Friday, May 18, 2012

Re: KOH etch

TMAH is slower but I think better selectivity.  The classic etch to control outside Si corners is KOH+IPA.  Ask Uli if we can do that at SNF.

jim


From: Young Ik Sohn <ysohn@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Friday, May 18, 2012 10:53 AM
Subject: KOH etch

Dear labmembers,

If anybody knows good KOH etch recipe that has a good selectivity between <100> <111> direction, please let me know.

I need selectivity way over 100.

Thank you.

Best regards,
Young-Ik Sohn


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