Problem p5000etch SNF 2012-03-30 21:39:28: DC bias drop on Chamber B

Running Jim Oxide:
dummy 120sec, DC bias good
test wafer 120sec, noticed DC bias low at the end of the run
measured etch rate: 589A/min (typically between 3300-3500 A/min)
ran test wafer again, watching DC bias. It remained near -500V for the entire 120sec etch. Measure etch rate of 3473 A/min.
Ran two more test wafers for 120sec, DC bias remained steady around -500V.
Loaded 6 production wafers for 144sec. First one ran smoothely. Second one started smoothely, about 50sec into the run DC bias dropped. I stopped the run at 60sec in an aborted the rest.
This problem happened a while back and it turned out to be the quartz ring was shorting.

Re: Problem p5000etch SNF 2012-03-29 09:48:09: Ch.A and Ch.C needs quals

Done and posted

Comment p5000etch SNF 2012-03-30 16:30:42: Quick check of metal etch

Quick check of metal etch;
Al etch rate = 5277A/min without Break Though Step
Al etch rate = 5598A/min with Break Though Step (10 secs)

Comment p5000etch SNF 2012-03-29 17:28:45: Qual for CH.C results

I ran the recipe CH.C POLY ETCH.
Poly ER = 2920A/min
PR ER = 603A/min
Single Crystal Si ER = 2404A/min
Thermal Ox ER = 306A/min
Poly : PR = 4.8 : 1
Poly : Ox = 9.5 : 1
Poly : Single Cr Si = 1.2 : 1

Problem p5000etch SNF 2012-03-29 09:48:09: Ch.A and Ch.C needs quals

Re: Problem p5000etch SNF 2012-03-15 10:18:40: Ch.A needs a process qual

Archived

Re: Comment p5000etch SNF 2012-03-20 14:41:00: Ch.A and B are up

Archived

Re: Comment p5000etch SNF 2012-03-20 16:26:56: Chamber C

Archived

Re: Problem p5000etch SNF 2012-03-15 10:17:50: Ch.C is down

Was able to make the pneumatic cylinder work after reversing the direction of the air metering valves. The metering valves now restricts the incoming air and have the exhaust air at full flow instead of the other way.
Ran 16 wafers through Ch.C with no problems.

Blue TGO alarms last night .... SNF open for business

SNF Lab Members:

If you were here last night, you know that the blue TGO alarms went off
at about 11:50 p.m. The event that triggered this alarm was an apparent
failure of the exhaust system in the clean room. I say "apparent"
because it is not yet clear whether the exhaust actually failed or
whether the pressure sensors that monitor the system failed. We are
working with the appropriate facilities personnel this morning to try to
sort that out. I believe that the alarms were silenced at about 12:20
a.m. when the Palo Alto Fire Department reset the system.

I can tell you with confidence, however, that there was no gas leak last
night even though the blue alarms went off.

I also believe that all gas cabinets have been reset so that pressures
and flows should behave normally. However, after an event of this type,
it is always wise to carefully monitor gas flows and pressures carefully
to look for any anomalous conditions.

The lab is, however, fully operational this morning.

Please let me know if you have any questions or concerns.

Thanks,

John

FW: [MSE-Students] Possible Offering of MSE 353

Dear snf members,

This might be of your interest...

Yusuke Matsuda

Yusuke Matsuda
Ph.D. Candidate
Email: yusuke.matsuda@stanford.edu
http://dauskardt.stanford.edu/people/ymatsuda.html
Tel: 1-650-704-4786 (Cell)
Department of Materials Science and Engineering
496 Lomita Mall, Durand Bldg., Rm. 112
Stanford University
Stanford, CA 94305
USA

-----Original Message-----
From: mse-students-bounces@lists.stanford.edu
[mailto:mse-students-bounces@lists.stanford.edu] On Behalf Of William D. Nix
Sent: Monday, March 26, 2012 11:33 AM
To: MSE Graduate Students; MSE Undergraduates
Subject: [MSE-Students] Possible Offering of MSE 353

MSE Students and others:

I am considering the possibility of offering MSE 353, Mechanical Properties
of Thin Films, next Winter quarter. I am interested in knowing who might
wish to take the course. Let me know if you think you might be interested
in taking the course and tell anyone in other departments who might be
interested.

Thanks

WDN

--
William D. Nix
Lee Otterson Professor of Engineering (Emeritus ) Department of Materials
Science and Engineering
496 Lomita Mall, Durand Bldg., Rm. 117
Stanford University
Stanford, CA 94305-4034
phone: (650) 725-2605
fax: (650) 725-4034
e-mail: <mailto:nix@stanford.edu>nix@stanford.edu
--++**==--++**==--++**==--++**==--++**==--++**==--++**==
mse-students mailing list
mse-students@lists.stanford.edu
https://mailman.stanford.edu/mailman/listinfo/mse-students

postdoc/research associate in nanofab at SLAC

All,

Dr. Anne Sakdiniwat, who's recently moved from LBNL to SLAC, is looking
for a nanofabrication guru -- see the attached flyer.

