Fwd: Fwd: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)

All,

Thank you for the tremendous support.  As of now, registration is officially closed. 

I have received a number of inquires regarding acknowledgement of registration.  The web site was not configured to send out any acknowledgements.  If you successfully completed the registration form, then your attendance has been captured and we are planning on your attendance. 

Those on the waiting list who registered prior to noon today, should plan on attending.  We may have slightly overbooked the seats, but we will not know until everyone arrives. 

Plasma-Therm and SNF look forward to seeing everyone on Monday.
Regards,

-------- Original Message --------

Subject:	Fwd: Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)
Date:	Thu, 30 Aug 2012 10:36:46 -0700
From:	Ed Myers <edmyers@stanford.edu>
To:	labmembers@snf.stanford.edu

All,

Due to the overwhelming response, we have reached the allowable occupancy level in the conference room.  I encourage you to still sign up, but please be aware it will be on a waiting list status. 

I also encourage those who have registered and know they will not be attending the full two days to let me know.  I'm sure you don't want to be responsible for preventing anyone from attending.

Regards,
Ed

-------- Original Message --------

Subject:	Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)
Date:	Thu, 09 Aug 2012 16:28:22 -0700
From:	Ed Myers <edmyers@stanford.edu>
To:	labmembers@snf.stanford.edu
CC:	Lishan, David (Plasma-Therm LLC) <david.lishan@plasmatherm.com>

All,    SNF and Plasma-Therm would like to invite you and your team members to   attend the Plasma-Therm Technical Workshop: Fundamentals of Plasma   Processing (Etching and Deposition) to be held at the Stanford   University on September 10 and 11, 2012.    The Workshop is intended to provide understanding and insight to those   working with plasma etching and deposition processes and equipment. The   goal is to help researchers make faster progress on projects requiring   plasma processing. The course has been very well received at Harvard, UC   Berkeley, UCLA, Notre Dame, USF, IMRE, Israel, and Lund University.   Graduate students, post docs, professors, and staff have all found the   material useful.    The format encourages questions and we hope attendees take advantage of   the opportunity for networking and discussing their projects. The   workshop is meant to encourage cooperation within the academic and   industrial research communities.    Please be assured that the course is not an advertisement about   Plasma-Therm products.  Aside from a very brief 15 min introduction to   Plasma-Therm, the rest of the day is dedicated to education on   fundamentals and advanced etching and plasma-enhanced chemical vapor   deposition technology. Presentation materials are equally useful to   those that do and do not have our equipment.    Details regarding the Workshop objectives, agenda, location, and speaker   can be found on the attached flyer.    Please note that the workshop is free and registration is requested   online by August 31, 2012 at the website:   http://www.surveymonkey.com/s/FPQLZPQ    Regards,  SNF Staff and Plasma-Therm