Problems with ChA pressure control were reported earlier.
Cesar re-crimped connections and tested the standard Al etch process -- pressure now seems to control just fine for this process. Because of user demand, he did not test other processes.
ChA is OK to use for now, but be aware it has not been thoroughly tested. Make sure to run a couple of dummy wafers on your process and carefully monitor especially the pressure -- before committing your wafers. And please make sure to report your observations, good or bad.
Cesar/Elmer will test further Sunday/Monday;.
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