Thursday, July 9, 2009

Maskless Patterning: Presentation Today (Thurs), 7/9, 1:30 pm, 101X

Greetings labmembers:   Our esteemed Gary Yama is hosting a presentation by Intelligent Micro Patterning, a company that manufactures the SF-100 maskless photolithography system.  This is a UV-direct-write system which allows you to expose photosensitive substrates without a mask, with feature sizes down to one micron.  The substrate surfaces can be curved as well as flat.  This technical presentation will take place today, Thursday, July 9, at 1:30 pm in the Allen 101X auditorium.  More information about this system can be found on the company website at: http://www.intelligentmp.com
 
--  Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA  94305 (650)723-9980 mtang@stanford.edu http://snf.stanford.edu 

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