Thanks and happy holidays!
Shibing Wang
shibingw@stanford.edu
I'm having trouble locating a brown box labelled on at least two sides
"Elizabeth Edwards/ehe@stanford.edu 12/2008" that was in the storage
racks in the CAD room. I last saw it around 12/17/08 and could not
find it anywhere in the CAD room or hallway. If you see it anywhere
please send me an email.
Thanks,
Liz Edwards
ehe@stanford.edu
Thursday, December 18th, 2008
2:00 – 3:00 pm
CISX-101
Title:
Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems
Speaker:
Prof. Sunghoon Kwon
Seoul National University, Korea
Abstract:
There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it's facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly.
Moving past the mundane introduction, what I really want to talk about is 'Smart Scalable Systems', a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature's various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material.
Bio.:
Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors.
This seminar is worth attending -- Prof. Sunghoon Kwon from SNU.
Roger
MEMS Seminar Announcement:
~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
Thursday, December 18th, 2008
2:00 – 3:00 pm
CISX-101
Title:
Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems
Speaker:
Prof. Sunghoon Kwon
Seoul National University, Korea
Abstract:
There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it's facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly.
Moving past the mundane introduction, what I really want to talk about is 'Smart Scalable Systems', a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature's various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material.
Bio.:
Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors.
------------------------------------------------------------------------
_______________________________________________
ciems-stanford mailing list
ciems-stanford@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/ciems-stanford
Thanks,
Tim
The SNF Lab is now officially closed for business. We will reopen on
Tuesday, Jan. 6, at 7 am.
During the shutdown, only SNF staff, Facilities, and contractors are
allowed into the cleanroom. There will be many "non-clean" and even
potentially hazardous activities being performed (to make the lab a
cleaner, brighter place when you return) so labmembers are not allowed
inside the lab until 1/6.
Limited access to equipment outside the lab (wafersaw, semhitachi) is
allowed: please check with Staff before using as there will be
Facilities and maintenance work planned which will affect access or use
of these tools.
Until startup -- Happy holidays-- and see you next year!
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
The annual testing of the Toxic Gas Alarm system will begin Wednesday
morning, Dec. 17. There will be a brief activation of the fire alarm
system in the morning which is part of the testing. There is no need to
evacuate for this test. (In the case of an emergency situation, the
alarm will continue for more than a few seconds.)
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Thursday, December 18th, 2008
2:00 – 3:00 pm
CISX-101
Title:
Guided Self-Assembly & Artificial Structural Colors for Smart Scalable Systems
Speaker:
Prof. Sunghoon Kwon
Seoul National University, Korea
Abstract:
There are two different fabrication methods for building complex micro devices: top-down and bottom-up. The top-down approach, based on conventional photolithography, has given us amazing CMOS manufacturing capabilities but it's facing a fundamental limit in it's downward scalability. Recently, various bottom-up manufacturing technologies have gained notice for their ability to overcome limits of top-down manufacturing. Breakthroughs will result from marrying top-down technique such as lithography and bottom-up technique such as self-assembly.
Moving past the mundane introduction, what I really want to talk about is 'Smart Scalable Systems', a radical bottom-up point of view for building complex systems. It seeks to construct a complex system by self-assembly of many simpler components, like a mosaic or a collage in art. Instead of building a system monolithically, it scalably assembles lots of small parts that are manufactured separately in large quantity to build up complex systems such as biosensors, energy sources, and displays. In this seminar optofluidic maskless lithography will be presented as a first step for smart particle generation. Secondly, various fluidic self-assembly technologies such as railed microfluidics will be discussed as a smart particle assembly method. Then I will give a road map of application examples such as encoded particle based scalable biosensors, LED chip packaging, scalable energy sources and scalable displays. Finally, I will end with an innovative method of artificially mimicking nature's various structural colors as a first step to scalable display. By creatively combining OFML and magnetic self-assembly, we demonstrated full color printing of artificial structural color using a single material.
Bio.:
Sunghoon Kwon was born and raised in Seoul, Korea. He received his BS from Seoul National University in Electrical Engineering in 1998. Fascinated by MRI and CT, he decided to study biomedical engineering and got his MS in BME from SNU. His passion for sailing motivated him to move to the Bay area for his advanced degree. In 2004, he got his Ph.D in Bioengineering at UC Berkeley completing his thesis work on MEMS confocal microscopes with Professor Luke Lee. He then worked on various nanofabrication and nanoscience problems with Professor Jeff Bokor at the Molecular Foundry at Lawrence Berkeley National Laboratory. He also founded SPS Microsystems, a company working on commercialization of a MEMS projector for cell phone. In 2006 he arrived back to Korea and joined SNU EE as a faculty member. His research group, the Biophotonics and Nano Engineering Laboratory (BINEL), is now working on various topics such as guided self assembly, scalable biosensors, and artificial structural colors.
