Stanford Nanoscience & Nanotechnology Society Seminar:
Spin-Torque Strikes Back!: The Present & Future of Spintronics
Larkhoon Leem (James Harris group)
When: TODAY, Jan. 30th 12pm
Where: McCullough Rm 115
.
Free Food (pizza) served at 11:45am
For more information please visit http://nanosociety.stanford.edu
* SVTC company background
* Making the transition of your project from SNF to SVTC
* Toppan company background
* E-beam lithography services at SVTC
* Summary and timeline
The representatives of SVTC and Toppan will be happy to hear your
comments and questions.
Refreshments will be served.
Thanks,
Tim Holme
Prinz Group
Please come to the Labmembers meeting this Friday, Jan. 30, at 1 pm in
the CISX Auditorium. We will review:
- Shutdown activities (while the rest of us were enjoying time off, the
maintenance and facilities crews were hard at work...)
- Quality Circle round-up (labmember metals survey, innotec
reservations, Coral data entry, new equipment)
- General updates (problem tools of the month, EE410, ASML, what the
Nanoscience building means to SNF)
All members of the lab community are welcome.
Your SNF Staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
j
Since Rishi had the nerve to schedule his thesis defense for 3 pm
tomorrow --
http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3531:200901:pnonfglgbnhdepopgokc
and as most of us on the staff wouldn't miss this for anything, even a
CleanCon meeting, the CleanCon is being postponed to 4:15 pm. It will
still be in CIS 101. The agenda is to review the project list
http://snf.stanford.edu/cgi-bin/ezmlm-cgi?mss:3526:200901:nhnfdgpjodaabkfkjplp
Bring your process/materials/contamination concerns.
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
The Optical Society of America / SPIE Stanford Student Chapter presents:
"Light Emitting Diodes for Solid State Lighting"
Speaker: Dr. Klaus Streubel, OSRAM Opto Semiconductors
Thursday, January 22, 2009
4:15pm, Ginzton Building, AP200
Refreshments at 4:00pm
Abstract:
Artificial light is an ubiquitous 'resource' for every day life. Due to a wide range of demands a huge variety of light sources has been invented in the past. Probably the most ingenious one are light emitting diodes (LEDs) which produce light by recombination of charge carriers in a solid. While formally only utilized as status indicators due to their limited power, today's LEDs have reached a status to revolutionize almost any lighting application in the near future.
The talk will illustrate the physical challenges for generating and extracting light using small and wide bandgap semiconductors. It will be highlighted how technologies, pioneered by OSRAM Opto Semiconductors, boosted the efficacy of InGaAlP and InGaN based light emitting diodes over the past decade. With the presented developments, the still ongoing race for ultimate efficacy and power already lead to devices which beat any other light source with respect to most demands and specifications. With its unique properties, LEDs even open up new opportunities as will be demonstrated by many examples. So there is time for a change in illumination and visualization.
About our speaker:
Dr. Klaus Streubel is Senior Director R&D at Osram Opto Semiconductors and head of the Conceptual Engineering department. He is responsible for the research and pre-development activities in the area of LEDs and Lasers at Osram OS.
Dr. Streubel received his diploma and PhD degree in Physics from the University in Stuttgart. For his PhD, he developed MOPVE systems and growth processes for InGaAs semiconductors. He spent two years as a post doc at the Swedish Institute of Microelectronics in Stockholm, where he was involved in the development of semiconductor lasers. In 1993, Dr. Streubel took a permanent position at the Royal Institute of Technology (KTH) in Stockholm, where he received a lecturer certificate and was appointed as adjunct professor. At KTH he led and grew the long wavelength vertical cavity laser group and started a successful collaboration with the University of California in Santa Barbara.
In 1997, Dr. Streubel switched from academic to industrial research. The following two years, he developed vertical cavity lasers and resonant-cavity LEDs at Mitel Semiconductors in Järfälla, before he joined Osram Opto Semiconductors in Regensburg, Gemany in 1999. At Osram he took the responsibility for the development of AlGaInP devices and initiated the implementation of thin-film technology for high-brightness LEDs.
Dr. Streubel has authored and co-authored over 120 scientific publications and more than 100 conference contributions. In 2004 Dr. Streubel and his team were awarded with the Osram Innovation Award for his work on AlGaInP LEDs. In December 2007, he was awarded with the German Future Price of the German Federal President for the innovation of thin-film LEDs.
Rishi Kant
Department of Electrical Engineering
Stanford University
Date: Friday, January 23rd, 2009
Time: 3 pm (Refreshments before)
Location: Packard Building, Room 202
Abstract:
Over the last decade, designers have sought to supplement traditional micro-fabrication with the ability to create 3D curved surfaces, in order to build new and novel micro & nano-devices. One such technique is silicon migration, which can generate atomically smooth, in-plane & 3D curved structures, in a batch fabrication-compatible manner. This work focuses on the development of silicon migration as a micro/nanotechnology processing tool. Contributions were made to three essential areas: 1) Fundamental investigations into the conditions/parameters governing the silicon migration phenomenon; 2) Development and validation of a simulation tool for predicting the 3D transformation; 3) Demonstration of applications to improving photonic crystal performance and micro/nano-fluidic integration. This work develops and demonstrates the potential of silicon migration for creating a new generation of micro & nano-devices.
