Badger Questions and Concerns for industrial users

Dear SNF Staff,

As we all know that the Badger software is in full swing to replace beloved Coral. 

I have been using Badger for SNL and I am familiar with the software.

Here are my few concerns: 

1. As I understand Badger can only be accessed through VPN. For some of us industrial users it will be hard to access VPN, since many companies won't let employees to use VPN access      through there company sites. 

    I am not sure if Badger folks aware of this issue. If VPN is the only way to access the equipment reservation system, Industrial users have no way to book the desired tools.

    Please let us know if there are any other ways to access Badger other than VPN. 

2. As a consultant with multiple accounts we need to know if Badger will be able to do that. 

Thank you for your attention.

Pnataraj/ Pradeep

All enables/disables should work now ...

SNF Lab Members:

As of 1 p.m. all remaining equipment with hardware interlocks should
enable and disable without error. If you find anything for which this
is not the case, please let me know.

We have two minor areas of the network that are still offline as we
conduct further tests but those areas are not currently connected to any
interlocked equipment.

Again, we apologize for the inconvenience and hope that you have a
productive afternoon of processing.

John

Steam (and temp/humidity control) back up!

Hi all --

The steam is back up, so the lab should be getting back to normal
humidity and temperature control conditions.

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Network problems ...

SNF Lab Members:

This morning in the process of installing new Badger interlocks we
apparently cross-wired two sub networks which took the building network
down. I believe that this occurred at about 10:15 a.m. Joe Little
discovered the problem and was able to recover the building network
connection by completely disconnecting the Badger interlock switch from
the network. That recovered the building internet connections but still
left all Badger interlocks inaccessible.

We have since been working to localize the problems. At this point,
most, but not all, of the badger interlocks are working.

There are two areas that will still have enable/disable problems:

The tools that back up to the open pipe rack behind wbgeneral including
stsetch2 and the HDP Plasma Therm tool.

The tools that back up to the fingerwall behind stsetch and innotec.

We are currently working on this part of the system to see if we can
find and resolve the source of the network connection problem. We will
hope to have further tools accessible by 1 p.m.

We apologize for the inconvenience that this has caused.

Thanks,

John

Effective December 1st, 2012 NEW RATES

Dear SNF Labmembers,

This is a courtesy email to remind you that effective December 1st, 2012, our new rates go into effect. Please see our website for details. http://snf.stanford.edu/about/fees.htm If you have any further questions, please do not hesitate to ask.

Regards,

Aubrey Martinez
Program Manager

Bldg steam off: lab temps will change

Hi all --

Steam is unexpectedly off campus-wide. This means that we do not have
temperature or humidity control in the lab. If you have critical
processes, particularly in litho, you may want to check on the lab
status before committing your wafers. We will provide updates on this list.

Your SNF STaff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: SF6 recipe at pquest

Seongjae,

I have the old PQ log bks from 1996 to 2004. The old SiO2 etch recipe was 10H2, 15 CH4, 700w uW, 200 W bias (-102Vdc), 1.5mT, 20C. So far, I have not found any etch rate or sel numbers in the logs. Jim

----- Original Message -----
From: "Jim McVittie" <mcvittie@stanford.edu>
To: "Seongjae Cho" <felixcho2010@gmail.com>
Cc: labmembers@snf.stanford.edu
Sent: Thursday, November 29, 2012 2:50:54 PM
Subject: Re: SF6 recipe at pquest

Seongjae,

GaAs will not etch GaAs in a F based recipe if that is what you are asking. If you want to etch SiO2 over GaAs, below is a recipe from 2003 for forming micro lens. I expect Jim Kurger has an some oxide etch recipes for the PQ. Jim

Subject:
Re: PQuest Process Info Request
Date:
Thu, 3 Jul 2003 09:21:14 -0700
From:
"Michael Wiemer" <mwiemer@stanford.edu>
To:
"Jim McVittie" <mcvittie@snf.stanford.edu>
References:

> Name:_Michael Wiemer_________ Group/Company:__Miller/Harris__________
>
> Email address: __mwiemer@stanford.edu________ Date:__07-03-03_______
>
> Process name: __Mikelens___ Material to be etched:_SiO2 (quartz) and
PR__
>
> Chamber condition procedure:
>
> I usually use 15min of my etch process (described below) to condition the
chamber.
>
> Etch Process:
> Sample size__~2inX2in___, Mask Mat'l___SPR220-7___, Carrier__Silicon
(yes)
>
> Top Power__350_W, Bottom Power__75___W, Pressure___10_mT
>
> Gases and flows__CF4=32, O2=5sccms or more__________________
>
> Temperature __22C, Bias voltage__-85_V, Plasma time ___2h to 3.5h_
>
> Comment on rates, selectivity and on how well this process works:
> Works great! Transfers resist profile into the quartz wafer. Selectivity
~2.4 resist/SiO2
>

----- Original Message -----
From: "Seongjae Cho" <felixcho2010@gmail.com>
To: labmembers@snf.stanford.edu
Sent: Thursday, November 29, 2012 2:27:40 PM
Subject: SF6 recipe at pquest


Hello labmembers,

Does anyone of labmembers and staff members know a proper F-based recipe
for etching GaAs with an oxide mask at a selectivity > 4:1?
It will be really appreciated if you recommend one of recipes
of which GaAs etch rate is a value you know, with the high selectivity.

Thank you.

- Sincerely, Seongjae.

Re: SF6 recipe at pquest

Seongjae,

GaAs will not etch GaAs in a F based recipe if that is what you are asking. If you want to etch SiO2 over GaAs, below is a recipe from 2003 for forming micro lens. I expect Jim Kurger has an some oxide etch recipes for the PQ. Jim

Subject:
Re: PQuest Process Info Request
Date:
Thu, 3 Jul 2003 09:21:14 -0700
From:
"Michael Wiemer" <mwiemer@stanford.edu>
To:
"Jim McVittie" <mcvittie@snf.stanford.edu>
References:

> Name:_Michael Wiemer_________ Group/Company:__Miller/Harris__________
>
> Email address: __mwiemer@stanford.edu________ Date:__07-03-03_______
>
> Process name: __Mikelens___ Material to be etched:_SiO2 (quartz) and
PR__
>
> Chamber condition procedure:
>
> I usually use 15min of my etch process (described below) to condition the
chamber.
>
> Etch Process:
> Sample size__~2inX2in___, Mask Mat'l___SPR220-7___, Carrier__Silicon
(yes)
>
> Top Power__350_W, Bottom Power__75___W, Pressure___10_mT
>
> Gases and flows__CF4=32, O2=5sccms or more__________________
>
> Temperature __22C, Bias voltage__-85_V, Plasma time ___2h to 3.5h_
>
> Comment on rates, selectivity and on how well this process works:
> Works great! Transfers resist profile into the quartz wafer. Selectivity
~2.4 resist/SiO2
>

----- Original Message -----
From: "Seongjae Cho" <felixcho2010@gmail.com>
To: labmembers@snf.stanford.edu
Sent: Thursday, November 29, 2012 2:27:40 PM
Subject: SF6 recipe at pquest


Hello labmembers,

Does anyone of labmembers and staff members know a proper F-based recipe
for etching GaAs with an oxide mask at a selectivity > 4:1?
It will be really appreciated if you recommend one of recipes
of which GaAs etch rate is a value you know, with the high selectivity.