Is there anyone who used BCB (benzocyclobutene) in the lab before? I
plan to use it for a dielectric between metal interconnect lines. I
would appreciate getting your advice about BCB process. Thank you.
Regards,
Yoonyoung
--
Yoonyoung Chung
Ph.D. Candidate
Department of Electrical Engineering
Stanford University
Email: yoonyoung.chung@stanford.edu
---------------------------------------------------------
Final judge is by Nature itself
I'm working for my owner, who can be reached
at p5000etch-pcs-owner@snf.stanford.edu.
Messages to you from the p5000etch-pcs mailing list seem to
have been bouncing. I've attached a copy of the first bounce
message I received.
If this message bounces too, I will send you a probe. If the probe bounces,
I will remove your address from the p5000etch-pcs mailing list,
without further notice.
I've kept a list of which messages from the p5000etch-pcs mailing list have
bounced from your address.
Copies of these messages may be in the archive.
To retrieve a set of messages 123-145 (a maximum of 100 per request),
send an empty message to:
<p5000etch-pcs-get.123_145@snf.stanford.edu>
To receive a subject and author list for the last 100 or so messages,
send an empty message to:
<p5000etch-pcs-index@snf.stanford.edu>
Here are the message numbers:
2375
2376
--- Enclosed is a copy of the bounce message I received.
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Labmembers:
Please be aware that the annual building evacuation drill will take
place on Monday, December 15, at 9:30 am. What does this mean for the
lab? This means that at that time, the fire alarm will go off.
Everyone must evacuate both buildings, including the lab, and report to
the Emergency Assembly Point. The Fire department will perform a sweep
of the building and lab to make sure everyone has left. The evacuation
drill ends when the Fire Marshal gives the "all clear". We don't
anticipate it will take long; perhaps 30 minutes at most.
Although alarms will sound, no other building systems should be affected
(in the case of a real fire alarm, toxic gases will shut off). Long
furnace runs and other operations that can normally be run safely
unattended for this period of time should be unaffected. However,
attended operations should be avoided during this time. Please plan
your processing Monday morning accordingly.
Thanks for your attention --
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Come for some food if still around next Monday!
--------------------------------------------------------------------------
Title: Expandable Monolithic Silicon Network For Cost-Effective Large Area Electronics
University Oral Examination
Kevin Huang
Department of Electrical Engineering
Stanford University
Advisor: Peter Peumans
Date: Monday, December 15, 2008
Time: 2pm (Refreshments served at 1:45pm)
Location: CIS-X 101 (Auditorium)
Abstract:
CMOS technology has progressed substantially over the past decades in terms of cost per function and energy required per unit of computation due to advances in microelectronic manufacturing. Unfortunately, these advances have not been shared by the field of large area electronics because a different set of constraints exists in this field, for example, cost per unit area is an important factor when evaluating the applicability of technologies. Therefore, entirely different technologies such as inkjet printing or other pattern transfer methods are used. One method, fluidic self-assembly, uses small chiplets of monolithic silicon electronics that self-assemble at specific sites in a large-area system to realize large-area electronics. This approach does benefit from advances in CMOS technology and allows one to build large-area and high-performance electronic systems, but it has proven challenging to ensure high yields and throughput.
Our approach to construct large-area electronic systems from monolithic silicon substrates expands a functional silicon die by several orders of magnitude in area by structuring the silicon die as a two-dimensional network of silicon islands and springs. Each island houses electronics and connects mechanically and electrically via springs to neighboring islands in a 2D network topology. Electrical interconnects on top of the spiral springs provide electrical connectivity between the islands. Since all the strain induced by the expansion process is contained in the spiral springs, the active device area remains strain free. Silicon networks with built-in 2D expandability can also conform to curved surfaces. The fabrication process required to realize such networks can be performed on a wafer that has been fully processed in a foundry as a post-CMOS process.
Expandable silicon is a platform technology that enables the use of microelectronic manufacturing, with its exponential reduction in cost per electronic function and exponential increase in performance, in large-area systems. This preserves the benefits of foundry processing while reducing cost per unit area to levels compatible with many application domains. This technology can be used for the cost-effective manufacturing of microconcentrator solar cells, RFID tags, sensor networks, curved imagers, retinal prostheses, and displays. In my talk, I will discuss the design constraints of expandable silicon, the processes that were developed and illustrate the use of expandable silicon.
