RE: Solution for Slow Etch Pit Density Studies in Ge

Robert,

 

Dilute Secco etch from IBM works well for  threading dislocations in SiGe. It required a Silicon cap though.

 

Quick Turnaround Technique for Highlighting Defects in Thin Si/SiGe Bilayers

S. W. Bedella,z, D. K. Sadanaa, K. Fogela, H. Chenb and A. Domenicuccib

doi: 10.1149/1.1676116 Electrochem. Solid-State Lett. 2004 volume 7, issue 5, G105-G107

 

J. Phys. D: Appl. Phys. 42 (2009) 175306 (6pp) doi:10.1088/0022-3727/42/17/175306

Defect identification in strained Si/SiGe heterolayers for device applications

 

Thanks,

 

Bin

 

From: robertatx@gmail.com [mailto:robertatx@gmail.com] On Behalf Of Robert Chen
Sent: Tuesday, August 21, 2012 10:40 AM
To: labmembers
Subject: Solution for Slow Etch Pit Density Studies in Ge

 

Hi All,

 

I'm looking for an etchant for looking at etch pit density studies for Germanium (001) epi (etching pits corresponding to threading dislocations). There are a few recipes out there, but I believe they use some non-standard and non-stocked chemicals in SNF. Does  anyone have a recipe (and the chemicals) that is verified to work for this?

 

Thanks,

 

Robert Chen