIS-X Room B113
Stanford, CA 94305-4075
o: (650)725-6970 c: (708)261-5383 f: (650)723-4659
http://snow.stanford.edu/~tdo/
capillary electrophoresis
Hello,
I would like to measure the mobility of some small proteins using capillary electrophoresis detected by UV absorbance. Does anyone know if there is equipment available for use either on or off campus? Any other suggestions are welcome.
Thanks,
Bob
Tuesday, June 2, 2009
Learn about lab fires!
Alison Pena, from the Stanford Fire Marshall's office, will be giving a
one hour class on how to deal with laboratory fires. This will be held
this Friday, June 5, at 1:30 pm, in Allen 101 (note the room change from
any previous notes.)
The training will take about one hour and consists of a brief
presentation and video, followed by hands-on practice with a fire
extinguisher on a controlled burn. It's fun -- and good to know in any
lab environment.
Preregistration is required, with preference given to active labmembers
and building occupants. If interested, send me an email.
Another session is scheduled for July. Stay tuned for announcements.
Thanks for your attention!
Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Nano Facilities equipment survey
the Shared Nano-facilities Committee, please complement the data
being gathered from a faculty survey by taking the survey found at:
http://www.surveymonkey.com/s.aspx?sm=LTLkB5tL2N7cwa9Y4R9H_2bw_3d_3d
This survey will indicate the most urgent needs for new shared tools.
Stanford has made great progress on shared nano-facilities in the
past year. Your inputs will help the committee decide which tools
are most important for future grant opportunities. On the first page
are five candidates for the next NSF Major Research Instrumentation
grant competition.
Five candidate tools (listed alphabetically):
1. Chemically assisted ion beam etcher (CAIBE) - Enables high
precision dry etching of semiconductors (Si, III-V, II-VI),
chalcogenide materials, magnetic materials and metal oxides using a
combination of reactive gases and ion beam. Provides a controllable
etch by giving independent control of ion energy, current density,
and incident angle.
2. Dual focussed ion beam (FIB)/SEM (possibly with cryostage) - FIB
allows imaging, etching and deposition of materials on length scales
at 100 nm. Electron column enables non-destructive imaging of high
resolution samples to achieve three-dimensional imaging with
high-resolution SEM.
3. Electron microprobe - Provides quantitative chemical analysis of
major and minor elements and qualitative analysis of trace elements
in sample. The combination wavelength-dispersive and
energy-dispersive spectrometers with backscattered and secondary
electron imaging allows detection of elements from Beryllium through Uranium.
4. Plasma etcher - Modern r&d plasma etch tools to support etch of
silicon oxide, polysilicon, silicon, silicon nitride, GaAs, II-VI,
photoresist and other materials. This equipment would replace the
ones installed in 1988 in SNF and will be better able to reproduce
the fine structures fabricated in lithography.
5. Scanning electron microscope (SEM) (high resolution and/or
environmental) - Will provide more capacity for high resolution
scanning electron microscopy with resolution to 0.8 nm. The
environmental SEM provides for the capability to work at lower vacuum
for high-resolution imaging of insulating and non-solid materials.
Highlights of progress on Stanford nanofacilities:
Tools ordered:
1. workhorse/training TEM (installation underway)
2. aberration-corrected FEI Titan TEM (expected in 2010)
3. JEOL 6300 ebeam lithography system (expected in September, 2009)
Proposals submitted:
1. NanoSIMS (submitted to NSF MRI competition in January, 2009)
2. nanofab tools (submitted to NSF through the NNIN in May, 2009)
3. Academic Research Infrastructure for facilities upgrades (no
equipment) (in progress).
The nanobuilding construction is proceeding rapidly. The new
nanobuilding includes 9000 square feet of shared facilities. The
design team is working hard to meet the sensitive specifications for
the quiet environment necessary for many modern tools.
Shared Nano-facilities Committee
Chris Chidsey, Chemisty
Curt Frank, Engineering
Sam Gambhir, Radiology, BioX, and Molecular Imaging
David Goldhaber-Gordon, Physics
Paul McIntyre, Materials Science and Engineering
Kam Moler, Applied Physics and Physics
Jody Puglisi, Structural Biology
Olav Solgaard, Electrical Engineering
Jonathan Stebbins, Geological and Environmental Sciences
Jelena Vuckovic, Electrical Engineering
H.-S. Philip Wong, Electrical Engineering
University PhD Dissertation Defense Michael J. Preiner
University PhD Dissertation Defense
Electronic and Optical Spectroscopy of Molecular Junctions
Michael John Preiner
Research Advisor: Nicholas Melosh
3 June 2009 @1:30 p.m.
(Refreshments served at 1:15 p.m.)