Today's scheduled Cleantamination meeting has been canceled since many
people are out or otherwise committed (I, for example, am on jury duty
call.) The summary of the last meeting is posted on the wiki at:
https://spf.stanford.edu/SNF/processes/cleantamination-group/mtg-3
Comments on this and suggestions for topics for the next meeting are
welcome. We will meet again the first Friday in January. Topics for
discussion will include:
Update on projects
1. Measuring contamination
2. RTA's for gold
3. STS etch policies
4. "Semi-Clean" chrome processing
5. ALD
6. STS dep cleaning and contamination
If you have a contamination or cleanliness process concern which entails
a policy or equipment change beyond the scope of SpecMat, please let me
know and we'll add it to the agenda.
See you next year!
Mary
a 50x50mm square bonded Si piece was taken from the EVBond501 table this morning (~10am). I know it looked aesthetically pleasing, but I need it back.
Please let me know if you have mistakenly taken it, or place it back inside my box that is on the table.
Thanks,
Filip
--------------------------------------
Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305
The JA Woollam company, the manufacture of our Spectral Ellipsometer,
is proposing a condensed two day training course covering their
WVASE32 modeling software. Since this is a customized course for our
ellipsometer users we want to gauge the interest in the course before
we start making the arrangements.
The course would be in the April time frame and the cost would be
approximately $500 per person, paid directly to JA Woollam.
Please let me know if this is a course you would plan on attending,
or under what circumstances you would attend. Please don't say free
because there are real costs to holding this course.
Thanks,
Ed
Please make sure to properly fill out hazardous waste tags when
disposing of chemical waste.
1. Use complete, proper chemical names. DO NOT use acronyms or trade
names ("Cr14 etch") but list all the chemicals in the mix. Stanford EH&S
(Environmental Health & Safety) department needs to know what the
chemicals are in order to properly sort and dispose of them (and they
are not going to know what "Gold Etch" or "AL12" means.)
2. Examples are posted at the Chemicals Passthrough. Chemical
compositions for the most chemical mixtures are now posted there too.
(And if your favorite chemical mixture isn't listed, let Uli know.)
3. For hazardous waste tags that are not properly filled out: you will
be called back into the lab to fill out a proper tag. Second offense,
you'll be expected to help staff label, bag and sort general lab waste.
We realize that many labmembers are electrical engineers with a year of
undergraduate general chemistry a distant memory... But it is important
that everyone one of us is diligent in managing our chemical waste in a
way that makes it safe for us, for the people who have to take care of
it, and our environment. If you have any questions about these
procedures, the documentation, or other chemical safety concerns, please
bring them up with your favorite staff member.
Thanks for your attention --
Your Lab Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
"Internal Electrostatic Transduction of RF MEMS Resonators"
Maryam Ziaei-Moayyed
Advisor: Professor Roger Howe
Department of Electrical Engineering
Stanford University
Date: Thursday, December 11th, 2008
Time: 1:00 pm
Location: Packard Building, Room 101
Abstract:
Radio Frequency (RF) Microelectromechanical Systems (MEMS) resonators offer advantages in terms of power, bandwidth, quality factor, and compatibility with CMOS technology. These resonators have many applications in wireless communications such as frequency references, filters and mixers. One of the major challenges of RF MEMS resonators is the high motional impedance. This work describes design, fabrication, and testing of internal electrostatic transduction of MEMS resonators. By replacing the air gap in resonators with high-k dielectrics, higher transduction efficiencies resulting in lower motional impedance and higher quality factor are achievable. Internal electrostatic transduction allows for efficient coupling to a specific resonance mode, while achieving high quality factors. The devices were fabricated in a novel and manufacturable double-nanogap process tailored toward high frequency resonators. Internal electrostatic transduction of a bulk-mode GHz ring resonator on a quartz substrate is demonstrated. By integrating the transducing electrode within the same vibrating structures, a Lamé-mode resonator with inherent differential drive, sense transduction and high quality factor is demonstrated. This work demonstrates the valuable potential of internal electrostatic transduction in extending MEMS resonators toward higher frequencies.
Come, take a break, and join your work and lab mates for some fun and
food -- the Building party is starting NOW!
Your Building party planners
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Please be aware that the annual building evacuation drill will take
place on Monday, December 15, at 9:30 am. What does this mean for the
lab? This means that at that time, the fire alarm will go off.