Thank you.

- Sincerely, Seongjae.

Coral ...

SNF Lab Members:

We are rebooting the Coral servers and I expect that things will be
functional by 2:35.

On two occasions we have been unable to get a clean restart of the
servers which has necessitated a reboot of the Coral server machine.

I expect that things will be fully operational shortly ...

Sorry for the inconvenience,

John

SF6 recipe at pquest

Hello labmembers,

 

Does anyone of labmembers and staff members know a proper F-based recipe

for etching GaAs with an oxide mask at a selectivity > 4:1?

It will be really appreciated if you recommend one of recipes

of which GaAs etch rate is a value you know, with the high selectivity.

 

Thank you.

 

- Sincerely, Seongjae.

 

Reminder: Process Clinic today, 11 am

Hi all --

Just a reminder of the Process Clinic today, at 11 am. We meet in the
cube area next to Maureen's office. Bring process questions to brainstorm.

Your SNF Staff

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Reminder: Fab closure tonight from 11:45pm Thur to ~6:00am Fri morning.

Monthly cleaning of floors and horizontal surfaces.   

We will be pulling gowns tonight as well. 

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

Blank Karlsuss Mask

Hi All,

The blank mask holder/case in Mahnaz's bin is empty.. Does anyone know where it is?

Thanks,

Robert Chen
Electrical Engineering Ph.D. Candidate
Harris MBE Group, Stanford University
http://robochen.web.stanford.edu

8inch wafers?

Dear Labmembers,

 

Does anybody have a 8-inch wafer that I could borrow?  I only need it as a substrate so doping does not really matter.  I'd appreciate it if anyone could share one with me.

 

Thank you,

Takane

 

--
Takane Usui
Ph. D. Candidate
Stanford University

Email: takane@stanford.edu
Phone: (310) 500-6132
Web: npl-web.stanford.edu

 

Defense this Friday 2:15 (Phys./Astro. 102), Daniel Clark

All -

LIGO's a pretty demanding application of inertial sensing-based structural control.  If you're interested in learning more, Daniel Clark's defense would be a good place to start --

Roger

The Seismic Platform Interferometer – an auxiliary sensor enabling the control of differential motion between adjacent LIGO seismic isolation platforms

Daniel Clark

Dissertation Adviser: Prof. Daniel B. DeBra

Friday November 30, 2012

2:30 PM (Refreshments at 2:15 PM)

Physics and Astrophysics (04-470) Room 102

Abstract:
The Laser Interferometer Gravitational-wave Observatory (LIGO) is a large project designed to detect directly gravitational waves from astrophysical sources. LIGO utilizes three earth-based, long-baseline interferometers and is funded by the National Science Foundation (NSF).

Currently, LIGO is going through a sensitivity upgrade. As part of the upgrade, 30 six degrees-of-freedom Internal Seismic Isolation (ISI) platforms are being installed. The platforms are actively controlled relative to inertial space using seismometers and provide excellent performance at high frequencies. At low frequencies, however, the horizontal feedback seismometers have difficulty distinguishing horizontal accelerations from the component of gravity (g) due to tilt.

This talk addresses one method that could be used to overcome the difficulties caused by the tilt-horizontal coupling in the feedback inertial sensors. An auxiliary sensor, the Seismic Platform Interferometer (SPI), was developed and tested in the Stanford Engineering Test Facility (ETF). Using the information from the SPI, two adjacent platforms in the ETF were controlled in differential length, pitch, and yaw. Independent seismometers on the two platforms indicated an order of magnitude reduction in the differential length motion between the platforms from 50 mHz  to 5 Hz. Similar performance was also anticipated for differential pitch and yaw although the lack of independent sensors precludes direct measurement of performance improvement.

The SPI is a possible solution to unwanted motion at low frequency caused by the tilt-horizontal coupling in the feedback seismometers of the LIGO active ISI platforms.

Daniel Clark
Stanford University
6235 22nd St.
Rio Linda, CA 95673
916.769.2411 Mobile

Venture Clinic TODAY at 5pm in Allen 101

All:

 

Apologies for the last minute notice (as this was just formally scheduled today), but we wanted to invite you to a Venture Clinic to be held in Allen 101 at the Stanford Nanofabrication Facility this Wednesday, November 28, at 5:00 p.m.

 

These clinics are held periodically at the Stanford Nanofabrication Facility by two professionals from the start-up community: Shahin Farshchi, a VC from Lux Capital Management, and Gavin McCraley, a start-up attorney from Morrison & Foerster. At the clinic, both Shahin and Gavin will be happy to discuss any questions you may have about start-ups, including all issues around getting started, funded and formed and around issues to think about growing and operating tech companies.

 

We hope to see you there!

 

Best,

 

Gavin & Shahin

--

Alok Vasudev | alokv@stanford.edu | 512.576.1956

PhD Candidate | Geballe Laboratory for Advanced Materials | Stanford University

Countdown to shutdown: 3 weeks!

Dear Labmembers --

REMINDER: Lab shuts down at 7 am THURSDAY, Dec. 20. Lab reopens Tuesday, Jan. 8, at 7 am.

REMOVE EVERYTHING: from WIP shelves and common storage by shutdown.

LAB BINS & LOCKERS: All personal items MUST be removed from lab bins and lockers by
shutdown, unless you accept a full year of rental charges in January, per the new
policy below. Contact Maureen or Mahnaz (mbaran@snf or mahnaz@snf) to get your
bin or locker tagged. Bins or lockers without tags will be emptied at shutdown.
Be aware that SNF is not responsible for valuables left during shutdown.


NEW BIN & LOCKER POLICY: Bin/locker fees will be charged when assigned, for rental
through Dec. 2013. So, in January, it will be 12 months of fees (e.g., $120 for
a medium sized bin, plus overhead.) In March, 9 months. The goal is to simplify
billing and ensure inactive bins/lockers don't accumulate by encouraging
annual cleanup. Any questions,contact Aubrey Martinez (aubreym@snf)

Thanks for your attention --

Your SNF Staff


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Steam shutdown Saturday, December 1, 6 am to 4 pm

SNF Lab Members:

This is a reminder that there will be no steam in the building this
coming Saturday, December 1, due to an emergency repair to one of the
main steam distribution lines outside of the building.

Currently steam is schedule to go off at 6 a.m. and should be back on by
4 p.m. Jose Solarzano will be in communication with the steam shop and
will bring building systems back on line as soon as the work has been
completed.

During this time window, temperature control in the cleanroom will not
be very good and there will be no humidity control in the lithography
area. There are Extech temperature/humidity controllers near the ASML
and the SVG coat track that will give you an idea of how far temperature
has drifted.

Critical lithography operations and even critical wet etch operations
should likely be deferred until proper temperature control is restored.

Heating in the offices and domestic hot water will also be affected.

Let me know if you have any questions,

John

Re: Problem p5000etch SNF 2012-11-27 19:03:34: Ch.B OXIDE ISO etch acts strangely

Calibrate throttle valve and Bchui tested the w/out problem.
Ben think problem with the etchrate is with his wafer.

Problem p5000etch SNF 2012-11-27 19:03:34: Ch.B OXIDE ISO etch acts strangely

earlier in the day, it etches about 500A oxide in 13 sec. When I tried it again just now (after Cesar serviced the machine--but he shouldn't have touched ch.B anyway), it's not etching at all but rather depositing a couple hundred angstroms of something (i.e. the apparent oxide thickness AFTER the etch looks higher than BEFORE the etch by about 200A). Very strange.... Also, the pressure isn't getting up to setpoint in the set-up stage (stays around 20mT); have to wait 15 sec or so in the main etch for the pressure to build up to 250mT and THEN plasma comes on.

Re: Comment p5000etch SNF 2012-11-15 09:34:10: Ch A High backside He

Changed lip seal..

Re: Problem p5000etch SNF 2012-11-27 14:22:55: High He flow, 29.4sccm

Vented chamber and found wafer chips on top of the large lip seal.
Vacuumed wafer chips and changed both 4 small and large
lip seal. Wiped down chamber with ipa, pump down chamber for
30mins and checked backside he leak 1.5sccm with dummy a wafer.

Problem p5000etch SNF 2012-11-27 14:22:55: High He flow, 29.4sccm

Seminar on "Solar Junction's III-V multi-junction solar cell technology"

"Solar Junction's III-V multi-junction solar cell technology"

Wednesday, November 28, 2012
Time: 4:15pm
Location: Paul Allen Building (CIS)-101X

Abstract:
This talk will briefly discuss the history of Solar Junction. We will provide an overview of III-V multi-junction solar cell technology and Solar Junction's technology platform for generating solar cell efficiencies beyond ~40%. Solar Junction recently broke its own certified world record for solar cell conversation efficiency (44% under concentrated light). We will discuss the markets for III-V solar cells (Concentrated PV and space power) and the unique technical requirements put on the solar cell by these markets.

Speaker Bio:
Dr. Mike Wiemer spent 11 years at Stanford University as a student. He recieved his B.S. (2000), M.S. and Ph.D.(2007) all in Electrical Engineering. His Ph.D. work was on the design and fabrication of high repetition rate III-V mode-locked lasers working under Prof. David Miller and Prof. James Harris. After graduation, he co-founded Solar Junction Corporation, a high efficiency solar cell startup located in San Jose. Two other Stanford Ph.D. grads (Vijit Sabnis and Homan Yuen) are also co-founders.

Smokey odor in the fab coming from outside make-up air.

Users,

The odor of smile in the fab has apparently been traced to external intake air having a smoke aroma.  

we will continue to monitor and update if needed.

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

Re: URGENT: Coral not working

Stephanie et al

According to the logs, folks are now able to fire up in-lab Coral. Are those sessions not opening and/or running properly? That is based on what I see between 7:30 and 7:40. 

John

Sent from my iPhone

On Nov 26, 2012, at 7:32 PM, Stephanie Claussen <sclaussen@stanford.edu> wrote:

Until this problem gets repaired, Remote Coral still works (in case anyone has a laptop inside the fab).

On Mon, Nov 26, 2012 at 7:20 PM, J. Jason Lin <jasonlin@stanford.edu> wrote:

Dear SNF Staff,

We currently cannot start coral to enable/disable tools.  This is for the last 30 minutes or so at least, and is currently experienced by other labmembers as well.

Please take a look at this problem ASAP.

Thanks,
Jason

Re: URGENT: Coral not working

Hi John,

Coral works now.  Thanks!

Jason

On Mon, Nov 26, 2012 at 7:32 PM, Stephanie Claussen <sclaussen@stanford.edu> wrote:

Until this problem gets repaired, Remote Coral still works (in case anyone has a laptop inside the fab).

On Mon, Nov 26, 2012 at 7:20 PM, J. Jason Lin <jasonlin@stanford.edu> wrote:

Dear SNF Staff,

We currently cannot start coral to enable/disable tools.  This is for the last 30 minutes or so at least, and is currently experienced by other labmembers as well.

Please take a look at this problem ASAP.

Thanks,
Jason

Re: URGENT: Coral not working

Until this problem gets repaired, Remote Coral still works (in case anyone has a laptop inside the fab).

On Mon, Nov 26, 2012 at 7:20 PM, J. Jason Lin <jasonlin@stanford.edu> wrote:

Dear SNF Staff,

We currently cannot start coral to enable/disable tools.  This is for the last 30 minutes or so at least, and is currently experienced by other labmembers as well.

Please take a look at this problem ASAP.

Thanks,
Jason

Re: URGENT: Coral not working

Jason et al

I've restarted the servers from my iPhone and they appear to have started properly. However, if this is a network related problem, I can't do much in the way of diagnostics.

I see people logging in so I think that things are resolved.

If I am incorrect, send me email or call me at 650 5752508 and I'll come in. I'm only about 20 minutes away if required

But as of 7:30, I'm Cautiously optimistic.

Good luck,

John

Sent from my iPhone

On Nov 26, 2012, at 7:20 PM, "J. Jason Lin" <jasonlin@stanford.edu> wrote:

> Dear SNF Staff,
>
> We currently cannot start coral to enable/disable tools. This is for the last 30 minutes or so at least, and is currently experienced by other labmembers as well.
>
> Please take a look at this problem ASAP.
>
> Thanks,
> Jason
>

URGENT: Coral not working

Dear SNF Staff,

We currently cannot start coral to enable/disable tools.  This is for the last 30 minutes or so at least, and is currently experienced by other labmembers as well.

Please take a look at this problem ASAP.

Thanks,
Jason

Contact angle analyzer

Hello SNF users,

Does anyone know a facility in which I can use a contact angle analyzer on this campus?
I would appreciate your information.
 
Thanks,
Mune

--

Munekazu Motoyama, Ph.D.
Nanoscale Prototyping Laboratory
Department of Mechanical Engineering
Stanford University
440 Escondido Mall, Bldg. 530, Rm. 226
Stanford, CA 94305
 
Phone: 650.353.0917
Fax: 650.723.5034
Email: munekazu@stanford.edu

November Fab Cleaning. Thursday Nov. 29th at midnight. Opening Friday at ~6:00 am.

Reminder.  Please do not leave your important samples lying out in the open.

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

ENGR MEMS sequence starts this winter

Please forward to students interested in Micro/Nano and ultimately working in SNF...

The complete ENGR MEMS project course sequence of ENGR240, ENGR341, ENGR342 will be offered again starting this winter after a 1 year hiatus. Note that priority for ENGR341 lab training slots in SNF will be given to those who were not admitted previously but tried to take the project sequence and have completed ENGR240. 

ENGR 240: Introduction to Micro and Nano Electromechanical Systems
Miniaturization technologies now have important roles in materials, mechanical, and biomedical engineering practice, in addition to being the foundation for information technology. This course will target an audience of first-year engineering graduate students and motivated senior-level undergraduates, with the goal of providing an introduction to M/NEMS fabrication techniques, selected device applications, and the design tradeoffs in developing systems. The course has no specific prerequisites, other than graduate or senior standing in engineering; otherwise, students will require permission of the instructors.
Terms: Win | Units: 3 | Grading: Letter or Credit/No Credit
Instructors: Tang, S

Mon, Wed 2:15 PM - 3:30 PM at 260-113

ENGR 341: Micro/Nano Systems Design and Fabrication
Laboratory course in micro and nano fabrication technology that combines lectures on theory and fundamentals with hands-on training in the Stanford Nanofabrication Facility.  Limited enrollment. Prerequisite: ENGR 240 or equivalent.

Terms: Spr | Units: 3-5 | Grading: Letter (ABCD/NP)

Instructors: Pruitt, B

ENGR 342: MEMS Laboratory II
Emphasis is on implementation of fabricated N/MEMS-based solutions. Student teams collaborate to develop, fabricate and test N/MEMS solutions proposed in E341. Design alternatives fabricated and tested in SNF with emphasis on manufacturability, assembly, test, and design. Limited enrollment. E342 is an advanced graduate project course that allows a limited number of students the opportunity to pursue directed projects in the SNF during the summer quarter.  Real projects which can benefit from microfabricated solutions will be defined by industry and internal research groups, who will also pay expenses for the projects materials and fabrication fees.  Limited enrollment. Prerequisite: ENGR 341.

Terms: Aut2013 | Units: 3 | Grading: Letter (ABCD/NP)

Instructors: Pruitt, B

Comment p5000etch SNF 2012-11-24 21:56:43: Found Ch. B offline

Got error "the specified chamber is not on line" when I tried to run a recipe in chamber B.
Checked "Vacuum Service" menu and found chamber set to "offline for maintenance".... didn't see anything on the maintenance log regarding the reason for this so I simply set the chamber back to "online for process"

Re: Problem p5000etch SNF 2012-11-21 15:37:45: High Resist etch rate

Checked and verified cathode cooling temp(15C)
and RF power at 500watts, both are in spec. Pls check
EPeralta comment..

Steam shutdown cancelled ... building hot water and temperature control OK

SNF Lab Members and Allen Building Occupants:

As you know, the building steam had originally been scheduled for an
emergency shutdown today that was going to affect domestic hot water,
clean room temperature control, etc. It was originally scheduled to
happen today from 6 a.m. to 4 p.m.

I was surprised to see no activity when I wandered by and called the
project manager. Apparently, yesterday some of our colleagues in a
nearby building asked that this shutdown be canceled. Unfortunately,
nobody thought to notify us.

As a result, all utilities are available today and temperature and
humidity control are running normally. I just checked and the
temperature in the lithography aisle near the SVC coat is 20.4 C and
20.8 C near the ASML and have not fluctuated over the past couple of hours.

We should have been notified of this change in advance, but I hope that
this somewhat tardy announcement will allow some of you to get some work
done today, should you so desire, rather than losing a full day.

It is my understanding that the shutdown has been re-scheduled for
Saturday, December 1, but expect that further announcements will be
forthcoming.

Thanks for your attention,

John

Comment p5000etch SNF 2012-11-21 20:56:17: Ch B. rates

jim-ox on 955 resist
11/21/12: 2.71nm/s
10/11/12: 2.55 nm/s
jim-ox on fused silica:
11/21/12: 4.41nm/s
04/04/12: 4.36 nm/s
Seems good to me, I would check your recipe to make sure it's what you expected it to be.

Reminder of Planned steam shutdown on 11/23

Hello Labmembers:

     This is a reminder that on Friday, November 23rd, there will be no building heat or humidity control due to planned repair of a 14" steam flange. The repair, by Stanford facilities begins at 6:00am and is expected to be completed by 4:00pm. During this time there will be no temperature or humidity control in the Litho area. We strongly recommend that you postpone any Litho steps until the repairs are completed and the litho area returns to a normal, controlled state. This is so you can avoid any potential processing problems or unpredictable results due to the fluctuating temperature and humidity. If you choose to do litho processing, please expose and disposition a test wafer to check your process. Please make Coral entries if the ASML Stepper posts warnings regarding air or water temperature or call the SNF Duty phone at 650-521-7306. Thanks for your patience and understanding .

         Your SNF Staff

Problem p5000etch SNF 2012-11-21 15:37:45: High Resist etch rate

For the Ch. B Oxide recipe I measured an etch rate of 182nm/min for 3612 resist. 2-3 weeks ago, I measured a rate oi 86nm/min

Occasional Coral server restarts ...

SNF Lab Members:

Some of you may have noticed several times over the past couple of days
when you could not access Coral (either local or remote) for a period of
a few minutes. As you likely know, we are in the process of exchanging
Coral-style interlocks with new interlocks that are compatible with
Badger. When we change this information in the database, this requires
a restart of the Coral servers. When this happens, you existing Coral
sessions will die off and you will need to start a new Coral session.
When things are going smoothly, we can update interlocks on several
tools in a single restart of the servers ... and a restart of the
servers typically happens in about 20 seconds.

However, both on Monday and Tuesday, we ran into a couple of interlocks
that were giving us problems. In trying to diagnose those problems,
reset network connections, and get those interlocks working, we had to
restart the Coral servers more times than we would have liked. I think
that we restarted the servers a total of 10-20 times over those days.
While we still don't know whether these interlocks have configuration,
firmware, or hardware problems, we were clearly encountering problems on
a couple of the interlocks that we have not experienced on the other 40
or so that have been already installed.

We apologize for the inconvenience that the switching of interlocks has
caused and will hope to keep the number of server restarts to a minimum.

Let me know if you have any questions,

John

Comment p5000etch SNF 2012-11-20 11:18:26: Ch B Oxide resist etch rate seems high

Will try to confirm later

Countdown to Shutdown: Note date change to THU 12/20 & bin update!

Dear Labmembers -- Please note the following changes to the lab shutdown:

Lab Shutdown Date/time: 7 am THURSDAY, Dec. 20 (yes, one month from
today!) That gives everyone an extra 14 hours of play time. Everything
on WIP shelves and common storage must be removed from the lab by then.
Lab will still reopen for business on Tuesday, Jan. 8, at 7 am.

Update to Lab & Locker policy: Personal items must be cleared from Lab
bins and lockers by Thursday, 12/20. EXCEPTION: Labmembers can keep bin
and locker assignments if they (and their PI's or organizations) are
willing to accept a full year of bin or locker charges in January, as
per the new lab storage policy (see below). Contact Maureen or Mahnaz
(mbaran@snf or mahnaz@snf) if you would like to do this and your bin or
locker will be tagged. But please also be aware that there will be
non-Stanford contractors working in the building during Winter Closure
and SNF cannot be responsible for valuables left in storage.

New bin & locker storage policy: Bin and locker fees will be charged
when assigned to you, for rental through Dec. 2013. So, in January, it
will be 12 months of fees (e.g., $120 for a medium sized bin, not
including overhead.) If you're assigned a bin in March, that will be 9
months. Some details still need to be worked out, but in general, the
objective is to simplify billing and ensure inactive bins/lockers don't
accumulate by encouraging an annual cleanup. Any questions on this,
please contact Aubrey Martinez (aubreym@snf)

Thanks for your attention --

Your SNF Staff


--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Polytec Technical Presentation: Dynamic Characterization of MEMS using Laser Vibrometry

Polytec Technical Presentation: Dynamic Characterization of MEMS using Laser Vibrometry

When: Tuesday November 27th, 10 AM
Where: Room 218 Spilker Engineering and Applied Science Building (formerly nano)

Polytec presents technology for dynamic characterization of MEMS. Our
Micro System Analyzer (MSA-500) combines powerful tools for analysis and visualization of structural vibrations of MEMS. The MSA-500 features laser vibrometry for measurement of out-of-plane motion with resolution down to picometers and bandwidth out to MHz. Scanning measurements provide full-field mapping and 3D visualization of deflection shapes. The system also includes Strobe Video Microscopy for planar motion and White Light Interferometer for static topography measurements. Our latest capabilities include our Ultra High Frequency (UHF-120) Vibrometer featuring 1.2 GHz frequency bandwidth.

This technology is used throughout the MEMS research community. We present several characterization studies where our MSA has been instrumental in research and development of MEMS.

Our engineers will present new advances in our measurement technology and discuss potential MEMS applications you may have.

More information at: http://www.polytec.com/int/applications/micro-nano-technology/

Fab Closure for Cleaning. Nov 29th - 30th, midnight to 6 am.

All,

Our monthly cleaning will be a single night, Thursday night (29th) starting around midnight and re-opening by 6-7 am. Friday morning.

Please plan your work accordingly.

Brett E. Huff

SNF Clean Room Manager

Stanford University

©510-612-8670

bhuff@stanford.edu

remote desktop from SNF

Hi All,

I saw somebody today on one of the terminals with a remote desktop session.

I looked around a bit and figured out this was done with the command 'rdesktop' but it didn't seem to be installed by default.
I downloaded the source and tried to install it but it seems I don't have permission to create a directory in /usr/local/bin.

I was wondering if anyone could help me with this. I'd be super useful to be able to remote desktop to my office computer while i wait for processes to finish instead of having to bring in my laptop everytime.
How i can gain permission to install this? (I think this is done by first using the 'su -' command which then prompts for a password)

Thank you for your time,

--
Edgar A. Peralta 

Ph.D. Candidate, Stanford University

Department of Applied Physics

M: 954.940.2700

Re: Problem p5000etch SNF 2012-11-13 08:37:18: CF4

CF4 is back online..

Re: Problem p5000etch SNF 2012-11-15 18:44:10: Endpoint stepper B calibration failed

Reset monochrometer..

Problem p5000etch SNF 2012-11-15 18:44:10: Endpoint stepper B calibration failed

Academic Pricing for Maskmaking - website is down, can somebody forward me the quote?

Hi all,

I was wondering if somebody could send me the contact information (and hopefully a sample quote) for the company providing academic pricing for maskmaking? Unfortunately, the relevant SNF website is down, and I was hoping to order a mask tomorrow.

Thanks!

Sincerely,
Alex Piggott

Comment p5000etch SNF 2012-11-15 09:34:10: Ch A High backside He

Backside He flow 8-9 sccm; plasma stable; no sign of arcing.

Process Clinic, 11 am

Hi all --

Just a reminder, there's a process clinic today (Thursday) at 11 am.
Bring your process questions, mask designs, etc. We'll meet in the cube
area next to Maureen's office.

Mary

Badger lights on Equipment

Dear Labmembers,

You may have noticed new Badger lights on selected tools in the lab.
This is part of the transition to the Badger lab system from Coral
that the maintenance staff have been working on. Tools that have the
new lights are running Badger through Coral. By the end of winter break
all lab tools will have been transferred.

This is transparent to labmembers. So if the Coral On light is missing,
just look for the cute badger and the light button next to him. Red
means off and green means enabled.

-Nancy

Seminar on Thin-Silicon, Low-Cost Solar Photovoltaic Modules Using Kerfless Epitaxial Silicon Lift-off Technology

Seminar Announcement

Thin-Silicon, Low-Cost Solar Photovoltaic Modules Using Kerfless Epitaxial Silicon Lift-off Technology

Mehrdad Moslehi, Ph.D., Founder, Executive Chairman, & CTO
Solexel
Date: Nov. 14 (Today)
Time: 4:15pm
Venue: CIS-X 101

This seminar presents an overview of the crystalline silicon solar PV technology and the overall PV market, with special emphasis on Solexel's thin-silicon, high-efficiency, low-cost PV solution based on its Kerfless epitaxial silicon lift-off technology. Solexel has developed a disruptive technology that eliminates the performance vs. cost trade-off that is common for the currently available crystalline silicon and thin-film solar PV technologies. Instead of using the high-cost, energy-intensive polysilicon-ingot-wafering process sequence, we grow our thin cell substrates directly from an inexpensive silicon source gas using silicon epitaxy on reusable templates with porous silicon seed and release layers. Since we form our thin silicon cell substrates using epitaxial growth, we engineer the monocrystalline silicon substrate properties, such as doping profile, in situ and during the epitaxial growth process, hence enabling advanced device architectures. The use of significantly less silicon, combined with much lower energy usage and industry-low capital expenditure, delivers a manufacturing cost and LCOE roadmap well below the lowest-cost crystalline-silicon and thin-film solar modules. Our unique cell design, process integration architecture, and integrated electronics enable superior efficiency and energy yield performance compared to the mainstream crystalline-silicon PV. We have established a fully operational pilot fab where we produce large-area (156 mm x 156 mm ) thin mono-crystalline solar cells and prototype quantity modules, on production tools that are representative of the high-volume tools used in mass production.

Bio
Mehrdad is the Founder, Executive Chairman, and CTO of Solexel. After completing his undergraduate studies in Electrical Engineering at Sharif University of Technology, he received his M.S. and Ph.D. degrees in Electrical Engineering from Stanford. His professional experience includes Texas Instruments and start-ups in the semiconductor and solar industries. He has been recognized as a Prolific Inventor by the USPTO and Texas Instruments. Mehrdad is a Fellow of the IEEE.

Please dont miss the exciting guest lecture by Dr. Mehrdad Moslehi today. After 5 years of being in stealth Solexel finally announced their technology and their stuff was highlight of Intersolar conference this year.

Comment p5000etch SNF 2012-11-13 10:00:39: CF4

CF4 expected to be delivered thursday at the latest

Problem p5000etch SNF 2012-11-13 08:37:18: CF4

Out of CF4. Replacement has been ordered

special course, EE392P, winter 2013

SNF Labmembers,

I've attached a flyer for Sandip Tiwari's course on nanoscale device
physics, which he'll be teaching here next quarter.

Roger

[Reminder] Oral Exam Announcement: Karthik Vijayraghavan -- TODAY

EE Department Oral Defense

Title: High Bandwidth AFM Imaging in Fluid Using Interdigitated Probes

Speaker: Karthik Vijayraghavan
Advisor: Olav Solgaard

Date: Monday, November 12, 2012
Time: 3:30 pm (refreshments at 3:15 pm)
Location: Packard 101

Abstract:

High speed imaging of local material properties of soft materials such as cells using the Atomic Force Microscope (AFM) is an area of active research. An understanding of nanomechanical properties and local adhesive forces of cells would greatly improve our understanding of fundamental cellular processes. Traditionally, these properties have been obtained quantitatively using "force-distance" curves which are slow to obtain and not amenable to high speed imaging. Alternatively, qualitative mapping of these properties has been performed using phase imaging in AC mode AFM where an AFM probe is oscillated close to its fundamental resonance frequency and concurrently scanned over a sample surface to make intermittent contact with the sample surface. The interaction force between the probe tip and the sample surface contains rich information about the properties of the sample. However, due to the limited bandwidth of traditional AFM cantilevers, a significant portion of this rich information is lost. Interdigitated AFM probes overcome this limitation by incorporating a high bandwidth diffraction grating based force sensor on the cantilever to measure the time-varying interaction forces with adequately high bandwidth.

In the first part of this talk, I will describe the mechanical and optical design of interdigitated AFM probes and present a simplified analytical model to calculate the mechanical frequency response of the probes. I will then describe the fabrication of these probes using MEMS fabrication techniques and demonstrate the characterization of these probes. In the second part of this talk, I will describe signal processing methods that were developed to obtain physical properties of samples scanned with these probes. Finally, I will present representative results from imaging a sputtered gold surface, a polymer sample, and a cell sample, in fluid, thereby demonstrating the ability of these interdigitated probes to image multiple physical properties of a wide range of samples.

Comment p5000etch SNF 2012-11-11 07:58:24: Chamber's l/r

-Chamber A: Base pressure@0.9mt and l/r@0.1mt
-Chamber B: Base presuure@0.9mt and l/r:@0.3mt
-Chamber C: Base pressure@0.4mt and l/r@0.1mt

DISSERTATION DEFENSE---Monday 10am! DONG LIANG

Hi Everyone,

We're all in for a real treat. Dong Liang is giving his defense this monday at 10am. Come listen to what he's done to save our world one exciton at a time. 

Sonny

DEPT OF PHYSICS

DISSERTATION DEFENSE


Ph.D. Candidate:  DONG LIANG
Research Advisor:  JAMES S. HARRIS
Date: MondayNovember 12th, 2012
Time: 10:00 am (Refreshments at 9:45 am)
Location: Physics & Astrophysics Bldg. Room 102/103
Title: Nanostructures in III-V solar cells

Abstract:

From the physics and materials viewpoint, III-V materials are ideal
for highly efficient photovoltaic conversion. Their major limitations
are cost and resource availability. As industrial planar III-V solar
cells continue to set the all-time efficiency records, nanostructured
III-V solar cells are now being investigated in academia with the goal
to further improve the efficiency and lower the required materials
volume and cost. However, most previously investigated nano-structured
solar cells suffer from low efficiencies. In this talk, I will first
present optical enhancement in nanopyramid III-V ultra-thin
films which can potentially reduce the required materials by one order
of magnitude. I will then demonstrate significant efficiency
improvement in GaAs solar cell with an AlGaAs nanocone window layer,
leading to a 17% efficiency nanostructured single-junction solar cell.

The first part of my talk will focus on optical engineering and
absorption improvement in nanopyramid GaAs ultra-thin film. I will
demonstrate a double-sided nanopyramid GaAs film that is only 160 nm
thick, laminated in a flexible transparent superstrate. Without
additional antireflection coatings, this nanopyramid film absorbs over
80% more photons than a planar counterpart with equal thickness at
normal incidence and is equivalent to a 1um thick film.  At large
incident angles, this enhancement can be even greater. With similar
light trapping design, III-V solar cell film thickness can be
potentially reduced from 3-4 um to 200-300 nm, which could
significantly reduce III-V cell cost.

 The second part of my presentation will focus on efficiency
improvement in III-V nanostructured solar       cells. Nanostructures
applied to different layers in III-V solar cells are demonstrated,
including antireflection, p-n junction and the window layer. Among
these, the nanostructured window layer leads to the best performances.
By applying a nanocone AlGaAs window layer with metal mesa grids to a
GaAs solar cell, light absorption, carrier confinement and lateral
conductance are improved at the same time, leading to a high energy
conversion efficiency of 17.0%, which is a 30% improvement from its
planar counterpart. High open circuit voltage of 0.982 V is achieved
with post-growth nanostructure processing that maintains low junction
area and low dark current. Fill factor also increases from 63% to 71%
with the metal mesa grids design that reduces series resistance and
maintains high shunt resistance. By comparing external quantum
efficiency, absorption spectra and 2D photon density mapping, charge
transferring mechanism in AlGaAs nanocone window layer is illustrated.
I will conclude my talk with some take-home design rules that can
optimize the optical and electrical trade-offs in nanostructured solar
cells.

--
Dong Liang
PhD candidate
Department of Physics
Stanford University

--
Regards,
Sonny

----
Department of Applied physics, Stanford University
research group: http://snow.stanford.edu/index.html
626-216-4597

Re: Problem p5000etch SNF 2012-11-09 20:07:47: root directory full and stopped

Reboot system and check cleared event log..

Problem p5000etch SNF 2012-11-09 20:07:47: root directory full and stopped

There was "root directory full" message and it stopped working after finishing all etching and unloading process. So I turned the tool to manual mode hardly, and then unload cassette.

Clean room garment graffiti. DO NOT WRITE on cleanroom garments.

Lab Users,

The cost of writing on your gown, or in this case, the back of your neighbors gown is $100 to SNF.  This garment can not be processed in Prudentials facility and they will be billing us for the damage.

hplc pump to borrow?

Hello,

We are urgently in need of a liquid pump (hplc or syringe that can reach a backing pressure of 1500 psi and a flow rate of 1 mL/min) for an experiment we are trying to run starting Monday. We have limited experimental time and would like to make the most of it. We would like to borrow the pump for a few days while ours is shipped and will take good care of it.

Thanks!
Erzsi

MSE PhD Dissertation Defense: Don Koun Lee (Fri, November 9th, 10AM)

Department of Materials Science & Engineering

University PhD Dissertation Defense 

 

Nano-fabrication and Characterization of emerging memory technology specialized in spintronics

 

Don Koun Lee

Advisor: Prof. Shan X. Wang

 

Date: Friday, November 9th, 2012

Time: 10:00 AM (Refreshment served at 09:45 AM)

 

Location: Spilker Building (Center for Nanoscale Science and Engineering, Nano building)

Conference room # 232

 

Abstract

First part: Spin transfer torque (STT) devices with a nano aperture

Recent progresses in spin transfer torque (STT)-based random access memory make it a realistic contender in the race toward next generation solid state data storage devices. However, the relentless scaling-down of device dimensions stemming from the Moore's law mandates that the STT-based devices have a spin switching current density of well below 10⁶ A/cm² while maintaing thermal stability of data bits stored, which are usually two contradictory requirements that have spurred worldwide research for new approaches to boost STT with minimal spin currents. We demonstrate that a reduction of the switching current by a factor of >100 in a magnetic tunnel junction (MTJ) pillar of 200 × 400 nm² can be achieved with a nano-aperture of 30 × 30 nm². In the presence of the nano-aperture, there is a large component of current in the plane of the free layer that creates the adiabatic and non-adiabatic spin torques on the free layer in addition to the conventional spin torque of the tunnel current. A micromagnetic simulation including these competing spin torques confirms that the in-plane current induced spin torques generate spin waves that causes the dramatic reduction of the tunnel current required for switching. The nano-apertured MTJ pillars presented in this work provide a promising path to the large scale practical applications of STT devices since they retain their thermal stability over 10 years and simultaneously achieve a low switching tunnel current of the order of 10⁴ A/cm².

 

Second part: Low contact resistance in Ge/MgO/CoFeB spin diodes

While the rapid and continued progress in the scalability and the integration technology of conventional planar transistor facing the physical limitation, introduction of the new functionality into the transistors has emerged as one of the alternative approaches for the future integrated electronics technology. One of the current issues for improving the efficiency of the spin injection from the ferromagnetic materials (FM) into semiconductors (S) is the conductivity mismatch between both materials because the spin injection can be greatly affected by the ratio of both conductivities. Recent reports suggested that the improvement in the spin injection could be achieved by an ultra thin oxide layer between FM and S. In addition, the oxide barrier also reduces the metal-induced gap-state (MIGS) density at the interface between FM and S, which can release the Fermi level pinning and decrease the effective barrier height. We studied and compared the Schottky barrier height of FM/S and FM/oxide/S and demonstrated that the ultra thin oxide layer between FM and S can modulate the effective barrier height based on measurement of the current versus voltage characteristics and a thermionic emission model. Moreover, we will discuss how contact resistance of spin diodes can be optimized by fine control of MgO layer thickness. 

Don Koun Lee 
Ph.D. Candidate 
Materials Science and Engineering 
Stanford University

Re: Anisotropic Etching of 3612

Robert,

Sputtering etching is not a great way to etch resist. For one resists tend to have low ion sputter yields and thus a low etch rate/selectivity. For an ion flux of 1 mA/cm2 and an ion energy of 500eV its etch rate is only about 20 nm/m while SiO2 and Al have rates of around 33 and 64 nm/m, respectively. These numbers are from a sputter rate table I have. Note that the MRC at 100w/10mT has an est. ion flux of about 0.1mA/cm2 and a bias around -700v so its sputter rates about 1/10th of the above rates. The PQ has higher ion fluxes but you can not get high bias voltages, if you do manage to get the bias voltage up where you need it for sputtering, you usually get stainless steel sputtering from around the top window where the uwave comes in.

A second issue with sputter etching is that it is not real anisotropic compared to what one can get with plasma etching. The problems with sputter etch wall profiles are faceting at the top corners, which leads to sloped walls, and redeposition. Of course, you need very directional ions, and you are not going them with Drytek4 because it cannot go to low pressures. I guess you cannot add O2 to go the usual way of getting anistropic resist wall profiles.

Jim



----- Original Message -----
From: "Robert Chen" <robertchen@snf.stanford.edu>
To: "labmembers" <labmembers@snf.stanford.edu>
Sent: Thursday, November 8, 2012 12:19:28 AM
Subject: Anisotropic Etching of 3612

Hi All,

I'm looking for recipes to do a sputter etch of 3612, something anisotropic with an etch rate of around 300nm/min. Has anyone tried using Ar in DryTek4 or Ar in pquest to do this?

Thanks,

Robert Chen
Electrical Engineering Ph.D. Candidate
Harris MBE Group, Stanford University
http://robochen.web.stanford.edu

Anisotropic Etching of 3612

Hi All,

I'm looking for recipes to do a sputter etch of 3612, something anisotropic with an etch rate of around 300nm/min. Has anyone tried using Ar in DryTek4 or Ar in pquest to do this?

Thanks,

Robert Chen
Electrical Engineering Ph.D. Candidate
Harris MBE Group, Stanford University
http://robochen.web.stanford.edu

[Reminder] Oral defense for Gary Shambat, Nov. 8th, 10AM in Clark Auditorium

Ph.D. Dissertation Defense for Gary Shambat

From Solid State to Soft Matter: Photonic Nanocavities as Advanced 

Optoelectronic Devices and Single-Cell Biomedical Probes

Advisor: Professor Jelena Vučković

Department of Electrical Engineering

 

Thursday, November 8^th 2012

10:00 AM

(Refreshments at 9:45 AM)

 

Location: Clark Auditorium (outside entrance at the very center of Clark Building)

 

Photonic nanocavities are wavelength-scale dielectric structures that possess remarkable properties due to their intrinsic small sizes and high quality factors. Simply by modifying the device materials and optical properties, one can realize nanocavities for diverse applications ranging from lasers to quantum optics and even biosensing. In this talk I will present two drastically different functions of nanocavities, both of which make them more practical for real-world adoption.   

The first half of my presentation will focus on how photonic crystal (PC) cavities can be utilized for ultra-low energy and ultra-fast optical sources for next-generation communications. To date, the true power of these nanocavities has only been demonstrated by using secondary optical control, preventing realistic integration of devices with electronics. We have therefore developed a new platform for efficiently driving PC cavities using a lithographically defined, lateral p-i-n junction. With our lateral junction we have demonstrated a world record low threshold laser with a threshold power of only 208 nW at 50K. At room temperature we find that these same devices behave as ultra-fast light-emitting diodes which can be directly modulated at up to 10 GHz. Additional active photonic devices incorporating a lateral junction will also be discussed.

The second half of my talk describes the demonstration of a whole new class of tools that marry PC cavities to the tips of optical fibers. The form factor of the optical fiber lends itself to operation of the tool in exotic environments never before accessible to a nanocavity. Specifically we have used our probes to interrogate single human prostate cells with internalized PC cavities showing, for the first time, resonant photonic modes inside biological cells. The beams can be loaded in cells and tracked for days at a time, with cells undergoing regular division and migration. Furthermore, we present in vitro label-free protein sensing with our probes as a path towards quantitative, real-time biomarker detection in single cells.

Seminar on "A Corporate VC's view on Displays "

A Corporate VC's view on Displays

Nov 7, 2012 (Today)
Time: 4:15pm
Location: CISX-101

Abstract:

Eileen representing Applied Ventures, the corporate venture capital arm of Applied Materials, will discuss a brief history of LCD and the current state of the display market including the changes happening in the transistor layers for HD LCD and OLED displays . She will also talk about the technical challenges need to be overcome for the mass adoption of OLED TV to occur. Finally, Applied Ventures, who has invested $160M in over 45 companies in the nanotechnology sector including the following companies in display: Halation, Liquavista, Plextronics, TeraBarrier Films, and Kateeva will give a brief overview of some of these investee companies and their plans for the future.

Bio:

Eileen Tanghal joined Applied Ventures in 2008 and was appointed Head of Applied Ventures in October, 2011. Ms. Tanghal is currently board of directors observer at Aventa Systems and BT Imaging. She also manages Applied's investments in Illumitex, Kateeva and Plextronics . She led Applied Ventures' investment in Liquavista and served as a board observer director for the company until it was acquired by Samsung in January, 2011.

Eileen has 14 years of experience working with technology companies in the US and Europe including 10 years of combined financial and corporate venture capital experience and 4 years working directly within venture capital backed startups. Prior to joining Applied, she served as an investment director in the London office of Kennet Partners. Prior to this, Ms. Tanghal was an investment associate with Amadeus Capital Partners Limited, where she worked closely with portfolio companies including Plastic Logic Limited., SPI Lasers (acquired by JDS Uniphase), Forth Dimension Displays (acquired by Kopin) and Artimi. Prior to entering the venture capital industry, she was one of the first ten employees, at PDF Solutions, specializing in semiconductor device design and fabrication. PDF Solutions subsequently went public in 2001 (Ticker: PDFS).

Ms. Tanghal holds a bachelor of science degree in electrical engineering and computer science from the Massachusetts Institute of Technology and an MBA from the London Business School.

SNF Winter Closure and Cleanup, 12/19/12-1/8/13

Greetings labmembers --

It is now official. The annual winter cleanroom closure will begin on
Wednesday, December 19, at 5 pm. The lab will reopen for business on
Tuesday, January 8, 2013, at 8 am.

PLEASE NOTE: ALL personal items must be REMOVED FROM THE LAB!

Personal storage lockers and lab bins will be cleared out and reassigned
in the new year. Therefore, make sure to remove ALL personal belongings
from the lab by Wednesday at 5 pm. This includes WIP shelves, personal
lab bins, shared labware storage, and the red lockers. Feel free to
make use of the vacuum sealers in the lab to keep your items clean as
you remove them from the lab. And if you are not local and cannot empty
your bin or locker, please get in touch with one of your labmates or a
staff member, who can help you. Bins and lockers will be reassigned in
the new year.

Please be warned: any items remaining in these areas after Wednesday,
12/19, at 5 pm will be removed and dispositioned by staff - and we will
not be responsible for accounting for lost items, unless you contact us
in advance.

SNF staff will be here through Friday, December 21, returning to start
up the lab on Monday, January 7, 2013, in observation of the Stanford
University-wide Winter Closure. During this time, SNF cleanroom,
stockroom, and wafersaw room will be closed. The Allen building will be
open to occupants, but access may be limited due to maintenance and
construction work. On Saturday, December 22, the building scrubber
systems will undergo annual maintenance; we advise staying away from the
building during this time as strong odors may result. The toxic gas
system will be tested on Jan. 2-4, 2013, so there will be audible alarms
throughout the building.

If you have any questions, don't hesitate to get in touch --

Your SNF Staff



--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Vacation Coverage

I will be out of the office 11/7-11/15, returning to the office 11/16.  

For any urgent issues, please contact the following:

Fiji1/Fiji2/Savannah: J Provine

CMP/Woollam/Fiji3/MVD Permitting: Ed Myers 

Thanks!

Best,

Michelle

---------------------------------------------

Michelle Rincon, PhD
Process Staff Engineer
Stanford Nanofabrication Facility

(650)-725-0307
mmrincon@stanford.edu

Re: Shutdown p5000etch SNF 2012-11-06 09:02:09: EMO activated

Restarted the system

Shutdown p5000etch SNF 2012-11-06 09:02:09: EMO activated

The emergency off switch was accidentally activated.

Comment p5000etch SNF 2012-11-04 08:42:20: Robot Cal

Preformed robot cal and verified wafer handoff from
storage elevator to chamber A,B and C.

Re: GaAs wafer bonding

Hi Arka,

Not sure what your application requires or what kind of bonding is sufficient, but there's been a lot of success with diffusion bonding and wafer fusion.  For diffusion bonding, thin InGaAs or InGaP layers on the two GaAs wafers are held at low temperature to diffuse the In atoms to form the bond.  Wafer fusion doesn't require additional layers but uses much higher temperatures to form atomic bonds.  Here are two papers:

http://144.206.159.178/ft/CONF/16410985/16410997.pdf

http://www.psicorp.com/library/SR-1322.pdf

Angie

On Nov 2, 2012, at 2:18 PM, arka majumdar wrote:

Hi

Does anyone know whether we can bond one GaAs wafer to another GaAs wafer? What is the surface quality of such bonding? Please let me know

Thanks

Arka

--
Best,
Arka
______________________________________________
Arka Majumdar, PMP, PhD
Postdoc Scholar, UC Berkeley
www.stanford.edu/~arkam
Phone: 6509068666