FINAL PROGRAM- Invitation to Raith / Stanford Advanced Lithography Workshop - February 15, 2012

This is the final announcement.  The latest agenda now includes contributions from Dr. Ivan Kravchenko of Oak Ridge National Laboratory, Kelley Rivoire of Stanford University, James Conway of Stanford University, and Ruud Schmits of TNO.  We have already registered ~50% capacity. Stanford's RAITH150 system has just been upgraded with Raith's unique Fixed Beam Moving Stage (FBMS) capability.  In this context, Raith and the Stanford Nanofabrication Facility cordially invite you to attend the Advanced Nanolithography Workshop.  This one day workshop will be dedicated to advanced patterning techniques that have been implemented by Raith for both electron and ion beam lithography to enhance nanoscale fabrication beyond traditional vector scan patterning. Please use the link below to automatically register for the workshop. As space is limited, we hope that you can confirm as soon as possible. When: Wednesday February 15, 2012 Where: Allen Building Auditorium (ALLEN 101X), Stanford University Time: 9:00 AM - 5:00 PM Click Here to Register Agenda 9:00 AM - 9:30 AM Gather, greet and meet over coffee and light snack. 9:30 AM - 9:45 AM Opening remarks James Conway, Ebeam Technology Group, Stanford Nanofabrication Facility, Stanford University 9:45 AM - 10:45 AM Zero Stitching Error Lithography by Raith Fixed Beam Moving Stage (FBMS) - For Nanophotonics, Plasmonics, and More Jason E. Sanabia, Ph.D., President & CEO, Raith USA, Inc. 10:45 AM - 11:45 AM Stitch Error Free Nanofabrication for Photonics Research and Development at TNO Ruud Schmits, Researcher, Nano-instrumentation, TNO 11:45 AM - 12:00 PM Group Photograph 12:00 PM - 1:00 PM Lunch served (soup, sandwiches, salads), Allen X Courtyard Patio 1:00 PM - 1:30 PM Multiply resonant photonic crystal cavities Kelley Rivoire, Ph.D. Candidate with Prof. Jelena Vuckovic, Electrical Engineering, Stanford University 1:30 PM - 2:15 PM  Large area e-beam lithography on insulator and metal substrates Ivan Kravchenko, Ph.D., Center for Nanophase Materials Sciences, Oak Ridge National Laboratory 2:15 PM - 3:15 PM Zero Stitching Error Lithography by Raith Modulated Beam Moving Stage (MBMS) - Advanced Periodic Patterning Jason E. Sanabia, Ph.D., President & CEO, Raith USA, Inc. 3:15 PM - 4:15 PM Ion Beam Lithography with Advanced Patterning Modes, Joseph Klingfus, Ph.D., Applications Scientist and Project Manager for the Stanford RAITH150, Raith USA, Inc. 4:15 PM - 5:00 PM Open discussions

 

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