Everyone must evacuate both buildings, including the lab, and report to
the Emergency Assembly Point. The Fire department will perform a sweep
of the building and lab to make sure everyone has left. The evacuation
drill ends when the Fire Marshal gives the "all clear". We don't
anticipate it will take long; perhaps 30 minutes at most.
Although alarms will sound, no other building systems should be affected
(in the case of a real fire alarm, toxic gases will shut off). Long
furnace runs and other operations that can normally be run safely
unattended for this period of time should be unaffected. However,
attended operations should be avoided during this time. Please plan
your processing Monday morning accordingly.
Thanks for your attention --
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
I'm working for my owner, who can be reached
at labmembers-owner@snf.stanford.edu.
Messages to you from the labmembers mailing list seem to
have been bouncing. I've attached a copy of the first bounce
message I received.
If this message bounces too, I will send you a probe. If the probe bounces,
I will remove your address from the labmembers mailing list,
without further notice.
I've kept a list of which messages from the labmembers mailing list have
bounced from your address.
Copies of these messages may be in the archive.
To retrieve a set of messages 123-145 (a maximum of 100 per request),
send an empty message to:
<labmembers-get.123_145@snf.stanford.edu>
To receive a subject and author list for the last 100 or so messages,
send an empty message to:
<labmembers-index@snf.stanford.edu>
Here are the message numbers:
3490
--- Enclosed is a copy of the bounce message I received.
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From: Mail Delivery Subsystem <mailer-daemon@google.com>
To: labmembers-return-3490-snfblog.P5000=blogger.com@snf.stanford.edu
Subject: Delivery Status Notification (Failure)
Date: Fri, 21 Nov 2008 15:27:35 -0800 (PST)
-------------------------------------------------------
Band-to-Band Tunneling Transistors for Low Power Logic Applications
University Oral Examination
Raymond Woo
Department of Electrical Engineering
Stanford University
Advisor: James D. Plummer
Date: Monday, December 8, 2008
Time: 1pm (Refreshments served at 12:45pm)
Location: Packard Room 202
Abstract:
As MOSFET gate lengths are scaled below 45nm, fundamental physical
limitations are for the first time presenting barriers to further
scaling. Among the most important of these barriers is the 'kT/q'
limitation which, due to the thermal distribution of carriers, limits
the rate at which a MOSFET can be turned on or off with respect to
applied gate voltage. This means that as supply voltages are reduced,
leakage power is increasing exponentially.
This presentation first provides a review of the MOSFET leakage power
problem as well as a systematic study of all of the possible ways to
overcome the 'kT/q' limitation. Next, I focus on a specific novel
device, the Band-to-Band Tunneling (BTBT) transistor, which has the
potential to beat the 'kT/q' limit. Simulation and experimental studies
will be presented that provide a thorough understanding of BTBT devices
and their scaling properties. The use of different channel materials and
device structures are examined to explore the design space of BTBT
transistors and to gain insight into the practical prospects for these
devices to outperform MOSFETs.
Remember, the lab shuts down for annual cleaning and maintenance starting
at 7 am sharp on WEDNESDAY, DECEMBER 17.
However, staff will begin cleanup on MONDAY, DECEMBER 15 according to
the following:
1. IN THE LAB: All personal items must be stored inside assigned lab
bins. No personal items on WIP racks or on top of lab bins. Anything
found outside of lab bins will be removed from the lab.
2. LAB BINS: All assigned bins in the lab must be labeled with the
current owner's Coral login. Bins which are assigned to labmembers who
have not been very active in the lab will be tagged for reassignment to
active labmembers in the new year.
3. IN THE CAD ROOM: All personal storage bins in the CAD room (CIS
151) must be labeled with the Coral login and the current date. No
chemicals inside storage bins. Staff may choose move bins around to
make better use of available space.
4. IN THE CUBICLE AREA: As an evacuation path for cubicle and office
occupants, aisleways must be clear to 36" across and no unsecured items
stored above (to prevent blocking paths in case of earthquake, as per
code.) Desk space will be subject to reassignment to active labmembers,
SNF student helpers and guests. In addition, carpets will be cleaned
at 6 pm on Friday, December 5. All boxes and other personal items
should picked up off the floor.
Any questions, ask a staff member --
Thanks,
Mary
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Just a reminder of the Process Clinic today (Monday), from 2-4 pm in the
cubicle area near Maureen's office. Bring your process runsheets (or
learn how to make one), your processing questions, mask layouts, etc.
Staff will be on hand to help out where we can. Senior labmembers are
especially welcome to offer advice. We'll be there!
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