Roger

potential EE412 projects

dear labmembers,

there is a rolling list of potential EE412 projects (and the possible mentors associated with each) now online here:

https://snf.stanford.edu/SNF/processes/ee412/list-of-potential-ee412-projects 

other ideas are welcome of course, and this will be changed over time as projects are completed and new ones added.  if you want to participate in EE412 for the spring 2012 quarter you should have spoken with your possible mentor already, but there are still a few days left before the quarter begins in case you can put together a detailed proposal.

thanks,

j

looking for EE412 partner to examine contamination in cleanroom

Hello everyone,

My name is Kimberly Harrison.  I am a graduate student in Prof. Roger Howe's lab, working on contacting M/NEMS switches.  For the spring quarter, I am looking for a partner for EE412.  I have proposed a project involving contamination of MEMS devices in the SNF cleanroom.  Depending on my partner's interest, the project scope could expand to include other devices.  I have described my project below, and also attached a more detailed testing plan to this email. 

The project will focus on contamination from the release/dry steps of a standard MEMS process (including wet HF release, CPD dry and vapor HF release).  My study will include Si wafers that are both unpatterned and patterned, as well as wafers with a metal and ceramic coating.  I will use XPS spectroscopy (available in the SNL) to verify the presence of excess carbon contamination.

I have already pitched the idea to Prof. Solgaard, and J Provine has offered to be the mentor for this project.

If you are interested or know someone who might be, please let me know!

Thank You,
Kim

Reminder: Course Announcement- E204: Research Ethics for Engineers & Scientists

Dear labmembers --

Have you ever wondered:

- How is authorship on a paper decided? Who gets to be first author?
- Who should be included as an inventor on a patent?
- What can and should you do if you suspect data fraud?
- Is it data fraud to omit a few "bad" points?
- How should peer review be handled? How is it actually done?
- Are you responsible for anticipating the ways, good and bad, that your
research might be used?
- What are the responsibilities of mentors and mentees?
- What kinds of conflicts of interest are important to avoid?

Explore these issues and more, in E204, Research Ethics for Engineers
and Scientists, a course that examines the PRACTICAL aspects of
ethics for researchers with lectures, discussions, guest speakers, and
real case studies. This course is 1-2 units and will be held Spring
term, on Thursdays, 2:15 PM - 4:05 PM. The course instructor is
Prof. Robert McGinn. Last year's course featured the following guest speakers:
- Prof. Malcolm Beasely, Applied Physics, who headed the Hendrik Schon
commission
- Katherine Ku, Director of the Office of Technology Licensing, on
the ethics of licensing
- Prof. Roger Howe, Electrical Engineering, on authorship, publication
and intellectual property

For more information, see the Bulletin or contact Prof. McGinn.

For those of you supported by NSF fellowships, this course satisfies the NSF
requirement for "Training in the responsible and ethical conduct of
research." (http://dor.stanford.edu/rcr.html)

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu

Re: Comment p5000etch SNF 2012-03-22 06:31:39: No Cl2 or HBr

Cl2 and HBr are available.

Re: Shutdown p5000etch SNF 2012-03-22 14:40:03: Working on Heat exchanger 1

Heat changer is back on...

Shutdown p5000etch SNF 2012-03-22 14:40:03: Working on Heat exchanger 1

SpecMat/Change Control Board (CCB) Form

Hi All,

The SpecMat/Change Control Board (CCB) Form has been moved from our old
site to the wiki:

https://snf.stanford.edu/SNF/materials-and-chemicals/specmat-requests/CCB%20Request%20Form%20v2.docx/view

-m

--
maurice@stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA 94305
P. (650)725-3660
F. (650)725.6278

Comment p5000etch SNF 2012-03-22 06:31:39: No Cl2 or HBr

Corrosives vault duct work replacement underway,. Due to be complete by noon Friday.

Ph.D. Oral Examination - Shasha Wang

Stanford University Ph.D. Oral Examination – Department of Electrical Engineering

 

Title:

Hermetically Encapsulated Fully Differential Breathe-Mode Ring Resonator

 

Speaker: Shasha Wang

Advisor: Professor Thomas W. Kenny

 

Date: Thursday, March 22, 2012

Time: 2:00 pm (refreshments at 1:45 pm)

Location: Allen-X Auditorium (formerly CIS-X Auditorium) - Room 101

 

Abstract: 

As the modern electronic devices continue to miniaturize and integrate more functionalities, silicon based MEMS timing references attract more attentions and are replacing quartz crystal in the $5 billion market. They offer a lot of advantages such as small foot-print, low cost, low power consumption, etc.  However, the performance of MEMS based timing reference still need improving to overperform the well-establised quartz crystal. The oscillators' phase noise performance is particularly important, since the frequency references in RF devices must satisfy stringent phase noise specifications. In this talk, I will talk about how to design a MEMS oscillator to achieve good phase noise performance. 

