Friday, November 5, 2010

Announcement ION BEAM LITHOGRAPHY PRESENTATION by Dr. Lloyd Peto RAITH GmbH Tuesday November 9, 2010 09:30 AM NANOCENTER 143



Greetings:

It is my pleasure to announce a special presentation in Ion Beam Lithography by Dr. Lloyd Peto from Raith GmbH whom will be visiting Stanford this next Tuesday November 9, 2010.

His presentation will be held in the Nanocenter 143 conference room starting at 9:30 AM. The room is
reserved through 11:30 AM to allow for through discussions in Applications of Ion Beam Lithography and the  IonLine system.   All interested parties are welcome to attend and participate in these discussions.  It is hoped that this meeting will create further interest in Ion Beam Lithography here at Stanford.

Thank you for considering attending this meeting,

James Conway
Ebeam Technology Group
Stanford Nanofabrication Facility

 



Ion Beam Lithography with the new Raith ionLiNE Platform

 

 

Abstract:

 

The Raith ionLiNE is new and dedicated ion beam lithography (IBL) system which is the realization of an advanced lithography platform with a highly focused ion beam source.   IBL offers an extension to nanofabrication without many of the limitations of electron beam lithography (EBL), while being fully compatible and complimenting it.  Combining EBL and IBL processes within a single GDSII file is enabling new results and removing the processing limits of conventional tools sets.  Distinct from the established FIB technology, which is based on an analytical SEM platform, IBL opens new frontiers of nanofabrication where resist free, large area, and direct 3-D nanoscale patterning is made possible in an automated and stable platform with nanometer pattern placement accuracy and negating the requirement for direct imaging, simultaneous inspection or user added process variability. 


Neil Lloyd Peto BSc Hons Physics

Lloyd has been working with focused ion beams since being an undergraduate. Initially working at the Rutherford Appleton Research Labs in Oxfordshire but then joining FEI in 1993 as an applications engineer. Lloyd has since worked for FEI company, Micrion corporation and now Raith GmbH in a number of countries. His career progressed through applications development, business development, sales management, marketing, and management of several commercial ion beam lab.



 

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