During the day we have been receiving growing complaints regarding
odors in the Litho area. I contacted facilities at 2pm to report the
problem of a "musty" odor and humidity of 37% in the Litho area. At
3pm facilities reported all the control systems are and have been
within specification. Talking with lab members, they report smelling
a faint odor beginning on Tuesday (which was not reported) and it
appears to be growing during the day.
Unfortunately, facilities has gone home for the day. I did get a
promise from them, that if the problems remains on Thursday morning
they will go in to the fab and help us locate the origin of the odor.
If you find this odor to be offensive, please refrain from working in
the litho area.
Regards,
Ed
Rishi Kant
Department of Electrical Engineering
Stanford University
Date: Friday, January 23rd, 2009
Time: 3 pm
Location: Packard Building, Room 202
Abstract:
Over the last decade, designers have sought to supplement traditional
micro-fabrication with the ability to create 3D curved surfaces, in
order to build new and novel micro & nano-devices. One such technique is
silicon migration, which can generate atomically smooth, in-plane & 3D
curved structures, in a batch fabrication-compatible manner. This work
focuses on the development of silicon migration as a
micro/nanotechnology processing tool. Contributions were made to three
essential areas: 1) Fundamental investigations into the
conditions/parameters governing the silicon migration phenomenon; 2)
Development and validation of a simulation tool for predicting the 3D
transformation; 3) Demonstration of applications to improving photonic
crystal performance and micro/nano-fluidic integration. This work
develops and demonstrates the potential of silicon migration for
creating a new generation of micro & nano-devices.
Absolutely unbelievable and selfish lab member behavior. This
morning I came in and found absorbent pads all around the CMP system,
the carboy over flowing and wafer saw grit inside the CMP unit. It
appears some selfish lab member feels their project is more important
and subsequently it's fine to cross contaminate the tool sets. I now
have a mess to clean up and have lost a $350 CMP pad.
As a working lab member community, I would hope you would self police
and prevent and or identify the individuals displaying this type of behavior.
Ed
Would appreciate any pointers for the following problem that we are facing.
1. We need to wet etch TiO2 and TaO2 with selectivity to thermally grown SiO2.
2. This may require some non-HF based solutions or an HF based solution which has very fast etch rates for at least TiO2 or TaO2.
Please let me know if anyone has any information on this.
thanks much,
Regards,
Pawan
The next Cleanliness/Contamination meeting will be Friday, 1/23, at 3 pm
in CIS 101. We'll review the process capability improvements that have
been brought up in previous meetings:
1. Quantifying contamination (lifetime testing/CV's).
2. Gold-contaminated RTA processing that is controlled and reproducible.
3. STS DRIE: Allow etching of substrates which may contain metals
(semiclean or gold), while ensuring against contamination of critical
clean processes.
4. "Semiclean" chrome deposition and etch.
5. Upcoming/expected ALD installation.
6. STS PECVD chamber clean improvement.
If you've got a process requirement relating to
cleanliness/contamination or equipment capability you like to discuss,
let us know and we'll include in the agenda.
Mary
Biomedical Application of Carbon Nanotubes
Dr. Zhuang Liu (Hongjie Dai group)
When: Friday Jan. 16th 1pm
Where: CISX 101
Free Food (pizza) served at 12:45pm
For more information please visit http://nanosociety.stanford.edu
Process Clinics resume, the first one this year being today (Monday), from 2-4 pm in the cubicle area near Maureen's office. Bring your process runsheets (or
learn how to make one), your processing questions, mask layouts, etc. Staff will be on hand to help out where we can. Senior labmembers are
especially welcome to offer advice. We'll be there!
Your SNF staff
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang@stanford.edu
http://snf.stanford.edu
Our annual EE410 class begins processing the week of Jan. 12th and
runs for 6 consecutive weeks. You will see reservations appearing
each week on Tuesday, Wednesday and Thursday's as the staff holds the
equipment for each week's lab processing requirements. In addition
there is substantial processing required on Friday through Monday to
prepare the wafers for the next lab section. You will see
reservations appear on these days for the TA's to complete the
necessary processing.
The EE410 mask design and process flow has been up-dated and changed
to reflect the capability of the ASML tool. Beginning this year you
will see more processing emphasis on the P5000, LAMPOLY and more
furnace work and less use of the Dryteks. Please work with us during
the next 6 weeks as we provide the EE410 students with a crash course
in semiconductor processing.
Regards,
SNF staff and EE410 TA's
The lab is OPEN for business as of 7 am on Tuesday, January 6
Please be aware that not all equipment may be available or qualified.
Check current status on Coral. In addition, there have been some
changes in the following operations:
Tylan oxidation furnaces (tylan1-2): In order to integrate data
collection into Coral, data entry will be requested when any of these
furnaces is disabled. To aid in transition over to this new system,
station logsheets have been updated to reflect data requested. The
tylan ox furnaces will allow us to test data collection methods, which
we plan to extend to other operations in the lab.
Svgcoat: i-line resist has been moved to the back track while dyed
resist has been moved to the front. Check station notes and the wiki
for recipe info.
svgdev: Developer programs now all use MF-26A. Check station notes and
wiki for updated recipes.
Wbgaas: New hot plate controller -- different operating procedures are
under development - see Uli if you want to use this.
innotec and stsetch: Understanding that reservations are difficult for
these systems, Staff are reserving 2 am-6 am weekdays on these tools for
standy-by use. Contact staff about getting access to standby reservations.
Welcome back!
Your SNF Staff