First, I will talk about how to design MEMS resonators with high quality factor through minimizing air damping, anchor loss and thermoelastic dissipation. We have designed and fabricated a fully-differential breathe-mode ring resonators with a quality factor as high as 473,000 at 10MHz. This quality factor is approaching the theoretical maximum quality factor, set by the phonon to phonon scattering in the material. However, the motional impedance of our resonator is very high due to large transduction gap size limited by the fabrication process. We designed and analyzed an OP-AMP based three-stage trans-impedance amplifier to provide sufficient gain for close loop oscillation. Close-to-carrier (1kHz offset) phase noise performance of -120dBc/Hz is achieved.  The relatively poor noise performance is due to high motional impedance of our resonator. 

In the second part, I will talk about how to modify our fabrication process flow to reduce the resonator's motional impedance. We used surface mico-machining combined with bulk micro-machining to achieve a transduction gap size as small as 260nm, which reduces the motional impedance by 16x and also lowers DC bias voltage requirement. The resonator's quality factor and stability is well maintained too.

In the last part, I will briefly talk about using InvenSense Nasiri Fabrication platform to achieve integrated MEMS-CMOS structures. Open loop transmission response of the ring resonator with integrated CMOS Trans-impedance amplifier will be presented. Additionally, mechanical coupling method is used to form ultra-narrow bandwidth (<0.05% BW) breathe-mode ring filters. 

-------------------

Shasha Wang

PhD Candidate

Electrical Engineering Department

Stanford Micro Structures and Sensors Lab

Stanford University, California, USA

Special Seminar - Dr. Peter Kiesel (Palo Alto Research Center), Thursday April 05, 4:15PM, CISX 101

Special Seminar Presented by the Stanford Optical Society

 

 Opto-fluidic Detection System Enabling Sophisticated Point-of-care Diagnostics

Dr. Peter Kiesel

PARC (Palo Alto Research Center, Inc.)

Thursday, April 05, 4:15 PM, CISX 101 Auditorium

Refreshments at 4PM

 

The strategic landscape for biological and biomedical testing is undergoing a truly disruptive transformation. Today the majority of tests are performed at major, centralized clinical laboratories since compact, robust, and inexpensive instruments for point of care (POC) testing are not available. The principal drivers for POC testing are reducing costs, obtaining timely test results, lowering mortality rates, and reducing morbidity. We have demonstrated and prototyped a new optical detection approach that delivers high signal-to-noise discrimination – without complex optics, expensive detectors or bulky excitation sources. It therefore enables a truly compact and low-cost microfluidic-based instrument that can be used for diagnostics on whole blood or other complex fluids. The enabling technique is termed "spatially modulated emission" and generates a time-dependent signal as a continuously fluorescing bio-particle traverses a predefined pattern for optical transmission. Correlating the detected signal with the known pattern achieves high discrimination of the particle signal from background noise. The detection technique has been evaluated with measurements of CD4+ lymphocytes in human blood, which is required for initiation and monitoring the treatment of HIV-infected patients. The technique has been benchmarked against a commercial instrument and excellent agreement for both absolute CD4 and percentage CD4 has been demonstrated. More recent experiments showed that our detection platform can address a large variety of diagnostic needs including multiplexed bead-based assays (ELISA on-the-flow) and identification and enumeration of pathogens (e.g., Giardia, Cryptosporidium and E.Coli) in fluids.

About the speaker

Dr. Peter Kiesel, Principal Scientist, Palo Alto Research Center  

Dr. Kiesel is conducting research in the areas of compact optical sensing systems, ultra sensitive light detection, and nitride based light emitters. Leading the optical detection group at PARC, Peter's current research and development activities include compact on-chip optical detection systems targeting bio-technological and medical applications. Key technologies that he has developed over the last 5 years include:

·   Micro-fluidic-based optical detection platform for on-the-flow analyte characterization;

·   Spatially modulated excitation and emission technique for analyte detection with improved signal-to-noise discrimination which enables point-of-care flow cytometers;

·   Low-cost interrogation unit for wavelength-encoded optical sensors;

·   Improved light/target interaction by guiding light in the fluid containing the analyte;

·   Cavity-enhanced sensing, a method enabling on-the-flow absorption and refractive index measurements in a microfluidic device;

·   Chip-size spectrometer which enables fluorescence spectroscopy on a chip; and

·   Detection of individual bacteria based on native fluorescence.

Dr. Kiesel is author or coauthor of more than 240 scientific publications including 90 refereed journal articles, 53 issued patents, 22 patent applications and 3 book chapters. He has organized many international workshops and conferences and has been the principal investigator on more than 12 research projects covering a large variety of sensing systems and optoelectronic devices (e.g., pathogen detection in water, micro-fluidic flow cytometer, bio-detection based on native fluorescence spectroscopy, highly efficient light emitters, light modulators, sensitive photo detectors, opto-optical switches, and polarization coded logic elements).

 

http://photons.stanford.edu