Heat to 40 or 50 C for greater rate is standard.
Resist adhesion may be an issue, re-bake on a hot plate just before etch and repeat if you dry it off for inspection and then etch more.
jim
From: Suyog Gupta <suyog@stanford.edu>
To: labmembers@snf.stanford.edu
Sent: Tuesday, October 4, 2011 5:35 AM
Subject: Wet etching TiW?
Dear Labmembers,
I was wondering if anybody has tried wet etching TiW? I have about 100nm of TiW on Al2O3 that I need to wet etch.
H2O2 seems to work but the etch rate at room temperature turned out to be too slow ~ 3 nm/min. If you have any suggestions, please let me know!
Thanks,
Suyog
I was wondering if anybody has tried wet etching TiW? I have about 100nm of TiW on Al2O3 that I need to wet etch.
H2O2 seems to work but the etch rate at room temperature turned out to be too slow ~ 3 nm/min. If you have any suggestions, please let me know!
Thanks,
Suyog
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