Allen Building (Formerly CIS-X), Room 101
Abstract
Electronic transport through molecules has been intensively studied in recent years, due to scientific interest in fundamental questions about charge transport and the technological promise of nanoscale circuitry. A wide range of range of experimental platforms have been developed to electronically probe both single molecules and molecular monolayers. However, it remains challenging to fabricate reliable electronic contacts to molecules, and the vast majority of molecular electronic architectures are not amenable to standard characterization techniques, such as optical spectroscopy. Thus the field of molecular electronics has been hampered with problems of reproducibility, and many fundamental questions about transport and switching behavior remain unanswered.
In the work I will present, we have developed a new method for creating robust, large area junctions where the electronic transport is through a single monolayer of molecules. This method utilizes atomic layer deposition (ALD) to grow an ultrathin oxide layer on top of a molecular monolayer, which passivates defects and protects the molecules against subsequent processing. I will also show how this method can be be adapted to provide a mechanism for rapid imaging and analysis of single defects in molecular monolayers. I will then present results of spectroscopy of these molecular electronic junctions using optically excited hot electrons. Finally, I will discuss methods of coupling surface plasmons to these molecular junctions to greatly increase the light intensity within the molecular layer, which presents a major step towards in-situ optical spectroscopy of active molecular junctions.
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Maskmaking Clinic, Wed. June 3, 3 pm
Bill Martin, representing Compugraphics and other mask suppliers, will
be here on Wednesday, June 3, at 3 pm in Allen 101 (Linvill Room). If
you have ANY questions about maskmaking for any of the tools at SNF,
then this is the place to come. Bring your ideas, your sketches, and
your layouts.
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Remote Coral .... do not upgrade to JRE 1.6.0_14
Notre Dame (they also run Coral ....) has reported that Remote Coral
"breaks" after upgrading to JRE 1.6.0_14 (which also upgrades Java Web
Start to version 1.6.0_14) because it us unable to properly load and
initialize the Bouncy Castle encryption/decryption package that we use.
As a result, I would suggest that you NOT upgrade your JRE (Java Runtime
Environment) to JRE 1.6.0_14. I will be tracking this issue and will
send out an announcement when Sun resolves this issue. Hopefully in
release JRE 1.6.0_15.
Thank you for your consideration,
John
Monday, June 1, 2009
Reminder: MEMS & Neuroscience Seminar TODAY 4-5 PM, Allen 101X (Wesley Chang, UCSF)
Microdevice Technologies for Neuroscience
Wesley Chang, PhD
Postdoctoral Researcher
Programs in Neuroscience and Bioengineering
University of California, San Francisco
Given the broad efforts to develop MEMS technologies for serving biology, new clinical
and research capabilities are becoming available in specialties such as neuroscience. In
our own work, we have used novel, MEMS-based microsurgical tools to explore the
possibility of repairing nerves by directly reconnecting individual axons, the slender
projections from nerve cells that carry signals throughout the nervous system. This
capability can only be developed with tools that can operate with microns-scale precision
and perform numerous tasks within a confined volume and may provide an important
alternative nerve repair strategy to conventional approaches based on stimulating
regeneration, which have only seen limited successes. As we continue to develop MEMS-based
nerve repair as a clinical application, we have also identified another essential use
for microfabrication technology in support basic research in neuroscience. By employing
thin film deposition and batch microfabrication methods, we have developed specialized
cell culture substrates that can be mass-produced with reliable, high-resolution
micropatterning to provide neuroscientists with well-organized neuron cultures that can
be arranged into efficient arrays for high-throughput experimentation. While bioengineers
have demonstrated numerous methods for micropatterning of cell culture over the years,
our new method is user-friendly and can potentially permit widespread adoption of cell
micropatterning among biologists and non-engineers. My talk will discuss both of these
applications of microtechnology to neuroscience.
Wesley Chang is a postdoctoral researcher in the laboratory of Dr. David Sretavan in the
Departments of Ophthalmology and Physiology and Programs in Neuroscience and
Bioengineering at UC San Francisco. He received both his Ph.D. and B.S. degrees in
Mechanical Engineering at UC Berkeley. Dr. Chang is also a founder of Aperys LLC, a
new company that develops research tools for neuroscience and biology.
Process Clinic, Today (Monday) 2-4 pm
Process Clinic, Monday, June 1, 2 pm, in the cubicle area outside
Maureen's office. Bring process questions, mask layouts, SpecMat
requests. New labmembers are especially encouraged to come and review
process flows and runsheets. Experienced people will be on hand for discussion.
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu