Dear labmembers,
does anyone deposit ITO (indium tin oxide) for optically transparent gate electrodes?
If so, which technique do you use? We would like to use it with a material where we can not exceed 80 degrees Celsius during processing. Does anyone think this is possible?
Thanks in advance!
Reyes
Dr. Reyes Calvo
Marie Curie IOF Postdoctoral Fellow
Goldhaber-Gordon Lab
Geballe Laboratory for Advanced Materials
McCullough Building, 476 Lomita Mall
Stanford University
Stanford, CA 94305-4045
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