Re: Cleaning after dry etching (Removal of Fluorine)

Jim,

 

I meant after using SF6 or CF4 gas in drytek1/2.

Let me know if you need further information.

 

Joongsun

On Mon, Nov 16, 2009 at 6:01 PM, Jim McVittie <mcvittie@cis.stanford.edu> wrote:

Joongsun,

Can you define what you mean by Fluorine contaminants? What etch process
are you coming from? When I know more about what you want, I may be able
to give you some info.

       Jim

On Mon, 16 Nov 2009, Joongsun Park wrote:

> Dear labmembers,
>
> Does anyone know how to clean samples after dry etching?
> I could observe a lot of Fluorine contaminants after etching. If anyone
> knows cleaning processes please let me know.
> Many thanks in advance.
>
> Best,
> Joongsun
>

--
--------------------------------------------------------------
James (Jim) P. McVittie, Ph.D.          Sr. Research Scientist
Paul G. Allen Building                  Electrical Engineering
Stanford Nanofabrication Facility       jmcvittie@stanford.edu
Stanford University                     Office: (650) 725-3640
Rm. 336X, 330 Serra Mall                Lab: (650) 721-6834
Stanford, CA 94305-4075                 Fax: (650) 723-4659