TMAH is slower but I think better selectivity. The classic etch to control outside Si corners is KOH+IPA. Ask Uli if we can do that at SNF.
jim
From: Young Ik Sohn <ysohn@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Friday, May 18, 2012 10:53 AM
Subject: KOH etch
Dear labmembers,
If anybody knows good KOH etch recipe that has a good selectivity between <100> <111> direction, please let me know.
I need selectivity way over 100.
Thank you.
Best regards,
Young-Ik Sohn
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